JP2002225283A - Water repellent article and its manufacturing method, ink jet head and its manufacturing method, and ink jet printer - Google Patents
Water repellent article and its manufacturing method, ink jet head and its manufacturing method, and ink jet printerInfo
- Publication number
- JP2002225283A JP2002225283A JP2001020708A JP2001020708A JP2002225283A JP 2002225283 A JP2002225283 A JP 2002225283A JP 2001020708 A JP2001020708 A JP 2001020708A JP 2001020708 A JP2001020708 A JP 2001020708A JP 2002225283 A JP2002225283 A JP 2002225283A
- Authority
- JP
- Japan
- Prior art keywords
- water
- tin
- indium
- silicon oxide
- repellent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、撥水特性に優れた
撥水性物品及びその製造方法、インクジェットヘッド及
びその製造方法並びにインクジェットプリンタに関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a water-repellent article having excellent water-repellent properties, a method of manufacturing the same, an ink jet head, a method of manufacturing the same, and an ink jet printer.
【０００２】[0002]
【従来の技術】インクジェットヘッドのインク吐出面構
成材料には、ガラス、金属等の材質が用いられている。
インクジェットヘッドにおいて水性又は油性のインクを
用いる場合、ノズル表面の撥水性が不十分であるとイン
クの液滴が付着し易くなり、そのため吐出するインク滴
の直進性が損なわれ、印字乱れなどを発生し易くなると
いう問題点がある。インクジェットヘッドのインク吐出
面の構成材料はインクに濡れ易いので、インクが吐出す
る部分であるノズルの表面を、水性又は油性のインク付
着を防止するために、撥水処理が行われている。例えば
特開平６−１４３５８６号公報には、珪素又は酸化珪素
がインク吐出面の構成材料に用いられている場合には、
真空蒸着によりインク吐出面にフルオロアルキルシラン
系化合物を付着させて撥水化する方法が提案されてい
る。2. Description of the Related Art Materials such as glass and metal are used as a material for forming an ink ejection surface of an ink jet head.
When using water-based or oil-based ink in an ink jet head, if the water repellency of the nozzle surface is insufficient, ink droplets are likely to adhere, which impairs the straightness of the ejected ink droplets and causes printing disorder. There is a problem that it becomes easy. Since the constituent material of the ink ejection surface of the ink jet head is easily wetted by the ink, a water-repellent treatment is performed on the surface of the nozzle where the ink is ejected in order to prevent the adhesion of aqueous or oily ink. For example, JP-A-6-143586 discloses that when silicon or silicon oxide is used as a constituent material of an ink ejection surface,
A method has been proposed in which a fluoroalkylsilane-based compound is adhered to an ink ejection surface by vacuum evaporation to make the surface water-repellent.
【０００３】ところがこの技術は、次のような理由によ
ってインク吐出面の撥水膜の性能が低下するという課題
をかかえていた。However, this technique has a problem that the performance of the water-repellent film on the ink ejection surface is deteriorated for the following reasons.
【０００４】（１）インクのｐＨは、色素材料を安定に
分散させるため、人体に影響しない範囲で弱アルカリ性
に調整されている。珪素又は酸化珪素がインク吐出面の
構成材料の場合には、撥水膜を浸透した弱アルカリ性イ
ンクが、珪素又は酸化珪素を溶解する。その結果、撥水
膜がインク吐出面より脱落し、撥水膜の耐久性能が低下
する場合があった。(1) In order to stably disperse a dye material, the pH of the ink is adjusted to be slightly alkaline within a range that does not affect the human body. When silicon or silicon oxide is a constituent material of the ink ejection surface, the weakly alkaline ink that has penetrated the water-repellent film dissolves silicon or silicon oxide. As a result, the water-repellent film may fall off from the ink ejection surface, and the durability of the water-repellent film may be reduced.
【０００５】（２）ノズル構成材料がステンレスまたは
樹脂またはそれらの混成材料の場合には、フルオロアル
キルシラン系化合物との密着性が悪いため、インクジェ
ットヘッドの長期使用により、インク吐出面の撥水耐久
性能が低下する場合があった。(2) When the nozzle constituting material is stainless steel, resin, or a hybrid material thereof, the adhesion to the fluoroalkylsilane-based compound is poor. In some cases, performance was reduced.
