JPS59172206A - Method of producing resistor - Google Patents
Method of producing resistorInfo
- Publication number
- JPS59172206A JPS59172206A JP58046289A JP4628983A JPS59172206A JP S59172206 A JPS59172206 A JP S59172206A JP 58046289 A JP58046289 A JP 58046289A JP 4628983 A JP4628983 A JP 4628983A JP S59172206 A JPS59172206 A JP S59172206A
- Authority
- JP
- Japan
- Prior art keywords
- resistor
- curing
- electron beam
- resistors
- producing resistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、電気機器に用いられる抵抗体の製造方法に関
するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method of manufacturing a resistor used in electrical equipment.
従来例の構成とその問題点
近年、電子線硬化システムは、電子線硬化樹脂及び、単
純で安全性の高い電子線照射装置の開発にともない、塗
装、印刷工業などへの実用化が進められている。Conventional configurations and their problems In recent years, with the development of electron beam curing resins and simple and highly safe electron beam irradiation equipment, electron beam curing systems have been put into practical use in the painting and printing industries. There is.
従来より、抵抗体の製造には加熱硬化システムが用いら
れてきたが、抵抗体の硬化には、高温で数分から数十分
の時間を必要とする。そしてそのエネルギー効率も１％
以下である。また、この条件下では、基材の劣化も相当
なもので、打ち抜き不良の原因にもなっている。Conventionally, heat curing systems have been used to manufacture resistors, but curing of resistors requires several minutes to several tens of minutes at high temperatures. And its energy efficiency is 1%
It is as follows. In addition, under these conditions, the base material deteriorates considerably, causing poor punching.
一方、電子線硬化システムでは、硬化設備が短かく、エ
ネルギー効率も６０〜６０％と高く、硬化時間も１秒以
下である。従って、省スペース。On the other hand, in the electron beam curing system, the curing equipment is short, the energy efficiency is high at 60 to 60%, and the curing time is 1 second or less. Therefore, space saving.
省エネルギー、生産性の点で優れる電子線硬化システム
への転換が望まれている。There is a desire to switch to an electron beam curing system, which is superior in terms of energy savings and productivity.
一般に、電子線硬化樹脂の硬化に必要な照射量は、塗膜
の場合、２〜３Ｍｒａｄが代表的な値であるが、抵抗体
用インキの場合、カーボン含有率がきわめて高いので多
量の照射が必要である。このように、照射量が高くなる
と、分子主鎖の切断も考えられ、樹脂本来の特性が発揮
できないこともあシうるため好ましくない。また、今ま
での電子線のみによる硬化で得られる抵抗体の諸特性も
、まだ満足されるものではなかった。Generally, the amount of irradiation required to cure electron beam curing resin is typically 2 to 3 Mrad in the case of paint films, but in the case of ink for resistors, a large amount of irradiation is required because the carbon content is extremely high. is necessary. As described above, if the irradiation dose becomes high, the main chain of the molecule may be broken, and the resin's original properties may not be exhibited, which is not preferable. Moreover, the various properties of resistors obtained by conventional curing using only electron beams have not yet been satisfactory.
発明の目的
本発明は熱硬化システムから電子線硬化システムへの転
換を促進するものであり、電子線硬化システムにおいて
照射量を減少し、抵抗体の諸特性を改善する抵抗体の製
造方法を提供するものである。OBJECTS OF THE INVENTION The present invention promotes the conversion from thermosetting systems to electron beam curing systems, and provides a method for manufacturing a resistor that reduces the radiation dose and improves various properties of the resistor in the electron beam curing system. It is something to do.
発明の構成
この目的を達成するだめに、本発明の抵抗体の製造方法
は、加熱炉により抵抗体塗膜を４ｏ″Ｃ以上に加温し、
その温度で電子線を照射し抵抗体を製造するものであり
、これによって、硬化に必要な照射量を減少させ、まだ
抵抗体の緒特性を改善することができる。Structure of the Invention In order to achieve this object, the method for manufacturing a resistor of the present invention includes heating the resistor coating film to 4o''C or more in a heating furnace,
The resistor is manufactured by irradiating the resistor with an electron beam at that temperature, thereby reducing the amount of radiation necessary for curing and still improving the resistor's initial characteristics.
実施例の説明 以下、本発明の内容を具体的実施例を用いて説明する。Description of examples Hereinafter, the content of the present invention will be explained using specific examples.
表１に示す組成の混合物を三本ロールミルで混練し、抵
抗体用インキを作製する。A mixture having the composition shown in Table 1 is kneaded in a three-roll mill to prepare an ink for a resistor.
これらのインキを用いて厚さ０．５ｍのベークライト基
板上に、２５μｍの塗膜を作り、希釈溶媒を乾燥させ、
室温まで冷却する。Using these inks, a 25 μm coating film was made on a 0.5 m thick Bakelite substrate, the diluted solvent was dried,
Cool to room temperature.
ｉ子ｍの照射は、ＥＬＥＣＴＲＯＣＵＲＴＡＩＮ■実験
機（加速電圧１６５ＫＶ）を用いた。An ELECTRO CURTAIN experimental machine (acceleration voltage: 165 KV) was used for irradiation of the particles.
表２にそれぞれの電子線硬化で得られた抵抗体の緒特性
を示す。Table 2 shows the characteristics of each resistor obtained by electron beam curing.
表２
米８６°Ｃ，１ｏｏ時間
米＋４０’Ｃ，９５％ １００時間
この結果より、加温による硬化がほとんど考えられ々い
ような、４ｏ″Ｃという低温度でさえも、加温したまま
電子線で硬化すると抵抗体の鉛筆硬度が増加し、耐熱試
験、耐湿試験における抵抗値変化率が大幅に減少するこ
とがわかる。Table 2 Rice 86°C, 100 hours Rice + 40'C, 95% 100 hours These results show that even at a low temperature of 4o''C, where curing due to heating is almost impossible, it is possible to It can be seen that when wire-cured, the pencil hardness of the resistor increases, and the rate of change in resistance value in heat resistance tests and moisture resistance tests decreases significantly.
発明の効果
以上のように本発明によれば、硬化に必要な照射量を半
減させることができ、これにより抵抗体の生産スピード
を上げることが可能となるとともに、抵抗体の特性を向
上させることができ、産業上の効果は大である。Effects of the Invention As described above, according to the present invention, the amount of radiation necessary for curing can be halved, thereby making it possible to increase the production speed of resistors and improving the characteristics of resistors. can be achieved, and the industrial effects are significant.
Claims (1)
することを特徴とする抵抗体の製造方法。A method for manufacturing a resistor, which comprises curing the resistor coating film with an electron beam while heating the resistor coating to 40"C or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58046289A JPS59172206A (en) | 1983-03-18 | 1983-03-18 | Method of producing resistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58046289A JPS59172206A (en) | 1983-03-18 | 1983-03-18 | Method of producing resistor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59172206A true JPS59172206A (en) | 1984-09-28 |
| JPH0552644B2 JPH0552644B2 (en) | 1993-08-06 |
Family
ID=12743050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58046289A Granted JPS59172206A (en) | 1983-03-18 | 1983-03-18 | Method of producing resistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59172206A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS531898A (en) * | 1976-06-25 | 1978-01-10 | Sharp Corp | Printed resistor |
-
1983
- 1983-03-18 JP JP58046289A patent/JPS59172206A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS531898A (en) * | 1976-06-25 | 1978-01-10 | Sharp Corp | Printed resistor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0552644B2 (en) | 1993-08-06 |
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