JPS59142157A - Recording head - Google Patents

Recording head

Info

Publication number
JPS59142157A
JPS59142157A JP1675683A JP1675683A JPS59142157A JP S59142157 A JPS59142157 A JP S59142157A JP 1675683 A JP1675683 A JP 1675683A JP 1675683 A JP1675683 A JP 1675683A JP S59142157 A JPS59142157 A JP S59142157A
Authority
JP
Japan
Prior art keywords
recording head
ink
water
amorphous
ink jet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1675683A
Other languages
Japanese (ja)
Inventor
Munehiko Sawafuji
宗彦 澤藤
Masatoshi Matsuzaki
松崎 正年
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP1675683A priority Critical patent/JPS59142157A/en
Publication of JPS59142157A publication Critical patent/JPS59142157A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1606Coating the nozzle area or the ink chamber

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Ink Jet (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)

Abstract

PURPOSE:To obtain a recording head having ink jet orifices whose chemical and mechanical durability is large and whose working precision is high by a construction wherein a water-repellent layer formed of a specific material is provided on a surface on which ink jet ports are formed. CONSTITUTION:The above purpose can be achieved by a construction in which a water-repellent layer formed of an amorphous material containing silicon and carbon in the main is provided on a surface 13 in which ink jet ports are formed in an ink-jetting recording head of an ink jet recording device. A surface layer composed, as the most preferable mode, of amorphous hydrogen and silicon carbide fluoride (a-Si1-xCx:H,F) which are formed by using amorphous silicon carbide as a main component and making preferably fluorine and more preferably hydrogen contained is formed on the surface 13 in which the ink jet ports are formed. The carbon content of the amorphous silicon carbide is 5-50 atom %. An amorphous state defines the state in which no crystalline portion exists in an entire material, or the state in which microcrystalline regions are scattered partly in the material.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明はインクジェット記録装置に関し、更に詳しくは
□該装置に於てインクを噴射する記録ヘッドの改良に関
する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an inkjet recording device, and more particularly to an improvement in a recording head that ejects ink in the device.

(従来技術) 情報記録の必要性及び必要量の増大と共に、記録のため
の装置の作動音、印字音の少いノンインパクト記録法は
辞譲を主とする場所に歓迎され、特に高速記録が可能で
また印字定着を要することもなく普通紙の使用が可能で
あるインクジェット記録法は社会情勢にマツチするもの
として大いに注目されている。
(Prior Art) As the need and amount of information recording increases, non-impact recording methods that reduce the operating noise of recording devices and printing noise are welcomed in places where recording is mainly required, especially when high-speed recording is required. The inkjet recording method, which allows the use of plain paper without requiring print fixing, is attracting a lot of attention as a method that matches the social situation.

前記インクジェット記録法は、電気信号によって駆動さ
れる記録ヘッドよりインクを紙等の記録媒体に向けて飛
翔ざ奢、記録媒体上に文字、図形等の画像を画く記録法
である。
The inkjet recording method is a recording method in which ink is ejected from a recording head driven by an electric signal toward a recording medium such as paper to draw images such as characters and figures on the recording medium.

この様なインクジェット記録法は概して2つの方式に大
別することができる。
Such inkjet recording methods can generally be divided into two types.

即ち第一の方式では、インク小滴を超音波等の連続振動
発生法で生成し、これに電荷を付与して偏向電極によっ
てインク小滴の飛翔軌道を制御し、必要インク小滴を選
び出し画素点にインク小滴を着点させるか、または噴射
口の口唇部と輪状帯電極間に電界を与え、連続振動発生
法で霧状に生ずるインク小滴の飛散範囲を、噴出オリア
イス軸を中心とする所定の円錐径内に制御し、アパーチ
ャーを通過するインク小滴数の二次元的密度変化によっ
て記録を形成する方法であって米国特許第3゜060.
429  号、同第3.59’6,275号、同第3゜
298.030 号及び同第3,416,153号等に
開示されている。
That is, in the first method, ink droplets are generated using a continuous vibration generation method such as ultrasonic waves, an electric charge is applied to the ink droplets, and the flight trajectory of the ink droplets is controlled by a deflection electrode, and the necessary ink droplets are selected and displayed at the pixel. Either by placing an ink droplet at a point, or by applying an electric field between the lip of the jet orifice and a ring-shaped electrode, the scattering range of the ink droplets generated in the form of a mist is determined by the continuous vibration generation method, centered around the jet orifice axis. A method of forming a record by two-dimensional density variation of the number of ink droplets passing through an aperture within a predetermined cone diameter, as disclosed in US Pat. No. 3,060.
No. 429, No. 3.59'6,275, No. 3298.030, No. 3,416,153, etc.

また他の第二の方式は所謂ドロップ・オン・ディマント
(drop on d’emand )方式であって、
発生させた小滴インクをすべて制御または制約された軌
道に乗せて無駄なく所定の画素点に着点させる、dわば
射的形式の記録方式である。
Another second method is the so-called drop on d'emand method, which
This is a shooting type recording method in which all the generated ink droplets are placed on controlled or restricted trajectories to land at predetermined pixel points without waste.

