JPS59190326A - Production of grain-oriented high silicon steel strip - Google Patents

Production of grain-oriented high silicon steel strip

Info

Publication number
JPS59190326A
JPS59190326A JP58064842A JP6484283A JPS59190326A JP S59190326 A JPS59190326 A JP S59190326A JP 58064842 A JP58064842 A JP 58064842A JP 6484283 A JP6484283 A JP 6484283A JP S59190326 A JPS59190326 A JP S59190326A
Authority
JP
Japan
Prior art keywords
ribbon
steel strip
silicon steel
high silicon
texture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58064842A
Other languages
Japanese (ja)
Other versions
JPH0665723B2 (en
Inventor
Masayuki Wakamiya
若宮 正行
Yukio Hotta
幸男 堀田
Harufumi Sakino
先納 治文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58064842A priority Critical patent/JPH0665723B2/en
Publication of JPS59190326A publication Critical patent/JPS59190326A/en
Publication of JPH0665723B2 publication Critical patent/JPH0665723B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00Modifying the physical properties by deformation combined with, or followed by, heat treatment
    • C21D8/12Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
    • C21D8/1205Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties involving a particular fabrication or treatment of ingot or slab
    • C21D8/1211Rapid solidification; Thin strip casting

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Steel Electrode Plates (AREA)
  • Soft Magnetic Materials (AREA)

Abstract

PURPOSE:To produce easily a grain-oriented high silicon steel strip having an excellent magnetic characteristic by subjecting a high silicon steel strip which is manufactured by a quick liquid cooling method and contains a specific compsn. contg. of silicon to cold rolling at a high draft then to a heat treatment. CONSTITUTION:A high silicon steel strip which is manufactured by a quick liquid cooling method such as an ultraquick double roll cooling method or the like and contains 4.0-10.0wt% Si is cold rolled at >=60% draft under >=1t/mm. force applied thereon by rolling rolls to form the crystal structure contg. {111} <112> and further the rolled material is heat treated to form the crystal texture contg. {110}<001>, by which a grain-oriented high silicon steel strip having an excellent magnetic characteristic is obtd. A magnetic core material having an extremely small iron loss is obtd. by using such high silicon steel strip.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は方向性高珪素鉄薄帯の製造方法に関するもので
ある。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for producing a oriented high silicon iron ribbon.

従来例の構成とその問題点 4.0〜10.0wt%の珪素を含む高珪素鉄は、これ
1で圧延などの加工ができないものであったため、薄帯
化できなかった。最近、溶融金属を移動する冷却体の表
面に噴出させ、10〜b超急冷(−1−挙に金属薄帯を
得る超急冷法により、高珪素鉄薄帯が作製され、かつ、
この薄帯は加工性を有することが明らかにされた。各種
の作製方法、熱処理方法あるいは圧延および熱処理方法
が検討され、(1oo)<o)l>、(1oo)<oo
l>。
Structure of the conventional example and its problems High silicon iron containing 4.0 to 10.0 wt % silicon cannot be processed into a thin ribbon because it cannot be processed by rolling or the like. Recently, a high-silicon iron ribbon has been produced by an ultra-quenching method in which molten metal is jetted onto the surface of a moving cooling body to obtain a metal ribbon in 10 to 10 seconds.
It was revealed that this ribbon has workability. Various manufacturing methods, heat treatment methods, or rolling and heat treatment methods were investigated, and (1oo)<o)l>, (1oo)<oo
l>.

(1o○)<011.>、(110)<O○1〉などの
結晶集合組織の制(財)が提案されているが、磁化容易
軸(001)’j5薄帯長手方向に有(〜優れた磁気特
性が期待される(11Q)〈Ool〉なる集合組織実現
については、温度勾配を与えての熱処理法あるいは圧延
熱処理法などが考えられるが、前者の方法では集合組織
を有する薄帯の作製速度が1闘/分以下とされめて遅い
。また後者では薄帯を熱処理し、さらに圧延、熱処理を
順次行なう方法であり、その工程がきわめて複雑である
。このように、従来法では、C110)〈001〉なる
結晶集合組織門有する薄帯の製造能力は乏しく、また複
雑であるため、薄帯の製造価格が高くなるという問題が
ある。
(1o○)<011. >, (110)<O○1>, etc., have been proposed, but the easy axis of magnetization (001)'j5 exists in the longitudinal direction of the ribbon (~ excellent magnetic properties are expected. (11Q) In order to realize the <Ool> texture, heat treatment with a temperature gradient or rolling heat treatment can be considered, but in the former method, the production speed of the ribbon with the texture is 1 stroke/min. In addition, in the latter method, the ribbon is heat-treated, and then rolling and heat treatment are sequentially performed, and the process is extremely complicated.In this way, in the conventional method, the C110) <001> crystal There is a problem in that the manufacturing cost of the ribbon is high because the ability to manufacture the ribbon having texture is poor and complicated.

