JPS5914545B2 - Articles with self-cleaning coating layer - Google Patents
Articles with self-cleaning coating layerInfo
- Publication number
- JPS5914545B2 JPS5914545B2 JP54119867A JP11986779A JPS5914545B2 JP S5914545 B2 JPS5914545 B2 JP S5914545B2 JP 54119867 A JP54119867 A JP 54119867A JP 11986779 A JP11986779 A JP 11986779A JP S5914545 B2 JPS5914545 B2 JP S5914545B2
- Authority
- JP
- Japan
- Prior art keywords
- self
- coating layer
- catalyst
- frit
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011247 coating layer Substances 0.000 title claims description 22
- 238000004140 cleaning Methods 0.000 title claims description 8
- 239000003054 catalyst Substances 0.000 claims description 29
- 229910052782 aluminium Inorganic materials 0.000 claims description 16
- -1 phosphoric acid compound Chemical class 0.000 claims description 14
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 12
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 11
- 229910052742 iron Inorganic materials 0.000 claims description 6
- 229910019142 PO4 Inorganic materials 0.000 claims description 5
- 229910052748 manganese Inorganic materials 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical group 0.000 claims description 4
- 239000011973 solid acid Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- 239000010452 phosphate Substances 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052788 barium Inorganic materials 0.000 claims description 2
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 16
- 239000004115 Sodium Silicate Substances 0.000 description 14
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 14
- 229910052911 sodium silicate Inorganic materials 0.000 description 14
- 239000010410 layer Substances 0.000 description 10
- 239000002585 base Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 229910000680 Aluminized steel Inorganic materials 0.000 description 6
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000000746 purification Methods 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 230000000996 additive effect Effects 0.000 description 5
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 210000003298 dental enamel Anatomy 0.000 description 5
- 238000004090 dissolution Methods 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 230000003197 catalytic effect Effects 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000010411 cooking Methods 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 235000021317 phosphate Nutrition 0.000 description 4
- 150000003016 phosphoric acids Chemical class 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000000395 magnesium oxide Substances 0.000 description 3
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910052789 astatine Inorganic materials 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000004534 enameling Methods 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000002574 poison Substances 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910004072 SiFe Inorganic materials 0.000 description 1
- 235000011941 Tilia x europaea Nutrition 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 230000009970 fire resistant effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- GVALZJMUIHGIMD-UHFFFAOYSA-H magnesium phosphate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GVALZJMUIHGIMD-UHFFFAOYSA-H 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002694 phosphate binding agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- POWFTOSLLWLEBN-UHFFFAOYSA-N tetrasodium;silicate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])[O-] POWFTOSLLWLEBN-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Glass Compositions (AREA)
- Catalysts (AREA)
- Chemically Coating (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Cookers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
Description
【発明の詳細な説明】
本発明は、調理時に調理器の庫内壁に飛散し、汚れとな
る油分を触媒で分解浄化する作用を有した自己浄化被覆
層に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a self-purifying coating layer that has the effect of using a catalyst to decompose and purify oil that scatters and becomes dirt on the inner wall of a cooking appliance during cooking.
10近年、各種調理器の普及に伴つて、自己浄化作用を
有する被覆層を有するものが市販されている。10 In recent years, with the spread of various types of cooking appliances, appliances with a coating layer that has a self-purifying effect have become commercially available.
これらの被覆層を大別すると、ガラス質フリットを結合
剤としたものと、ケイ酸塩を結合剤としたものがある。
前者の代表的なものは、特公昭4915−33088号
公報にみられるように、触媒をフリットの一成分として
、ガラス質物質と溶融合体したものを用いて金属基質に
担持するものである。この方式の欠点として、触媒がガ
ラス成分となつているため、効果を充分に発揮できない
ことや、■0 触媒をガラス溶融時に一担、1200℃
以上の高温にするため不活性になつてしまうことなどが
あろ。これを改良する手段として、特開昭52一135
325号や、特開昭52−127913号ノ5 公報に
みられろように、フリットと触媒を分離した状態で、し
かも触媒が不活性にならない程度の低温で焼付けろ方法
がある。These coating layers can be broadly classified into those using glass frit as a binder and those using silicate as a binder.
A typical example of the former method, as disclosed in Japanese Patent Publication No. 4915-33088, is a method in which a catalyst is supported on a metal substrate using a molten mixture with a glassy material as a component of a frit. The disadvantages of this method are that the catalyst is a glass component, so it cannot fully demonstrate its effect;
If the temperature is higher than that, it may become inactive. As a means to improve this, JP-A-52-135
As seen in No. 325 and JP-A-52-127913-5, there is a baking method in which the frit and the catalyst are separated and at a low temperature that does not make the catalyst inactive.