この方式に用いられるインク小滴は、例えば記録ヘッド
に装着されているピエゾ振動素子が電気パルス信号に即
応して機械的振動を発生し、インク母液の圧を短時間に
高め噴出オリフィスの噴射口からインク小滴として射出
する。この方式に於ては先に述べた第一の方式に比ベイ
ンクの回収を必要としない点から頓に注目されて来てお
り、米国特許第3,683,212号、同第3,747
,120号及び同第3,946,398号等に詳しく開
示しである。
The ink droplets used in this method are produced by, for example, a piezo vibrating element installed in the recording head generating mechanical vibrations in immediate response to an electric pulse signal, which quickly increases the pressure of the ink mother liquid at the ejection orifice. ejected as ink droplets from the ink. This method has attracted a lot of attention because it does not require the recovery of vane ink compared to the first method mentioned above, and is disclosed in U.S. Pat. Nos. 3,683,212 and 3,747.
, No. 120 and No. 3,946,398.

前記したいづれの方式のインクジェット記録方式に於て
もインクを噴射する記録ヘッドの噴射口が形成された面
、即ち、インク噴射口を取り囲み外部に露出している面
はインクジェット記録法に於て致命的重要性を有してい
る。
In any of the above-mentioned inkjet recording methods, the surface where the ejection ports of the recording head that ejects ink are formed, that is, the surface that surrounds the ink ejection ports and is exposed to the outside, is critical to the inkjet recording method. It has important importance.

即ち、記録ヘッドからのインクの飛翔特性の安定性、詳
しくは記録媒体に達するインク小滴の形状の安定性イン
クの飛翔速度の安定性等保証されて°はじめて画像濃度
の整った画像歪のない等の優れた画質の記録物が得られ
るのであった。このためには噴射インクに接触し、イン
クが記録ヘッドから離れる時の諸要因を決定する噴射オ
リフィス端部、言い換えるとインク噴射口を形成する面
を形成する部分のインク母液に対する表面濡れ詩法化学
的或は電気化学的耐蝕性、障害物固着による変形、変質
禁忌等に於る要求は厳格であり、更にインク内圧、連続
振動或は電気11す衝撃に対する機械的、構造的強度に
対する要求が加わる。しかも前記厳格な要求を満すには
、加工し易く加工精度が良好であることが必要である。
In other words, the stability of the ink flight characteristics from the recording head, more specifically, the stability of the shape of the ink droplets reaching the recording medium, the stability of the ink flight speed, etc. are guaranteed, and the image density is uniform and there is no image distortion. Records with excellent image quality such as these can be obtained. For this purpose, the surface wetting of the ink mother liquor at the end of the ejection orifice, which contacts the ejected ink and determines various factors when the ink leaves the recording head, in other words, forms the surface that forms the ink ejection port. There are strict requirements for physical or electrochemical corrosion resistance, deformation due to sticking to obstacles, and prohibitions against deterioration, and additional requirements are added for mechanical and structural strength against ink internal pressure, continuous vibration, or electrical shock. . Moreover, in order to meet the above-mentioned strict requirements, it is necessary that the material be easy to process and have good processing accuracy.

前記したインク噴射口が形成された面の濡れ特性、変形
、変質はインクジェット記録装置の死命を制すると言っ
ても過言でなく、ノズル部分が従来の如く金属、セラミ
、り或はガラス等で形成され、該材質素地が裸出してい
る場合には、)ンクに対する接触角が小さくインク噴射
口周縁及びその附近の部分のインク濡れが生ずる。一旦
これらの部分に濡れが生ずると、連続的にインク小滴を
噴射する際、インクの表面張力により時系列的にインク
小滴形成に対する抵抗が変化するため、インク小滴の大
きさ及び速度及び噴射間隔が変動し、また噴射方向が乱
れ、インク小滴飛翔に対する制御に失調を来し良質な記
録画質が得られない。またインク噴射口が形成された面
を濡したインクが乾燥、固着することKよる、或は核部
の化学的腐蝕による変形、変質による濡れ特性の変化は
、更に前記した制御失調を拡大する。
It is no exaggeration to say that the wetting characteristics, deformation, and deterioration of the surface on which the ink jetting ports are formed are critical to the life and death of an inkjet recording device. If the material base is exposed, the contact angle with the ink is small, and the periphery of the ink jet orifice and its vicinity will be wetted with ink. Once wetting occurs in these areas, the size and velocity of the ink droplet and its resistance to ink droplet formation change over time during successive ink droplet ejections due to the surface tension of the ink. The ejection interval fluctuates, the ejection direction is disturbed, and the control over the flight of ink droplets becomes unbalanced, making it impossible to obtain high quality recorded images. In addition, changes in wetting characteristics due to drying and solidification of the ink that wets the surface where the ink jet ports are formed, or deformation and alteration due to chemical corrosion of the core further aggravate the above-mentioned loss of control.

前記した不都合に対し、インク噴射口が形成された面に
撥水処理を施すことが行われ、例えば弗素系ポリマーま
たはオリゴマーを蒸着もしくは塗 布する、シリコン系
フェスまたはオイル、シラザン系化合物から成るコーテ
ング剤を塗布する(4?開昭55−148170号)、
或はシランカップリング剤、有機チタン化合物コーテン
グ剤を塗布する<*開明55−161668号)等ニソ
ノ例ヲミルコとができる。
To address the above-mentioned disadvantages, water-repellent treatment is performed on the surface on which the ink jetting ports are formed, such as a silicone-based face that is vapor-deposited or coated with a fluorine-based polymer or oligomer, or a coating made of oil or a silazane-based compound. Applying agent (4? Kaisho 55-148170),
Alternatively, it is possible to apply a silane coupling agent or an organic titanium compound coating agent (Kokai 55-161668).

