JPS59150081A - Amorphous magnetic material provided with high hardness insulating coating and its manufacture - Google Patents

Amorphous magnetic material provided with high hardness insulating coating and its manufacture

Info

Publication number
JPS59150081A
JPS59150081A JP2054883A JP2054883A JPS59150081A JP S59150081 A JPS59150081 A JP S59150081A JP 2054883 A JP2054883 A JP 2054883A JP 2054883 A JP2054883 A JP 2054883A JP S59150081 A JPS59150081 A JP S59150081A
Authority
JP
Japan
Prior art keywords
amorphous magnetic
magnetic material
gas
film
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2054883A
Other languages
Japanese (ja)
Inventor
Kenji Hara
賢治 原
Mitsuaki Ikeda
満昭 池田
Shusaku Yao
八百 周作
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yaskawa Electric Corp
Original Assignee
Yaskawa Electric Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yaskawa Electric Manufacturing Co Ltd filed Critical Yaskawa Electric Manufacturing Co Ltd
Priority to JP2054883A priority Critical patent/JPS59150081A/en
Publication of JPS59150081A publication Critical patent/JPS59150081A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To manufacture the titled material with a small iron loss, superior wear and corrosion resistances by forming a coating of an oxide of Ti, Zr, Cr, Al or Si or the nitride of Al or Si on the surface of an amorphous magnetic material in an atmosphere of a specified gas under reduced pressure. CONSTITUTION:An amorphous magnetic material is put in an atmosphere of an inert gas such as Ar, Ne or He, an active gas such as N2, O2 or H2, or a gaseous mixture contg. one or more kinds of active or inert gases under 2.5X10<-4>- 5X10<-3>Torr pressure. One or more kinds of compounds selected among the oxides of Ti, Zr, Cr, Al and Si and the nitrides of Al and Si are vapor-deposited on the surface of the amorphous magnetic material to form a coating of about 100Angstrom -3.7mum thickness.

Description

【発明の詳細な説明】 本発明は、高硬度絶縁皮膜付非晶質磁性材料と。[Detailed description of the invention] The present invention relates to an amorphous magnetic material with a high hardness insulating film.

その製造方法に関するものである。The present invention relates to a manufacturing method thereof.

周知のように非晶質磁性材料(微結晶磁性材料も含む)
は、機械的強度が高く、透磁率が大きいため、今迄の硅
素鋼板やパーマロイなどに代る高透磁率材料として、あ
るいはコンピュータや電子機器に用いら几る磁気バブル
材料や、磁気メモリ材料として使わnつつある。
As is well known, amorphous magnetic materials (including microcrystalline magnetic materials)
Because it has high mechanical strength and high magnetic permeability, it can be used as a high permeability material to replace conventional silicon steel sheets and permalloy, or as a magnetic bubble material or magnetic memory material used in computers and electronic devices. It is starting to be used.

しかし、高透磁率材料として使用する場合、薄板状の非
晶質材料ヶ層状に重ねて使用するので、高周彼領域では
層間抵抗に基づく鉄損の増大と耐食性に問題がある。
However, when used as a high magnetic permeability material, thin plate-like amorphous materials are stacked in layers, so in the high frequency region there are problems with increased iron loss due to interlayer resistance and corrosion resistance.

また、後者の材料として使用する場合は、こnらの問題
点以外に消耗による特性劣fヒも問題になる。
Furthermore, when used as the latter material, in addition to these problems, there is also a problem of poor characteristics due to wear and tear.

そこで、本発明はこルらの欠点のない非晶質磁性材料と
その製造方法?提供しようとするものである。
Therefore, the present invention aims to provide an amorphous magnetic material free from these drawbacks and a method for producing the same. This is what we are trying to provide.

即ち、第1の発明は非晶質磁性材料の表面にTi、Zr
、Cr、AA、Siの酸化物もしくばAA、8jの窒f
ヒ物の一種あるいは二種以上の皮腋ケ100A乃至3.
7μmの厚さに形成するようにしたものであり、第2の
発明は上記の金属皮膜全形成するに際して、アルゴン、
ネオン、ヘリウムなどの不活性ガス。
That is, the first invention has Ti and Zr on the surface of the amorphous magnetic material.
, Cr, AA, Si oxide or AA, 8j nitrogen f
One or more types of skin and axilla 100A to 3.
The metal film is formed to have a thickness of 7 μm, and the second invention uses argon,
Inert gases such as neon and helium.