この方式の欠点は、低軟化点フリットを用いる場合のミ
ル添加剤として、ケイ酸ナトリウムを使用することであ
る。ケゞ0 イ酸ナトリウムは、触媒を被毒させ、触媒
の活性を低下させてしまう。このことは、ケイ酸ナトリ
ウムを結合剤とした特公昭49−28120号公報にみ
られる自己浄化被覆層にも認められろ。ケイ酸ナトリウ
ムによる触媒能の低下は、特にオー■5 フッ使用偏度
が250゜C以下の比較的低温側にお(・て著し(・。
したがつて、触媒能を充分発揮させるためには、ノl一
ケイ酸ナトリウムを用いないで被覆層を形成させること
が望まし(・。A disadvantage of this approach is the use of sodium silicate as a mill additive when using low softening point frits. K0 Sodium silicate poisons the catalyst and reduces the activity of the catalyst. This can also be seen in the self-purifying coating layer shown in Japanese Patent Publication No. 49-28120, which uses sodium silicate as a binder. The decrease in catalytic ability due to sodium silicate is particularly noticeable at relatively low temperatures, where the degree of use of fluorine is below 250°C.
Therefore, in order to fully exhibit the catalytic ability, it is desirable to form the coating layer without using sodium monosilicate.
しかし、現実の問題として、低軟化点ガラスを使用する
場合は、スリップの安定性や、ホーロー層としての金属
との密着強度、表面硬度などの観点から、これを用いな
いで形成することは、非常に困難である。本発明は、七
述した従来のケイ酸ナトリウムをミル添加剤とした自己
浄化被覆層の欠点を改良したもので、低温側での浄化性
能を改善し、しかも充分な密着強度、表面硬度を得るも
のである。However, as a practical matter, when using low softening point glass, it is difficult to form without it from the viewpoints of slip stability, adhesion strength with metal as an enamel layer, surface hardness, etc. Very difficult. The present invention improves the drawbacks of the conventional self-purifying coating layer using sodium silicate as a mill additive as described in Section 7. It improves the purifying performance at low temperatures and also provides sufficient adhesion strength and surface hardness. It is something.
本発明の自己浄化被覆層は、ガラス質フリットと触媒と
リン酸系化合物を必須成分とするものである。本発明者
らは先にリン酸塩系結合剤を用いた自己浄化被覆層を提
案した。このものは従来の自己浄化被覆層に比較した場
合は、確かに優れた性能を有す・,が、密着強度、表面
硬度の観点からは、必ずLも満足のいくものではなかつ
た。本発明は、このリン酸塩系結合剤をガラス質フリツ
トと共存させることによつて、従来には認められなか0
た優れた浄化性能と、ホーローとして優れた物理的特性
を有する自己浄化被覆層を提供するものである。本発明
に望ましいガラス質フリツトは、アルミニウムもしくは
アルミニウムを溶融メツキしたアルミナイズド鋼板に適
した軟化温度が600℃以下のものである。The self-purifying coating layer of the present invention contains a glassy frit, a catalyst, and a phosphoric acid compound as essential components. The present inventors previously proposed a self-cleaning coating layer using a phosphate binder. When compared with conventional self-purifying coating layers, this material certainly has superior performance, but L was not always satisfactory from the viewpoints of adhesion strength and surface hardness. In the present invention, by coexisting this phosphate-based binder with a glassy frit, the present invention achieves a
The present invention provides a self-purifying coating layer that has excellent cleaning performance and excellent physical properties as a enamel. The glassy frit desirably used in the present invention has a softening temperature of 600° C. or less, which is suitable for aluminum or an aluminized steel plate coated with aluminum.
軟化混度が600℃以上のものは焼成時にアルミニウム
が溶融してしまうので用いることができない。従来、ア
ルミニウム用のホーローのミル添加剤としてケイ酸ナト
リウムを用いることは既に知られている。Materials with a softening temperature of 600° C. or higher cannot be used because the aluminum will melt during firing. Conventionally, it is already known to use sodium silicate as a mill additive for aluminum enamel.