しかしながら塗布して用いるコーテング剤は液状のもの
が主であり、塗布後熱処理により硬化及び撥水性付与操
作が必要で作成工程が複雑となり、また有機性のコーテ
ング剤は高温処理ができないしまた経時耐久性に劣る。
However, the coating agents that are applied are mainly in liquid form, which requires heat treatment to harden and impart water repellency after application, which complicates the production process.Also, organic coating agents cannot be treated at high temperatures and are durable over time. inferior to sex.

また弗素系ポリマーはインクに対する撥水性が不充分で
あり、シランカップリング剤は長期インク浸漬によって
劣化する。
Furthermore, fluorine-based polymers have insufficient water repellency to ink, and silane coupling agents deteriorate due to long-term immersion in ink.

また一般に前記したコーテング剤は基材との接着性、紙
の繊維、ゴムキャップ等との接触に対する機械的強度が
弱い。
Furthermore, the above-mentioned coating agents generally have poor adhesion to substrates and mechanical strength against contact with paper fibers, rubber caps, and the like.

また他の技術努力としてノズル部分を撥水性素材を用い
て作成することが行われ、例えばエポキシ樹脂、フェノ
ール樹脂、ポリエステル樹脂の中に前記弗素系オリゴマ
ー、シリコーンオイル或はシラザン系化合物をドーピン
グし硬化させて用いる例(特開昭55−148170号
)がある。しかしながらノズル部分には高精度の加工性
を必要とするものであるが、素材的に高精密加工性で且
つ高撥水性である素材を求めることは甚だ困難である。
In addition, other technological efforts have been made to make the nozzle part using water-repellent materials, such as doping and curing the fluorine-based oligomer, silicone oil, or silazane-based compound into epoxy resin, phenol resin, or polyester resin. There is an example (Japanese Unexamined Patent Application Publication No. 148170/1983) in which this method is used. However, although the nozzle portion requires highly precise machinability, it is extremely difficult to obtain a material that is highly water repellent and has high precision machinability.

(発明の目的) 本発明の目的は記録ヘッドのノズル部分特に噴射口が形
成された面のインク濡れ特性に対する厳格な要求及び該
要求にまつわる各種問題に関っており、本発明の目的の
第一はインクジェット記録装置における記録ヘッドのイ
ンク噴射口が形成された面がロ4−¥i峠高撥水性であ
り化学的、機械的に耐久性が大きな記録ヘッドを提供す
ることにある。
(Object of the Invention) The object of the present invention relates to strict requirements for the ink wetting characteristics of the nozzle portion of the recording head, especially the surface where the ejection ports are formed, and various problems related to these requirements. The object of the present invention is to provide a recording head in an inkjet recording apparatus in which the surface on which ink jet ports are formed has high water repellency and is chemically and mechanically durable.

本発明の第2の目的は簡易な方法でしかも、高い加工精
度のインク噴射オリアイスを持った記録ヘッドを提供す
ることにある。
A second object of the present invention is to provide a recording head having an ink ejecting orifice which can be processed easily and with high precision.

(発明の構成) 前記した本発明の目的は、インクジェット記録装置のイ
ンクを噴射する記録ヘッドに於てインク噴射口が形°成
される面に、珪素と炭素を主体とする非晶質物質から成
る撥水層を設けたことを特徴とする記録ヘッドによって
達成することができる。
(Structure of the Invention) It is an object of the present invention to form an amorphous material mainly composed of silicon and carbon on the surface where ink ejection ports are formed in the recording head that ejects ink of an inkjet recording device. This can be achieved by a recording head characterized by being provided with a water-repellent layer consisting of:

本発明は前記の如く記録ヘッドのインク噴射孔が形成さ
れた面に、アモルファス炭化珪素を主体とし、好しくは
弗素、更に好しくは水素を含有させることによって最も
好しい態様としてアモルファス水素、弗素化炭化珪素(
a−8i、 z CX :H,F )から成る表面層を
形成せしめることから成る。
In the most preferred embodiment of the present invention, the surface of the recording head on which ink ejection holes are formed contains amorphous silicon carbide, preferably fluorine, and more preferably hydrogen. Silicon carbide (
a-8i, z CX :H,F).

既に、結晶質の炭化珪素(S1c)が2000℃以上の
高温に耐え、耐酸、耐アルカリ性に優れ、また硬度が大
きく機械的に丈夫であることは公知であり、また他物へ
の被覆加工に好都合なアモルファス炭化珪素の生成法に
ついては、そのグロー放電による生成法に関してフィロ
ソフィカル・マガジy (Phyloaophleal
 Magazine ) 35巻(1977)に、高周
波スパッタリング法に関してはシン・ソリッズ・フィル
ムズ(Thin 5olids Fllms ) 2巻
(1968)に記載がある。
It is already well known that crystalline silicon carbide (S1c) can withstand high temperatures of 2000°C or higher, has excellent acid and alkali resistance, and has high hardness and mechanical strength. A convenient method for producing amorphous silicon carbide is described in the Philosophical Magazine regarding its production method by glow discharge.
Magazine) Volume 35 (1977), and the high frequency sputtering method is described in Thin Solids Films Volume 2 (1968).

