JPS59167935A - Manufacturing method for mesh master - Google Patents

Abstract

PURPOSE:To form a fine mesh pattern with good accuracy by exposing a negative mask on which a mesh pattern is previously plotted using the electron beam plotting, developing and processing chrome and photoresist, and etching the mask by means of the reactive ion etching and chemical etching. CONSTITUTION:Chrome 2 is vacuum evaporated on the surface of a glass substrate 1 and the surface is coated with positive type photoresist 3. Then a negative mask is tightly exposed and developed and then the chrome of an exposed section is removed. Subsequently, a groove 5 is formed by scraping the exposed glass 4 in a mesh pattern form using the reactive ion etching and then the depth and width of a groove 6 are extended as requested, using the chemical etching. Then, after the square type chrome is removed, the corner of the glass groove is smoothly chamfered using the chemical etching. As a result, a mesh master with a smooth groove 7 can be manufactured.

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a method for manufacturing a mesh master used for manufacturing mesh electrodes for electron tubes such as image pickup tube field meshes.

[Technical background of the invention and its problems]

Generally, a mesh master is used to manufacture mesh electrodes for electron tubes such as image pickup tube yield meshes. Conventionally, the method for manufacturing mesh masters involves coating a film of paraffin or the like on the surface of an electrically insulating substrate. There is a method of manufacturing a mesh master by chemically etching it after attaching it and carving a mesh pattern with a scribing needle made of diamond or other material.However, this method cannot form a fine mesh pattern with high precision. It is difficult to do so.

[Purpose of the invention]

An object of the present invention is to provide a method for manufacturing a mesh master that can form a fine mesh pattern with extremely high precision.

[Summary of the Invention] This invention involves the process of vaporizing chromium on the surface of a glass substrate, and then coating the surface with photorenost, and then passing through an original mask on which a mesh pattern has been drawn in advance by electron beam drawing. a development process in which the chromium and photoresist are exposed to light, and then the exposed area of the glass is etched into a mesh pattern by reactive ion etching, and then the photoresist gold is removed; This method of manufacturing a mesh master comprises a step of etching the groove portion of the glass by chemical etching, and a step of removing chromium and further chamfering the groove portion of the glass by chemical etching.

[Embodiments of the invention]

First, as shown in FIG. 1, chromium 2 is vaporized on the surface of a glass substrate 1 made of, for example, quartz glass or soda glass.
Furthermore, a pot-shaped photorenost 3 is applied to the surface. In this case, the thickness of chromium 2 is about 0.1 μm, and the thickness of photorenost 3 is about 0.5 μm.

Next, as shown in FIG. 2, the entire portion from which chromium 2 and photorenost 3 have been removed by photolithography (this will become the mesh turn) is completely formed. After the pattern drawing and the glass substrate l shown in FIG. 1 are exposed in close contact and developed, the exposed chromium is removed using a mixed water bath solution of ceric ammonium nitrate and perchloric acid, for example. Remove with liquid.

Next, the glass 4 exposed in the mesh pattern is removed by reactive ion etching to form newspaper-shaped grooves 5 as shown in FIG. Here, Photorenost 3 is ion etch knob resistant, and Glass 4
The etching speed of glass 4 is lower than that of 12~
Even after etching to a depth of 1.5 μm, 0.1 μm
A certain amount remains. This photorenost 3k 1. H2O
Remove by soaking in a mixed solution of 2 and H2SO4.

Next, as shown in FIG. 4, the groove 6 is etched by chemical etching.
Increase the floor height and groove width as desired.

Next, after removing the square chrome 2 by soaking it in the chrome stripping solution, chemical etching is used to smoothly chamfer the corners of the glass grooves! I'll do my best. In this case, the 5th
A mesh master having a smooth shape 47 as shown in FIG. 6 can be manufactured. The chemical etching solutions used in the chemical etching shown in FIGS. 4 and 5 above include HF, NH4F, CH3CO0H, and H.
3PO4 or a mixed bath consisting of one of these etching solutions.

〔Effect of the invention〕

According to this invention, #
It is possible to form fine menonyu and arm turns with extremely high precision. That is, in the manufacturing method of the present invention, the chromium and photoresist are developed without any exposure using an original mask on which a mesh and pattern have been drawn in advance by ``Seiko beam drawing'', so it is easier to use than the conventional method using a scribing needle. Haruka
・A fine mesh pattern can be obtained with high accuracy. Also reactive ion etching and chemical engineering.

Since it uses chingu, is it metshu zokoon? The constituting grooves 7 and their depths are made with high precision so that the dimensions can be freely controlled and a desired shape can be easily obtained.

In mass production, these values can easily be kept constant to some extent. That is, very high precision can be obtained by controlling the time, atmosphere and concentration in reactive ion etching, and concentration of liquid in chemical etching.

Furthermore, if the groove is angular, there is a risk of it being chipped during dubbing, but in this invention, the chamfering is done by chemical etching, so the groove can be chamfered easily and with high precision. Furthermore, there is an advantage that the width and depth of the groove can be freely controlled to desired dimensions through the chemical etching process without changing the original mask.

Further, according to the present invention, mesh masters of various sizes ranging from 500 to 2,500 meshes can be easily manufactured. Further, since the mesh master obtained by this invention is made of a single member, the mesh master has a very long length.

[Brief explanation of the drawing]

1 to 5 are process cross-sectional views showing a method for manufacturing a mesh master according to this method, and FIG. 6 is a plan view of FIG. 5. l...Glass substrate, 2...Chromium, 3...Photorenost, 4...Glass exposed in a mesh pattern, 5...Groove after reactive ion etching, 6...
Groove after chemical etching, 7... Groove of completed Metsu/Emaster. Applicant's agent Patent attorney Suzu Ko Takehiko Showa Month 1-1 1 stomach 1. Kazuo Wakasugi Biao 1, Incident Display No. 1985-41985 2, Name of Invention: Mesh Master No. 1 2! Submission method 3, relationship with the case of the person making the amendment Patent issuer (307) Kakyo Shibaura Electric Co., Ltd. 4, agent 5, voluntary amendment 7 Contents of amendment fil In the specifications attached to the application, page 6, No. 12 Correct the word ``gupi/gu'' in the first line to ``rubbing.''

Claims (1)

[Claims] A method for manufacturing a mesh master comprising at least the following steps. ■ Step of vapor depositing chromium on the surface of the glass substrate and then applying photorenost to the surface. ■ Next, exposure is performed through an original mask on which an electron beam lithography pattern has been drawn in advance to reveal the chromium and photorenost. 1. Next, a step of etching the exposed surface of the glass in a mesh pattern using reactive ion etching, and then removing the photoresist; 2. A step of etching the grooves of the glass using chemical etching; ■Next, the chromium is removed and the grooves of the glass are chamfered by chemical etching.