このケイ酸ナトリウムを用いるのは以下の理由による。
ガラス質フリツトは、スリップ製造時に少し溶解し、P
Hが11〜12程度のアルカリ性を示す。この状態でア
ルミニウムの上に塗布すると、アルミニウムの安定領域
すなわちアルミニウムが溶附しないPHの領域は4〜9
までなので、アルミニウムが溶解し、水素が発生してピ
ンホールを生じる。このため、フリット層と金属との密
着が得られない。ケイ酸ナトリウムの添加効果は、この
アルミニウムとスリップとの溶解反応に対する抑制剤と
して大きな役割を持つ。すなわち、一般的にケイ酸ナト
リウム中のNa+イオンが、金属アルミニウムに吸着し
、溶解反応を阻止していると云われている。この作用に
より、スリツプのPHが9以上であつても、水素の発生
なしに、アルミニウム上にホーロー加工が可能となるの
である。以上述べた理由の他に、表面硬度や密着強度の
向七の上でもケイ酸ナトリウムの添加効果は大きい。こ
のことは、直接アルミニウム金属と接触する下塗り層で
も、その上に形成する上塗り層でも同じである。通常、
上塗り層は金属と隔離している下塗シ層があるので、溶
解反応は起こらないように思われるが、下塗シ層には微
少のピンホールが多数存在しているので、同様に溶解反
応が起こるのである。以上述べたように、軟化温度が6
00′C以下のフリットを用いて、アルミニウムもしく
はアルミナイズド鋼板上にホーロー加工を行う上でケイ
酸ナトリウムを用いることは必須条件であつた。The reason for using this sodium silicate is as follows.
The vitreous frit melts a little during slip manufacturing and P
Shows alkalinity with H of about 11 to 12. When applied on aluminum in this state, the stable range of aluminum, that is, the pH range where aluminum does not melt, is 4 to 9.
As a result, aluminum dissolves, hydrogen is generated, and pinholes are created. Therefore, close contact between the frit layer and the metal cannot be obtained. The effect of adding sodium silicate plays a major role as an inhibitor against the dissolution reaction between aluminum and slip. That is, it is generally said that Na+ ions in sodium silicate are adsorbed to metal aluminum and inhibit the dissolution reaction. Due to this effect, even if the pH of the slip is 9 or higher, it is possible to perform enameling on aluminum without generating hydrogen. In addition to the above-mentioned reasons, the addition of sodium silicate has a great effect in improving surface hardness and adhesion strength. This is true for both the undercoat layer that comes into direct contact with the aluminum metal and the topcoat layer formed thereon. usually,
The overcoat layer has an undercoat layer that separates it from the metal, so it seems that no dissolution reaction occurs, but since there are many minute pinholes in the undercoat layer, a dissolution reaction occurs as well. It is. As mentioned above, the softening temperature is 6
The use of sodium silicate is an essential condition for enameling aluminum or aluminized steel sheets using a frit of 00'C or less.
しかしながら、このケイ酸ナトリウムは、先に述べたよ
うに自己浄化被覆層の触媒性能という観点からみた場合
は、望ましくな(・ものである。本発明は、このケイ酸
ナトリウムの代わりに、リン酸系化合物を用いるもので
ある。リン酸系化合物は、一般式MO,XP2O5・Y
H2Oで示されるものである。この式において、MはA
t,Mg,Ca,Fe,Cu,Ba,Ti,Mnおよび
Znよりなる群より選択される。通常、最も安価で、入
手しやすいものは例えば第一リン酸アルミニウム、第二
リン酸アルミニウムなどのアルミニウム化合物、第三リ
ン酸マグネシウムなどがある。これらのリン酸系化合物
は、加熱により次のような高分子の縮合リン酸塩となる
。さらに高温に加熱すると、例えば第一リン酸アルミニ
ウムの場合、次のような反応によつて結晶化し硬化する
。However, as mentioned above, this sodium silicate is undesirable from the viewpoint of the catalytic performance of the self-purifying coating layer.The present invention uses phosphoric acid instead of this sodium silicate. The phosphoric acid compound has the general formula MO, XP2O5・Y
It is indicated by H2O. In this formula, M is A
t, Mg, Ca, Fe, Cu, Ba, Ti, Mn and Zn. Generally, the cheapest and most easily available materials include aluminum compounds such as monoaluminum phosphate and dibasic aluminum phosphate, and tribasic magnesium phosphate. When heated, these phosphoric acid compounds turn into the following polymeric condensed phosphates. When heated to a higher temperature, for example, primary aluminum phosphate crystallizes and hardens through the following reaction.
