JPS59184336A - 電離放射線感応ネガ型レジスト - Google Patents

電離放射線感応ネガ型レジスト

Info

Publication number
JPS59184336A
JPS59184336A JP5905483A JP5905483A JPS59184336A JP S59184336 A JPS59184336 A JP S59184336A JP 5905483 A JP5905483 A JP 5905483A JP 5905483 A JP5905483 A JP 5905483A JP S59184336 A JPS59184336 A JP S59184336A
Authority
JP
Japan
Prior art keywords
resist
ionizing radiation
film
dry etching
minutes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5905483A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0332778B2 (enrdf_load_stackoverflow
Inventor
Naoya Ogata
直哉 緒方
Kohei Sanai
讃井　浩平
Chiaki Azuma
千秋 東
Kiyoshi Oguchi
小口　清
Yoichi Takahashi
洋一 高橋
Tomihiro Nakada
中田　富紘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP5905483A priority Critical patent/JPS59184336A/ja
Publication of JPS59184336A publication Critical patent/JPS59184336A/ja
Publication of JPH0332778B2 publication Critical patent/JPH0332778B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyamides (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP5905483A 1983-04-04 1983-04-04 電離放射線感応ネガ型レジスト Granted JPS59184336A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5905483A JPS59184336A (ja) 1983-04-04 1983-04-04 電離放射線感応ネガ型レジスト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5905483A JPS59184336A (ja) 1983-04-04 1983-04-04 電離放射線感応ネガ型レジスト

Publications (2)

Publication Number Publication Date
JPS59184336A true JPS59184336A (ja) 1984-10-19
JPH0332778B2 JPH0332778B2 (enrdf_load_stackoverflow) 1991-05-14

Family

ID=13102225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5905483A Granted JPS59184336A (ja) 1983-04-04 1983-04-04 電離放射線感応ネガ型レジスト

Country Status (1)

Country Link
JP (1) JPS59184336A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024521080A (ja) * 2021-05-18 2024-05-28 アプライド マテリアルズ インコーポレイテッド 先進的なパッケージングのためのマイクロビア形成の方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024521080A (ja) * 2021-05-18 2024-05-28 アプライド マテリアルズ インコーポレイテッド 先進的なパッケージングのためのマイクロビア形成の方法

Also Published As

Publication number Publication date
JPH0332778B2 (enrdf_load_stackoverflow) 1991-05-14

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