発明の目的 本発明は、前述のような従来法のもつ欠点をなくし、(
11o)〈○01〉なる集合組織を有する高珪素鉄薄帯
を、単なる冷間圧延と熱処理によって形成させ、磁気特
性全大幅に改善させ、鉄損のきわめて少ない磁心材料を
供給しようとするものである。
OBJECTS OF THE INVENTION The present invention eliminates the drawbacks of the conventional method as described above, and
11o) The purpose is to form a high-silicon iron ribbon having a texture of <○01> by simple cold rolling and heat treatment, thereby significantly improving all magnetic properties and supplying a magnetic core material with extremely low iron loss. be.

発明の構成 本発明は以下の構成からなる。すなわち、液体急冷法に
よって作製した4、0〜1o、owt係の珪素を含有す
る高珪素鉄薄帯を60係以上の圧下率で冷間圧延するこ
とにより、(111)〈112〉を含む結晶集合組織全
形成し、さらに熱処理することにより(11o)〈○0
1〉を含有する結晶集合組織を形成することを特徴とす
る。
Structure of the Invention The present invention consists of the following structure. That is, a crystal containing (111)<112> is produced by cold rolling a high-silicon iron ribbon containing 4,0 to 1o, owt silicon produced by a liquid quenching method at a rolling reduction of 60 or more. By fully forming the texture and further heat treatment, (11o)〈○0
It is characterized by forming a crystal texture containing 1>.

第1図に示すように、圧下率60係未満ではX線回折に
よって薄帯内の(111)〈112〉集合組織をほとん
ど検出することができないが、圧下率が60%を越える
と前記組織が急速に出現し、さらに85%では薄帯の約
50%を占めるようになる。そして、圧下率の増加に伴
い、この集合組織の占める割合が高くなる。これらの薄
帯を熱処理すると、(110)〈o○1〉集合組織が出
現するが、第1図に示すようにその割合は熱処理前の(
111)(112’)の集合組織を有する割合より若干
増加する。さらに圧延工程において、この薄帯に1トン
7’mm以上の力を圧延ロールによって与えて冷間圧延
すると、第2図で示すように(111)〈112〉集合
組織の出現はより顕著となり、その後の熱処理による(
110)くO○1〉集合組織の出現割合も高くなる。
As shown in Figure 1, the (111)<112> texture in the ribbon cannot be detected by X-ray diffraction at a reduction rate of less than 60%, but when the reduction rate exceeds 60%, the texture is They appear rapidly, and at 85%, they occupy about 50% of the ribbon. As the rolling reduction rate increases, the proportion of this texture increases. When these ribbons are heat-treated, a (110)〈o○1〉 texture appears, but as shown in Figure 1, the proportion is lower than that before heat treatment.
111) (112') texture. Furthermore, in the rolling process, when this ribbon is cold-rolled by applying a force of 1 ton or more to 7'mm using rolling rolls, the appearance of the (111)<112> texture becomes more pronounced as shown in FIG. Due to subsequent heat treatment (
110) KuO○1> The appearance rate of texture also increases.

実施例の説明 本発明の構成を、以下の実施例によって詳述する。Description of examples The configuration of the present invention will be explained in detail with reference to the following examples.