【０００６】そこで発明者は、基材と撥水膜との間にイ
ンジウム・錫ターゲットを使ったスパッタリング法によ
ってインジウム・錫酸化物からなる中間膜を形成する方
法を考案し、次の理由によって撥水膜の耐久品質を改善
することが可能になった。The inventor has devised a method of forming an indium / tin oxide intermediate film between a substrate and a water-repellent film by a sputtering method using an indium / tin target. It has become possible to improve the durability quality of the water film.
【０００７】（ａ）インジウム・錫酸化物は、強酸を除
く酸またはアルカリ性の環境で腐食しにくい物質であ
る。従って、基材にインジウム・錫酸化物を形成した場
合には、その上に形成された撥水膜が脱落することな
く、撥水性能が長期間維持された。(A) Indium tin oxide is a substance which is hardly corroded in an acid or alkaline environment except strong acids. Therefore, when indium / tin oxide was formed on the substrate, the water-repellent film formed thereon did not fall off, and the water-repellent performance was maintained for a long time.
【０００８】（ｂ）インジウム・錫酸化物は、珪素、酸
化珪素、ステンレス等の基材と密着性が強いため、長期
間放置した場合でも、その基材から脱落することがな
い。さらにインジウム・錫酸化化合物は、表面に水酸基
を有するため、フルオロアルキルシラン系化合物との密
着性が良く、高い撥水性能が長期間維持された。(B) Indium / tin oxide has strong adhesion to substrates such as silicon, silicon oxide and stainless steel, so that it does not fall off the substrate even when left for a long period of time. Further, since the indium / tin oxide compound has a hydroxyl group on the surface, it has good adhesion to the fluoroalkylsilane-based compound and high water repellency is maintained for a long time.
【０００９】（ｃ）インジウム・錫酸化物のスパッタリ
ング中の酸素濃度が高くなるに従って高い耐摩耗性が得
られ、長期間高い撥水性能が持続した。(C) As the oxygen concentration during sputtering of indium tin oxide increases, higher wear resistance is obtained, and high water repellency is maintained for a long time.
【００１０】[0010]
【発明が解決しようとする課題】しかし発明者が考案し
た従来の技術は、次のような理由によってインク吐出面
の撥水膜の性能が長期使用で低下するという課題を新た
にかかえた。However, the conventional technique devised by the inventor has a new problem that the performance of the water-repellent film on the ink discharge surface is reduced over a long period of use for the following reasons.
【００１１】（１）インジウム・錫酸化膜表面で撥水剤
であるフルオロシラン系化合物と結合可能な水酸基の密
度分布が製造ロットによってばらつき、その上に形成し
たフルオロアルキルシラン系化合物との反応結合が不完
全となる場合があり、撥水膜の耐久性能が低下する場合
があった。(1) The density distribution of hydroxyl groups capable of binding to the fluorosilane compound as a water repellent on the surface of the indium / tin oxide film varies depending on the production lot, and reacts with the fluoroalkylsilane compound formed thereon. Was sometimes incomplete, and the durability performance of the water-repellent film was sometimes reduced.
【００１２】（２）また顔料のような硬い色素が分散さ
せたインクを吐出する場合、インジウム・錫酸化膜の耐
摩耗性を向上させるため、スパッタリング中の酸素ガス
濃度を高める必要があった。(2) When an ink in which a hard dye such as a pigment is dispersed is ejected, it is necessary to increase the oxygen gas concentration during sputtering in order to improve the abrasion resistance of the indium tin oxide film.
【００１３】本発明は、上記の課題を解決するためにな
されたものであり、撥水性能を高めるとともにその撥水
性能の耐久性能及び生産性の向上を可能にした撥水性物
品及びその製造方法、インクジェットヘッド及びその製
造方法並びにインクジェットプリンタを提供することを
目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and a water-repellent article which has improved water-repellent performance and has improved durability and productivity of the water-repellent performance, and a method of manufacturing the same. It is an object to provide an ink jet head, a method of manufacturing the same, and an ink jet printer.
【００１４】[0014]
【課題を解決するための手段】（１）本発明の一つの態
様に係る撥水性物品は、基材の表面にインジウム・錫・
珪素酸化膜が形成され、更にその上に、水酸基と反応可
能な部位を有する撥水物質を結合させた撥水膜が形成さ
れてなる撥水性物品である。(1) A water-repellent article according to one embodiment of the present invention comprises a substrate having indium / tin / tin on its surface.
A water-repellent article is formed by forming a silicon oxide film and further forming a water-repellent film on which a water-repellent substance having a site capable of reacting with a hydroxyl group is bonded.