A4O3・3P205・XH2O
この反応において、加熱温度が500℃以下のときは脱
水を完丁したAt2O3・3p205およびAt2O3
・P2O5の結晶と非結晶のもの、それに脱水過程の中
間生成物である非結晶のAt2O33P2O5・2H2
0などが一様に存在し、一度は結晶化するが、空気中に
放置すると吸湿性の強いA4O3・3P205・2H2
0が空気中の水分を結晶水として取り入れ、A4O3・
3P205・6H20の結晶が生成し、同時に体積が膨
張し、初めて結晶化組織を破壊して粉末状になつてしま
う。A4O3・3P205・XH2O In this reaction, when the heating temperature is 500℃ or less, At2O3・3p205 and At2O3 are completely dehydrated.
・Crystalline and amorphous P2O5, and amorphous At2O33P2O5・2H2, which is an intermediate product of the dehydration process.
A4O3, 3P205, 2H2, which are uniformly present and crystallize once, but are highly hygroscopic when left in the air.
0 takes in moisture from the air as crystal water and forms A4O3.
Crystals of 3P205 and 6H20 are formed, and at the same time, their volume expands, and for the first time, the crystallized structure is destroyed and they become powder-like.
また、500℃以上に加熱したものは、安定で強固の結
晶体At2O3・3p205を形成する。さらに100
0℃以七になると、A4O3・3P205→At2O3
・P2O5+2H20の熱分解を起こして、より強固な
耐熱性のものが得られる。Moreover, when heated to 500° C. or higher, stable and strong crystalline At2O3.3p205 is formed. 100 more
When the temperature is below 0℃, A4O3・3P205 → At2O3
・By causing thermal decomposition of P2O5+2H20, a product with stronger heat resistance can be obtained.
このように、リン酸塩は500℃以上で、安定なものて
得られ、フリツトの焼付け温度が500〜600℃であ
ることからも、好ましいといえる。As described above, phosphates can be obtained stably at temperatures of 500 DEG C. or higher, and the frit baking temperature is 500 DEG to 600 DEG C., so it can be said to be preferable.
さらに、このリン酸系化合物が本発明にとつて好都合な
理由がある。それは、リン酸系化合物が水溶液において
酸件を示すことである。この酸性は、フリツトの溶解成
分のアルカリ分を中和する働きを有している。したがつ
て、スリップを中和し、アルミニウムもしくはアルミニ
ウム合金との溶解反応を抑制する。しかし、フリツトに
対する添加量が多過ぎたり、フリットのガラス成分の溶
出量が多すぎる場合はゲル化してしまうので、適切な量
を選ぶことが重要である。次に、ガラス質フリツトであ
るが、本発明に望ましいフリツトは、軟化温度が600
℃以下のものである。Furthermore, there is a reason why this phosphoric acid compound is advantageous for the present invention. That is, phosphoric acid compounds exhibit acidity in aqueous solutions. This acidity has the function of neutralizing the alkaline content of the dissolved components of the frit. Therefore, slip is neutralized and dissolution reaction with aluminum or aluminum alloy is suppressed. However, if the amount added to the frit is too large or the amount of glass components eluted from the frit is too large, gelation will occur, so it is important to select an appropriate amount. Next, regarding the glass frit, the frit preferred for the present invention has a softening temperature of 600
℃ or below.
通常、このような低軟化点ガラスは、成分として、酸化
鉛やカドミウムを含んでいるが、できれば、上述した公
害物質を含まないで構成された、特開昭52−1353
25号公報に示された下記の組成のものがよいこの組成
内で製造したガラスは、水中での溶出量が少なく、本発
明に好ましいガラス質フリツトで、軟化温度が500〜
580℃内にある。Usually, such low softening point glass contains lead oxide or cadmium as a component, but if possible, it is preferable to use Japanese Patent Application Laid-Open No. 52-1353, which does not contain the above-mentioned pollutants.
The following composition shown in Publication No. 25 is preferable. Glass produced within this composition has a small amount of elution in water, is a preferable glass frit for the present invention, and has a softening temperature of 500 to 500.
It is within 580℃.