実施例1 第3Naに示すような超急冷両ロール法で、6・5 w
t%の珪素全台み残部鉄からなる幅5朋、厚み100 
l1mの高珪素鉄薄帯を作製(−だ。なお、図において
、1は溶湯噴出ノズル、2は合金溶解用高周波コイル、
3は金属溶湯、4は回転冷却ロール、5は超急冷薄帯で
ある。そ]−で、この薄帯に0.9トン/ mmの力を
加えるようにバックアップ(−だ一対の20馴直径の圧
延ロールを用いて圧下率85係で冷間圧延して厚み15
μmの薄帯を得た。このときの(111)〈112〉の
占める割合を折 X線罹点図、X線解析で測定すると、薄帯中の4570
1%がC111)〈112〉なる結晶集合組織含有して
いた。さらにこの薄帯を1000℃。
Example 1 Ultra-quenched double roll method as shown in tertiary Na, 6.5 w
Width: 5 mm, thickness: 100 mm, made of t% silicon with the remainder iron
A high-silicon iron ribbon with a thickness of 1 m is produced (-. In the figure, 1 is a molten metal spouting nozzle, 2 is a high-frequency coil for melting alloy,
3 is a molten metal, 4 is a rotating cooling roll, and 5 is an ultra-quenched ribbon. Then, the ribbon was cold-rolled to a thickness of 15 mm using a pair of rolling rolls with a diameter of 20 mm and a rolling reduction of 85 mm.
A thin ribbon of μm was obtained. When the ratio of (111)<112> at this time is measured using a folded X-ray distribution diagram and X-ray analysis, it is found that 4570
1% contained a crystal texture of C111)<112>. Furthermore, this ribbon is heated to 1000℃.

IlX10ff71IHの真空のもとで熱処理すると5
6vo1%(11o)〈001〉を有する集合組織が形
成された。この薄帯の抗磁力(直流)、鉄損(W10/
15゜:5oHz、IT)i測定するとそれぞれ0.4
50e 。
When heat treated under the vacuum of IlX10ff71IH, 5
A texture with 6vo1% (11o) <001> was formed. The coercive force (DC) and iron loss (W10/
15°: 5oHz, IT) i measured 0.4 respectively
50e.

1.2WAq であった。It was 1.2 WAq.

実施例2 両ロール法によって7.0wt%の珪素金倉み残部鉄か
らなる幅8問、厚み9011n+の高珪素鉄薄帯全作製
し、この薄帯に1.1トン/闘の力を加えるようにバッ
クアップした一対の15朋直径の圧延ロールを用いて圧
下率85係で冷間圧延し、厚み13.6/1mの薄帯を
得た。このときの(111)<112〉なる結晶集合組
織の割合’t 1.11定すると、薄帯の60vo1%
を占めていた。さらにこの薄帯を900℃、  I X
l 0 mmHg  の真空のもとで熱処理すると、6
γvo1%の(11o)くo○1〉を有する集合組織が
形成された。この薄帯の抗磁力(直流)、鉄損(50H
z+IT)’i測測定ると、それぞれ0,310e 、
 0.87 W/kgであった。
Example 2 A high-silicon iron ribbon of 8 widths and a thickness of 9011n+ made of 7.0 wt% silicon-containing iron was produced by the double roll method, and a force of 1.1 tons/force was applied to the ribbon. Cold rolling was carried out at a reduction rate of 85 using a pair of rolling rolls with a diameter of 15 mm, backed up by a roller, to obtain a ribbon with a thickness of 13.6/1 m. At this time, the ratio of the crystal texture 't of (111)<112> is 1.11, which is 60vo1% of the ribbon.
was occupied. Furthermore, this ribbon was heated to 900℃, I
When heat treated under a vacuum of l 0 mmHg, 6
A texture with (11o)kuo○1> of γvo1% was formed. Coercive force (DC) and iron loss (50H) of this ribbon
z+IT)' i measurement is 0,310e, respectively.
It was 0.87 W/kg.

実施例3 両ロール法によって6.0wt%の珪素を含み残部鉄か
らなる幅1(J711.厚み60μmの高珪素鉄薄帯を
作製1−だ。この薄帯に1.5トン/間の力e加えるよ
うにバックアップした一対のIQffll+直径の圧延
ロールを用いて圧下率86係で冷間圧延し、卑み9μm
の薄帯を得た。このときの(111)(112,>なる
結晶集合組織の割合を測定すると、薄帯中の66 vo
1%を占めていた。さらにこの薄帯を1100℃、lX
10 朋Hgの真空のもとで熱処理すると、72 vo
1%の(11o)〈oOl〉を有する集合組織が形成さ
れた。この薄帯の抗磁力(@流)。
Example 3 A high-silicon iron ribbon with a width of 1 (J711) and a thickness of 60 μm was prepared by a double roll method, containing 6.0 wt% silicon and the balance iron. A force of 1.5 tons/m was applied to this ribbon. Using a pair of rolling rolls with a diameter of
obtained a thin strip. When measuring the ratio of the crystal texture (111)(112,>) at this time, it is found that 66 vo in the ribbon
It accounted for 1%. Furthermore, this ribbon was heated to 1100℃, lX
When heat treated under a vacuum of 10 Hg, 72 vo
A texture with 1% (11o)<oOl> was formed. Coercive force of this ribbon (@ style).

