JPS59195148A - Gas detecting element - Google Patents

Gas detecting element

Info

Publication number
JPS59195148A
JPS59195148A JP6839683A JP6839683A JPS59195148A JP S59195148 A JPS59195148 A JP S59195148A JP 6839683 A JP6839683 A JP 6839683A JP 6839683 A JP6839683 A JP 6839683A JP S59195148 A JPS59195148 A JP S59195148A
Authority
JP
Japan
Prior art keywords
gas
combustion
metal oxide
sintered
oxide semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6839683A
Other languages
Japanese (ja)
Inventor
Toshi Sakai
酒井 才
Kiyoshi Fukui
清 福井
Koji Komatsu
宏二 小松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHINKOSUMOSU DENKI KK
New Cosmos Electric Co Ltd
Original Assignee
SHINKOSUMOSU DENKI KK
New Cosmos Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHINKOSUMOSU DENKI KK, New Cosmos Electric Co Ltd filed Critical SHINKOSUMOSU DENKI KK
Priority to JP6839683A priority Critical patent/JPS59195148A/en
Priority to KR1019830006122A priority patent/KR870001325B1/en
Priority to DE8484300573T priority patent/DE3476270D1/en
Priority to EP19840300573 priority patent/EP0115953B1/en
Publication of JPS59195148A publication Critical patent/JPS59195148A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/12Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)

Abstract

PURPOSE:To obtain a gas detecting element having stable sensitivity and responsiveness without any variation, etc. in output due to the combustion heat in a gas to be detected, by depositing specified elements such as Bi, P on the surface of a sintered body of metal oxide semiconductor to suppress the combustion activity of the surface layer. CONSTITUTION:The parts of metal oxide such as SnO2, ZnO is screen-printed on the surface of an alumina substrate 1 provided with a platinium heater electrode 2 at the rear surface and a platinum electrode 3 at the surface respectively, dried and sintered to form the metal oxide semiconductor 4. Next, 0.01mol% aqueous solution of H3PO4, Pb(NO3)2, TiCl3, Bi(NO3)3.5H2O is impregnated into the sintered body, and said body is dried, then thermally decomposed for 1hr at 600 deg.C to deposit the material for obstructing the combustion of the detecting gas at the surface of the semiconductor 4. Thus, the output variation due to the combustion heat of the combustible gas to be tested such as H2, C2H5O and the error generation due to the decrease of the concn. of the gas attaining to the inner part of the sintered layer 4 due to the combustion are prevented and the stable sensitivity and the responsiveness are obtained.

Description

【発明の詳細な説明】 この発明は、金属酸化物半導体の燃焼活性を抑制したガ
ス検知素子に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a gas sensing element in which the combustion activity of a metal oxide semiconductor is suppressed.

第1図は従来のカス検知素子の一例を示す側断面図で、
1はアルミナ基板、2はpt膜上ヒータ3はpt電極、
4は5no2.Fe2O3+ ZnO等の金属酸化物半
導体である。
Figure 1 is a side sectional view showing an example of a conventional waste detection element.
1 is an alumina substrate, 2 is a PT film heater 3 is a PT electrode,
4 is 5no2. It is a metal oxide semiconductor such as Fe2O3+ ZnO.