フリットの特性は単に結合剤としてはかりではなく、自
己浄化性能においても重要な働きを持つ。フリットの熱
膨張係数は、金属との結合力、添加する触媒量の決定に
おいても重要で、好ましい範囲は100〜130×10
−7Deglである。焼成条件は、自己浄化性能と、ホ
ーローとして要求される物理的特徴を満足させる上で重
要な要因であり、600℃以内に軟化点を有することが
必要である。本発明が適用できる金属基材は、アルミニ
ウムもしくはアルミニウム合金を被覆した鋼板で、好ま
しくは、アルミニウム溶融メツキ鋼板(アルミナイズド
鋼板)である。The properties of frit are not only useful as a binder, but also play an important role in self-purification performance. The coefficient of thermal expansion of the frit is also important in determining the bonding strength with the metal and the amount of catalyst added, and the preferable range is 100 to 130 x 10
-7Degl. Firing conditions are important factors in satisfying self-purifying performance and physical characteristics required for enamel, and it is necessary to have a softening point within 600°C. The metal base material to which the present invention can be applied is a steel plate coated with aluminum or an aluminum alloy, preferably an aluminum hot-dip plated steel plate (aluminized steel plate).
アルミナイズド鋼板は、鋼板の上にAt分90%、Si
分8〜9%程度で構成される層を溶融メツキ法でメツキ
した鋼板で、10〜30μm程度のAt−Si層を有し
たものである。このアルミナイズド鋼板は、通常の純A
tよりも耐熱性は高いが、それでも600℃までである
。600℃を過ぎると、表面層のAtと鋼中のFeとが
合金化反応を起こし、At−SiFeからなる合金層を
形成してしまう。Aluminized steel plate has 90% At and Si on the steel plate.
This is a steel plate plated with a layer composed of about 8 to 9% of At-Si by a hot-dip plating method, and has an At-Si layer of about 10 to 30 μm. This aluminized steel sheet is made of ordinary pure A
Although it has higher heat resistance than t, it is still up to 600°C. When the temperature exceeds 600°C, an alloying reaction occurs between At in the surface layer and Fe in the steel, forming an alloy layer made of At-SiFe.
したがつて、600℃以下で焼成可能なフリットが必要
である。次に、触媒について詳述する。Therefore, a frit that can be fired at 600° C. or lower is required. Next, the catalyst will be explained in detail.
本発明に使用することの可能な触媒は、金属酸化物、複
酸化物、固体酸触媒、固体塩基触媒である。Catalysts that can be used in the present invention are metal oxides, double oxides, solid acid catalysts, and solid base catalysts.
金属酸化物はMn,Cu,FeラNiラCrラCOなど
から選択される金属の酸化物で、特に好ましいのは、M
n,Cu,Feの酸化物である。複酸化物は、2種以上
の酸化物からなる高次化合物のうち、その構造において
、酸素酸としての基イオンの存在が認められないような
化合物のことである。一般式としては、M[[)M[1
1204(Mll)、Mは各々2価、3価の金属イオン
を示す)で示され、スピネル型構造を有しているもので
ある。本発明に有効なものは、特にMlI)Fe2O4
で示されるMIl)が2価の金属イオンで、Mn2+,
F工+,CO2+,Ni2+,Zn2+,Ba2+など
からなるものである。固体酸触媒、塩基触媒は、近年注
目されてお虱ブレンステッド、あるいはルイスの酸塩基
の定義による固体上の酸点、塩基性点を有した触媒であ
る。The metal oxide is an oxide of a metal selected from Mn, Cu, Fe, Ni, Cr, CO, etc. Particularly preferred is Mn, Cu, Fe, Ni, Cr, CO, etc.
It is an oxide of n, Cu, and Fe. A double oxide is a higher-order compound consisting of two or more types of oxides, in which the presence of a base ion as an oxygen acid is not recognized in its structure. The general formula is M[[)M[1
1204 (Mll), M represents divalent and trivalent metal ions, respectively), and has a spinel structure. Particularly effective for the present invention are MlI)Fe2O4
MIl) is a divalent metal ion, Mn2+,
It consists of F +, CO2+, Ni2+, Zn2+, Ba2+, etc. Solid acid catalysts and base catalysts have been attracting attention in recent years, and are catalysts having acidic sites and basic sites on a solid according to the definition of acid-base by Bronsted or Lewis.
