JPS591402B2 - 光重合法とその組成物 - Google Patents

光重合法とその組成物

Info

Publication number
JPS591402B2
JPS591402B2 JP51104203A JP10420376A JPS591402B2 JP S591402 B2 JPS591402 B2 JP S591402B2 JP 51104203 A JP51104203 A JP 51104203A JP 10420376 A JP10420376 A JP 10420376A JP S591402 B2 JPS591402 B2 JP S591402B2
Authority
JP
Japan
Prior art keywords
photopolymerization
initiating compound
photopolymerization initiating
compound
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51104203A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5237989A (en
Inventor
フランシス・アンソニー・ビア
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stauffer Chemical Co
Original Assignee
Stauffer Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stauffer Chemical Co filed Critical Stauffer Chemical Co
Publication of JPS5237989A publication Critical patent/JPS5237989A/ja
Publication of JPS591402B2 publication Critical patent/JPS591402B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0407—Processes of polymerisation
    • C08F299/0421—Polymerisation initiated by wave energy or particle radiation
    • C08F299/0428—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F299/0435—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S524/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S524/901—Electrodepositable compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
JP51104203A 1975-09-18 1976-08-31 光重合法とその組成物 Expired JPS591402B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/614,469 US4038164A (en) 1975-09-18 1975-09-18 Photopolymerizable aryl and heterocyclic glyoxylate compositions and process

Publications (2)

Publication Number Publication Date
JPS5237989A JPS5237989A (en) 1977-03-24
JPS591402B2 true JPS591402B2 (ja) 1984-01-12

Family

ID=24461380

Family Applications (2)

Application Number Title Priority Date Filing Date
JP51104203A Expired JPS591402B2 (ja) 1975-09-18 1976-08-31 光重合法とその組成物
JP60005997A Pending JPS60168702A (ja) 1975-09-18 1985-01-18 光重合開始剤

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP60005997A Pending JPS60168702A (ja) 1975-09-18 1985-01-18 光重合開始剤

Country Status (8)

Country Link
US (1) US4038164A (enExample)
JP (2) JPS591402B2 (enExample)
BE (1) BE846244A (enExample)
CA (1) CA1206031A (enExample)
DE (1) DE2639742C2 (enExample)
FR (1) FR2324648A1 (enExample)
IT (1) IT1078747B (enExample)
NL (1) NL7609724A (enExample)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH598288A5 (enExample) * 1975-12-23 1978-04-28 Ciba Geigy Ag
DE2703863A1 (de) * 1976-02-02 1977-08-11 Ppg Industries Inc Durch aktinisches licht polymerisierbare zusammensetzung
US4118298A (en) * 1977-04-15 1978-10-03 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylamide compositions
JPS53130779A (en) * 1977-04-20 1978-11-15 Mitsubishi Rayon Co Ltd Molded metallized plastic article and its manufacture
US4279720A (en) * 1978-07-13 1981-07-21 Ciba-Geigy Corporation Photocurable composition
US4475999A (en) * 1983-06-06 1984-10-09 Stauffer Chemical Company Sensitization of glyoxylate photoinitiators
US4519883A (en) * 1983-06-06 1985-05-28 Stauffer Chemical Company Sensitization of glyoxylate photoinitiators using a terphenyl compound
EP0127764A1 (en) * 1983-06-06 1984-12-12 Stauffer Chemical Company Sensitization of glyoxylate photoinitiators
EP0128321A1 (en) * 1983-06-08 1984-12-19 Stauffer Chemical Company Amine promotion of glyoxylate photoinitiators
US4507187A (en) * 1984-04-19 1985-03-26 Loctite Corporation Siloxane photoinitiators with aryoyl formate groups
US5084568A (en) * 1989-02-02 1992-01-28 Eli Lilly And Company Process for preparing acid halides
US5013854A (en) * 1989-02-02 1991-05-07 Eli Lilly And Company Process for preparing acid halides
JPH0513985U (ja) * 1991-07-27 1993-02-23 日本電気ホームエレクトロニクス株式会社 デイスクカ−トリツジケ−ス
WO1996035725A1 (en) * 1995-05-10 1996-11-14 Avery Dennison Corporation Pigmented, uv-cured, acrylic-based, pressure sensitive adhesives, and method for making same
CA2275667A1 (en) * 1997-01-30 1998-08-06 Ciba Specialty Chemicals Holding Inc. Non-volatile phenylglyoxalic esters
DE19913353A1 (de) 1999-03-24 2000-09-28 Basf Ag Verwendung von Phenylglyoxalsäureestern als Photoinitiatoren
TWI244495B (en) * 2000-08-14 2005-12-01 Ciba Sc Holding Ag Process for producing coatings siloxane photoinitiators
DE60319954T2 (de) * 2002-02-04 2009-04-09 Ciba Holding Inc. Fluorierte photoinitiatoren in hochfluorierten monomeren
KR100979660B1 (ko) * 2002-04-26 2010-09-02 시바 홀딩 인크 혼입 가능한 광개시제
ITVA20050032A1 (it) * 2005-05-13 2006-11-14 Lamberti Spa Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore
CN101523289A (zh) * 2006-10-03 2009-09-02 西巴控股有限公司 包含苯甲酰甲酸酯型光引发剂的可光固化组合物
JP4173526B1 (ja) 2007-05-16 2008-10-29 株式会社ソフケン 接続具
DE102008053778B4 (de) 2008-10-23 2020-08-06 Institut Dr. Foerster Gmbh & Co. Kg Prüfverfahren und Prüfvorrichtung zur Prüfung von langgestreckten Gegenständen mittels Durchlaufspule
US8507726B2 (en) 2008-11-03 2013-08-13 Basf Se Photoinitiator mixtures
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
JP2018024716A (ja) * 2014-12-26 2018-02-15 日立化成株式会社 光硬化性樹脂組成物、画像表示用装置及び画像表示用装置の製造方法
EP3507279B1 (en) * 2016-09-02 2020-10-14 IGM Group B.V. Polycyclic glyoxylates as photoinitiators
AT520240B1 (de) * 2017-07-27 2022-01-15 Univ Wien Tech Photoinitiatoren für lichthärtende Zusammensetzungen
CN112939779B (zh) * 2021-02-22 2024-03-26 湖北固润科技股份有限公司 适用于uv-led深层光聚合的对苯二甲酰甲酸酯型光引发剂及其制备方法
CN120865455A (zh) * 2024-04-30 2025-10-31 常州强力先端电子材料有限公司 一种光固化组合物及其应用