このよ5VC1金IA’(II化物半導体4を用いたガ
ス検知素子は、5n02 r Fe2O3,ZnO等の
金属酸化物半導体自体か酸化触媒としての活性を有して
いる1こめに、可燃性ガスに接したときガス検知素子の
表層で燃焼反応が起る。このため、ガス検知素子圧おい
ては、一定濃度のカス中で素子感度の応答特性に異常を
きたす1例えば、金属酸化物半導体4にZnOを用いた
厚膜焼結型のガス検知素子においては、第2図に示すよ
うにエタノール0.1%の一定濃度中で温度T=400
’C;で動作させ1こ場合の出力は時間経過にともなっ
て減衰し安定しない。
This gas detection element using 5VC1 gold IA' (II compound semiconductor 4) is capable of reacting to combustible gases by using metal oxide semiconductors such as 5n02r Fe2O3, ZnO, etc., which themselves have activity as oxidation catalysts. When in contact, a combustion reaction occurs on the surface of the gas sensing element.For this reason, at the gas sensing element pressure, the response characteristics of the element sensitivity will be abnormal in the gas at a certain concentration. In a thick-film sintered gas sensing element using ZnO, as shown in Figure 2, the temperature T = 400 in a constant concentration of 0.1% ethanol.
When operated at 'C;, the output in this case attenuates over time and is not stable.

また、第3図に示すように金属酸化物半導体4VcSn
O□ を主剤とする厚膜素子を有するガス検知素子ケ約
350℃で動作させた場合、H2(#!。
Moreover, as shown in FIG. 3, metal oxide semiconductor 4VcSn
When a gas sensing element having a thick film element mainly composed of O□ is operated at approximately 350°C, H2(#!.

度0.1%)やエタノール等の被検知ガスに対する応答
特性にオーバシュートが現わハる。このような特性はカ
ス等報器のアラームレベル設定等の回路設計上好ましく
ない等の欠点があった。
Overshoot appears in the response characteristics to detected gases such as 0.1%) and ethanol. Such a characteristic has disadvantages such as being unfavorable in terms of circuit design such as alarm level setting of a waste alarm device.

この発明は、上記の欠点な解消するためになさまたもの
で、被検知ガスの応答特性の異常は、金属酸化物半導体
で構成している焼結体の表層での液検知ガス燃焼消費(
Cより焼結層内部へ到達する実質ガス濃度が減少−[る
こと、また、燃焼反応熱により感カス部の温度が上昇し
、ガス感度が時間的に変化することに起因するという事
実を突き止め、焼結層の燃焼活性を抑制し、ガス感度の
安定化を削ったもので、燃焼不活性な物質を表面に付着
させろことにより活性点をつぶせば表層での燃焼を抑制
することができることを見出したものである。以下、こ
の発明について説明する。
The present invention is intended to solve the above-mentioned drawbacks, and the abnormality in the response characteristics of the detected gas is caused by the combustion consumption of the liquid detected gas on the surface layer of the sintered body made of metal oxide semiconductor.
It was discovered that the actual gas concentration reaching the inside of the sintered layer decreased from C, and that this was caused by the fact that the temperature of the scum-sensitive area increased due to the heat of combustion reaction, and the gas sensitivity changed over time. , which suppresses the combustion activity of the sintered layer and reduces the stabilization of gas sensitivity, and it is possible to suppress combustion in the surface layer by crushing the active points by attaching a combustion-inactive substance to the surface. This is what I found. This invention will be explained below.

この発明の実施例においては、金属酸化物半導体の焼結
体VcBi、p、pb、’ri、si、AI等のうち少
なくとも一種の塩の希薄水溶液等を含浸し、乾燥後に熱
処理するかあるいは上記金属の有機金属化合物を用いて
化学蒸着を行って金属酸化物半導体の表面に燃焼阻害物
質を担持させるものである。
In an embodiment of the present invention, a sintered body of a metal oxide semiconductor is impregnated with a dilute aqueous solution of at least one salt among VcBi, p, pb, 'ri, si, AI, etc., and then heat-treated after drying or A combustion inhibiting substance is supported on the surface of a metal oxide semiconductor by chemical vapor deposition using an organometallic compound of metal.

