JPS59178788A - Method of producing circuit board - Google Patents

Method of producing circuit board

Info

Publication number
JPS59178788A
JPS59178788A JP5308583A JP5308583A JPS59178788A JP S59178788 A JPS59178788 A JP S59178788A JP 5308583 A JP5308583 A JP 5308583A JP 5308583 A JP5308583 A JP 5308583A JP S59178788 A JPS59178788 A JP S59178788A
Authority
JP
Japan
Prior art keywords
circuit board
thickness
conductor
resist
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5308583A
Other languages
Japanese (ja)
Inventor
宮沢 要
赤沢 正史
吉川 国光
清水 長治
伊藤 邦美
英和 森山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suwa Seikosha KK
Original Assignee
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suwa Seikosha KK filed Critical Suwa Seikosha KK
Priority to JP5308583A priority Critical patent/JPS59178788A/en
Publication of JPS59178788A publication Critical patent/JPS59178788A/en
Pending legal-status Critical Current

Links

Landscapes

  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明はフルアディティブ回路基板製造における液状感
光性メンキレジストの厚みと導体厚みとの関係について
のものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to the relationship between the thickness of a liquid photosensitive Menki resist and the thickness of a conductor in fully additive circuit board manufacturing.

近年低コストで信頼性の高い回路基板の製造方式として
フルアディティブ法が注目され1部実用化され又いる。
In recent years, full-additive methods have attracted attention as a low-cost and highly reliable method for manufacturing circuit boards, and some of them have been put into practical use.

しかしビン間1一本捏度の中密度パターンに限定されて
いる。これはフルアディティブ法で回wrヲ形成する場
合メンキレノストの解像度によって回路基板の密度が決
足されると言っても過言ではない。従来はこのメツキレ
ジストラスクリーン印刷法によっていたため卸1密パタ
ーンの形式が困難であった。これは細密に印刷がむずか
しいという問題の他に、印刷法によるとエッヂがだれて
しまい導体1]当たりのビール強度が減少してしまう。
However, it is limited to medium-density patterns with one-by-one kneading between bins. It is no exaggeration to say that when a circuit board is formed using a fully additive method, the density of the circuit board is determined by the Menkilenost resolution. Conventionally, this method of mesh registration screen printing has been used, making it difficult to produce single-density patterns. In addition to the problem that fine printing is difficult, the printing method also causes the edges to sag, resulting in a decrease in beer strength per conductor 1.

第1図を用いて説明するなら、導体3のみかけの1〕は
bで示されるがこのビールは基板1に密着さnたa部の
みで保持される、この傾向は細密になればなる程増加す
る。すなわち無電解メッキの成長厚みと同じ位横方向に
もメッキは成長析出するのでly’aの値は太きくなる
。この様子を第2図に示す。微細パターンになればなる
程導体抵抗を一定に確保する(全体の抵抗は導体の体積
によって決まる)ためには導体厚みを厚くしなければな
らず、このようなスクリーン印刷レジスト法では高密度
基板が製造できない理由の1つになっていた。又後工程
のハンダディップによるハンダブリッジも微細になれば
生じ易くなりこれも防止しなくてはならない。このよう
な従来がらの方法を解決する方法として本発明者らは液
状感光レジストをメツキレシストとして用いることにょ
シ第1のビル強度確保、すなわちa#bならしめること
を可能ならしめた。又第2のハンダブリッジもレジスト
厚みを必要とされる導体回路厚みと同等又は大きく形成
することにょシ解決可能なことを見出し本発明を生むに
至った。第6図にょシ説明するならば液状感光性レジス
ト4の厚みCは導体回路6の厚みdとC≧dなる関係が
成立しなければならない。Cはコーティング条件、例え
ばカーテンフローコーターであるならば、レジスト固形
分濃度、粘度、ベルトスピード、カーテンへソドスリッ
ト巾等によって調整可能である。
To explain with reference to FIG. 1, the apparent 1] of the conductor 3 is shown as b, but this beer is held in close contact with the substrate 1 only at the part a. To increase. That is, since the plating grows and precipitates in the lateral direction to the same extent as the growth thickness of electroless plating, the value of ly'a becomes thick. This situation is shown in FIG. The finer the pattern, the thicker the conductor must be in order to maintain a constant conductor resistance (the overall resistance is determined by the volume of the conductor), and with this screen printing resist method, it is difficult to use a high-density substrate. This was one of the reasons why it could not be manufactured. Furthermore, solder bridges caused by solder dipping in the subsequent process are more likely to occur as the solder becomes finer, and this must also be prevented. As a solution to such conventional methods, the present inventors have made it possible to ensure the first building strength, that is, a#b, by using a liquid photosensitive resist as a metal resist. Furthermore, the inventors found that the second solder bridge can also be solved by forming the resist thickness to be equal to or larger than the required conductor circuit thickness, leading to the present invention. Referring to FIG. 6, the thickness C of the liquid photosensitive resist 4 must satisfy the relationship C≧d with the thickness d of the conductor circuit 6. C can be adjusted by coating conditions, for example, in the case of a curtain flow coater, resist solid content concentration, viscosity, belt speed, curtain slit width, etc.