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2824084A (en) * 1955-05-26 1958-02-18 Eastman Kodak Co Light-sensitive, unsaturated polymeric maleic and acrylic derivatives
DE1949010C3 (de) * 1969-09-27 1979-11-29 Bayer Ag, 5090 Leverkusen Verwendung von halogenmethylierten Benzophenonen als Photopolymerisationsinitiatoren
US3888671A (en) * 1972-06-29 1975-06-10 Richardson Co Photoreactive compositions and products made therewith
US3930868A (en) * 1973-05-23 1976-01-06 The Richardson Company Light sensitive arylglyoxyacrylate compositions

Also Published As

Publication number Publication date
FR2324648A1 (fr) 1977-04-15
FR2324648B1 (enExample) 1983-04-22
IT1078747B (it) 1985-05-08
DE2639742A1 (de) 1977-03-24
JPS60168702A (ja) 1985-09-02
US4038164A (en) 1977-07-26
BE846244A (nl) 1977-03-15
DE2639742C2 (de) 1986-12-11
NL7609724A (nl) 1977-03-22
CA1206031A (en) 1986-06-17
JPS5237989A (en) 1977-03-24

Similar Documents

Publication Publication Date Title
JPS591402B2 (ja) 光重合法とその組成物
US3607693A (en) Polyester compounds which are hardenable by ultraviolet radiation in the presence of an alpha-substituted benzoin ether
US3720635A (en) Polyester moulding and coating masses which can be cured by ultraviolet irradiation
US3914166A (en) Butyric acid derivatives as novel photosensitizers
US4199420A (en) Alkoxymethylbenzophenones as photoinitiators for photopolymerizable compositions and process based thereon
US4447520A (en) Acylphosphine oxides and their use
JPS6011507A (ja) 光重合開始剤用の増感剤
JPH06298817A (ja) 重合方法
US3912606A (en) Photosensitive compositions containing benzoxazole sensitizers
US4080275A (en) Photopolymerizable benzoyl benzoate compositions
US3657088A (en) Moulding and coating masses hardenable by uv irradiation
US4040922A (en) Photopolymerizable polymeric compositions containing halogen containing heterocyclic compound
US3824284A (en) Butyric acid derivatives
US4118298A (en) Photopolymerizable aryl and heterocyclic glyoxylamide compositions
US3766111A (en) Polyester moulding and coating materials which can be set by ultraviolet irradiation
US3636026A (en) Benzoin-silyl-esters
US4519883A (en) Sensitization of glyoxylate photoinitiators using a terphenyl compound
NZ208675A (en) Photopolymerisation using alpha-halogenated benzene derivatives as photoinitiators
US3962055A (en) Photosensitive compositions containing benzothiazole sensitizers
EP0132867A1 (en) Alpha-halogenated aromatic compounds as photoinitiators
EP0542439B1 (en) Polymerisable compositions
EP0132868A1 (en) Alpha-halogenated aromatic compounds as photoinitiators
US2579095A (en) Photopolymerization process and photopolymerizable compositions of matter
US4165267A (en) Photo-polymerizable systems containing 2-haloacetophenone derivatives as photosensitizing agents
US3664937A (en) Photosensitizing molding and coating compositions with benzoin-silyl-esters