次に、上記の具体的な例として、99.99 ’3’o
の金属スズを硝酸に溶かし、こt+ Kアンモニア水を
滴下して得67″LL沈Ii教を水洗、乾燥、仮焼して
酸化スズ粉体を得る。この粉体を粉砕し、水l加えて分
散させてペーストをつ(す、こ」1をpt膜上ヒータ電
極の付いたアルミナ基板」二にスクリーン印刷し、乾燥
後、800℃で2時間焼結して、その後、この焼結体に
H3P 04 、P b (NO3)2 、 T i 
C13B i (NO3)3・5 H20などの0.0
1mo1%の水溶液!含浸し、乾燥後600℃で1時間
熱分解を行う。
Next, as a specific example of the above, 99.99 '3'o
of tin metal is dissolved in nitric acid, and aqueous ammonia is added dropwise to obtain a 67" LL precipitate, which is washed with water, dried, and calcined to obtain tin oxide powder. This powder is crushed, and 1 liter of water is added. The paste was screen-printed on an alumina substrate with a heater electrode on the PT film (2), and after drying, it was sintered at 800°C for 2 hours. H3P 04 , P b (NO3)2 , T i
C13B i (NO3)3.5 H20 etc. 0.0
1mo1% aqueous solution! After impregnation and drying, thermal decomposition is performed at 600°C for 1 hour.

このようにして作られたガス検知素子の感ガス応答特性
を第4図に示す。この図において、ガス検知素子はH2
ガス01%中において出力が安定するまでに約1分を要
するが、その後は非常に安定した状態になる。
FIG. 4 shows the gas-sensitive response characteristics of the gas sensing element thus fabricated. In this figure, the gas sensing element is H2
It takes about 1 minute for the output to stabilize in 01% gas, but after that it becomes very stable.

以上説明し1こようにこの発明(・土、ガス検知素子の
金属酸化物半導体の焼結体に燃焼活性を抑制する定め、
Bi+ P、Pb+ Ti+ Sit AIのうち少に
くとも一種を表面に担持させたので表層での燃焼効率l
低下させることができ、被検知ガス中における出力の変
化がなく、安定した感度応答特性ケ有するガス検知索子
が得らハる利点を有する。
As explained above, 1. Thus, the present invention (a provision for suppressing combustion activity in a sintered body of a metal oxide semiconductor of a soil, gas detection element,
Since at least one of Bi+P, Pb+Ti+Sit AI is supported on the surface, the combustion efficiency in the surface layer is improved.
This has the advantage of providing a gas sensing probe that can be used to reduce the temperature of the gas, has no change in output in the gas to be detected, and has stable sensitivity response characteristics.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のガス検知素子の一例を示す側断面図、第
2図、第3図は従来のガス検知素子な被検知ガス中で動
作させた場合の特性図、第4図はこの発明の実施例のガ
ス検知素子を被検知ガス中で動作させる場合の特性図で
、f−1ろ。 図中、1はアルミナ基板、2はpt膜上ヒータ3はPt
電極、4は金属酸化物半導体である。 ) 第1図 第2図 9時間(min ) 第3図 第4図 一時間(min) 手続補正書(自発) 昭(目59イl3)113+1 特許庁長官殿 1、事件の表示 特願昭58−0883’913号2、
発明の名称   ガス検知素子 3、補正をする者 事件との関係  特許出願人 住所 大防府大阪市淀用区三津屋中2丁目5番4号名称
 新コスモス電機株式会社 代表者  笠原 理一部 4、代 理 人〒150 東京都渋谷区桜斤町31番16号 )↓の松ビル6階小
林持言′1事務所 電話03 (496) 1256番
5、補正の対象 明細書の発明の詳細な説明の欄 6、補正の内容 (1)明細書第1頁19行の「自体か」を、「自体が」
と補正する。 (2)同じく第3頁13行の「燃焼阻害物質を」を、「
燃焼阻害物質を微量」と補正する。 以上
Fig. 1 is a side sectional view showing an example of a conventional gas detection element, Figs. 2 and 3 are characteristic diagrams of the conventional gas detection element when operated in a gas to be detected, and Fig. 4 is the invention according to the present invention. This is a characteristic diagram when the gas detection element of the embodiment is operated in a gas to be detected. In the figure, 1 is an alumina substrate, 2 is a PT film, and a heater 3 is a Pt film.
The electrode 4 is a metal oxide semiconductor. ) Figure 1 Figure 2 9 hours (min) Figure 3 Figure 4 1 hour (min) Procedural amendment (voluntary) 113+1 Mr. Commissioner of the Japan Patent Office 1, Indication of the case Patent application 1982 -0883'913 No. 2,
Title of the invention Gas detection element 3, relationship to the case of the person making the amendment Patent applicant address 2-5-4 Mitsuya Naka, Yodoyo-ku, Osaka, Osaka Name Shin-Cosmos Electric Co., Ltd. Representative Osamu Kasahara 4th generation Mr. Kobayashi Chigon'1 Office, 6th floor, Matsu Building, 31-16 Sakurato-cho, Shibuya-ku, Tokyo, 150 Japan Telephone: 03 (496) 1256-5, Detailed explanation of the invention in the specification to be amended Column 6, Contents of amendment (1) Changed “in itself” from line 19 on page 1 of the specification to “in itself”
and correct it. (2) Similarly, on page 3, line 13, change “combustion inhibitors” to “
Corrected to ``trace amounts of combustion inhibitors''. that's all

