JPS59175593A - Electroluminescent display unit - Google Patents

Electroluminescent display unit

Info

Publication number
JPS59175593A
JPS59175593A JP58050678A JP5067883A JPS59175593A JP S59175593 A JPS59175593 A JP S59175593A JP 58050678 A JP58050678 A JP 58050678A JP 5067883 A JP5067883 A JP 5067883A JP S59175593 A JPS59175593 A JP S59175593A
Authority
JP
Japan
Prior art keywords
layer
semiconductor layer
insulator
pulse voltage
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58050678A
Other languages
Japanese (ja)
Other versions
JPH0516158B2 (en
Inventor
任田 隆夫
富造 松岡
洋介 藤田
阿部 惇
新田 恒治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58050678A priority Critical patent/JPS59175593A/en
Priority to EP83901614A priority patent/EP0111566B1/en
Priority to PCT/JP1983/000146 priority patent/WO1983004123A1/en
Priority to DE8383901614T priority patent/DE3371578D1/en
Priority to US06/572,415 priority patent/US4634934A/en
Priority to CA000445263A priority patent/CA1250038A/en
Publication of JPS59175593A publication Critical patent/JPS59175593A/en
Priority to US07/140,867 priority patent/US4814668A/en
Publication of JPH0516158B2 publication Critical patent/JPH0516158B2/ja
Granted legal-status Critical Current

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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は平板型表示装置に関し、と9わけ発光従来例の
構成とその問題点 従来EL累子には、エレクトロルミネ七/ス(E L)
発光体層の両面を絶縁体層で挾み、さらにその外1f]
1175−ら、酸化インジウムや酸化すず全主体にした
透明電極と、アルミニウム等の金属電極で挾んだ二重絶
縁層タイプと、酸化インジウムや酸化すずを主体にした
透明電極の上vCEL発尤体発奮体層形成し、その上に
順次絶縁体層および、金属電極を設けた一重絶縁層タイ
ブとがある。これらの二つのタイプの素子において、絶
縁体層の会計の厚さ、および発光体層の厚さる同一にし
て形成し、正弦波や交流パルス電圧を印加し、発光させ
た場合、−重絶縁層タイブは二重絶縁層タイプに比べて
、発光しきい値眠王は低いが、発光輝度も低下するとい
う問題点があった。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a flat panel display device, and particularly describes the structure of a conventional light emitting device and its problems.
Both sides of the light emitter layer are sandwiched between insulator layers, and the outside 1f]
1175- et al., a double insulating layer type in which a transparent electrode made entirely of indium oxide or tin oxide is sandwiched between metal electrodes such as aluminum, and a vCEL emitter on a transparent electrode made mainly of indium oxide or tin oxide. There is a single insulating layer type in which a stimulant layer is formed, on which an insulating layer is sequentially provided, and a metal electrode is provided. In these two types of devices, when the insulator layer and the luminescent layer are formed with the same thickness and emit light by applying a sine wave or AC pulse voltage, - a heavy insulating layer Compared to the double insulating layer type, the type has a lower luminescence threshold and lower luminance, but it also has the problem of lower luminance.

発明の目的 不発明に、交流パルス電圧、捷たけ直流パルス電圧で駆
動可能な、高輝度で低発光しきい値電圧のEL表表示装
置機提供ることが目的である。
OBJECTS OF THE INVENTION It is an object of the invention to provide an EL display device with high brightness and a low emission threshold voltage, which can be driven with an AC pulse voltage or a DC pulse voltage.

発明の構成 発光活性物質金倉む硫化也鉛を主成分とするEL発発光
光体層一方の面上に、酸化亜鉛、セレン化徂鉛、および
硫化カドミウムづ・らなるグループの半導体層全形成し
、他方の面上には絶縁体層台形成し、半導体層および絶
縁体層を介して、ELL光体層に交流パルス電圧、育た
ば直流パルス電圧を印加する手段を備えることにより、
−ヒ記目的を達成することができた。唸だ直流パルス電
圧全印加する場合、半導体層側に対して絶縁体層側が正
となるような硬性のパルス電圧を印加する手段を備える
ことにより、逆極性の場合よりも、より輝度の高いEL
L示装置を形成することかで@た。
Constituent of the Invention: An EL light emitting layer whose main component is lead sulfide, a luminescent active substance.On one side, a semiconductor layer of a group consisting of zinc oxide, lead selenide, and cadmium sulfide is entirely formed. , an insulator layer is formed on the other surface, and means is provided for applying an AC pulse voltage and, if grown, a DC pulse voltage to the ELL light layer through the semiconductor layer and the insulator layer.
- I was able to achieve the objective described in (h). By providing a means for applying a hard pulse voltage such that the insulating layer side is positive with respect to the semiconductor layer side when the full DC pulse voltage is applied, higher brightness EL can be achieved than in the case of opposite polarity.
The purpose was to form an L display device.

