JPS59126620A - Method and device for manufacturing film - Google Patents

Method and device for manufacturing film

Info

Publication number
JPS59126620A
JPS59126620A JP104183A JP104183A JPS59126620A JP S59126620 A JPS59126620 A JP S59126620A JP 104183 A JP104183 A JP 104183A JP 104183 A JP104183 A JP 104183A JP S59126620 A JPS59126620 A JP S59126620A
Authority
JP
Japan
Prior art keywords
substrate
film
target
films
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP104183A
Other languages
Japanese (ja)
Inventor
Hidefumi Funaki
船木 秀文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Canon Anelva Corp
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp, Anelva Corp filed Critical Canon Anelva Corp
Priority to JP104183A priority Critical patent/JPS59126620A/en
Publication of JPS59126620A publication Critical patent/JPS59126620A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851Coating a support with a magnetic layer by sputtering

Landscapes

  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To enable to reduce the warpage of a magnetic recording medium by a method wherein the quantity of heat accumulated on a substrate when a film is formed on the first surface of the substrate and the quantity of heat which is accumulated when a film is formed on the second surface are almost equalized. CONSTITUTION:A roll 2, to be used to roll out a substrate 11, and a take-up roll 3 are provided inside a vacuum chamber 1, and substrate supporting electrodes 16-19 and targets 5-9 are arranged between guide rolls 4 and 4'. In order to form a magnetic film on both sides of the substrate 11 using the device, first, the first magnetic film 12 is formed on the first surface of the substrate 11 using the target 5. Subsequently, the first magnetic film 14 is formed on the second surface of the substrate 11 using the target 8. Then, the second magnetic film 15 is formed on said magnetic film 14 using the target 9, and then the second magnetic film 13 is formed on the first surface using the target 6. As a result, the total quantity of heat accumulated on the substrate 11 when a film is formed on the first surface of the substrate 11 and the total quantity of heat accumulate on the substrate can be almost equalized, thereby enabling to manufacture the recording medium having a little warpage.

Description

【発明の詳細な説明】 本発明は、基体の両面に各々薄膜を形成するための膜製
造方法及び該膜製造方法に使用する膜製造装置に関し、
特に、基体の両面に磁性層を有する磁気記録媒体の製造
方法及び該製造方法に使用する製造装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a film manufacturing method for forming thin films on both sides of a substrate, and a film manufacturing apparatus used in the film manufacturing method.
In particular, the present invention relates to a method of manufacturing a magnetic recording medium having magnetic layers on both sides of a substrate, and a manufacturing apparatus used in the manufacturing method.

近年、高密度磁気記録用の記録媒体の製造法として、ポ
リエステルフィルム等の基体に磁性の薄−膜を蒸着とか
スパッタ及びその池の方法により付着させる磁気記録媒
体の製造法の開発が行なわれている。ところが、フィル
ム状の薄い基体゛の両面に磁性層を形成する場合(=は
、基体の第1の面に磁性層を形成し、然る後に基体の第
2の面に磁性層を形成し1両面の記録媒体を製造するの
が一般的である。しかしながら、かかる工程により製造
した記録媒体はそりが発生し、高品質の情報の記録再生
が行なえず、使用に耐えない場合が多かった。
In recent years, as a method for manufacturing a recording medium for high-density magnetic recording, a method for manufacturing a magnetic recording medium has been developed in which a magnetic thin film is attached to a substrate such as a polyester film by vapor deposition, sputtering, or other methods. There is. However, when forming magnetic layers on both sides of a thin film-like substrate (=, a magnetic layer is formed on the first surface of the substrate, and then a magnetic layer is formed on the second surface of the substrate. It is common to manufacture double-sided recording media.However, recording media manufactured by this process tend to warp, cannot record and reproduce high-quality information, and are often unusable.

本発明の目的は、基体の両面に各、々膜を形成する膜製
造方法及び膜製造装置において、膜を形成した基体のそ
りを極小におさえることができる膜製造方法及び膜製造
装置を提供することにある。
An object of the present invention is to provide a membrane manufacturing method and a membrane manufacturing apparatus in which films are formed on both sides of a substrate, in which warping of a substrate on which a film is formed can be minimized. There is a particular thing.