Claims (1)

【特許請求の範囲】[Claims] 金属酸化物半導体の焼結体を用いたガス検知素子におい
て、前記金属酸化物半導体の燃焼活性を抑IU−fるた
めBi 、P、Pb 、Ti 、Si 、AIのうち少
なくとも一種ン前記焼結体の表面に担持させたことを特
徴とするガス検知素子。
In a gas sensing element using a sintered body of a metal oxide semiconductor, at least one of Bi, P, Pb, Ti, Si, and AI is added to the sintered body to suppress combustion activity of the metal oxide semiconductor. A gas detection element characterized in that it is carried on the surface of the body.
JP6839683A 1982-12-28 1983-04-20 Gas detecting element Pending JPS59195148A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP6839683A JPS59195148A (en) 1983-04-20 1983-04-20 Gas detecting element
KR1019830006122A KR870001325B1 (en) 1982-12-28 1983-12-22 Gas detecting sensor
DE8484300573T DE3476270D1 (en) 1983-02-03 1984-01-30 Gas sensor
EP19840300573 EP0115953B1 (en) 1983-02-03 1984-01-30 Gas sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6839683A JPS59195148A (en) 1983-04-20 1983-04-20 Gas detecting element

Publications (1)

Publication Number Publication Date
JPS59195148A true JPS59195148A (en) 1984-11-06

Family

ID=13372492

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6839683A Pending JPS59195148A (en) 1982-12-28 1983-04-20 Gas detecting element

Country Status (1)

Country Link
JP (1) JPS59195148A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102539426A (en) * 2012-01-06 2012-07-04 吉林建龙钢铁有限责任公司 Method for determining phosphorus in silicon-manganese alloy

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5446094A (en) * 1977-09-19 1979-04-11 Fuji Electric Co Ltd Oxygen sensor for exhaust gases
JPS5739341A (en) * 1980-08-22 1982-03-04 Toyota Motor Corp Oxygen sensor
JPS5774646A (en) * 1980-10-29 1982-05-10 Ngk Spark Plug Co Ltd Gas-sensitive element

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5446094A (en) * 1977-09-19 1979-04-11 Fuji Electric Co Ltd Oxygen sensor for exhaust gases
JPS5739341A (en) * 1980-08-22 1982-03-04 Toyota Motor Corp Oxygen sensor
JPS5774646A (en) * 1980-10-29 1982-05-10 Ngk Spark Plug Co Ltd Gas-sensitive element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102539426A (en) * 2012-01-06 2012-07-04 吉林建龙钢铁有限责任公司 Method for determining phosphorus in silicon-manganese alloy

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