本発明はアモルファス炭化珪素の前記した優れた耐熱性
、化学的安定性及び機械的強靭性、更に加工性に着目し
、噴射口が形成された面に記録ヘッド形成後に簡易に且
つ加工精度よく真空中でグロー放電法或はスバ、タリン
グ法等で撥水性表面層を構成するものであり、更に好し
くは水素を含有させることにより該撥水層に化学的物性
的経時安定性を付与し、更に組成々分に弗素を追加併存
させることにより耐熱性、化学的安定性及び撥水性を太
き(向上させたものである。結晶StCが耐熱性、化学
的安定性、機械的強度に優れていることはよ(知られて
おり、上述した通りであるが本発明におけるアモルファ
ス炭化珪素もこれらの優れた性質を有しており、しかも
記録ヘッド先端部即ち、記録ヘッドにおいてインク噴射
口が形成される面に薄膜層として形成することができる
。このことからも記録ヘッドの撥水層としてアモルファ
ス炭化珪素が好適であることがわかる。更に記録へ、ド
は珪酸ガラスで形成されるのが一般的であるが、アモル
ファス炭化珪素はこのヘッド形成材料に接着性が良く、
強固な撥水層が形成される。
The present invention focuses on the above-mentioned excellent heat resistance, chemical stability, and mechanical toughness of amorphous silicon carbide, as well as workability, and makes it possible to easily and accurately vacuum amorphous silicon carbide after forming a recording head on the surface where the injection ports are formed. A water-repellent surface layer is formed by a glow discharge method, a sputtering method, etc., and more preferably hydrogen is added to the water-repellent layer to impart chemical and physical stability over time. Furthermore, by adding fluorine to the composition, the heat resistance, chemical stability, and water repellency are increased (improved).Crystalline StC has excellent heat resistance, chemical stability, and mechanical strength. (Although it is known and as mentioned above, the amorphous silicon carbide used in the present invention also has these excellent properties, and moreover, the ink jet orifices are formed at the tip of the recording head, that is, at the recording head.) It can be formed as a thin film layer on the recording surface. This also shows that amorphous silicon carbide is suitable as the water repellent layer of the recording head.Furthermore, the recording head is generally formed of silicate glass. However, amorphous silicon carbide has good adhesion to this head forming material,
A strong water-repellent layer is formed.

本発明に関る炭素、珪素を主体とするアモルファス炭化
珪素に於て含有炭素量は、5〜50原子%、また水素量
は1〜40原子%、好しくは5〜30原子%である。ま
た含有弗素量は0.01〜20原子%、好しくは0.1
〜10原子%である。
In the amorphous silicon carbide mainly composed of carbon and silicon according to the present invention, the content of carbon is 5 to 50 atomic %, and the hydrogen content is 1 to 40 atomic %, preferably 5 to 30 atomic %. The amount of fluorine contained is 0.01 to 20 at%, preferably 0.1
~10 at%.

また、非晶質(アモルファス)という状態は、材料全体
にわたって結晶部分の存在しない状態又は材料中に部分
的には微結晶化した領域が点在する状態を指す。
Furthermore, the term "amorphous" refers to a state in which no crystalline portions exist throughout the material, or a state in which partially microcrystalline regions are scattered throughout the material.

また形成する撥水層の厚みは0.2〜30μm、好しく
は0.5〜10μmである。
The thickness of the water-repellent layer to be formed is 0.2 to 30 μm, preferably 0.5 to 10 μm.

形成するに当っては、真空炉に少くとも該口唇部を露呈
させ均一形成に好都合に例えば回転機構等を取入れて記
録ヘッドを設置し、真空炉中を適当な真空度に保ち真空
蒸着法、グロー放電法、スパッタリング法或はイオンプ
レーテング法等によって、珪素、炭素の組成比制御及び
水素、弗素の含有量制御等を行って形成される。
When forming, at least the lip is exposed in a vacuum furnace, and a recording head is installed with a rotating mechanism or the like conveniently installed for uniform formation, and the inside of the vacuum furnace is maintained at an appropriate degree of vacuum, using a vacuum evaporation method. It is formed by controlling the composition ratio of silicon and carbon and the content of hydrogen and fluorine by a glow discharge method, a sputtering method, an ion plating method, or the like.

グロー放電法を例にとれば、シランまたはシラン誘導体
ガス(例えばSiH4,812Ha、5iCJ4.5i
n(4、SIH,C/ffi、SiF、、5i(CH8
)、等)、または前記ガスをB7或はHe、 Ne  
等の不活性ガスで稀釈したガスと、有機ガス(例えばC
H4、C,H,、C,H4、C!H6、C3l(4,C
,H6、C,H,等)或は弗素系ガス(例えばCF、、
CH3F、 C,H3P、 C,H3P、、C5F、、
C,CIF、、CCA’、F。
Taking the glow discharge method as an example, silane or silane derivative gas (e.g. SiH4,812Ha, 5iCJ4.5i
n(4, SIH, C/ffi, SiF, 5i(CH8
), etc.), or the gas is converted to B7 or He, Ne
gas diluted with an inert gas such as organic gas (e.g. C
H4, C, H,, C, H4, C! H6,C3l(4,C
, H6, C, H, etc.) or fluorine-based gas (e.g. CF, etc.)
CH3F, C,H3P, C,H3P,,C5F,,
C,CIF,,CCA',F.

F、 、 HF、 BrF3等)等の少くとも一種以上
のガスとをグロー放電真空炉に導入して、高周波あるい
は直流によってグロー放電を惹起し、導入ガスを分解さ
せ、露呈した前記口唇部に付着させ、被膜を構成させる
At least one type of gas such as F, , HF, BrF3, etc.) is introduced into a glow discharge vacuum furnace, a glow discharge is induced by high frequency or direct current, the introduced gas is decomposed, and it adheres to the exposed lip part. to form a film.