鉄損(W1g/so :50 Hz 、 I T ) 
f測定すると、それぞれ0.270e 、 o、y 2
 W/kq  であった。
Iron loss (W1g/so: 50 Hz, IT)
When f is measured, they are 0.270e, o, y2, respectively.
It was W/kq.

実施例4 両ロール法によって5.5 wt%の珪素金倉み残部鉄
からなる幅5問、厚み110μmの高珪素鉄薄帯全作製
した。この薄帯に0.8トン/朋の力を加えるようにバ
ックアンプした一対の20ffffilffi径の圧延
ロールを用いて圧下率90%で冷間圧延し、厚み11μ
mの薄帯を得た。このときの(111)(112)なる
結晶集合組織の割合を測定すると。
Example 4 A high-silicon iron ribbon of 5 widths and 110 μm thick made of 5.5 wt % silicon-containing iron was entirely produced by the double roll method. This ribbon was cold rolled at a reduction rate of 90% using a pair of rolling rolls with a diameter of 20fffilffi which were back-amplified to apply a force of 0.8 tons per hour to a thickness of 11μ.
A thin ribbon of m was obtained. At this time, the ratio of crystal texture (111) (112) is measured.

薄帯中の80 vo1%を占めていた。さらにこの薄帯
を1000℃、水素中で熱処理すると、約90vo1%
の(110)〈ool〉を有する集合組織が形成された
。この薄帯の抗磁力(直流)、鉄損(W+gJo :5
0Hz、IT)Q測定するト0.190s 、 o、e
 6W/kgであった。
It accounted for 80 vol1% of the ribbon. Furthermore, when this ribbon is heat-treated in hydrogen at 1000℃, approximately 90vo1%
A texture with (110)〈ool〉 was formed. Coercive force (DC) and iron loss (W+gJo: 5) of this ribbon
0Hz, IT) Q measurement 0.190s, o, e
It was 6W/kg.

実施例5 第3図すに示した片ロール法によって6.5 wt%の
珪素を含み残部鉄からなる幅10朋、厚み40μmの高
珪素鉄薄帯を作製(−だ。なお、図において第3図aと
対応する部分には同じ符号を付した。
Example 5 A high-silicon iron ribbon with a width of 10 mm and a thickness of 40 μm containing 6.5 wt% silicon and the balance iron was prepared by the single roll method shown in Figure 3 (-). Parts corresponding to those in Figure 3a are given the same reference numerals.

前述のようにして得られた薄帯[1,3)ン/闘の力を
加えるようにバックアンプした一対の20M直径の圧延
ロールを用いて、圧下率66%で冷間圧延し、厚み14
μmの薄帯全得た。このときの(111)〈112〉な
る結晶集合組織の割合を測定すると、薄帯のa vo1
%を占めていた。さらにこの薄帯を1000℃、水素中
で熱処理すると、約7係の(110)くOe1〉を有す
る集合組織が形成された。この薄帯の抗磁力(直流)、
鉄損(W1g/so :50Hz、IT)′f:測定す
ると、それぞれQ、8 Q Oe 。
The thin strip [1,3) obtained as described above was cold rolled at a rolling reduction of 66% using a pair of 20M diameter rolling rolls which were back-amplified so as to apply a rolling force to give a thickness of 14 mm.
A whole thin strip of μm was obtained. When measuring the ratio of the (111)<112> crystal texture at this time, the a vo1 of the ribbon is
It accounted for %. When this ribbon was further heat-treated in hydrogen at 1000° C., a texture having a (110) Oe1> of about 7 was formed. The coercive force (DC) of this ribbon,
Iron loss (W1g/so: 50Hz, IT)'f: When measured, they are Q and 8 Q Oe, respectively.

1、esW/kgであった。1, esW/kg.

上述の圧下率は次の通り定義される。The above rolling reduction rate is defined as follows.

葦た各集合組織は、理想的配向から15度以内のミス配
向(−だものをも含んだ集合組織である。
Each reed texture includes misorientation (-) within 15 degrees from the ideal orientation.