固体酸触媒として代表的なものは、シリカ・アルミナ、
シリカ、マグネシア、ゼオライトなどがある。また、塩
基性のものは、CaO,MgO,Na2cO3,K2c
O3,BacO3,アルミン酸石灰などがある。これら
の酸塩基触媒は、油脂との反応において分解性能に優れ
ている。以七、述べた触媒は、従来のミル添加剤である
ケイ酸ナトリウムと共存させた場合は、触媒毒となつて
性能を低下させるが、リン酸系化合物と共存させた場合
は、低下が招められない。Typical solid acid catalysts are silica, alumina,
Examples include silica, magnesia, and zeolite. In addition, basic ones include CaO, MgO, Na2cO3, K2c
Examples include O3, BacO3, and lime aluminate. These acid-base catalysts have excellent decomposition performance in reaction with fats and oils. 7. When the catalyst mentioned above coexists with sodium silicate, which is a conventional mill additive, it becomes a catalyst poison and reduces performance, but when it coexists with phosphoric acid compounds, the performance decreases. I can't stand it.
この理由は次のように考えられる。スリツプ中に存在し
ているアルカリイオンは、触媒があるとその活性点に吸
着してしまうが、リン酸系化合物の場合、アルカリイオ
ンは、塩を形成してしまうものと思われる。また過剰の
リン酸系化合物が存在しても、例を第一リン酸塩にとる
なら、末端の解離件のHを耐水性のよいもので置換封鎖
させることが可能である。この目的に用いられている金
属酸化物は酸化亜鉛のように、相当激しく反応するもの
と、反応の緩慢なAt,Si,Ti,Fe,Snなどの
酸化物がある。これらは、前述の触媒の一成分ともなつ
ているし、また多孔質形成剤として、マット形成物とし
て添加されているので、本発明においては好都合である
。マツト形成剤とは、自己浄化被覆層に多孔を与える目
的で添加するもので、耐火性の基骨材、例えば、AbO
3,SlO2,TiO2,MgO,CaOなどの酸化物
および、これらを一成分としてなる種々の鉱物である。The reason for this is thought to be as follows. The alkali ions present in the slip will be adsorbed to the active sites of the catalyst, but in the case of phosphoric acid compounds, the alkali ions are thought to form salts. Furthermore, even if an excess of the phosphoric acid compound is present, taking the primary phosphate as an example, it is possible to replace and block the dissociated H at the terminal with a highly water-resistant compound. Metal oxides used for this purpose include those that react quite violently, such as zinc oxide, and those that react slowly, such as At, Si, Ti, Fe, and Sn. These are convenient in the present invention because they are one of the components of the catalyst mentioned above, and are added as porosity forming agents and mat forming substances. A mat forming agent is added for the purpose of providing porosity to the self-cleaning coating layer, and is used for fire-resistant base aggregates such as AbO.
3. Oxides such as SlO2, TiO2, MgO, and CaO, and various minerals containing these as one component.
これらの無機物の他に、焼成時の熱分解により多孔質を
付与する有機物もある。例として、ポリエチレン粉末、
カルボキシメチルセルロース、ポリビニルアルコール、
ポリテトラフルオロエチレン、ポリスチレンなどがある
。本発明は、以上述べた要素により構成された自己浄化
被覆層で、各種調理器の庫内壁面に適用可能であるが、
触媒作用が要求▲れる壁面には、用途を問わず適用可能
である。一例として、燃焼機器を構成する壁面のスズ,
タールの浄化に対しても有効である。以下、本発明の実
施例る述べる。In addition to these inorganic substances, there are also organic substances that impart porosity through thermal decomposition during firing. For example, polyethylene powder,
carboxymethylcellulose, polyvinyl alcohol,
Examples include polytetrafluoroethylene and polystyrene. The present invention is a self-purifying coating layer composed of the above-mentioned elements, and can be applied to the inner wall surfaces of various cooking appliances.
It can be applied to any wall surface that requires catalytic action, regardless of its purpose. As an example, tin on the walls of combustion equipment,
It is also effective for cleaning tar. Examples of the present invention will be described below.
実施例 1 基材として、大きさ10×10cm、厚み0。Example 1 As a base material, size 10 x 10 cm, thickness 0.
4mmのアルミナイズド鋼板に下塗りホーローを施した
ものを用いた。A 4 mm aluminized steel plate with an undercoat and enamel was used.
自己浄化被覆層を構成するフリツトは第2表に示したも
ので、熱膨張係数127×10−7Deg−1(貞空理
工製DL−1500で測定)、軟化渦度は535℃であ
つた。このフリットを100メッシユのふる(・を通過
する粒度にし、これと触媒、リン酸系化合物、マツト形
成剤、ミル添加剤を第3表の組成となるよう混合し、ボ
ールミルで1時間粉砕してスリップを作つた。The frit constituting the self-cleaning coating layer was shown in Table 2, and had a coefficient of thermal expansion of 127 x 10-7Deg-1 (measured with DL-1500 manufactured by Sadaku Riko) and a softening vorticity of 535°C. This frit was made into a particle size that would pass through a 100 mesh sieve, and this was mixed with a catalyst, a phosphoric acid compound, a mat forming agent, and a mill additive so as to have the composition shown in Table 3, and ground in a ball mill for 1 hour. I made a slip.