以下実施例によシ本発明を説明する。The present invention will be explained below with reference to Examples.

実施例 住人ベークライト社製紙エポキシ基板EL −8182
をNCボール盤を用いスルホール穴明けを行なった後、
3002μクロム酸、200 ?/を硫酸中に60℃1
5分浸漬して表面粗化全行なった。水洗後日立化成社製
増感剤H8−10i Bで5分間処理し、さらに同社製
促集剤に2分間浸漬した。水洗後120℃で30分間乾
燥させた後、岩田塗装機社製のカーテンコーターFL−
86Fk用い、液状感光性レジストであるウレタンアク
リレート変性ポリブタジェン樹脂(日本ソーダ製UVS
−400)を60μ厚に塗布した。なおとのパターンの
導体ピッチ間隔は200μとした。この時のカーテンコ
ート条件は以下の通シである。
Example: Tenman Bakelite Paper Epoxy Board EL-8182
After drilling through holes using an NC drilling machine,
3002μ chromic acid, 200? / in sulfuric acid at 60℃1
The entire surface was roughened by immersion for 5 minutes. After washing with water, it was treated with a sensitizer H8-10i B manufactured by Hitachi Chemical Co., Ltd. for 5 minutes, and further immersed in an accelerator manufactured by Hitachi Chemical Co., Ltd. for 2 minutes. After washing with water and drying at 120°C for 30 minutes, apply a curtain coater FL- manufactured by Iwata Yaiki Co., Ltd.
86Fk is used, and urethane acrylate modified polybutadiene resin (UVS manufactured by Nippon Soda), which is a liquid photosensitive resist, is used.
-400) was applied to a thickness of 60μ. The conductor pitch interval of the pattern was 200 μm. The curtain coating conditions at this time were as follows.

UVS’ −400粘度  、1.5ポイズ固形分濃度
=38係 溶剤   ニブチルセルソルブ カーテンコーター ベルトスピード:  100m/a
mカーテンコート後80℃で30分間乾燥して基板内の
コート膜厚を実測したところ30μ±2μであった。
UVS' -400 viscosity, 1.5 poise solid content concentration = 38 Solvent Nibutyl cell solve curtain coater Belt speed: 100 m/a
After curtain coating, the film was dried at 80° C. for 30 minutes, and the thickness of the coated film inside the substrate was actually measured to be 30 μ±2 μ.

さらに反対側面にも同条件でコートした。次に両面マス
ク露光しトリクレンで現像して回路状パターンを形成し
た。次にカニゼン社製無電M Ni −Pメッキ浴であ
るS −680’に用いてN1−P’i約1μ、次いで
薄材は無電解メッキ室町化学社製MK−450に15順
浸漬して廠メッキを得た。次に180℃20分間熱処理
し、レジストの重合を促進させるとともに、N1−px
cuの基板への密着強度の向上をはかった。次に作表面
を5係I(2S○4 で活性化し、水洗後高速熱電解[
有]メッキ(ワールドメタル社製)により厚付は初メッ
キを施した。メッキ時間をかえ、すなわちメッキ厚みを
かえいの値とビール強度(導体b’1ベースとして)ノ
・ングブノジ性を確認した。
Further, the opposite side was coated under the same conditions. Next, both sides were exposed with a mask and developed with trichlene to form a circuit pattern. Next, the thin material was immersed in an electroless M Ni -P plating bath S-680' manufactured by Kanigen Co., Ltd. for approximately 1μ of N1-P'i, and then the thin material was immersed in an electroless plating bath MK-450 manufactured by Muromachi Kagaku Co., Ltd. for 15 times. Got plated. Next, heat treatment was performed at 180°C for 20 minutes to promote polymerization of the resist, and N1-px
We aimed to improve the adhesion strength of cu to the substrate. Next, the work surface was activated with 5-layer I (2S○4), and after washing with water, fast thermal electrolysis [
The thick plate was first plated using plating (manufactured by World Metal Co., Ltd.). The plating time was changed, that is, the plating thickness was changed, and the beer strength (on the basis of conductor b'1) and the strength were confirmed.

