JPS59161895A - プリント基板のスルーホールメッキ装置 - Google Patents
プリント基板のスルーホールメッキ装置Info
- Publication number
- JPS59161895A JPS59161895A JP3792983A JP3792983A JPS59161895A JP S59161895 A JPS59161895 A JP S59161895A JP 3792983 A JP3792983 A JP 3792983A JP 3792983 A JP3792983 A JP 3792983A JP S59161895 A JPS59161895 A JP S59161895A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- tank
- electroless copper
- supply pipe
- copper plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title claims description 62
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims description 11
- 229910052802 copper Inorganic materials 0.000 title claims description 11
- 239000010949 copper Substances 0.000 title claims description 11
- 239000000758 substrate Substances 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000000243 solution Substances 0.000 description 31
- 238000000034 method Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000009826 distribution Methods 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- OWNRRUFOJXFKCU-UHFFFAOYSA-N Bromadiolone Chemical compound C=1C=C(C=2C=CC(Br)=CC=2)C=CC=1C(O)CC(C=1C(OC2=CC=CC=C2C=1O)=O)C1=CC=CC=C1 OWNRRUFOJXFKCU-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 229910052705 radium Inorganic materials 0.000 description 1
- HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/187—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating means therefor, e.g. baths, apparatus
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/422—Plated through-holes or plated via connections characterised by electroless plating method; pretreatment therefor
Landscapes
- Chemically Coating (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3792983A JPS59161895A (ja) | 1983-03-07 | 1983-03-07 | プリント基板のスルーホールメッキ装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3792983A JPS59161895A (ja) | 1983-03-07 | 1983-03-07 | プリント基板のスルーホールメッキ装置 |
Related Child Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5393690A Division JPH0375378A (ja) | 1990-03-06 | 1990-03-06 | 無電解メッキ槽のメッキ液循環装置 |
JP5393490A Division JPH0375377A (ja) | 1990-03-06 | 1990-03-06 | プリント基板のスルーホールメッキ装置 |
JP5393590A Division JPH0375376A (ja) | 1990-03-06 | 1990-03-06 | 無電解メッキ槽のメッキ液循環装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59161895A true JPS59161895A (ja) | 1984-09-12 |
JPH047120B2 JPH047120B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-02-07 |
Family
ID=12511241
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3792983A Granted JPS59161895A (ja) | 1983-03-07 | 1983-03-07 | プリント基板のスルーホールメッキ装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59161895A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6230883A (ja) * | 1985-07-31 | 1987-02-09 | Hitachi Condenser Co Ltd | 液の昇温装置 |
JPH0375376A (ja) * | 1990-03-06 | 1991-03-29 | Purantetsukusu:Kk | 無電解メッキ槽のメッキ液循環装置 |
JPH0375378A (ja) * | 1990-03-06 | 1991-03-29 | Purantetsukusu:Kk | 無電解メッキ槽のメッキ液循環装置 |
JPH056829A (ja) * | 1990-12-28 | 1993-01-14 | Tokin Corp | 薄型トランス |
WO2006022133A1 (ja) * | 2004-08-23 | 2006-03-02 | Tokyo Electron Limited | 無電解めっき装置 |
JP2011042832A (ja) * | 2009-08-20 | 2011-03-03 | Denso Corp | 無電解めっき処理方法 |
JP2016188398A (ja) * | 2015-03-30 | 2016-11-04 | 株式会社 コーア | めっき槽装置 |
CN111448338A (zh) * | 2017-11-30 | 2020-07-24 | Ap&S国际股份有限公司 | 用于化学镀金属化至少一个工件的目标表面的设备 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57140870A (en) * | 1981-11-09 | 1982-08-31 | Canon Inc | Controlling apparatus for concentration of plating solution |
-
1983
- 1983-03-07 JP JP3792983A patent/JPS59161895A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57140870A (en) * | 1981-11-09 | 1982-08-31 | Canon Inc | Controlling apparatus for concentration of plating solution |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6230883A (ja) * | 1985-07-31 | 1987-02-09 | Hitachi Condenser Co Ltd | 液の昇温装置 |
JPH0375376A (ja) * | 1990-03-06 | 1991-03-29 | Purantetsukusu:Kk | 無電解メッキ槽のメッキ液循環装置 |
JPH0375378A (ja) * | 1990-03-06 | 1991-03-29 | Purantetsukusu:Kk | 無電解メッキ槽のメッキ液循環装置 |
JPH056829A (ja) * | 1990-12-28 | 1993-01-14 | Tokin Corp | 薄型トランス |
WO2006022133A1 (ja) * | 2004-08-23 | 2006-03-02 | Tokyo Electron Limited | 無電解めっき装置 |
JP2011042832A (ja) * | 2009-08-20 | 2011-03-03 | Denso Corp | 無電解めっき処理方法 |
JP2016188398A (ja) * | 2015-03-30 | 2016-11-04 | 株式会社 コーア | めっき槽装置 |
CN111448338A (zh) * | 2017-11-30 | 2020-07-24 | Ap&S国际股份有限公司 | 用于化学镀金属化至少一个工件的目标表面的设备 |
Also Published As
Publication number | Publication date |
---|---|
JPH047120B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-02-07 |
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