JP2000318164A - Water repellent article and production thereof, ink jet head and manufacture thereof, and ink jet printer - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a water repellent article in which water repellent/oil repellent function is enhanced along with durability thereof, a production method thereof, an ink jet head and an ink jet printer. SOLUTION: An indium/tin oxide film 12 is formed on the ink ejecting side of a basic material having a nozzle and an water repellent/oil repellent film 13 is formed thereon through reaction coupling of an water repellent material having a part reactive on a hydroxy group. Intensity ratio of the X ray diffraction peak on (400) face to the X ray diffraction peak on (222) face of indium oxide crystal in the indium/tin oxide film is set at 1.1 or above or the oxygen concentration of sputtering gas is set at 30% or above when the indium/tin oxide film 12 is formed using an indium/tin target on conditions that the oxygen concentration of sputtering gas is 30% or above.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a water-repellent article having excellent water-repellent properties, a method of manufacturing the same, an ink jet head, a method of manufacturing the same, and an ink jet printer.

[0002]

2. Description of the Related Art Materials such as glass and metal are used as constituent materials of an ink ejection surface of an ink jet printer head. When using water-based or oil-based ink in an ink jet head, if the water repellency of the nozzle surface is insufficient, ink droplets are likely to adhere, thereby impairing the rectilinearity of the ejected ink droplets and causing print disorder. Is more likely to occur. Since the constituent material of the ink ejection surface of the ink jet head is easily wetted by the ink, a water repellent treatment is performed on the surface of the nozzle, which is the portion from which the ink is ejected, in order to prevent the adhesion of aqueous or oily ink. . For example, JP-A-6-143586 discloses that when silicon or silicon oxide is used as a constituent material of an ink ejection surface, a fluoroalkylsilane-based compound is attached to the ink ejection surface by vacuum evaporation to increase water repellency. A way to do that has been proposed.

[0003]

However, the prior art has a problem that the performance of the water-repellent film on the ink ejection surface is deteriorated for the following reasons. (1) The pH of the ink is adjusted to be slightly alkaline within a range that does not affect the human body in order to stably disperse the coloring material. When silicon or oxide is a constituent material of the ink ejection surface, the weakly alkaline ink that has penetrated the water-repellent film dissolves silicon or silicon oxide. As a result, the water-repellent film may fall off from the ink ejection surface, and the durability of the water-repellent film may be reduced. (2) When the nozzle constituent material is stainless steel, resin or a hybrid material thereof, the adhesion to the fluoroalkylsilane-based compound is poor, and the long-term use of the inkjet head deteriorates the water-repellent durability of the ink ejection surface. May be.

The present invention has been made in order to solve the above-mentioned problems, and has a water-repellent article capable of improving the water-repellent function and improving the durability performance of the water-repellent function, and a method of manufacturing the same. An object of the present invention is to provide an ink jet head, a method for manufacturing the same, and an ink jet printer.

[0005]

(1) In a water-repellent article according to one embodiment of the present invention, an indium tin oxide film is formed on the surface of a base material, and a portion capable of reacting with a hydroxyl group is further formed thereon. A water-repellent film formed by reacting a water-repellent substance having the following formula is formed, and the X-ray diffraction peak of the (400) plane with respect to the (222) plane of the indium oxide crystal in the indium tin oxide film is formed. Is 1.1 or more. (2) A water-repellent article according to another aspect of the present invention is the water-repellent article of the above (1), wherein the strength ratio is 1.5 or more. (3) The water-repellent article according to another aspect of the present invention is the water-repellent article according to the above (1), wherein the strength ratio is 2.0.
That is all. (4) In the water-repellent article according to another aspect of the present invention, an indium-tin oxide film is formed on the surface of the base material using an indium-tin target under the condition that the oxygen concentration of the sputtering gas is 30% or more. And a water-repellent film formed by reaction-bonding a water-repellent substance having a site capable of reacting with a hydroxyl group.

(5) A method for producing a water-repellent article according to another aspect of the present invention comprises the steps of: providing an indium tin oxide film on a surface of a substrate;
The sputtering conditions are adjusted so that the intensity ratio of the (400) plane X-ray diffraction peak to the (222) plane X-ray diffraction peak of the indium oxide crystal in the indium tin oxide film is 1.1 or more. Then, a water-repellent substance having a site capable of reacting with a hydroxyl group is reacted and bonded thereon to form a water-repellent film. (6) In the method of manufacturing a water-repellent article according to another aspect of the present invention, in the manufacturing method of (5), the adjustment of the sputtering conditions is an adjustment of the oxygen concentration of the sputtering gas. (7) The method for producing a water-repellent article according to another aspect of the present invention includes the steps of: using an indium / tin target on the surface of a base material; A film is formed, and a water-repellent substance having a site capable of reacting with a hydroxyl group is reacted and bonded thereon to form a water-repellent film.