またスパッタリンク法を用いるとすれば、所定の珪素及
び炭素の組成比をもっターゲット材、或は珪素、炭素各
単独ターゲット材を加速不活性ガス等で叩き、その衝撃
によってたたき出されたターゲツト材物質と水素ガス或
は弗素ガスとを反応させ、露呈された噴射口の口唇部に
アモルファス膜を形成させればよい。
Furthermore, if the sputter link method is used, a target material with a predetermined composition ratio of silicon and carbon, or a target material containing only silicon and carbon, is hit with an accelerating inert gas, etc., and the target material is knocked out by the impact. What is necessary is to cause the substance to react with hydrogen gas or fluorine gas to form an amorphous film on the exposed lip of the injection port.

イオンプレーテング法、真空蒸着法についても、既に実
用化されている技術を用いて口唇部にアモルファス撥水
層を形成させることができる。
Regarding the ion plating method and the vacuum deposition method, it is possible to form an amorphous water-repellent layer on the lips using techniques that have already been put into practical use.

本発明に関るアモルファス撥水層に於る含有水素及び弗
素の量的制御は含水素、含弗素物質の真空炉中への導入
量を制御することによってもよいし、また形成されたア
モルファス炭化珪素へ所定量の水素、弗素を打込む方法
を用いてもよい。或は活性化された該ガス雰囲気中に所
定条件の下にアモルファス炭化珪素膜を曝す方法をとっ
てもよい。
The amount of hydrogen and fluorine contained in the amorphous water-repellent layer according to the present invention may be controlled by controlling the amount of hydrogen-containing and fluorine-containing substances introduced into the vacuum furnace. A method of implanting a predetermined amount of hydrogen or fluorine into silicon may also be used. Alternatively, a method may be used in which the amorphous silicon carbide film is exposed to the activated gas atmosphere under predetermined conditions.

次に本発明に用いる真空炉装置について例を挙げて説明
する。例として第1図にグロー放電法を用いる装置を示
している。グロー放電真空炉1の真空ペルジャー2に、
グロー放電々極3及びその上方所定間隔を介して該電極
3に対峙して記録ヘッド5の保持部材4がある。保持部
材4には多数の記録ヘッド5.5′等が載置可能であり
、また水平に回転可能である。また必要な時には加熱部
材4′が併置される。グロー放電々極3は高周波電源6
に接続されており、高周波電力の印加によってグロー放
電電極3と保持部材40間にグロー放電が生起される。
Next, the vacuum furnace device used in the present invention will be explained by giving an example. As an example, FIG. 1 shows an apparatus using the glow discharge method. In the vacuum pelger 2 of the glow discharge vacuum furnace 1,
A holding member 4 of a recording head 5 is provided facing the glow discharge electrode 3 and the electrode 3 at a predetermined distance above the electrode. A large number of recording heads 5, 5', etc. can be placed on the holding member 4, and it is also horizontally rotatable. Further, a heating member 4' is placed side by side when necessary. Glow discharge electrode 3 is a high frequency power source 6
A glow discharge is generated between the glow discharge electrode 3 and the holding member 40 by applying high frequency power.

真空ペルジャー2には、ガス導入管が連結されており、
ガスボンベB1、B3、B3及びB2等に夫々付屈した
流量計G3、G2、G、及びG4等、また流量調節パル
プ(例えばニードルパルプ)■1、■1、■、及びV。
A gas introduction pipe is connected to the vacuum perger 2,
Flowmeters G3, G2, G, and G4, etc. bent to gas cylinders B1, B3, B3, and B2, respectively, and flow rate adjusting pulps (for example, needle pulp) ■1, ■1, ■, and V.

等を通じ所定ガスが流量を調節されて真空ペルジャー2
に導入される。またフィルター7によってガス中の塵埃
が除去され更に総合的流量調節にパルプ8が設けである
。真空ペルジャー2の下部には拡散ポンプパルプ9及び
四−タリボンプバルプlOを介して排気装置(図示せず
)が作動し、真空ペルジャー2の中の真空度を所定量に
保つ。
The flow rate of the specified gas is adjusted through the vacuum Pelger 2.
will be introduced in Further, a filter 7 removes dust in the gas, and a pulp 8 is provided for comprehensive flow rate adjustment. An evacuation device (not shown) is operated at the lower part of the vacuum pelger 2 via a diffusion pump pulp 9 and a tetragonal pump valve 10 to maintain the degree of vacuum in the vacuum pelger 2 at a predetermined level.

前記グロー放電真空炉1で記録ヘッド5の噴射口の口唇
部に& −81t−xcx : H,Fから成る撥水層
を形成するには、まづ記録ヘッド5表面を物理的にも化
学的にも清浄とし、保持部材4に載置、固定する。次い
で排気装置で真空ペルジャー2内を減圧し好しくは10
  torr以下とし、また必要ならば記録ヘッド5等
を所定温度とし、拡散ポンプパルプ9を閉じ、ロータリ
ポンプのみで排気し所定の背圧とする。次いでガスボン
ベB3等から夫々付属の流量計G1等で監視しながら夫
々の流量調節パルプη等で流量を調節し、撥水層形成に
必要なガスを導入する。
In order to form a water-repellent layer consisting of &-81t-xcx: H and F on the lip of the injection port of the recording head 5 in the glow discharge vacuum furnace 1, first, the surface of the recording head 5 is physically and chemically treated. Clean it, place it on the holding member 4, and fix it. Next, the pressure inside the vacuum pelger 2 is reduced using an exhaust device, preferably to 10
torr or less, and if necessary, the recording head 5 and the like are brought to a predetermined temperature, the diffusion pump pulp 9 is closed, and the rotary pump alone is used to exhaust air to a predetermined back pressure. Next, the gases necessary for forming the water-repellent layer are introduced from the gas cylinders B3 and the like by adjusting the flow rates using the respective flow rate adjusting pulps η and the like while monitoring with the attached flowmeters G1 and the like.