本発明の別の目的は、基体の両面に各々磁性膜が形成さ
れた磁気記録媒体を製造するための方法及び装置におい
て、ffl気記録媒体のそりを極小におさえることがで
きる磁気記録媒体の製造方法及び製造装置を提供するこ
とにある。
Another object of the present invention is to manufacture a magnetic recording medium that can minimize warpage of the ffl recording medium in a method and apparatus for manufacturing a magnetic recording medium in which magnetic films are formed on both sides of a substrate. An object of the present invention is to provide a method and a manufacturing apparatus.

本発明によれば、基体の両面に各々膜を形成する膜製造
方法において、前記基体の一方の面に第1の膜を形成す
る第1の工程と、該第1の工程の後に、前記基体の他方
の面に第1の膜を形成する第2の工程と、該第2の工程
の後に。
According to the present invention, in a film manufacturing method in which films are formed on both sides of a substrate, a first step of forming a first film on one surface of the substrate, and after the first step, a second step of forming a first film on the other surface of the wafer, and after the second step.

前記基体の他方の面に第2の膜を形成する第6の工程と
、該第6の工程の後に、前記基体の一方の面に第2の膜
を形成する第4の工程とを含むことを特・徴とする膜製
造方法が得られる。
A sixth step of forming a second film on the other surface of the base, and a fourth step of forming a second film on one surface of the base after the sixth step. A method for producing a membrane having the following characteristics can be obtained.

更に本発明によれば、基体の両面に各々膜を形成するた
めの膜製造装置において、真空容器と、該真空容器内の
所定方向に前記基体を移動させるための基体送り機構と
、前記基体の移動始端帯りに設けられ、前記基体の一方
の面に第1の膜を形成するための第1のターゲットと。
Further, according to the present invention, a film manufacturing apparatus for forming films on both sides of a substrate includes a vacuum container, a substrate feeding mechanism for moving the substrate in a predetermined direction within the vacuum container, and a substrate transport mechanism for moving the substrate in a predetermined direction within the vacuum container. a first target provided on the movement starting end band and for forming a first film on one surface of the substrate;

該第1のターゲットよりも前記基体の移動路端寄りに設
けられ、前記基体の他方の面に第1の膜を形成するため
の第2のターゲットと、該第2のターゲットよりも前記
基体の移動路端寄りに設けられ、前記基体の他方の面に
第2の膜を形成するための第6のターゲットと、該第6
のターゲットよりも前記基体の移動路端寄りに設けられ
、前記基体の一方の面に第2の膜を形成するための第4
のターゲットとを備えたことを特徴とする膜製造装置が
得られる。
a second target provided closer to the end of the movement path of the substrate than the first target and for forming a first film on the other surface of the substrate; a sixth target provided near the end of the movement path for forming a second film on the other surface of the base;
A fourth film is provided closer to the end of the moving path of the base than the target, and is for forming a second film on one surface of the base.
A film manufacturing apparatus is obtained, which is characterized in that it is equipped with a target.

以下図面を参照して本発明の詳細な説明する。The present invention will be described in detail below with reference to the drawings.

第1図は従来の磁気記録媒体製造用連続スパッタ装置の
概念図である。図中、1は真空容器であり、該真空容器
1は図示されていない真空ポンプにより10  Tor
r台の圧力に排気された後2図示されてないアルゴンガ
ス導入系よりアルゴンガス導入系れ5X10 ’Tor
r 〜lX1O−2Torrの範囲の圧力に保たれてい
る。2は送り出しロールであり、フィルム状の基体(例
えばポリエステルフィルム等)11が巻かれている。
FIG. 1 is a conceptual diagram of a conventional continuous sputtering apparatus for manufacturing magnetic recording media. In the figure, 1 is a vacuum container, and the vacuum container 1 is heated to 10 Tor by a vacuum pump (not shown).
After being evacuated to a pressure of R, the argon gas is introduced from the argon gas introduction system (not shown) to 5X10' Tor.
The pressure is maintained in the range r to lX1O-2 Torr. Reference numeral 2 denotes a delivery roll, on which a film-like substrate 11 (eg, polyester film, etc.) is wound.