【００１５】（２）本発明の他の態様に係る撥水性物品
は、基材の表面にインジウム・錫・珪素酸化物ターゲッ
トを用いて、スパッタガスの酸素濃度が３０％以上の条
件で、インジウム・錫・珪素酸化膜が形成され、更にそ
の上に、水酸基と反応可能な部位を有する撥水物質を結
合させた撥水膜が形成されてなる。(2) A water-repellent article according to another embodiment of the present invention uses an indium-tin-silicon oxide target on the surface of a substrate and uses a sputtering gas with an oxygen concentration of 30% or more for indium. A tin-silicon oxide film is formed, and a water-repellent film is formed on the tin-silicon oxide film, on which a water-repellent substance having a site capable of reacting with a hydroxyl group is bonded.
【００１６】（３）本発明の他の態様に係る撥水性物品
は、基材の表面にインジウム・錫・珪素酸化物ターゲッ
トを用いて、スパッタガスの酸素濃度が４０％以上の条
件で、インジウム・錫・珪素酸化膜が形成され、更にそ
の上に、水酸基と反応可能な部位を有する撥水物質を結
合させた撥水膜が形成されてなる。(3) A water-repellent article according to another embodiment of the present invention uses an indium / tin / silicon oxide target on the surface of a base material and has a sputtering gas having an oxygen concentration of 40% or more and indium. A tin-silicon oxide film is formed, and a water-repellent film is formed on the tin-silicon oxide film, on which a water-repellent substance having a site capable of reacting with a hydroxyl group is bonded.
【００１７】（４）本発明の他の態様に係る撥水性物品
の製造方法は、基材の表面に、インジウム・錫・珪素酸
化物ターゲットを用いて、スパッタガスの酸素濃度が３
０％以上の条件で、インジウム・錫・珪素酸化膜を形成
し、その上に、水酸基と反応可能な部位を有する撥水物
質を結合させて撥水膜を形成する。(4) In a method of manufacturing a water-repellent article according to another aspect of the present invention, an oxygen concentration of a sputtering gas is set to 3 using an indium-tin-silicon oxide target on a surface of a substrate.
Under the condition of 0% or more, an indium / tin / silicon oxide film is formed, and a water-repellent substance having a site capable of reacting with a hydroxyl group is bonded thereon to form a water-repellent film.
【００１８】（５）本発明の他の態様に係る撥水性物品
の製造方法は、基材の表面に、インジウム・錫・珪素酸
化物ターゲットを用いて、スパッタガスの酸素濃度が４
０％以上の条件で、インジウム・錫・珪素酸化膜を形成
し、その上に、水酸基と反応可能な部位を有する撥水物
質を結合させて撥水膜を形成する。(5) In the method for producing a water-repellent article according to another aspect of the present invention, the oxygen concentration of the sputtering gas is set to 4 using an indium-tin-silicon oxide target on the surface of the substrate.
Under the condition of 0% or more, an indium / tin / silicon oxide film is formed, and a water-repellent substance having a site capable of reacting with a hydroxyl group is bonded thereon to form a water-repellent film.
【００１９】（６）本発明の他の態様に係るインクジェ
ットヘッドは、ノズルを有する基材の少なくともインク
吐出側の面に、インジウム・錫・珪素酸素ターゲットを
用いて、スパッタガスの酸素濃度が３０％以上の条件
で、インジウム・錫・珪素酸化膜が形成され、更にその
上に、水酸基と反応可能な部位を有する撥水物質を結合
させた撥水膜が形成されてなる。(6) In an ink jet head according to another aspect of the present invention, an oxygen concentration of a sputtering gas of 30 is formed on at least an ink discharge side of a substrate having a nozzle by using an indium / tin / silicon oxygen target. %, An indium-tin-silicon oxide film is formed, and a water-repellent film having a water-repellent substance having a site capable of reacting with a hydroxyl group is formed thereon.
【００２０】（７）本発明の他の態様に係るインクジェ
ットヘッドは、ノズルを有する基材の少なくともインク
吐出側の面に、インジウム・錫・珪素酸化物ターゲット
を用いて、スパッタガスの酸素濃度が４０％以上の条件
で、インジウム・錫・珪素酸化膜が形成され、更にその
上に、水酸基と反応可能な部位を有する撥水物質を結合
させた撥水膜が形成されてなる。(7) In an ink jet head according to another aspect of the present invention, an oxygen concentration of a sputter gas is reduced by using an indium / tin / silicon oxide target on at least the ink discharge side of a substrate having a nozzle. Under the condition of 40% or more, an indium / tin / silicon oxide film is formed, and a water-repellent film formed by bonding a water-repellent substance having a site capable of reacting with a hydroxyl group is formed thereon.