(8) In an ink jet head according to another aspect of the present invention, an indium tin oxide film is formed on at least the ink discharge side of a substrate having a nozzle, and furthermore, it is capable of reacting with a hydroxyl group thereon. A water-repellent film formed by reacting a water-repellent substance having a site is formed, and (22) of the indium oxide crystal in the indium-tin oxide film is formed.
The intensity ratio of the (400) plane X-ray diffraction peak to the 2) plane X-ray diffraction peak is 1.1 or more. (9) An inkjet head according to another aspect of the present invention is the inkjet head of (8), wherein the intensity ratio is 1.5 or more. (10) An inkjet head according to another aspect of the present invention is the inkjet head of (8), wherein the intensity ratio is 2.0 or more. (11) An ink jet head according to another aspect of the present invention is characterized in that at least the surface of the substrate having the nozzles on the ink ejection side uses an indium-tin target and has a sputtering gas having an oxygen concentration of 30% or more, An indium-tin oxide film is formed, and a water-repellent film formed by reacting and bonding a water-repellent substance having a site capable of reacting with a hydroxyl group is further formed thereon. (12) In a method of manufacturing an ink jet head according to another aspect of the present invention, an indium tin oxide film is formed on at least a surface of a substrate having a nozzle on an ink discharge side, and the indium tin oxide film is
The tin oxide film is formed by adjusting the sputtering conditions so that the intensity ratio of the (400) plane X-ray diffraction peak to the (222) plane X-ray diffraction peak of the indium oxide crystal is 1.1 or more. Then, a water-repellent substance having a site capable of reacting with a hydroxyl group is reacted and bonded to form a water-repellent film. (13) In the method of manufacturing an inkjet head according to another aspect of the present invention, in the manufacturing method of (12), the adjustment of the sputtering conditions is an adjustment of the oxygen concentration of a sputtering gas. (14) In a method for manufacturing an ink jet head according to another aspect of the present invention, an oxygen concentration of a sputtering gas of 30% or more is provided on at least a surface of a substrate having a nozzle on an ink ejection side using an indium / tin target. Under the conditions, an indium-tin oxide film is formed, and a water-repellent substance having a site capable of reacting with a hydroxyl group is reacted and bonded thereon to form a water-repellent film. (15) An inkjet head according to another aspect of the present invention includes the inkjet head according to any one of (7) to (10).

In the present invention, since a poorly soluble intermediate film made of indium / tin oxide is formed between the substrate and the water-repellent film, the durability of the water-repellent film can be improved for the following reasons. It has become.

(A) Indium tin oxide is a substance which does not easily corrode in an acid or alkaline environment except strong acids. Therefore, when indium tin oxide is formed on the substrate, the water repellent film formed thereon does not fall off, and the water repellency is maintained for a long time. (B) Further, since indium tin oxide has strong adhesion to a substrate such as silicon, silicon oxide, and stainless steel, it does not fall off the substrate even when left for a long period of time.
Further, since the indium tin oxide compound has a hydroxyl group on the surface, the indium tin oxide compound has good adhesion to the fluoroalkylsilane-based compound and maintains water repellency for a long period of time. (C) Also, (4) with respect to the X-ray diffraction peak of the (222) plane of the indium oxide crystal in the indium / tin oxide film.
Since the intensity ratio of the X-ray diffraction peak of the (00) plane (hereinafter referred to as the indium oxide crystal plane (222) / (400) intensity ratio) was set to 1.1 or more, or the oxygen concentration of the sputtering gas was set to 30% or more. In particular, a particularly high water-repellent function can be obtained, and the durability of the water-repellent function can be improved. The basis will be described in a first embodiment described later.

Further, the indium-tin oxide film according to the present invention has high adhesiveness regardless of the constituent material of the ink ejection surface of the ink jet head, and has a water- and oil-repellent film due to the reasons (a) to (c) above. Because of the chemical bonding, in any type of head (face eject type, edge eject type), it is possible to enhance the water repellent function and to improve the durability performance of the water repellent function. For this reason, the straightness of the ejected ink liquid is excellent, and troubles such as printing disorder can be avoided.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiment 1 FIG. FIG. 2 is a perspective view of the inkjet head according to the first embodiment of the present invention. This ink jet head includes an ink supply unit 3 and PZT
A first plate 1 in which a pressure chamber 4 for discharging ink by vibrations and a flow path 5 through which ink passes are formed, and a nozzle plate called a nozzle plate in which a nozzle hole 6 is formed in a direction perpendicular to the flow path 5 2 are joined. Then, the indium tin oxide film and the water repellent film of the present embodiment are formed on the surface of the nozzle plate 2.