送り出しロール2より出た基体11はガイドロール4,
4“を経由して巻き取りロール6に巻き取られる。即ち
、 2.3.4及び4゛は、真空容器1内の所定方向に
基体11を移動させるための基体送り機構を構成してい
る。真空容器1中には、送り出しロール2から巻き取り
ロール6に基体が移動する途中に、ターゲット5.ター
ゲット6、基体支持電極7.ターゲット8.ターゲット
9.および基体支持電極1oが配置されている。各ター
ゲットには図示されていないAC電源またはDC電源が
接続され電力が供給され、各ターゲットと真空容器1と
の間でグロー放電が行なわれる。この第1図の装置によ
り。
The base body 11 that has come out from the feed roll 2 is guided by the guide roll 4,
4" and is wound up onto the take-up roll 6. That is, 2.3.4 and 4" constitute a substrate feeding mechanism for moving the substrate 11 in a predetermined direction within the vacuum container 1. In the vacuum container 1, a target 5, a target 6, a substrate supporting electrode 7, a target 8, a target 9, and a substrate supporting electrode 1o are arranged in the middle of the movement of the substrate from the delivery roll 2 to the take-up roll 6. An AC power source or a DC power source (not shown) is connected to each target to supply power, and glow discharge is performed between each target and the vacuum vessel 1. With the apparatus shown in FIG.

基体11には第2図に示した如く、薄膜が形成される。A thin film is formed on the base 11 as shown in FIG.

すなわち、基体11の第1の面には。That is, on the first surface of the base 11.

第1図に示したターゲット5により第1の磁性膜12が
形成され、引き続いてターゲット6により第2の磁性膜
13(これは磁性膜12と実質的に異なる膜である。)
が形成される。さらに基体11の第2の面には、同様に
、ターゲット8により第1の磁性膜14(これは磁性膜
12と実質的に同じ膜である。)、ターゲット9により
第2の磁性膜15(これは磁性膜16と実質的に同じ膜
である。)が形成される。このように。
A first magnetic film 12 is formed by the target 5 shown in FIG. 1, and then a second magnetic film 13 (this is a film substantially different from the magnetic film 12) is formed by the target 6.
is formed. Further, on the second surface of the base 11, a first magnetic film 14 (which is substantially the same film as the magnetic film 12) is formed by the target 8, and a second magnetic film 15 (substantially the same film as the magnetic film 12) is formed by the target 9. This is substantially the same film as the magnetic film 16) is formed. in this way.

基体の両面にそれぞれ2層の磁性膜が形成されることに
なる。
Two layers of magnetic films are formed on each side of the base.

しかるに、かかる製造法により製造したものは大きなそ
りが発生し磁気記録媒体として使用に耐えない。現在の
ところそりが発生する理由は充分に解明されていないが
、基体11の第1の面に磁性膜を形成する場合には基体
表面の熱放射には表面から放射される熱線と、基体11
を通り基体支持電極7に放射される熱線とがあると考え
られる。しかるに基体11−の第2の面に磁性膜を形成
する場合は、基体表面からの熱線の放射は基体11の第
1の面の場合と同様と考えられる。しかし、基体11を
通り基体支持電極10側に放射される熱線について考え
ると。
However, products manufactured by this manufacturing method suffer from large warpage and cannot be used as magnetic recording media. At present, the reason why warpage occurs is not fully understood, but when forming a magnetic film on the first surface of the substrate 11, heat radiation from the substrate surface includes heat rays radiated from the surface and heat rays radiated from the substrate 11.
It is considered that there are heat rays that pass through the substrate support electrode 7 and are radiated to the substrate support electrode 7. However, when a magnetic film is formed on the second surface of the substrate 11-, the radiation of heat rays from the surface of the substrate is considered to be the same as in the case of the first surface of the substrate 11. However, if we consider the heat rays that pass through the base 11 and are radiated to the base support electrode 10 side.

基体11を通ってきた熱線の一部は基体支持電極10に
放射されるが、一部は基体11の第1の面に既にイ」着
している磁性膜により反射される。反射された熱線の一
部は基体11の第2の面から放射されるが、一部は基体
11の第2の面の磁性膜により反射される。このように
熱線は反射を繰り返すうちに基体11に吸収され。
A portion of the heat rays passing through the substrate 11 is radiated to the substrate supporting electrode 10, but a portion is reflected by the magnetic film already attached to the first surface of the substrate 11. Some of the reflected heat rays are emitted from the second surface of the base 11, and some are reflected by the magnetic film on the second surface of the base 11. In this way, the heat rays are absorbed by the base 11 as they are repeatedly reflected.

シ1(体には熱が蓄積されると考えられる。1 (Heat is thought to accumulate in the body.