【００２１】（８）本発明の他の態様に係るインクジェ
ットヘッドの製造方法は、ノズルを有する基材の少なく
ともインク吐出側の面に、インジウム・錫・珪素酸化物
ターゲットを用いて、スパッタガスの酸素濃度が３０％
以上の条件で、インジウム・錫・珪素酸化膜を形成し、
更にその上に、水酸基と反応可能な部位を有する撥水物
質を結合させた撥水膜を形成する。(8) In a method of manufacturing an ink jet head according to another aspect of the present invention, at least a surface of a substrate having a nozzle on an ink discharge side is formed by using an indium / tin / silicon oxide target to form a sputter gas. Oxygen concentration is 30%
Under the above conditions, an indium / tin / silicon oxide film is formed,
Further, a water-repellent film having a water-repellent substance having a site capable of reacting with a hydroxyl group is formed thereon.
【００２２】（９）本発明の他の態様に係るインクジェ
ットヘッドの製造方法は、ノズルを有する基材の少なく
ともインク吐出側の面に、インジウム・錫・珪素酸化物
ターゲットを用いて、スパッタガスの酸素濃度が４０％
以上の条件で、インジウム・錫・珪素酸化膜を形成し、
更にその上に、水酸基と反応可能な部位を有する撥水物
質を結合させた撥水膜を形成する。(9) In a method of manufacturing an ink jet head according to another aspect of the present invention, a sputter gas is formed by using an indium / tin / silicon oxide target on at least a surface of a substrate having a nozzle on an ink ejection side. Oxygen concentration is 40%
Under the above conditions, an indium / tin / silicon oxide film is formed,
Further, a water-repellent film having a water-repellent substance having a site capable of reacting with a hydroxyl group is formed thereon.
【００２３】（１０）本発明の他の態様に係るインクジ
ェットヘッドは、上記（６）〜（９）の何れかに記載の
インクジェットへツドを搭載したものである。(10) An ink jet head according to another aspect of the present invention has the ink jet head according to any one of the above (6) to (9).
【００２４】本発明では、基材と撥水膜の間のインジウ
ム・錫・珪素酸化膜がスパッタリング中の酸素ガス濃度
を３０％以上、さらに望ましくは４０％以上に規定した
ので、高い撥水性能が得られるとともに、顔料インクに
対する耐摩耗性を向上させることが可能となっている。In the present invention, the indium / tin / silicon oxide film between the substrate and the water-repellent film regulates the oxygen gas concentration during sputtering to 30% or more, more preferably 40% or more, so that high water-repellent performance is obtained. And the abrasion resistance to the pigment ink can be improved.
【００２５】また、本発明に係るインジウム・錫・珪素
酸化膜は、上記理由により、インクジェットヘッドのイ
ンク吐出面の構成材料に依らず密着性が高く、撥水膜と
化学結合するため、いずれのタイプのヘッド（フェース
イジェクトタイプ、エッジイジェクトタイプ）において
も、撥水性能を高めるとともにその撥水性能の耐久性能
を向上させることが可能になっている。このため、吐出
されるインクの液の直進性が優れたものとなり、印字の
乱れ等のトラブルが避けられる。Further, the indium / tin / silicon oxide film according to the present invention has high adhesiveness regardless of the constituent material of the ink ejection surface of the ink jet head and chemically bonds to the water repellent film. In the heads of the type (face eject type, edge eject type) as well, it is possible to improve the water repellency and the durability of the water repellency. For this reason, the straightness of the ejected ink liquid is excellent, and troubles such as printing disorder can be avoided.
【００２６】[0026]
【発明の実施の形態】実施形態１ 図２は本発明の実施形態１に係るインクジェットヘッド
の斜視図である。このインクジェットヘッドは、ＰＺＴ
などの振動によりインクを吐出する圧力室４とインクが
通過する流路が形成された第１プレート１と、流路と垂
直方向にノズル穴６が形成きれたノズルプレートと呼ば
れるノズルプレート２を接合した構造となっている。そ
して、本実施形態のインジウム・錫・珪素酸化膜及び撥
水膜はこのノズルプレート２の表面へ形成する。Embodiment 1 FIG. 2 is a perspective view of an ink jet head according to Embodiment 1 of the present invention. This inkjet head uses PZT
The first plate 1 in which the pressure chamber 4 for discharging the ink by the vibration of the ink and the flow path through which the ink passes is formed, and the nozzle plate 2 called the nozzle plate in which the nozzle hole 6 is formed in the direction perpendicular to the flow path. It has a structured structure. Then, the indium / tin / silicon oxide film and the water repellent film of the present embodiment are formed on the surface of the nozzle plate 2.