FIG. 1 is a process explanatory view of a method of manufacturing the nozzle plate 2 of FIG. (A) First, a silicon oxide film 12 is formed on the surface of the silicon substrate 11 on which the nozzle holes 6 have been processed (FIG. 1A). (B) Next, an indium / tin oxide film 13 is formed to a thickness of about 1000 angstroms by a sputtering method (FIG. 1B).
In forming the indium tin oxide film 13,
A sputtering method using an indium / tin target was used, and the indium oxide crystal plane (222) / (4
00) Sputtering conditions are adjusted so that the intensity ratio is 1.1 or more, or the oxygen concentration of the sputtering gas is 30
%. (C) Next, a fluoroalkylsilane-based water-repellent film 14 is formed on the indium / tin oxide film 13 by a vacuum evaporation method (FIG. 1C). (D) Finally, the nozzle plate 2 and the first plate 1 generated as described above are joined to complete an ink jet recording head.

Next, the above-described conditions and characteristics when the indium-tin oxide film 13 is formed in the manufacturing process of FIG. 1 will be described.

FIG. 3 is a characteristic diagram showing the relationship between the indium oxide crystal plane (222) / (400) intensity ratio of the indium / tin oxide film and the ink repellency revival time, showing the characteristics of the two types of ink. Have been. As shown in FIG.
22) / (400) As the intensity ratio increases, a higher water-repellent function is obtained, and it can be seen that the desired water-repellent condition is satisfied in the region of “1.1” or more. In addition,
The ink-repellent revival time is the time required for immersing a 1 cm square substrate in water, pulling it up with the substrate surface vertical, and then repelling and removing water from the entire substrate surface. A shorter time indicates higher water repellency.
From the characteristics shown in FIG. 3, the indium oxide crystal plane (222) /
(400) The strength ratio is preferably “1.5” or more, and “2.
It turns out that 0 or more is more preferable.

FIG. 4 is a characteristic diagram showing a relationship between the oxygen concentration at the time of sputtering and the consumption amount after 3000 times of wiping. As shown in the figure, the higher the oxygen concentration, the higher the abrasion resistance is obtained, and it can be seen that the desired abrasion resistance is obtained in the region of 30% or more.

FIG. 5 is a characteristic diagram showing the relationship between the oxygen concentration of sputtering and the indium oxide crystal plane (222) / (400) intensity ratio. As shown in the figure, 15%
An (222) / (400) intensity ratio of 1.1 or more was obtained at an oxygen concentration of 1.1, and a (222) / (400) intensity ratio of 1.1 or more was obtained at an oxygen concentration of 30% or more. . Therefore, the (222) / (400) intensity ratio is set to “1.1”.
With the above, a desired water-repellent function can be obtained, and by setting the oxygen concentration of sputtering to 30% or more, both the water-repellent function and the wear resistance can be satisfied.

Embodiment 2 FIG. In the first embodiment, an example in which a fluoroalkylsilane-based water-repellent film is used has been described. However, any other water-repellent agent may be used as long as the material of the material includes a group capable of chemically reacting with a hydroxyl group. May be used. The material of the nozzle plate is not limited to the silicon substrate, but may be a metal material such as stainless steel, or an organic polymer material such as glass or polysulfone.

Furthermore, although the face eject head has been described in the first embodiment, the edge eject head also exhibits excellent durability because of good adhesion between the indium tin oxide and the substrate. .

[0019]

As described above, according to the present invention, the indium oxide crystal plane (222) of the indium tin oxide film is formed.
Since the // (400) strength ratio is 1.1 or more, or the oxygen concentration of the sputtering gas is 30% or more, it is possible to enhance the water / oil repellency and the durability of the water / oil repellency. It has become.

[Brief description of the drawings]

FIG. 1 is a manufacturing process diagram of a nozzle plate of an inkjet head according to Embodiment 1 of the present invention. FIG. 3 is a perspective view of an inkjet head.

FIG. 2 is a perspective view of the inkjet head according to the first embodiment of the present invention.