本発明によって(110)〈oOl〉の集合組織全゛有
する薄帯が得られるが、これらの薄帯は第4図のような
磁気特性金有する。これらの本発明の薄帯厚はいずれも
9〜1571mであり、この厚みのほぼ同組成の従来品
の値HC−; 0.90e + W+$0’= 17W
/に9と比較するといずれも低い値を示(−1(110
)く001〉の配向度の向上とともに一段と低い値を示
す。
According to the present invention, ribbons having an entire texture of (110)〈oOl〉 can be obtained, and these ribbons have magnetic properties as shown in FIG. The thickness of each of these ribbons of the present invention is 9 to 1571 m, and the value of a conventional product of approximately the same composition with this thickness is HC-: 0.90e + W + $0' = 17W
/ shows a low value when compared with 9 (-1 (110
) 001>, the value becomes even lower as the degree of orientation improves.

発明の効果 このように本発明によって得られた薄帯を磁心と1〜で
使用すると、従来法の無配向に近い高珪素鉄薄帯と比較
(〜て鉄損”、VS。全E以下に減じることがでさ、省
エネルギーに犬きく寄与する。この薄帯は、10μm程
度と非常に薄いため、1〜100 KHz程度の高周波
用磁心と(〜で非常に適しているものであシ、同組成、
同厚の従来品の薄帯に比べ1/3〜1/4の高周波鉄損
値を示(〜だ。
Effects of the Invention As described above, when the ribbon obtained by the present invention is used with a magnetic core, the iron loss is lower than the total E compared to the conventional high-silicon iron ribbon, which is close to non-oriented. This thin strip is very thin, about 10 μm, so it is very suitable for magnetic cores for high frequencies of about 1 to 100 KHz. composition,
It exhibits a high-frequency iron loss value that is 1/3 to 1/4 compared to conventional ribbons of the same thickness.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は圧延薄帯およびその熱処理後の薄帯の圧下率と
(111)<112>、(110)<001>集合組織
の薄帯中に占める割合との関係を示す図、第2図は冷間
圧延における薄帯加圧力が(111)ぐ12〉。 (110)くOol〉集合組織の出現におよぼす影響全
売す図である。第3図a、  bFiそれぞれ超急冷法
の代表例を説明するだめの図である。第4図は本発明の
方法によって出現した( 110 )<oo 1 >集
合組織の薄帯中に占める割合と磁気特性との関係を示す
図である。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名第1
図 圧下率(lフ ッ+rirt力)LU−ルIτ8 ’> 511’ !
’11,7Fj””/111111ff5 3  図
Figure 1 is a diagram showing the relationship between the rolling reduction ratio of a rolled ribbon and the ribbon after heat treatment and the ratio of (111) <112> and (110) <001> textures in the ribbon, and Figure 2 The ribbon pressing force during cold rolling is (111) 12>. (110) This is a diagram showing the influence on the appearance of texture. Figures 3a and 3b are diagrams for explaining typical examples of the ultra-quenching method. FIG. 4 is a diagram showing the relationship between the proportion of the (110) <oo 1 > texture in the ribbon that appeared by the method of the present invention and the magnetic properties. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure reduction rate (l foot + rirt force) LU-ru Iτ8'>511'!
'11,7Fj""/111111ff5 3 Figure

Claims (2)

【特許請求の範囲】[Claims] (1)液体急冷法によって作製した40〜10.0wt
%の珪素を含有する高珪素鉄薄帯金60係以上の圧下率
で冷間圧延することにより(111)<112〉を含む
結晶集合組織を形成し、さらに熱処理することにより(
11o)<ool> を含有する結晶集合組織を形成さ
せること全特徴とする方向性高珪素鉄薄帯の製造方法。
(1) 40-10.0wt produced by liquid quenching method
A high-silicon iron ribbon containing % silicon is cold-rolled at a reduction ratio of 60 or higher to form a crystal texture containing (111)<112>, and further heat-treated to form a crystal texture containing (111)<112>.
11o) A method for producing a oriented high-silicon iron ribbon, which is characterized by forming a crystal texture containing <ool>.
(2)圧延工程において、高珪素鉄薄帯に1トン/朋以
上の力をロールによって与えて冷間圧延することを特徴
とする特許請求の範囲第1項記載の方向性高珪素鉄薄帯
の製造方法。
(2) In the rolling process, the oriented high-silicon iron ribbon is cold-rolled by applying a force of 1 ton/h or more to the high-silicon iron ribbon using rolls. manufacturing method.
JP58064842A 1983-04-13 1983-04-13 Method for producing directional high-silicon iron ribbon Expired - Lifetime JPH0665723B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58064842A JPH0665723B2 (en) 1983-04-13 1983-04-13 Method for producing directional high-silicon iron ribbon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58064842A JPH0665723B2 (en) 1983-04-13 1983-04-13 Method for producing directional high-silicon iron ribbon