実施例の説明 第1図は本発明のELL示装置の表示部の構造の一例を
示す。
DESCRIPTION OF THE EMBODIMENTS FIG. 1 shows an example of the structure of the display section of the ELL display device of the present invention.

図において、1はガラス基板であり、コーニング706
9ガラスを用いた。その上に高周波スパッタリンク法に
より、0・1μmの厚さの錫添加酸化イノジウムよりな
る透明電極2全形成した。その上に高周波スパッタリン
グ法により、600オノグストロームの厚さの酸化徂鉛
から成る半導体層3全形成した。このとき基板温度を1
50’Cとし、スハソタガスとして2x1o  Tor
rの紅を用いた。半導体層3の上に、硫化岨鉛と活性物
質であるマンガンを同時蒸着し、0.8原子係のマンガ
ンを含む0・5μmの厚さの硫化卯鉛EL発光体層4を
形成した。このとき基板温度は220′Gに保ち、毎分
0・1μmの蒸着速度で蒸着した。その後、真空中で5
60’C,2時間の熱処理を行った。次に基板温度80
°Cで、発光体層4の上に酸化イツトリウムを電子ビー
ト蒸着することにより、Q・4μm17)厚さの絶縁体
層6全形成した。最後にアルミニウム全真空蒸着するこ
とにより、反射電(孕6ケ形成した。
In the figure, 1 is a glass substrate, Corning 706
9 glass was used. A transparent electrode 2 made of tin-doped indium oxide and having a thickness of 0.1 μm was entirely formed thereon by a high-frequency sputter link method. A semiconductor layer 3 made of lead oxide and having a thickness of 600 onogstroms was entirely formed thereon by high frequency sputtering. At this time, set the substrate temperature to 1
50'C, 2x1o Tor as suha sota gas
I used the red color of r. On the semiconductor layer 3, lead sulfide and manganese as an active substance were simultaneously deposited to form a lead sulfide EL phosphor layer 4 having a thickness of 0.5 μm and containing 0.8 atoms of manganese. At this time, the substrate temperature was maintained at 220'G, and the deposition was performed at a deposition rate of 0.1 μm per minute. Then 5 in vacuum
Heat treatment was performed at 60'C for 2 hours. Next, the substrate temperature is 80
The entire insulating layer 6 having a thickness of Q4 μm17) was formed by electronic beat evaporation of yttrium oxide on the phosphor layer 4 at .degree. Finally, aluminum was deposited in full vacuum to form six reflected charges.

このよ′)に炸裂した表示部の透明電極2と反射電極6
の間に第2図(a)に示すような波形の交流パルス電圧
を印加した場合の発光特性を第3図に示す。図中線(a
)は本実施例における表示装置の発光輝度を示し、同(
b)は本実施例において、半導体層3のみを形成しなか
った装置の特性を示し、■(C)げ透明電極の上に0・
2μmの厚さの酸化イツトリウム、0.5μmの厚さの
マノガフ付活硫化亜鉛EL発光体層、および0.2μm
の厚さの憤化イノトリウムヲ1直次形成し、最後にアル
ミニウムの反射電極ケ設けた従来の二重絶縁層構造の表
示装置の特性を示す。第3図かられかるように、本発明
の装置ば、発光輝度を低下させることなく1、駆動電圧
のみ全低下させることが可能であり、駆動回路の低電圧
化をd■能にするものである。
The transparent electrode 2 and reflective electrode 6 of the display section exploded like this.
FIG. 3 shows the light emission characteristics when an AC pulse voltage having a waveform as shown in FIG. 2(a) is applied during this period. The line in the figure (a
) indicates the luminance of the display device in this example, and (
b) shows the characteristics of the device in which only the semiconductor layer 3 was not formed in this example;
2 μm thick yttrium oxide, 0.5 μm thick Manogaf activated zinc sulfide EL phosphor layer, and 0.2 μm thick
This figure shows the characteristics of a conventional display device with a double insulating layer structure, in which an inotorium film with a thickness of As can be seen from Fig. 3, the device of the present invention allows only the drive voltage to be completely lowered without reducing the luminance of the light emitted, making it possible to reduce the voltage of the drive circuit. be.