FIG. 3 is a characteristic diagram showing a relationship between an indium oxide crystal plane (222) / (400) intensity ratio of an indium-tin oxide film and an ink-repellent property restoring time.

FIG. 4 is a characteristic diagram showing a relationship between an oxygen concentration at the time of sputtering and a consumption amount after 3000 times of wiping.

FIG. 5 is a characteristic diagram showing a relationship between an oxygen concentration of sputtering and an indium oxide crystal plane (222) / (400) intensity ratio.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 First plate 2 Nozzle plate 3 Supply part 4 Pressure chamber 5 Flow path 6 Nozzle hole 11 Silicon substrate 12 Silicon oxide film 13 Indium tin oxide film 14 Water repellent film

Claims (15)

[Claims] An indium-tin oxide film is formed on the surface of a substrate, and a water-repellent film formed by reacting and bonding a water-repellent substance having a site capable of reacting with a hydroxyl group is formed thereon. (40) with respect to the X-ray diffraction peak of the (222) plane of the indium oxide crystal in the indium tin oxide film.
The water-repellent article, wherein the intensity ratio of the X-ray diffraction peak on the 0) plane is 1.1 or more. 2. The water-repellent article according to claim 1, wherein the strength ratio is 1.5 or more. 3. The water-repellent article according to claim 1, wherein the strength ratio is 2.0 or more. 4. An indium / tin oxide film is formed on the surface of a base material using an indium / tin target under a condition that the oxygen concentration of a sputtering gas is 30% or more, and furthermore, it is possible to react with a hydroxyl group thereon. A water-repellent article comprising a water-repellent film formed by reaction-bonding a water-repellent substance having various sites. 5. An indium tin oxide film on a surface of a base material,
The sputtering conditions are adjusted so that the intensity ratio of the (400) plane X-ray diffraction peak to the (222) plane X-ray diffraction peak of the indium oxide crystal in the indium tin oxide film is 1.1 or more. A method for producing a water-repellent article, wherein a water-repellent material having a site capable of reacting with a hydroxyl group is reactively bonded thereon to form a water-repellent film. 6. The method for producing a water-repellent structural article according to claim 5, wherein the adjustment of the sputtering conditions is an adjustment of the oxygen concentration of the sputtering gas. 7. An indium / tin oxide film is formed on the surface of a base material using an indium / tin target under the condition that the oxygen concentration of a sputter gas is 30% or more, and the indium / tin oxide film can react with a hydroxyl group thereon. A method for producing a water-repellent article, comprising forming a water-repellent film by reacting a water-repellent substance having a site. 8. A repellent formed by forming an indium tin oxide film on at least a surface of the substrate having a nozzle on the ink ejection side, and further reacting and bonding a water repellent substance having a site capable of reacting with a hydroxyl group thereon. A water film is formed, and (22) of the indium oxide crystal in the indium-tin oxide film is formed.
2) The inkjet head, wherein the intensity ratio of the X-ray diffraction peak of the (400) plane to the X-ray diffraction peak of the plane is 1.1 or more. 9. The ink jet head according to claim 8, wherein said intensity ratio is 1.5 or more. 10. The ink jet head according to claim 8, wherein said intensity ratio is 2.0 or more. 11. An indium-tin target on at least a surface of a base material having a nozzle on an ink ejection side,
An indium tin oxide film is formed under the condition that the oxygen concentration of the sputtering gas is 30% or more, and a water repellent film formed by reacting a water repellent substance having a site capable of reacting with a hydroxyl group is formed thereon. An ink jet head, characterized in that: 12. An indium tin oxide film on at least a surface of the substrate having a nozzle on an ink ejection side, wherein (222) an indium oxide crystal in the indium tin oxide film.
The sputtering condition is adjusted so that the intensity ratio of the (400) plane X-ray diffraction peak to the X-ray diffraction peak of the plane becomes 1.1 or more. A method for manufacturing an ink jet head, comprising forming a water-repellent film by reacting water substances. 13. The method according to claim 1, wherein the adjustment of the sputtering condition is an adjustment of an oxygen concentration of a sputtering gas.
3. The method for manufacturing an inkjet head according to item 2. 14. An indium-tin target on at least a surface of a substrate having a nozzle on an ink ejection side,
Under the condition that the oxygen concentration of the sputtering gas is 30% or more, an indium-tin oxide film is formed, and a water-repellent substance having a site capable of reacting with a hydroxyl group is bonded thereon to form a water-repellent film. A method for manufacturing an ink jet head, which is characterized in that: 15. An ink jet printer comprising the ink jet head according to claim 7.