【００２７】図１は図２のノズルプレート２に関する製
造方法の工程説明図である。FIG. 1 is a process explanatory view of a manufacturing method for the nozzle plate 2 of FIG.
【００２８】（ａ）まず、ノズル穴６を加工した珪素基
板１１表面へ（図１（ａ））、スパッタ法でチタン膜１
２及びインジウム・錫・珪素酸化膜１３を約１００ナノ
メーター形成する（図１（ｂ））。このインジウム・錫
・珪素酸化膜１３を形成するに際しては、インジウム・
錫・珪素酸化物ターゲットを用いたスパッタ法によるも
のとする。(A) First, the titanium film 1 is formed on the surface of the silicon substrate 11 on which the nozzle holes 6 have been processed (FIG. 1A) by sputtering.
2 and an indium-tin-silicon oxide film 13 are formed to a thickness of about 100 nanometers (FIG. 1B). When forming the indium / tin / silicon oxide film 13, indium / tin / silicon oxide film 13 is used.
It is assumed that a sputtering method using a tin / silicon oxide target is used.
【００２９】（ｂ）次に、インジウム・錫・珪素酸化膜
１３の表面に２００ナノメーター以下の波長を有する紫
外線を照射した後、フルオロアルキルシラン系の撥水膜
１４を真空蒸着法によって、インジウム・錫・珪素酸化
膜１３上へ形成する（図１（ｃ））。(B) Next, after irradiating the surface of the indium-tin-silicon oxide film 13 with ultraviolet rays having a wavelength of 200 nm or less, the fluoroalkylsilane-based water-repellent film 14 is indium deposited by vacuum evaporation. Formed on the tin / silicon oxide film 13 (FIG. 1C).
【００３０】（ｃ）最後に、上記のように製造したノズ
ルプレート２を第１プレート１へ接合し、インクジェト
ヘッドを完成させる。(C) Finally, the nozzle plate 2 manufactured as described above is joined to the first plate 1 to complete an ink jet head.
【００３１】なお比較のため、インジウム・錫酸化物タ
ーゲットで珪素基板表面へインジウム・錫酸化膜を形成
した撥水処理済みノズルプレートを用いてインクジェッ
トヘッドを完成させる。For comparison, an ink jet head is completed using a water-repellent nozzle plate having an indium / tin oxide film formed on the surface of a silicon substrate with an indium / tin oxide target.
【００３２】次に、図１の製造工程においてインジウム
・錫・珪素酸化膜１３を形成する本発明のインクジェッ
トヘッドの特性について説明する。Next, the characteristics of the ink jet head of the present invention in which the indium / tin / silicon oxide film 13 is formed in the manufacturing process of FIG. 1 will be described.
【００３３】表１は、本発明のインジウム・錫・珪素酸
化膜を形成した撥水処理済みノズルプレートと、比較の
インジウム・錫酸化膜を形成した撥水処理済みノズルプ
レートについて、製造ロットを４回変えてインクに対す
る腐食性を静的接触角より求めた特性表である。腐食性
試験条件は、摂氏６０度のインクへ５日間浸せきであ
る。Table 1 shows four production lots for the water-repellent nozzle plate on which the indium / tin / silicon oxide film of the present invention was formed and the water-repellent nozzle plate on which the comparative indium / tin oxide film was formed. 4 is a characteristic table obtained by determining the corrosiveness to the ink from the static contact angle by changing the number of times. The corrosiveness test conditions were immersion in ink at 60 degrees Celsius for 5 days.
【００３４】[0034]
【表１】 [Table 1]
【００３５】表１に示されるように、インジウム・錫酸
化膜品は２回の急激な接触角低下現象を起こしたが、本
発明のインジウム・錫・珪素酸化膜品はいずれも接触角
の急激な低下が見られなかったことがわかる。As shown in Table 1, the indium / tin oxide film product caused two rapid contact angle reduction phenomena, whereas the indium / tin / silicon oxide film product of the present invention all had a sharp contact angle. It can be seen that no significant decrease was observed.