または窒素、酸素、水素などの活性ガス、もしくは活性
ガスまたは不活性ガスの一種もしくは二種以上倉含む混
合ガスからなる2、 5 X 10−’Torr〜5 
x 10−3Torrのガス雰囲気中で蒸着させること
?特徴とする製造方法である。
or 2,5 X 10-'Torr~5 consisting of an active gas such as nitrogen, oxygen, hydrogen, or a mixed gas containing one or more types of active gas or inert gas.
x Deposition in a gas atmosphere of 10-3 Torr? This is a unique manufacturing method.

第1の発明にか\る非晶質磁性材料は高周波領域での鉄
損が少く、且つ耐摩耗性に優nてるばかりでなく、皮膜
は化学的に安定であるため、腐食の問題もない。
The amorphous magnetic material according to the first invention not only has low core loss in the high frequency range and has excellent wear resistance, but also has a chemically stable film, so there is no problem of corrosion. .

また、第2の発明によnば、鉄損の少い耐摩耗性及び耐
腐食性の非晶質磁性材料が侍らnる。
Further, according to the second invention, there is provided an amorphous magnetic material with low iron loss and wear resistance and corrosion resistance.

以下本発明の実施ツυについて説明すれば次の通りであ
る。
The implementation steps of the present invention will be explained below.

先ず、厚さ30μmの非晶質磁性板の表面にTi、Zr
、Or、AA、Siからなる酸化物もしくUAA、St
の窒fヒ物を一種または二種以上、第1表に示すような
厚さに蒸着したもの?用意し、夫々内径11闘、外径2
4鼾のリング状片とし、同種のものを夫々10枚重ねて
巻線音節し、周波数IKHz、磁束密度10KGにおけ
る鉄損音測定した。
First, Ti and Zr were deposited on the surface of an amorphous magnetic plate with a thickness of 30 μm.
, Or, AA, Si or UAA, St
One or more types of nitrogen atomizers are deposited to a thickness as shown in Table 1? Prepared, each with an inner diameter of 11 mm and an outer diameter of 2
A ring-shaped piece of 4 snares was made, and 10 pieces of the same type were stacked and wound into a syllable, and the iron loss sound was measured at a frequency of IKHz and a magnetic flux density of 10KG.

その結果は第1表に示す通りで勘る力)、わがジ易(す
るため、図にすると第1図に示すようになる。
The results are as shown in Table 1.The results are as shown in Table 1.

この結果かられかるように、皮膜の種類によらず厚さ1
00Aから3,7μmの厚さ被覆丁九ば鉄損は被覆なし
のものに比べ小さいものが得ら几る。
As can be seen from this result, the thickness is 1 regardless of the type of film.
From 00A to 3.7 μm thick coating, the iron loss is smaller than that without coating.

皮膜が薄い間杖連続した均一な皮膜ではないため、層間
で短絡していて鉄損が小さくならない。
Although the film is thin, it is not a continuous and uniform film, so there are short circuits between the layers and iron loss is not reduced.

逆に厚すぎると、占積ホが増加し、鉄損の増加が起るこ
とになる。
On the other hand, if it is too thick, the space will increase, leading to an increase in iron loss.

以上、皮膜の厚さに関する編1の発明の実施ヒリについ
て述べたが5次にそれを製造する方法に関する第2の発
明の実施例Vこつ込て説明する。
The implementation of the invention in part 1 regarding the thickness of the film has been described above, and next, embodiment V of the second invention regarding the method for manufacturing the same will be explained in detail.

第2図は、皮膜?形成するための電子ビーム真空蒸着装
置ケ示すもので、真空槽1に排気口2が設けらt″L、
、図示しない真空ポンプによV)槽内が10−5Tor
rになるように排気するように構成されている。3,3
は槽壁に固定さt″した支持台で、非晶質磁性板4ケ巻
回したロール5および巻取りロール6が設けられている
。7はシ″ヤンター、8は槽内に設けらt″したハース
で、蒸発物質9か装入さnている。10は電子ビーム銃
、11はガス導入口である。
Figure 2 is a film? This shows an electron beam vacuum evaporation apparatus for forming a vacuum chamber 1 with an exhaust port 2 t''L,
, V) The inside of the tank is set to 10-5 Tor by a vacuum pump (not shown).
It is configured to exhaust air so that the temperature becomes r. 3,3
7 is a supporting stand fixed to the tank wall, and is provided with a roll 5 having four amorphous magnetic plates wound thereon, and a take-up roll 6. 7 is a shutter, and 8 is a support stand provided in the tank. An evaporative substance 9 is charged in the hearth. 10 is an electron beam gun, and 11 is a gas inlet.