−1た第4図には、反射電極6が正となるようなパルス
巾20マイクロ秒、周欣数100Hzの直流パルス屯田
(第2図b)を印加した場合の本実施例における表示装
置の発光特性を示す。図かられかるように、本発明の表
示装置は、デユーティ115COの直流パルス電圧で、
90ニツト (nit)の輝度で表示することができた
。この原因は、酸化亜鉛をら成る半導体層から、1li
ff化即鉛発光体層への電子の注入が容易に行ね、l”
l−,6ためと考えられる。
FIG. 4 shows the display device in this embodiment when a DC pulse (FIG. 2b) with a pulse width of 20 microseconds and a frequency of 100 Hz is applied so that the reflective electrode 6 becomes positive. Shows luminescent properties. As can be seen from the figure, the display device of the present invention has a DC pulse voltage of duty 115CO.
It was possible to display with a brightness of 90 nits. The reason for this is that 1li
Electrons can be easily injected into the FF-ready-lead luminescent layer.
It is thought that this is because of 1-,6.

不実施例では、半導体層として酸化亜鉛を用いた場合に
ついて説明したが、七ンン化亜鉛や、硫化カドミウムを
用いても、同様の効果が得られた。
In the non-example, a case was explained in which zinc oxide was used as the semiconductor layer, but similar effects were obtained even when zinc heptatonide or cadmium sulfide was used.

これらの半導体層は、厚さが300オングストロ一ム以
上で効果があった。1 μm以上でも効果はあるが、作
製に長時間を要し、ばくりか生じ易くなるため実用的で
ない。
These semiconductor layers were effective when the thickness was 300 angstroms or more. Although it is effective even if the thickness is 1 μm or more, it is not practical because it requires a long time to manufacture and is likely to be exposed.

さらに安定性、低電圧化に関する研究の結果、絶縁体層
として、0・2〜3μmの厚さの、チタノ酸ストロノチ
ウム、チタン酸バリウム、ナク/酸鉛、ニオブ酸鉛、酸
化タンクルなとの誘電率、絶縁耐圧の大きい薄膜を用い
ることにより、安定性が優れた低電圧で駆動可能なKL
表示装置か形成できることがわかった。
Furthermore, as a result of research on stability and low voltage, it was found that dielectric layers such as stronotium titanate, barium titanate, lead acid/acid, lead niobate, and tankle oxide with a thickness of 0.2 to 3 μm were used as the insulator layer. By using a thin film with high dielectric strength and dielectric strength, KL can be driven at low voltage with excellent stability.
It turns out that it can be used to form display devices.

発明の効果 り、上説明したように、本発明のEL表示装置は発光輝
度が高く見やすく、駆動電圧が低いため厄前1用集積回
路(I C)の耐圧が低くても良く、安価な表示装#全
形成できる。寸た直流パルス”賦圧駆動も可能であり、
駆動回路を単純に構成でき。
Effects of the Invention As explained above, the EL display device of the present invention has high luminance, is easy to see, and has a low driving voltage, so the withstand voltage of the integrated circuit (I # Can be fully formed. It is also possible to drive with small DC pulses,
The drive circuit can be configured simply.

その実用価値は太きい。Its practical value is great.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明のEL表示装置の表示部の構造の一例を
示す断面図、第2図は印加電圧波形を示す。第3図は本
発明によるEL表示装置および従来のEL表示装置の電
圧−輝度特性を示す。第4図は本発明の表示装置の直流
パルス電圧印加による電圧−輝度特性を示す。 1・・・・・カラス基板、2・−・透明市極、3・・・
・/・半導体層、4・・・・・EL発光体層、5・・・
・絶縁体層、6・・・・・反射電極。 代理人の氏名 弁理士 中 尾 敏 男 l・1か1名
第1図 第2図 時間 第 3 図 印力O萄ソE 第4図 (砿)
FIG. 1 is a sectional view showing an example of the structure of the display section of the EL display device of the present invention, and FIG. 2 shows the applied voltage waveform. FIG. 3 shows voltage-luminance characteristics of the EL display device according to the present invention and the conventional EL display device. FIG. 4 shows the voltage-luminance characteristics of the display device of the present invention when a DC pulse voltage is applied. 1...Crow board, 2...Transparent city pole, 3...
.../Semiconductor layer, 4... EL light emitting layer, 5...
- Insulator layer, 6...Reflecting electrode. Name of agent Patent attorney Toshio Nakao 1.1 or 1 person Figure 1 Figure 2 Time Figure 3 Figure 4 (Ko)

Claims (1)

