JPS59149024A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS59149024A
JPS59149024A JP58022775A JP2277583A JPS59149024A JP S59149024 A JPS59149024 A JP S59149024A JP 58022775 A JP58022775 A JP 58022775A JP 2277583 A JP2277583 A JP 2277583A JP S59149024 A JPS59149024 A JP S59149024A
Authority
JP
Japan
Prior art keywords
exposure
wafer
reflectance
photodetector
shutter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58022775A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0462167B2 (enrdf_load_stackoverflow
Inventor
Kazunori Imai
今井　和典
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58022775A priority Critical patent/JPS59149024A/ja
Publication of JPS59149024A publication Critical patent/JPS59149024A/ja
Publication of JPH0462167B2 publication Critical patent/JPH0462167B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
JP58022775A 1983-02-16 1983-02-16 露光装置 Granted JPS59149024A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58022775A JPS59149024A (ja) 1983-02-16 1983-02-16 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58022775A JPS59149024A (ja) 1983-02-16 1983-02-16 露光装置

Publications (2)

Publication Number Publication Date
JPS59149024A true JPS59149024A (ja) 1984-08-25
JPH0462167B2 JPH0462167B2 (enrdf_load_stackoverflow) 1992-10-05

Family

ID=12092034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58022775A Granted JPS59149024A (ja) 1983-02-16 1983-02-16 露光装置

Country Status (1)

Country Link
JP (1) JPS59149024A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61216324A (ja) * 1985-03-20 1986-09-26 Nec Corp 縮小投影式露光装置
JPS63111617A (ja) * 1986-10-29 1988-05-16 Mitsubishi Electric Corp 縮小投影露光装置
JPH02288326A (ja) * 1989-04-28 1990-11-28 Dainippon Screen Mfg Co Ltd ウエハの周辺部露光装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5068066A (enrdf_load_stackoverflow) * 1973-10-17 1975-06-07
JPS5317513A (en) * 1976-07-31 1978-02-17 Ishikawajima Harima Heavy Ind Co Ltd Extracting apparatus for reduction furnace
JPS56146138A (en) * 1980-04-16 1981-11-13 Nec Corp Method and apparatus for exposing photomask
JPS57117238A (en) * 1981-01-14 1982-07-21 Nippon Kogaku Kk <Nikon> Exposing and baking device for manufacturing integrated circuit with illuminometer
JPS57182149A (en) * 1981-05-01 1982-11-09 Matsushita Electric Works Ltd Surface defect detector

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5068066A (enrdf_load_stackoverflow) * 1973-10-17 1975-06-07
JPS5317513A (en) * 1976-07-31 1978-02-17 Ishikawajima Harima Heavy Ind Co Ltd Extracting apparatus for reduction furnace
JPS56146138A (en) * 1980-04-16 1981-11-13 Nec Corp Method and apparatus for exposing photomask
JPS57117238A (en) * 1981-01-14 1982-07-21 Nippon Kogaku Kk <Nikon> Exposing and baking device for manufacturing integrated circuit with illuminometer
JPS57182149A (en) * 1981-05-01 1982-11-09 Matsushita Electric Works Ltd Surface defect detector

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61216324A (ja) * 1985-03-20 1986-09-26 Nec Corp 縮小投影式露光装置
JPS63111617A (ja) * 1986-10-29 1988-05-16 Mitsubishi Electric Corp 縮小投影露光装置
JPH02288326A (ja) * 1989-04-28 1990-11-28 Dainippon Screen Mfg Co Ltd ウエハの周辺部露光装置

Also Published As

Publication number Publication date
JPH0462167B2 (enrdf_load_stackoverflow) 1992-10-05

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