【００３６】図３は染料インクへ浸せきした後のインジ
ウム・錫・珪素酸化膜の消耗量との関係、図４はスパッ
タリングするときの酸素濃度とワイピング前後のインク
接触角の差との関係を示した特性図である。図３に示さ
れるように、試験した顔料インクでは酸素濃度が高くな
るに従って高い耐摩耗特性が得られており、３０％以上
の領域において所望の耐摩耗特性が得られ、４０％以上
がより好ましいことがわかる。FIG. 3 shows the relationship between the amount of consumption of the indium / tin / silicon oxide film after immersion in the dye ink, and FIG. 4 shows the relationship between the oxygen concentration during sputtering and the difference between the ink contact angles before and after wiping. FIG. As shown in FIG. 3, in the pigment inks tested, the higher the oxygen concentration, the higher the abrasion resistance was obtained, and the desired abrasion resistance was obtained in a region of 30% or more, and more preferably 40% or more. You can see that.
【００３７】また図４に示されるように、ワイピング前
後の接触角の差も酸素濃度が高くなるに従って、撥水性
能が維持されていることがわかる。As shown in FIG. 4, the difference in the contact angle between before and after wiping also shows that the water repellency is maintained as the oxygen concentration increases.
【００３８】従って、インジウム・錫・珪素酸化膜表面
をスパッタリングの酸素濃度を３０％以上にすること
で、顔料インクに対する撥水性能及び耐摩耗性が満足し
たものとなる。Therefore, by setting the oxygen concentration of sputtering on the surface of the indium / tin / silicon oxide film to 30% or more, the water repellency and abrasion resistance to the pigment ink are satisfied.
【００３９】実施形態２ なお、上記実施形態１においては、フルオロアルキルシ
ラン系の撥水膜を用いた例について説明したが、その材
料の基に水酸基と化学反応可能な基を含むものであれ
ば、他の撥水剤を用いても良い。また、ノズルプレート
の材質は、珪素基板に限定されず、ステンレス等の金属
材料、ガラス又はポリサルフォン等の有機高分子材料で
も良い。Second Embodiment In the first embodiment, an example in which a fluoroalkylsilane-based water-repellent film is used has been described. However, if the material of the material includes a group capable of chemically reacting with a hydroxyl group. Alternatively, another water repellent may be used. The material of the nozzle plate is not limited to the silicon substrate, but may be a metal material such as stainless steel, or an organic polymer material such as glass or polysulfone.
【００４０】さらに、上記本実施形態１においてはフェ
イスイジェクトヘッドについて説明したが、エッジイジ
ェクトへツドにおいても、インジウム・錫・珪素酸化物
と基材との密着性が良好なため、優れた耐久性を発揮す
る。Furthermore, although the face eject head has been described in the first embodiment, the edge eject head also has excellent durability because of good adhesion between indium, tin and silicon oxide and the substrate. Demonstrate.
【００４１】[0041]
【発明の効果】以上説明したように本発明によれば、撥
水剤と基板の間にインジウム・錫・珪素酸化膜を形成
し、又はスパッタガスの酸素濃度を３０％以上にしたの
で、撥水性能を高めるとともに顔料インクに対する耐久
性能を向上させることが可能になっている。As described above, according to the present invention, an indium-tin-silicon oxide film is formed between the water repellent and the substrate, or the oxygen concentration of the sputtering gas is set to 30% or more. It is possible to improve water performance and durability performance against pigment ink.
【図１】本発明の実施形態１のノズルプレートに関する
製造方法の工程説明図である。FIG. 1 is a process explanatory view of a manufacturing method for a nozzle plate according to a first embodiment of the present invention.
【図２】本発明の実施形態１に係るインクジェットヘッ
ドの斜視図である。FIG. 2 is a perspective view of the inkjet head according to the first embodiment of the present invention.
【図３】本発明の実施形態１に係るスパッタリングする
ときの酸素濃度と顔料インクで３０００回ワイピングし
た後のインジウム・錫・珪素酸化膜の摩耗量との関係を
示した特性図である。FIG. 3 is a characteristic diagram showing a relationship between an oxygen concentration at the time of sputtering and a wear amount of an indium / tin / silicon oxide film after wiping with a pigment ink 3000 times according to the first embodiment of the present invention.