このスリツプをスプレーガンで厚みが200μmになる
ように七記基材に塗布した。This slip was applied to the base material described in Section 7 using a spray gun to a thickness of 200 μm.
乾燥後、550゜Cで5分間焼成して試料とした。この
試料を以下に示した試験項目について試験した。(1)
浄化能試験
ラード100ηを6点に分けて滴下し、2000C12
50℃、300℃で各30分間加熱し、前後の重量減か
ら浄化率を算出する。After drying, the sample was baked at 550°C for 5 minutes. This sample was tested for the test items shown below. (1)
Purification ability test lard 100η was divided into 6 points and dropped, 2000C12
Heating was performed at 50°C and 300°C for 30 minutes each, and the purification rate was calculated from the weight loss before and after.
(2)密着性試験
被覆層を外側にして直径10mmφの径に186′折り
曲げ、基板と被覆層間の剥離を観察する。(2) Adhesion test The substrate was bent 186' to a diameter of 10 mm with the coating layer on the outside, and peeling between the substrate and the coating layer was observed.
付着している場合は○、剥離している場合は×、一部付
着は△で表す。(3)表面硬度試,験
厚さ1.0mm(1)銅片(JISで定められたCll
OOP)で傷付け、銅が削り取られる場合を○、逆の場
合をXで表す。If it is adhered, it is represented by ○, if it is peeled off, it is represented by ×, and if it is partially adhered, it is represented by △. (3) Surface hardness test, test thickness 1.0 mm (1) Copper piece (Cll specified by JIS)
The case where the copper is scratched off due to OOP) is indicated by ○, and the opposite case is indicated by X.
(4)耐水性試験1
95℃以七の熱湯中で10時間煮沸し、重量減を求め、
単位面積6D当たりの減少量で表す。(4) Water resistance test 1 Boil in boiling water at 95°C or higher for 10 hours, calculate weight loss,
It is expressed as the amount of decrease per unit area of 6D.
試験の結果は以下に示す如くであつた。(1)浄化能
200′C:35%
250′c:720t)
3000C:96%
(2)密着囲・・・・・・○
(3)表面硬度・・・・・・○
(4)耐水性・・・・・・098ヮ/C7n2実施例
2第一リン酸アルミニウムの代わりに、以下に示したリ
ン酸系化合物を用いた他は実施例1と同様にして試料を
作成した。The results of the test were as shown below. (1) Purification capacity 200'C: 35% 250'C: 720t) 3000C: 96% (2) Tight enclosure...○ (3) Surface hardness...○ (4) Water resistance・・・・・・098ヮ/C7n2 Example
A sample was prepared in the same manner as in Example 1, except that the following phosphoric acid compound was used instead of monobasic aluminum phosphate.
試,験の結果を第4表に示す。実施例 3
スリツプ組成中の触媒を変えた他は実施例1と同様の条
件で試料を作成し、試験をした。The test results are shown in Table 4. Example 3 A sample was prepared and tested under the same conditions as in Example 1, except that the catalyst in the slip composition was changed.
その結果を第5表に示す。表中、触媒の重量部はフリツ
ト100重量部に対する値である。ロー株製)を用い、
スリツプの組成を実施例1と同様にし、焼成条件を52
0℃、5分間とし試料を得た。The results are shown in Table 5. In the table, parts by weight of catalyst are values based on 100 parts by weight of frit. (manufactured by Low Co., Ltd.),
The composition of the slip was the same as in Example 1, and the firing conditions were 52.
A sample was obtained at 0°C for 5 minutes.
このものは、密着性、表面硬度とも○で、耐水性は1.
2η/CTn2であつた。実施例 5
実施例1において、第一リン酸アルミニウムの量をフリ
ツト100重量部に対し3,5,10,20,30,4
0,50重量部と変化させて、スリツプを作成したとこ
ろ、30重量部以七になるとゲル化を起こし、塗布が困
難であつた。This product has a ○ in both adhesion and surface hardness, and a water resistance of 1.
2η/CTn2. Example 5 In Example 1, the amount of primary aluminum phosphate was 3, 5, 10, 20, 30, 4 with respect to 100 parts by weight of frit.