ここで例えばガスボンベB、にはシランガス或はシラン
誘導体ガスまたは稀釈ガスが封入されており、B、には
前記した炭素化合物である有機ガス、鳥には水素ガス及
びB4には弗素ガス等の原料ガスが充填されている。こ
れらの原料ガスは予め所定の混合比で混合されていても
よい。
Here, for example, gas cylinder B is filled with silane gas, silane derivative gas, or diluent gas, B is filled with an organic gas such as the carbon compound mentioned above, hydrogen gas is used as a bird, and raw material such as fluorine gas is filled in B4. Filled with gas. These source gases may be mixed in advance at a predetermined mixing ratio.

前記原料ガスをグロー放電々極3と保持部材4の間に流
入させ、次いでロータリポンプパルプ10で調節し、真
空ペルジャー2の内部を10−2〜10torrの真空
度にもたらす。次いで高周波電源6がら高周波室圧を印
加し、グロー放電々極3と保持部材4間にグロー放電を
生起させる。
The raw material gas is caused to flow between the glow discharge electrode 3 and the holding member 4, and then regulated by the rotary pump pulp 10 to bring the inside of the vacuum pelger 2 to a degree of vacuum of 10-2 to 10 torr. Next, high frequency chamber pressure is applied from the high frequency power source 6 to generate glow discharge between the glow discharge electrodes 3 and the holding member 4.

尚印加高周波電圧の周波数としては0.1 MHg程度
が適当であり、また交流に限らず0.3〜5 KVの直
流電圧を用いてもよい。更にグロー放電真空炉1には前
記説明した容量結合型でもよいし、コイル状グロー放電
々極を用いた誘導結合型を用いてもよい。
The appropriate frequency of the applied high-frequency voltage is about 0.1 MHg, and not only AC voltage but also DC voltage of 0.3 to 5 KV may be used. Furthermore, the glow discharge vacuum furnace 1 may be of the capacitive coupling type described above, or may be of the inductive coupling type using coiled glow discharge electrodes.

スパッタリング法を用いる場合には、使用するスパッタ
リング炉として第1図で示したと同様の真空ペルジャー
2を用い、同図のグロー放電々極3の位置に、所定の組
成比を有するターゲツト材を配置し、保持部材4に載置
した記録ヘッド5等に向って高周波もしくは直流スパッ
タリングを行えばよい。また水素、弗素の所定量を形成
するアモルファス膜中に含有させるには、前記グロー放
電の場合と同様に該水素、弗素等のドーピングガスを所
定分圧に調節して真空ペルジャーに導入すればよい。
When using the sputtering method, a vacuum Pelger 2 similar to that shown in FIG. 1 is used as a sputtering furnace, and a target material having a predetermined composition ratio is placed at the glow discharge electrode 3 shown in the same figure. , high frequency or direct current sputtering may be performed toward the recording head 5 etc. placed on the holding member 4. Further, in order to incorporate a predetermined amount of hydrogen or fluorine into the amorphous film to be formed, the doping gas such as hydrogen or fluorine may be adjusted to a predetermined partial pressure and introduced into the vacuum Pelger as in the case of glow discharge. .

本発明に於て真空ペルジャー中で撥水層を形成する際に
は記録ヘッドの噴射口口唇部の温度は(3)〜350℃
、好しくは100〜300℃であり、また該層膜の形成
速度は0.5〜50λ/ Beeの範囲が好し〜・。
In the present invention, when forming a water-repellent layer in a vacuum pelger, the temperature at the lip of the ejection opening of the recording head is (3) to 350°C.
, preferably 100 to 300°C, and the formation rate of the layer is preferably in the range of 0.5 to 50λ/Bee.

(実施例) 次に具体的に実施例によって本発明を説明する。(Example) Next, the present invention will be specifically explained with reference to Examples.

実施例−1 第1図に示した容量結合型グロー放電真空炉1で、第2
図に示すように珪酸ガラスからなる基板10a 、 1
0bからなり、噴出ノズル11、噴射口12及びインク
噴射口が形成された面13を有する記録ヘッドのインク
噴射口が形成された面13に本発明に係るアモルファス
撥水層を設けた。該撥水層の調製条件は下記の通りであ
る。
Example-1 In the capacitively coupled glow discharge vacuum furnace 1 shown in FIG.
As shown in the figure, substrates 10a, 1 made of silicate glass
The amorphous water-repellent layer according to the present invention was provided on the surface 13 where the ink jet orifices of the recording head were formed, and had the jet nozzles 11, the jet orifices 12, and the surface 13 where the ink jet orifices were formed. The conditions for preparing the water-repellent layer are as follows.