【特許請求の範囲】[Claims] (1)発光活性物質を含む硫化亜鉛を主成分とするKL
発光体層、上記EL発光体層の一方の面上に設けられた
、酸化亜鉛、セレン化亜鉛、および硫化カドミウムから
なるグループのなかから選ばれた少なくとも1種を主成
分とする半導体層、上記発光体層の他方の面上に設けら
れた絶縁体層、上記半導体層および上記絶縁体層を介し
て上記EL発光体層に交流パルス電圧、またe)発光活
性物質が、Mn 、 Cu 、 Ag 、 Al 、 
Tb 。 Dy 、 Er 、 Pr 、 Sm 、 Ho 、 
Tmおよびこれらのハロゲン化物からなるグループのな
かから選ばれ(3)半導体層の厚さが300オングスト
ローム以(4)半導体層、EL発光体層、絶縁体層およ
び電極が順次透明電極を有する透光性基板上に積層部)
絶縁体層、KL発光体層、半導体層および電極が順次透
明電極を有する透光性基板上に積層(6)F、L発光体
層に印加される直流パルス電圧の極性が、半導体層臼に
対して絶縁体層側が正で
(1) KL whose main component is zinc sulfide containing a luminescent active substance
a light emitting layer, a semiconductor layer provided on one surface of the EL light emitting layer, the semiconductor layer containing at least one selected from the group consisting of zinc oxide, zinc selenide, and cadmium sulfide as a main component; An insulator layer provided on the other surface of the phosphor layer, an AC pulse voltage applied to the EL phosphor layer via the semiconductor layer and the insulator layer, and e) a luminescent active substance of Mn, Cu, Ag. , Al,
Tb. Dy, Er, Pr, Sm, Ho,
(3) The thickness of the semiconductor layer is 300 angstroms or more. (4) The semiconductor layer, the EL light emitter layer, the insulator layer, and the electrode have transparent electrodes in this order. Laminated part on the substrate)
An insulator layer, a KL light emitter layer, a semiconductor layer, and an electrode are sequentially laminated on a transparent substrate having a transparent electrode (6) The polarity of the DC pulse voltage applied to the F and L light emitter layers On the other hand, the insulator layer side is positive.
JP58050678A 1982-05-19 1983-03-25 Electroluminescent display unit Granted JPS59175593A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP58050678A JPS59175593A (en) 1983-03-25 1983-03-25 Electroluminescent display unit
EP83901614A EP0111566B1 (en) 1982-05-19 1983-05-18 Electroluminescent display unit
PCT/JP1983/000146 WO1983004123A1 (en) 1982-05-19 1983-05-18 Electroluminescent display unit
DE8383901614T DE3371578D1 (en) 1982-05-19 1983-05-18 Electroluminescent display unit
US06/572,415 US4634934A (en) 1982-05-19 1983-05-18 Electroluminescent display device
CA000445263A CA1250038A (en) 1983-03-25 1984-01-13 Electroluminescent display device
US07/140,867 US4814668A (en) 1982-05-19 1987-12-23 Electroluminescent display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58050678A JPS59175593A (en) 1983-03-25 1983-03-25 Electroluminescent display unit

Publications (2)

Publication Number Publication Date
JPS59175593A true JPS59175593A (en) 1984-10-04
JPH0516158B2 JPH0516158B2 (en) 1993-03-03

Family

ID=12865589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58050678A Granted JPS59175593A (en) 1982-05-19 1983-03-25 Electroluminescent display unit

Country Status (2)

Country Link
JP (1) JPS59175593A (en)
CA (1) CA1250038A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61193396A (en) * 1985-02-21 1986-08-27 株式会社村田製作所 Thin film el element
JPS61198592A (en) * 1985-02-27 1986-09-02 株式会社村田製作所 Thin film el element
JPS62218474A (en) * 1986-03-19 1987-09-25 Futaba Corp Thin-film electroluminescence element

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS542083A (en) * 1977-06-07 1979-01-09 Futaba Denshi Kogyo Kk Electroluminescent device
JPS5857288A (en) * 1981-09-30 1983-04-05 日本精機株式会社 Field light emitting element
JPS59154793A (en) * 1983-02-22 1984-09-03 日本電気株式会社 Thin film el element
JPS6314833A (en) * 1986-07-03 1988-01-22 Kobe Steel Ltd Ti-base alloy excellent in neutron-absorption capacity

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS542083A (en) * 1977-06-07 1979-01-09 Futaba Denshi Kogyo Kk Electroluminescent device
JPS5857288A (en) * 1981-09-30 1983-04-05 日本精機株式会社 Field light emitting element
JPS59154793A (en) * 1983-02-22 1984-09-03 日本電気株式会社 Thin film el element
JPS6314833A (en) * 1986-07-03 1988-01-22 Kobe Steel Ltd Ti-base alloy excellent in neutron-absorption capacity

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61193396A (en) * 1985-02-21 1986-08-27 株式会社村田製作所 Thin film el element
JPH046278B2 (en) * 1985-02-21 1992-02-05 Murata Manufacturing Co
JPS61198592A (en) * 1985-02-27 1986-09-02 株式会社村田製作所 Thin film el element
JPH046279B2 (en) * 1985-02-27 1992-02-05 Murata Manufacturing Co
JPS62218474A (en) * 1986-03-19 1987-09-25 Futaba Corp Thin-film electroluminescence element

Also Published As

Publication number Publication date
CA1250038A (en) 1989-02-14
JPH0516158B2 (en) 1993-03-03

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