When slips were prepared by changing the amount to 0.50 parts by weight, gelation occurred when the amount exceeded 30 parts by weight, making it difficult to apply.
したがつて、リン酸系化合物の添加量はフリツト100
重重部に対し30重量部以内にするべきである。実施例
6実施例1において、マット形成gりをSiO2とT
iO2にして作成した試料の浄化能は、SiO2の場合
、200℃で38%、250℃で63%、300℃で9
4%であり、TiO2の場合は、各々32%、60%,
90%であつた。Therefore, the amount of phosphoric acid compound added is 100 frits.
The amount should be within 30 parts by weight based on the heavy weight. Example 6 In Example 1, the matte forming material was SiO2 and T.
The purification ability of the sample made with iO2 is 38% at 200℃, 63% at 250℃, and 9% at 300℃ in the case of SiO2.
4%, and in the case of TiO2, it is 32%, 60%, and 60%, respectively.
It was 90%.
実施例 7
実施例1のスリツプ組成に、さらにマツト形成剤?して
、ポリエチレン粉末(製鉄化学(株)製UF−20)を
5重量部添加し、同様の条件で作成したものの試料の浄
化能は、200℃で42%、250℃で74(fl)、
300℃で98%であつた。Example 7 Added a mat forming agent to the slip composition of Example 1? The purification ability of the sample prepared under the same conditions with the addition of 5 parts by weight of polyethylene powder (UF-20 manufactured by Tetsutsu Kagaku Co., Ltd.) was 42% at 200°C, 74 (fl) at 250°C,
It was 98% at 300°C.
Claims (1)
ことを特徴とする自己浄化被覆層を有する物品。 2 リン酸系化合物が、一般式MO・xP_2O_5・
yH_2O(ただし、MはAl、Mg、Ca、Fe、C
u、Ba、Ti、MnおよびZnからなる群より選択さ
れる少なくとも1種である。 )で示される化合物である特許請求の範囲第1項記載の
自己浄化被覆層を有する物品。3 触媒が金属酸化物、
複酸化物、固体酸触媒および固体塩基触媒からなる群よ
り選択される少なくとも1種である特許請求の範囲第1
項記載の自己浄化被覆層を有する物品。 4 ガラス質フリットが、軟化点600℃以下のフリッ
トである特許請求の範囲第1項記載の自己浄化被覆層を
有する物品。 5 リン酸系化合物が、第一リン酸塩である特許請求の
範囲第2項記載の自己浄化被覆層を有する物品。[Scope of Claims] 1. An article having a self-purifying coating layer comprising a vitreous frit, a catalyst, and a phosphoric acid compound. 2 The phosphoric acid compound has the general formula MO・xP_2O_5・
yH_2O (M is Al, Mg, Ca, Fe, C
At least one selected from the group consisting of u, Ba, Ti, Mn and Zn. ) An article having a self-cleaning coating layer according to claim 1, which is a compound represented by: 3 The catalyst is a metal oxide,
Claim 1 is at least one selected from the group consisting of a double oxide, a solid acid catalyst, and a solid base catalyst.
An article having a self-purifying coating layer as described in 1. 4. An article having a self-cleaning coating layer according to claim 1, wherein the vitreous frit has a softening point of 600° C. or lower. 5. An article having a self-purifying coating layer according to claim 2, wherein the phosphoric acid compound is a primary phosphate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54119867A JPS5914545B2 (en) | 1979-09-18 | 1979-09-18 | Articles with self-cleaning coating layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54119867A JPS5914545B2 (en) | 1979-09-18 | 1979-09-18 | Articles with self-cleaning coating layer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5644771A JPS5644771A (en) | 1981-04-24 |
JPS5914545B2 true JPS5914545B2 (en) | 1984-04-05 |
Family
ID=14772221
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54119867A Expired JPS5914545B2 (en) | 1979-09-18 | 1979-09-18 | Articles with self-cleaning coating layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5914545B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0420808Y2 (en) * | 1986-03-31 | 1992-05-13 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109761871B (en) * | 2019-03-18 | 2020-11-24 | 山东昌邑四方医药化工有限公司 | Synthetic method of aztreonam monocyclic parent nucleus |
-
1979
- 1979-09-18 JP JP54119867A patent/JPS5914545B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0420808Y2 (en) * | 1986-03-31 | 1992-05-13 |
Also Published As
Publication number | Publication date |
---|---|
JPS5644771A (en) | 1981-04-24 |
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