【図４】本発明の実施形態１に係るスパッタリングする
ときの酸素濃度とワイピング前後のインク接触角の差と
の関係を示した特性図である。FIG. 4 is a characteristic diagram showing a relationship between an oxygen concentration at the time of sputtering and a difference between ink contact angles before and after wiping according to the first embodiment of the present invention.
Claims (10)
膜が形成され、更にその上に、水酸基と反応可能な部位
を有する撥水物質を結合させた撥水膜が形成されてなる
撥水性物品。An indium / tin / silicon oxide film is formed on a surface of a base material, and a water repellent film formed by bonding a water repellent substance having a site capable of reacting with a hydroxyl group is further formed thereon. Aqueous articles.
物ターゲットを用いて、スパッタガスの酸素濃度が３０
％以上の条件で、インジウム・錫・珪素酸化膜が形成さ
れ、更にその上に、水酸基と反応可能な部位を有する撥
水物質を結合させた撥水膜が形成されてなることを特徴
とする撥水性物品。2. An indium / tin / silicon oxide target is used on the surface of the substrate, and the oxygen concentration of the sputtering gas is 30%.
% Or more, an indium-tin-silicon oxide film is formed, and a water-repellent film in which a water-repellent substance having a site capable of reacting with a hydroxyl group is further formed thereon. Water repellent articles.
物ターゲットを用いて、スパッタガスの酸素濃度が４０
％以上の条件で、インジウム・錫・珪素酸化膜が形成さ
れ、更にその上に、水酸基と反応可能な部位を有する撥
水物質を結合させた撥水膜が形成されてなることを特徴
とする撥水性物品。3. An indium-tin-silicon oxide target is used on the surface of the substrate, and the oxygen concentration of the sputtering gas is 40
% Or more, an indium-tin-silicon oxide film is formed, and a water-repellent film in which a water-repellent substance having a site capable of reacting with a hydroxyl group is further formed thereon. Water repellent articles.
化物ターゲットを用いて、スパッタガスの酸素濃度が３
０％以上の条件で、インジウム・錫・珪素酸化膜を形成
し、その上に、水酸基と反応可能な部位を有する撥水物
質を結合させて撥水膜を形成することを特徴とする撥水
性物品の製造方法。4. An oxygen concentration of a sputtering gas of 3% on a surface of a base material using an indium / tin / silicon oxide target.
A water-repellent film formed by forming an indium-tin-silicon oxide film under a condition of 0% or more, and bonding a water-repellent substance having a site capable of reacting with a hydroxyl group to the film; Article manufacturing method.
化物ターゲットを用いて、スパッタガスの酸素濃度が４
０％以上の条件で、インジウム・錫・珪素酸化膜を形成
し、その上に、水酸基と反応可能な部位を有する撥水物
質を結合させて撥水膜を形成することを特徴とする撥水
性物品の製造方法。5. An oxygen concentration of a sputtering gas of 4% on a surface of a base material using an indium / tin / silicon oxide target.
A water-repellent film formed by forming an indium-tin-silicon oxide film under a condition of 0% or more, and bonding a water-repellent substance having a site capable of reacting with a hydroxyl group to the film; Article manufacturing method.
吐出側の面に、インジウム・錫・珪素酸素ターゲットを
用いて、スパッタガスの酸素濃度が３０％以上の条件
で、インジウム・錫珪素酸化膜が形成され、更にその上
に、水酸基と反応可能な部位を有する撥水物質を結合さ
せた撥水膜が形成されてなることを特徴とするインクジ
ェットヘッド。6. An indium-tin-silicon oxide film is formed on at least the ink ejection side of a substrate having a nozzle by using an indium-tin-silicon oxygen target under a condition that an oxygen concentration of a sputtering gas is 30% or more. An ink-jet head, wherein a water-repellent film is formed thereon, and a water-repellent film having a water-repellent substance having a site capable of reacting with a hydroxyl group is formed thereon.
吐出側の面に、インジウム・錫・珪素酸素ターゲットを
用いて、スパッタガスの酸素濃度が４０％以上の条件
で、インジウム・錫・珪素酸化膜が形成され、更にその
上に、水酸基と反応可能な部位を有する撥水物質を結合
させた撥水膜が形成されてなることを特徴とするインク
ジェットヘッド。7. An indium-tin-silicon oxide film on at least the ink ejection side of a substrate having a nozzle, using an indium-tin-silicon oxygen target under a condition that the oxygen concentration of a sputtering gas is 40% or more. Is formed, and a water-repellent film is further formed thereon by bonding a water-repellent substance having a site capable of reacting with a hydroxyl group.