表   1 以上のようにb/aが1を越える、つま、!7b≧aす
なわちメッキ厚がレジスト厚みを越えるとメッキは急激
に導体パターンの横力向に成長するようになり導体中す
に対するビール強度は低下する。
Table 1 As shown above, b/a exceeds 1! If 7b≧a, that is, the plating thickness exceeds the resist thickness, the plating will rapidly grow in the direction of the lateral force of the conductor pattern, and the beer strength against the conductor core will decrease.

この傾向はaが小さくなれば、すなわち高密度化すれば
する程この傾向は増大するものと思われる。
This tendency seems to increase as a becomes smaller, that is, as the density increases.

又ハンダブリッジもb/aが1を越えると生じゃすくな
る。
Also, solder bridges become brittle when b/a exceeds 1.

以上液体感光性レジストによるフルアディティブ法につ
いてレジスト厚とメッキ厚の関係を示したが、本発明の
効果は明らかである。
The relationship between the resist thickness and the plating thickness has been shown above for the full additive method using a liquid photosensitive resist, and the effects of the present invention are clear.

本発明は高密度で安くしかも信頼性の高いフルアディテ
ィブプロセスに不可欠のものであると言える。
It can be said that the present invention is indispensable for a fully additive process that is high-density, inexpensive, and highly reliable.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、従来のレジン)k使ったフルアディティブ回路
基板の断面図 第2図:従来のレジストを使ったフルアディティブ回路
基板の断面図 第3図:本発明のレジン)’(z(吏ったフルアディテ
ィブ回路基&O断面図
Figure 1: A cross-sectional view of a fully additive circuit board using a conventional resin) Figure 2: A cross-sectional view of a full additive circuit board using a conventional resist Figure 3: A cross-sectional view of a fully additive circuit board using a conventional resin) Full additive circuit board & O cross section

Claims (1)

【特許請求の範囲】[Claims] 導体回路を回路基板に塗布さnた液状感光レジ7)kマ
スクUV(紫外線)露光、現像することによりパターン
化し、U■硬硬化管メッキ用レジストとし、現像除去部
にメッキによって導体全形成するフルアディティブ法に
おいて、液状感光レジストのUV硬化後の厚みが、必要
とする導体回路厚みと同等又はそれより太きく形成した
ことを特徴とする回路基板の製造方法−
Conductor circuit is applied to the circuit board by liquid photosensitive resist 7)K mask UV (ultraviolet rays) exposure and development to form a pattern, U■ hard hardened tube plating resist, and conductor is completely formed by plating on the development removed part. A method for manufacturing a circuit board, characterized in that, in a fully additive method, the thickness of a liquid photosensitive resist after UV curing is equal to or thicker than the required conductor circuit thickness.
JP5308583A 1983-03-29 1983-03-29 Method of producing circuit board Pending JPS59178788A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5308583A JPS59178788A (en) 1983-03-29 1983-03-29 Method of producing circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5308583A JPS59178788A (en) 1983-03-29 1983-03-29 Method of producing circuit board

Publications (1)

Publication Number Publication Date
JPS59178788A true JPS59178788A (en) 1984-10-11

Family

ID=12932946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5308583A Pending JPS59178788A (en) 1983-03-29 1983-03-29 Method of producing circuit board

Country Status (1)

Country Link
JP (1) JPS59178788A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61247092A (en) * 1985-04-24 1986-11-04 日立化成工業株式会社 Wiring board
JPS61247091A (en) * 1985-04-24 1986-11-04 日立化成工業株式会社 Wiring board
JPS61247093A (en) * 1985-04-24 1986-11-04 日立化成工業株式会社 Wiring board
JPS61247094A (en) * 1985-04-24 1986-11-04 日立化成工業株式会社 Wiring board

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61247092A (en) * 1985-04-24 1986-11-04 日立化成工業株式会社 Wiring board
JPS61247091A (en) * 1985-04-24 1986-11-04 日立化成工業株式会社 Wiring board
JPS61247093A (en) * 1985-04-24 1986-11-04 日立化成工業株式会社 Wiring board
JPS61247094A (en) * 1985-04-24 1986-11-04 日立化成工業株式会社 Wiring board

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