Publications (2)

Publication Number Publication Date
JPS59190326A true JPS59190326A (en) 1984-10-29
JPH0665723B2 JPH0665723B2 (en) 1994-08-24

Family

ID=13269879

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58064842A Expired - Lifetime JPH0665723B2 (en) 1983-04-13 1983-04-13 Method for producing directional high-silicon iron ribbon

Country Status (1)

Country Link
JP (1) JPH0665723B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62267446A (en) * 1986-05-13 1987-11-20 Nippon Kokan Kk <Nkk> High-silicon iron sheet excellent in practical magnetic property
US5051138A (en) * 1989-03-30 1991-09-24 Nippon Steel Corporation Method of producing grain oriented electrical steel sheet having high magnetic flux

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5732326A (en) * 1980-08-06 1982-02-22 Kawasaki Steel Corp Production of two directional silicon steel thin strip having superior magnetic characteristics

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5732326A (en) * 1980-08-06 1982-02-22 Kawasaki Steel Corp Production of two directional silicon steel thin strip having superior magnetic characteristics

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62267446A (en) * 1986-05-13 1987-11-20 Nippon Kokan Kk <Nkk> High-silicon iron sheet excellent in practical magnetic property
JPH0588300B2 (en) * 1986-05-13 1993-12-21 Nippon Kokan Kk
US5051138A (en) * 1989-03-30 1991-09-24 Nippon Steel Corporation Method of producing grain oriented electrical steel sheet having high magnetic flux

Also Published As

Publication number Publication date
JPH0665723B2 (en) 1994-08-24

Similar Documents

Publication Publication Date Title
JPS61250162A (en) Production of amorphous alloy magnetic core
JPS59190326A (en) Production of grain-oriented high silicon steel strip
JPS62240714A (en) Production of electrical steel sheet having excellent magnetic characteristic
JPS6038462B2 (en) Silicon iron ribbon and its manufacturing method
DE2047671C2 (en) Method of manufacturing sheet steel with a Goss texture
JP3067894B2 (en) Manufacturing method of thin slab for non-oriented electrical steel sheet
JPH01294804A (en) Ferromagnetic powder for dust core and dust core
JPS6256202B2 (en)
JP3022074B2 (en) Manufacturing method of non-oriented electrical steel sheet
JPS5996219A (en) Manufacture of rapidly cooled nondirectionally oriented thin silicon steel strip with superior magnetic characteristic
JPS5916925A (en) Manufacture of thin high-silicon iron strip
JPS61183454A (en) Manufacture of magnetic core of amorphous alloy
JPH0733547B2 (en) Method of manufacturing bidirectional electrical steel sheet with high magnetic flux density
DE2251511B2 (en) Process for the production of unalloyed magnetic sheets without a preferred magnetic direction
JPS6021329A (en) Production of light-gauge high silicon steel strip having (100) &lt;100&gt; texture
JPS6372824A (en) Rolling method for improving magnetic characteristic of rapidly cooled foil of high silicon steel
JPS5867825A (en) Preparation of high silicon steel thin strip
JPS63109114A (en) Manufacture of fe-sn soft-magnetic sheet metal
JPS60181237A (en) Manufacture of amorphous magnetic alloy having small iron loss
JPS619520A (en) Manufacture of rapidly cooled thin strip having high tensile strength and non-orientation
JPS6179723A (en) Manufacture of high silicon steel strip having superior magnetic characteristic
JPS60152633A (en) Manufacture of thin strip of high-silicon iron alloy having superior magnetic characteristic
JPS62213107A (en) Manufacture of magnetic core
JPS55122851A (en) Manufacture of amorphous alloy of rare earth metal and 3d group transition metal, and thin strip of said alloy
JPH06122092A (en) Super-thin au-si alloy brazing filler metal excellent in thickness precision