このように構成した電子ビーム真空蒸着装置の真空槽1
内に第2表に示すようなガスと皮膜材料を使用し、ガス
圧に2 X 10−’Torr 、3 X 10 ’T
orr 、 4.6 X 10−3Torr 、 5.
3 x 10−3Torrの4種類ケ選んで各皮膜材料
を表面に蒸着した非晶質磁性板を作り、次いで、前述の
実施例の場合と同じく、内径がllnm、外径が24 
nmのリング状片?打抜きによジ作ジ、歪取ジ焼鈍後1
0枚重ねた状態で巻線音節こし、周波数1 )G(z 
、磁束密度10KGで鉄損?測定した。
Vacuum chamber 1 of the electron beam vacuum evaporation apparatus configured in this way
The gas and coating materials shown in Table 2 were used in the tank, and the gas pressure was 2 x 10-'Torr and 3 x 10'T.
orr, 4.6 x 10-3 Torr, 5.
Four types of 3 x 10-3 Torr were selected and each film material was deposited on the surface to make an amorphous magnetic plate, and then, as in the case of the previous example, the inner diameter was 1 nm and the outer diameter was 24 nm.
nm ring-shaped piece? After stamping and annealing for strain relief 1
Winding syllables with 0 sheets stacked, frequency 1 ) G (z
, Iron loss at magnetic flux density 10KG? It was measured.

測定結果は第2衣に示す通りであるが、理解ケ容易にす
るため、アルεす(AA203)’に皮膜材料として選
び、活性ガスとして窒素ガス?使用して。
The measurement results are shown in Figure 2, but to make it easier to understand, aluminum (AA203) was selected as the coating material, and nitrogen gas was used as the active gas. Use.

ガス圧會変化系せた場合の鉄損の変rヒ倉示すと第3図
に示すようになる。
Figure 3 shows the variation of iron loss when the gas pressure is changed.

この第2衣及び第3図かられかるように、ガスや皮膜の
種類に関係なく、3 X 10”−’〜5X10〜3T
orr  の圧力範囲で蒸着したものは、鉄損が層間抵
抗全無限大とした理論値に等しくなることがわかった。
As can be seen from this second coat and Figure 3, regardless of the type of gas or film, the
It was found that the core loss of the material deposited in the pressure range of orr is equal to the theoretical value assuming that the total interlayer resistance is infinite.

このガス圧の効果については、ガス圧が扁くなるにつれ
て皮膜の付着力が弱くなるので応力の鉄損に与える影響
が小さくなるためで、5X10−3Torr  以上で
鉄損が急増し、皮膜のない場合と同じになるのは、付着
力があまり小さくなり、皮膜が剥離してしまつfcため
である。
Regarding the effect of gas pressure, as the gas pressure becomes flat, the adhesion of the film becomes weaker, so the effect of stress on iron loss becomes smaller.At 5X10-3 Torr or more, iron loss increases sharply, and when there is no film, The reason why it is the same as in the case is because the adhesion force becomes too small and the film peels off.

以上の結果から、先に特定した範囲の方法で皮膜を被覆
するようにすれば、層間抵抗の低下に基づく、磁気特性
上の問題はな(なり、これらの皮膜の化学的安定性から
考えて、耐食性も向上できる。
From the above results, if the film is coated using the method specified above, there will be no problems with magnetic properties due to a decrease in interlayer resistance (considering the chemical stability of these films). , corrosion resistance can also be improved.

