JPS59146177A - 光照射加熱方法 - Google Patents
光照射加熱方法Info
- Publication number
- JPS59146177A JPS59146177A JP1886983A JP1886983A JPS59146177A JP S59146177 A JPS59146177 A JP S59146177A JP 1886983 A JP1886983 A JP 1886983A JP 1886983 A JP1886983 A JP 1886983A JP S59146177 A JPS59146177 A JP S59146177A
- Authority
- JP
- Japan
- Prior art keywords
- heated
- light source
- heat transfer
- light
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Control Of Resistance Heating (AREA)
- Resistance Heating (AREA)
- Vertical, Hearth, Or Arc Furnaces (AREA)
- Furnace Details (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1886983A JPS59146177A (ja) | 1983-02-09 | 1983-02-09 | 光照射加熱方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1886983A JPS59146177A (ja) | 1983-02-09 | 1983-02-09 | 光照射加熱方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59146177A true JPS59146177A (ja) | 1984-08-21 |
| JPH0150837B2 JPH0150837B2 (https=) | 1989-10-31 |
Family
ID=11983542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1886983A Granted JPS59146177A (ja) | 1983-02-09 | 1983-02-09 | 光照射加熱方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59146177A (https=) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5390033A (en) * | 1977-01-19 | 1978-08-08 | Hitachi Ltd | Heat treatment equipment |
-
1983
- 1983-02-09 JP JP1886983A patent/JPS59146177A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5390033A (en) * | 1977-01-19 | 1978-08-08 | Hitachi Ltd | Heat treatment equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0150837B2 (https=) | 1989-10-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6720531B1 (en) | Light scattering process chamber walls | |
| KR910007109B1 (ko) | 화학증기증착 반응기용 반사장치 | |
| US20200022223A1 (en) | Circular lamp arrays | |
| JP2001291677A (ja) | 熱処理装置 | |
| JP2001210631A (ja) | 熱処理装置 | |
| JPS6289871A (ja) | 軸対称性を有する化学蒸着用反応装置を構成する方法及び装置 | |
| JPS62502823A (ja) | 選択的な化学蒸着方法および装置 | |
| TWI663285B (zh) | 用於半導體處理腔室的吸收反射體 | |
| WO2007034707A1 (ja) | 熱処理装置、コンピュータプログラム及び記憶媒体 | |
| TW200921754A (en) | Filament lamp and light irradiation type heat treatment device | |
| JPS60161616A (ja) | 半導体ウエハの赤外線加熱装置 | |
| JPS59146177A (ja) | 光照射加熱方法 | |
| US4419332A (en) | Epitaxial reactor | |
| US20040067052A1 (en) | Localized heating of substrates using optics | |
| JPH0778830A (ja) | 半導体製造装置 | |
| JPS5936927A (ja) | 半導体気相成長装置 | |
| KR100970013B1 (ko) | 열처리 장치 | |
| JPS60189927A (ja) | 気相反応容器 | |
| JPS5826658B2 (ja) | 気相成長装置 | |
| JPH04713A (ja) | 基板の加熱装置 | |
| JPH01280323A (ja) | 気相エピタキシャル成長装置 | |
| JP2008117892A (ja) | 半導体製造装置および半導体装置の製造方法 | |
| JPH0210866B2 (https=) | ||
| KR920004964B1 (ko) | 광화학증착장치용 적외선 가열장치 | |
| JPH04325686A (ja) | Cvd装置の加熱ヒータ |