(導入ガス)  SiL : Arで10.7%に稀釈
流量的2 c、c、/ 5ec CF4 : 5IH4との分圧比 CF4/S 1H4= 1/ 1 (真空ペルジャー背圧)  :  I X 10−’ 
torr(放電時真空度)  : 0.5 torr(
高周波1民力)  : 13.6MHg、 70W(0
,29W/m7)(極間距離)   :2.5cm (記録ヘッド温度):約200℃ (形成速度)  :約5λ/ see 上記条件で第2図に示した記録ヘッドの噴射口口唇部1
3に1.8ミクロン厚の撥水層を設けた。
(Introduced gas) SiL: Diluted to 10.7% with Ar Flow rate 2 c, c, / 5ec CF4: Partial pressure ratio with 5IH4 CF4/S 1H4 = 1/1 (Vacuum Pelger back pressure): I X 10-'
torr (degree of vacuum during discharge): 0.5 torr (
High frequency 1 civil power): 13.6MHg, 70W (0
, 29W/m7) (distance between poles): 2.5cm (recording head temperature): approximately 200°C (formation speed): approximately 5λ/see Under the above conditions, the ejection opening lip portion 1 of the recording head shown in FIG.
3 was provided with a 1.8 micron thick water repellent layer.

Augor分析によると該層に於てC/Sl = 0.
26である。
According to Augor analysis, C/Sl = 0.
It is 26.

前記の如く作成した本発明の記録ヘッドと、無処理のも
の及び口唇部13に弗素系コート剤を塗布し撥水層を構
成した3種の記録ヘッドについて(イ)耐インク性及び
(ロ)噴射性能を比較した。
Regarding the recording head of the present invention prepared as described above, the untreated one, and the three types of recording heads in which a fluorine-based coating agent was applied to the lip portion 13 to form a water-repellent layer, (a) ink resistance and (b) The injection performance was compared.

尚使用したインクは多価アルコール40 wt%、染 
−料8 wt%を含有する水性インクでpH11,5で
ある。
The ink used was 40 wt% polyhydric alcohol.
- It is an aqueous ink containing 8 wt% of the material and has a pH of 11.5.

(イ)耐インク性 前記3種の記録ヘッドの口唇部を前記インクに浸漬し、
ω℃、旬日間の耐久試験を行った結果、本発明の記録へ
、ドには何ら劣化が起らず試験前と同様の撥水性を示し
たが、2種の比較記録ヘッドに於ては初期に有していた
撥水性が失われ、顕著な濡れを生じた。
(a) Ink resistance: immersing the lips of the three types of recording heads in the ink;
As a result of an endurance test conducted at ω°C for several days, it was found that the recording head of the present invention exhibited the same water repellency as before the test without any deterioration; however, in the two comparative recording heads, The initial water repellency was lost and significant wetting occurred.

(ロ)噴射性能 前記3種の記録ヘッドをオン・デマンド型のインクジェ
ット記触装置に装着し、実用条件に於て長時間の連続噴
射及び間歇噴射試験を行った。その結果を第1表に示す
(b) Jetting Performance The three types of recording heads described above were mounted on an on-demand type inkjet writing device, and long-term continuous jetting and intermittent jetting tests were conducted under practical conditions. The results are shown in Table 1.

第   1   表 間歇噴射は各回毎にキャップで口唇部を閉塞するので一
般にキャップ或は付着異物により口唇部或は噴射口に環
を生ずるので、該部分の機械的強度が結果の要因として
加わっている。また噴射量の変動はインク小滴の大きさ
の変動によるものである。
Table 1: In intermittent injection, the lip is closed with a cap each time, so generally a ring is formed around the lip or the injection port due to the cap or attached foreign matter, so the mechanical strength of this part is an additional factor in the result. . Variations in ejection volume are also due to variations in ink droplet size.

尚間歇噴射は10秒噴射、刃秒休止を5000回行った
ものであり、この間本発明の記録ヘッドには何ら異常が
生じなかった。
The intermittent jetting was performed 5,000 times with 10 second jet and second second pause, and no abnormality occurred in the recording head of the present invention during this period.

実施例−2 高周波スパッタリング装置(パーキング・エルマー社製
;モデル4400 )により、前記第2図に示したガラ
スで作成した記録ヘッド口唇部に本発明に関るアモルフ
ァス撥水泗を形成しまた。層厚2.0ミクロンである。
Example 2 An amorphous water-repellent cup according to the present invention was formed on the lip of the recording head made of the glass shown in FIG. The layer thickness is 2.0 microns.

調製条件は次の通りである。The preparation conditions are as follows.

(導入ガス分圧比) ; Ar:H2:CF4=70:
25: 5(スパッタ一時真空度) 、 10  to
rr(高周波電力 )  ;13MHg、500 W(
1,6w/ffl )(記録ヘッド温度);〜200℃ (形成速度);約2λ/ sec このようにしてえられた層はAuger分析結果C/ 
S i二0.15であった。
(Introduced gas partial pressure ratio); Ar:H2:CF4=70:
25: 5 (temporary sputtering vacuum degree), 10 to
rr (high frequency power); 13MHg, 500W (
1.6 w/ffl) (recording head temperature); ~200°C (formation speed); approximately 2λ/sec The layer thus obtained has an Auger analysis result C/
The S i2 was 0.15.