吐出側の面に、インジウム・錫・珪素酸化物ターゲット
を用いて、スパッタガスの酸素濃度が３０％以上の条件
で、インジウム・錫・珪素酸化膜を形成し、更にその上
に、水酸基と反応可能な部位を有する撥水物質を結合さ
せた撥水膜を形成することを特徴とするインクジェット
ヘッドの製造方法。8. An indium-tin-silicon oxide using an indium-tin-silicon oxide target at least on a surface of a substrate having a nozzle on an ink discharge side under a condition that an oxygen concentration of a sputtering gas is 30% or more. A method for manufacturing an ink jet head, comprising: forming a film, and further forming a water-repellent film on which a water-repellent substance having a site capable of reacting with a hydroxyl group is bonded.
吐出側の面に、インジウム・錫・珪素酸化物ターゲット
を用いて、スパッタガスの酸素濃度が４０％以上の条件
で、インジウム・錫・珪素酸化膜を形成し、更にその上
に、水酸基と反応可能な部位を有する撥水物質を結合さ
せた撥水膜を形成することを特徴とするインクジェット
ヘッドの製造方法。9. An indium-tin-silicon oxide using an indium-tin-silicon oxide target at least on a surface of a substrate having a nozzle on an ink ejection side under a condition that an oxygen concentration of a sputtering gas is 40% or more. A method for manufacturing an ink jet head, comprising: forming a film, and further forming a water-repellent film on which a water-repellent substance having a site capable of reacting with a hydroxyl group is bonded.
クジェットヘッドを搭載したことを特徴とするインクジ
ェットプリンタ。10. An inkjet printer comprising the inkjet head according to claim 6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001020708A JP3815225B2 (en) | 2001-01-29 | 2001-01-29 | Water repellent article and method for producing the same, ink jet head and method for producing the same, and ink jet printer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001020708A JP3815225B2 (en) | 2001-01-29 | 2001-01-29 | Water repellent article and method for producing the same, ink jet head and method for producing the same, and ink jet printer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002225283A true JP2002225283A (en) | 2002-08-14 |
| JP3815225B2 JP3815225B2 (en) | 2006-08-30 |
Family
ID=18886380
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001020708A Expired - Fee Related JP3815225B2 (en) | 2001-01-29 | 2001-01-29 | Water repellent article and method for producing the same, ink jet head and method for producing the same, and ink jet printer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3815225B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005262514A (en) * | 2004-03-17 | 2005-09-29 | Ricoh Co Ltd | Liquid drop discharge head and manufacturing method therefor and image forming apparatus |
| JP2006044226A (en) * | 2004-07-06 | 2006-02-16 | Ricoh Printing Systems Ltd | Inkjet head, method for manufacturing inkjet head, inkjet recorder and inkjet coater |
| US8957144B2 (en) | 2011-06-28 | 2015-02-17 | Styron Europe Gmbh | Polycarbonate resin composition |
| US9216529B2 (en) | 2011-08-02 | 2015-12-22 | Trinseo Europe Gmbh | Chemical resistant and fire retardant polycarbonate polyester composition |
-
2001
- 2001-01-29 JP JP2001020708A patent/JP3815225B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005262514A (en) * | 2004-03-17 | 2005-09-29 | Ricoh Co Ltd | Liquid drop discharge head and manufacturing method therefor and image forming apparatus |
| JP4541006B2 (en) * | 2004-03-17 | 2010-09-08 | 株式会社リコー | Droplet discharge head and image forming apparatus |
| JP2006044226A (en) * | 2004-07-06 | 2006-02-16 | Ricoh Printing Systems Ltd | Inkjet head, method for manufacturing inkjet head, inkjet recorder and inkjet coater |
| JP4734979B2 (en) * | 2004-07-06 | 2011-07-27 | リコープリンティングシステムズ株式会社 | Inkjet head, inkjet head manufacturing method, inkjet recording apparatus, and inkjet coating apparatus |
| US8957144B2 (en) | 2011-06-28 | 2015-02-17 | Styron Europe Gmbh | Polycarbonate resin composition |
| US9216529B2 (en) | 2011-08-02 | 2015-12-22 | Trinseo Europe Gmbh | Chemical resistant and fire retardant polycarbonate polyester composition |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3815225B2 (en) | 2006-08-30 |
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