なお、こ\では真空蒸着法の例しか示さなかったが5本
開明は同じ真空系を利用した他の皮膜形成法にも適用し
得ることは勿論である。
Incidentally, although only an example of a vacuum evaporation method has been shown here, it goes without saying that the present invention can be applied to other film forming methods that utilize the same vacuum system.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明実施例の皮膜厚と鉄損との関係を示す図
、@2図は製造装置の実施例?示す断面図、第3図は本
発明実施例の製造ガス圧と鉄損との関係?示す図である
。 1・・・真空槽、2・・・排気口、3・・・支持台、4
・・・非晶質磁性板、5・・・ロール、6・・・巻取り
ロール、7・・・シャッタ、−18・・・ハース、9・
・・i介物’J+t、  1’0・・・電子ビーム銃、
11・・・ガス導入口。 第5岡 圧力 (io” Torr、) 第1圓 座戚4(/A領〕
Fig. 1 is a diagram showing the relationship between film thickness and iron loss in an embodiment of the present invention, and Fig. 2 is an embodiment of the manufacturing equipment? The cross-sectional view shown in FIG. 3 shows the relationship between production gas pressure and iron loss in the embodiment of the present invention. FIG. 1... Vacuum chamber, 2... Exhaust port, 3... Support stand, 4
... Amorphous magnetic plate, 5... Roll, 6... Winding roll, 7... Shutter, -18... Hearth, 9...
・・I intervention 'J+t, 1'0...Electron beam gun,
11...Gas inlet. 5th Oka pressure (io” Torr,) 1st Enza 4 (/A territory)

Claims (2)

【特許請求の範囲】[Claims] (1)底面K Ti 、Zr、Or、AA、Siの酸化
物もしくは、AA、Siの窒化物の一種あるいは二種以
上の皮膜kloOA乃至3.7μmの厚さに形成したこ
とを特徴とする高硬度絶縁皮膜付非晶質磁性材料。
(1) Bottom surface K Ti , Zr, Or, AA, Si oxide or AA, Si nitride one or more types of coating kloOA to 3.7 μm thick. Amorphous magnetic material with hard insulating film.
(2)  アルゴン、ネオン、ヘリウムなどの不活性ガ
ス、または窒素、酸累、水累などの活性ガス、もしくは
活性ガスまたは不活性ガスの一種もしくは二種以上を含
む混合ガスからなる2、 5 X 1 (1”4To’
rr 〜5 X 1.0−3Torrのガス雰囲気中に
非晶質磁性材料を入れ、 Ti、Zr。 Or、AA、Stの酸fヒ物もしくはAA 、 S i
の窒化物?一種もしくは二種以上?蒸発させて、前記非
晶質磁性材料の表面に皮膜?形成すること?特徴とする
高硬度絶縁皮膜付非晶質磁性板の製造方法。
(2) Consisting of an inert gas such as argon, neon, or helium, or an active gas such as nitrogen, acid, or water, or a mixed gas containing one or more of the active gas or inert gas. 1 (1"4To'
Amorphous magnetic materials are placed in a gas atmosphere of rr ~ 5 x 1.0-3 Torr, and Ti, Zr. Or, AA, St acid f arsenate or AA, Si
Nitride? One or more types? Does it evaporate and form a film on the surface of the amorphous magnetic material? To form? A method for producing an amorphous magnetic plate with a high-hardness insulating film.
JP2054883A 1983-02-12 1983-02-12 Amorphous magnetic material provided with high hardness insulating coating and its manufacture Pending JPS59150081A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2054883A JPS59150081A (en) 1983-02-12 1983-02-12 Amorphous magnetic material provided with high hardness insulating coating and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2054883A JPS59150081A (en) 1983-02-12 1983-02-12 Amorphous magnetic material provided with high hardness insulating coating and its manufacture

Publications (1)

Publication Number Publication Date
JPS59150081A true JPS59150081A (en) 1984-08-28

Family

ID=12030200

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2054883A Pending JPS59150081A (en) 1983-02-12 1983-02-12 Amorphous magnetic material provided with high hardness insulating coating and its manufacture

Country Status (1)

Country Link
JP (1) JPS59150081A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61227194A (en) * 1985-03-30 1986-10-09 Nippon Steel Corp Surface treatment of thin amorphous alloy strip
JPS6386889A (en) * 1986-09-30 1988-04-18 Nippon Steel Corp Surface treated amorphous alloy material
US6420042B1 (en) 1999-09-24 2002-07-16 Nippon Steel Corporation Fe-based amorphous alloy thin strip with ultrathin oxide layer

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61227194A (en) * 1985-03-30 1986-10-09 Nippon Steel Corp Surface treatment of thin amorphous alloy strip
JPH0141720B2 (en) * 1985-03-30 1989-09-07 Nippon Steel Corp
JPS6386889A (en) * 1986-09-30 1988-04-18 Nippon Steel Corp Surface treated amorphous alloy material
US6420042B1 (en) 1999-09-24 2002-07-16 Nippon Steel Corporation Fe-based amorphous alloy thin strip with ultrathin oxide layer

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