前記の如(にしてえやれた記録ヘッドは実施例1でえら
れた本発明による記録へ、ドと同様の性能を有し、常に
安定な記録かえられた。
The recording head improved as described above had the same performance as the recording head according to the present invention obtained in Example 1, and stable recording was always possible.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に使用されるグロー放電真空炉の概略図
である。第2図は本発明の記録ヘッドの1例の噴出オリ
アイス先端の断面図である。 1・・・グロー放電真空炉、2・・・真空ベルジャ、、
3・・・グロー放電々極、4・・・保持部材−5・・・
記録へラド、11・・・噴出ノズル、12・・・噴射口
、13・・・口唇部。 代理人 桑原義美 手続補正書 昭和58年7 >]27 l11 1 ・1fイ11のlシ示 昭和58年特f+’ Wi第 16756  υ2 発
明の名称 記録ヘッド :七 補11をする名 事件との関係 特許出願人 住 所  東京都新宿区西新宿1丁目26番21ノ名 
称 (1271小西六写真−に業株式会社代表取締役川
本信彦 4代pH人 〒 191 居 所  東京都11ツf市さくら町1 !!:地小西
六写真1′業株式会社内 6、補正の対象 「明細書の発明の詳細な説明の欄」 7、 補正の内容 明細書箱15頁5行目 「0.I MHPJとあるを、[o、IMHz Jと訂
正O同第17頁3行目 「ta、6yrmff Jとあるを、r13.6MHz
 J と訂正。 同第19頁16行目 「13MHf−Jとあるを、「13MHz」と訂正。
FIG. 1 is a schematic diagram of a glow discharge vacuum furnace used in the present invention. FIG. 2 is a sectional view of the tip of the ejecting orifice of one example of the recording head of the present invention. 1...Glow discharge vacuum furnace, 2...Vacuum bell jar,...
3...Glow discharge electrode, 4...Holding member-5...
Recording head, 11... Ejection nozzle, 12... Injection port, 13... Lip portion. Agent Yoshimi Kuwabara Procedural Amendment 1981 7>] 27 l11 1 ・1f I11 lshi 1988 special f+' Wi No. 16756 υ2 Invention name recording head: 7 Supplement 11 Relationship with the famous case Patent applicant address: 1-26-21 Nishi-Shinjuku, Shinjuku-ku, Tokyo
Name (1271 Konishiroku Photography Co., Ltd. Representative Director Nobuhiko Kawamoto 4th generation pH Person: 191 Address 1, Sakura-cho, 11th F City, Tokyo!!: Location 6 within Konishiroku Photography Co., Ltd. 6, subject to correction "Column for detailed explanation of the invention in the specification" 7. Contents of the amendment Specification box page 15, line 5 "0.I MHPJ" [o, IMHZ J and correction O, page 17, line 3 " ta, 6yrmff J, r13.6MHz
Corrected with J. Page 19, line 16, "13MHf-J" has been corrected to "13MHz."

Claims (4)

【特許請求の範囲】[Claims] (1)  インクジェット記録装置のインクを噴射する
記録ヘッドに於てインク噴射口が形成された面に、珪素
と炭素を主体とする非晶質物質から成る撥水層を設けた
ことを特徴とする記録へ、ド。
(1) A water-repellent layer made of an amorphous material mainly composed of silicon and carbon is provided on the surface of the recording head that jets ink of the inkjet recording device, on which the ink jet ports are formed. To the record, de.
(2)  前記撥水層を成す非晶質物質が弗素を含むこ
とを特徴とする特許請求の範囲第1項記載の記録ヘッド
(2) The recording head according to claim 1, wherein the amorphous material forming the water-repellent layer contains fluorine.
(3)前記撥水層を成す非晶質物質が水素を含むことを
特徴とする特許請求の範囲第1項または第2項記載の記
録ヘッド。
(3) The recording head according to claim 1 or 2, wherein the amorphous material forming the water-repellent layer contains hydrogen.
(4)  前記撥水層を成す非晶質物質に於て、炭素の
含有量が5〜50原子%である特許請求の範囲第1項、
第2項または第3項記載の記録へ、ド。
(4) Claim 1, wherein the amorphous material forming the water-repellent layer has a carbon content of 5 to 50 atomic %;
Go to the record described in paragraph 2 or 3.
JP1675683A 1983-02-03 1983-02-03 Recording head Pending JPS59142157A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1675683A JPS59142157A (en) 1983-02-03 1983-02-03 Recording head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1675683A JPS59142157A (en) 1983-02-03 1983-02-03 Recording head

Publications (1)

Publication Number Publication Date
JPS59142157A true JPS59142157A (en) 1984-08-15

Family

ID=11925079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1675683A Pending JPS59142157A (en) 1983-02-03 1983-02-03 Recording head

Country Status (1)

Country Link
JP (1) JPS59142157A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0612621A1 (en) * 1992-09-08 1994-08-31 Canon Kabushiki Kaisha Improved liquid jet printing head, and liquid jet printing apparatus provided with liquid jet printing head
US5786832A (en) * 1991-03-08 1998-07-28 Canon Kabushiki Kaisha Ink-jet recording head
US6780509B2 (en) 2000-05-27 2004-08-24 Alstom Technology Ltd. Protective coating for metallic components, metallic component having the coating and method of forming the coating

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5786832A (en) * 1991-03-08 1998-07-28 Canon Kabushiki Kaisha Ink-jet recording head
EP0612621A1 (en) * 1992-09-08 1994-08-31 Canon Kabushiki Kaisha Improved liquid jet printing head, and liquid jet printing apparatus provided with liquid jet printing head
EP0612621A4 (en) * 1992-09-08 1995-01-04 Canon Kk Improved liquid jet printing head, and liquid jet printing apparatus provided with liquid jet printing head.
US6780509B2 (en) 2000-05-27 2004-08-24 Alstom Technology Ltd. Protective coating for metallic components, metallic component having the coating and method of forming the coating

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