以」−の説明から明らかなようにJ%体11の第1の面
に成膜する場合と、引き続き基体11の第2の面に成膜
する場合とで、基体11の温度上昇が異なると考えられ
る。このことが、第1図に示した製造法により製造した
磁気記録媒体にそりが発生する原因の一つと考えられる
。更にその曲にもそりの発生する原因もあると思われる
が現在のところ不明である。
As is clear from the explanation below, the temperature rise of the substrate 11 is different when the film is formed on the first surface of the J% body 11 and when the film is subsequently formed on the second surface of the substrate 11. Conceivable. This is considered to be one of the causes of warping in the magnetic recording medium manufactured by the manufacturing method shown in FIG. Furthermore, there may be a cause for warping in that song as well, but it is currently unknown.

以北の説明でもわかるように基体の第1の面に成膜する
時と基体の第2の面に成膜する時とで基体に蓄積される
熱の社を同程度にできれば磁気記録媒体のそりは少なく
できるはずである。
As can be seen from the following explanation, if the amount of heat accumulated on the substrate can be made to be the same when forming a film on the first surface of the substrate and when forming a film on the second surface of the substrate, the magnetic recording medium will be It should be possible to reduce the amount of warping.

第6図は本発明による磁気記録媒体の製造装置の一実施
例である。第6図中の番号の中で第1図と同一番号を付
したものは第1図で説明したものと同一か、もしくは機
能が同じものを表わしている。第6図ではターゲットの
配置をターゲット5.ターゲット8.ターケント9.タ
ーゲツト6の順で配置し、各ターゲットは第1図で説明
したと同様に真空容器1との間にグロー放電を行ってい
るとする。また、16.17゜18.19は2図からも
明らかなように基体支持電極である。
FIG. 6 shows an embodiment of a magnetic recording medium manufacturing apparatus according to the present invention. Among the numbers in FIG. 6, the same numbers as those in FIG. 1 are assigned the same numbers as those explained in FIG. 1, or represent the same functions. In Figure 6, the target placement is set to target 5. Target 8. Tarkent 9. It is assumed that the targets 6 are arranged in this order, and each target is performing a glow discharge between it and the vacuum vessel 1 in the same manner as explained in FIG. Also, as is clear from Figure 2, 16.17° and 18.19 are substrate supporting electrodes.

第4図は第6図の装置により形成される磁性膜の順序を
示したものである。すなわち、基体11の第1の面にタ
ーゲット5により第1の磁性膜12が形成され、続いて
基体11の第2の面にターゲット8により第1の磁性膜
14(これは磁性膜12と実質的に同じ膜である。)が
形成され、その上にターゲット9により第2の磁性膜1
5(これは磁性膜12.14と実質的に異15と実a的
に同じ膜である。)が形成される。
FIG. 4 shows the order of magnetic films formed by the apparatus shown in FIG. That is, the first magnetic film 12 is formed on the first surface of the base 11 by the target 5, and then the first magnetic film 14 (this is substantially the same as the magnetic film 12) is formed on the second surface of the base 11 by the target 8. ) is formed, and a second magnetic film 1 is formed thereon by a target 9.
5 (which is substantially different from the magnetic films 12 and 14 and substantially the same as the magnetic films 15) is formed.

このようにすることにより基体11の第1の面に成膜す
る時の基体11に蓄積される総熱量と基体11の第2の
面に成膜する時の基体に蓄積される総熱量とは完全に同
量とはならないが。
By doing this, the total amount of heat accumulated in the substrate 11 when forming a film on the first surface of the substrate 11 and the total amount of heat accumulated in the substrate when forming a film on the second surface of the substrate 11 are as follows. It's not exactly the same amount, though.

かなり近ずけることができ、第1図の場合に比してそり
の少ない磁気記録媒体の製造が可能である。
It is possible to produce a magnetic recording medium with less warpage than in the case shown in FIG. 1.

以−ヒ、!i(体の両面に各々、2層の磁性膜を形成す
る場合について説明したが、基体の両面:二各々単層の
磁性膜を形成する場合にも本発明は著しい効果を示す。
I-hi! Although the case in which two magnetic films are formed on both sides of the substrate has been described, the present invention also exhibits remarkable effects when two single-layer magnetic films are formed on each of both sides of the substrate.

以下、この場合の本発明の詳細な説明する。The present invention in this case will be described in detail below.

第5図は本発明の別の実施例を示すものであり、第5図
の実施例と異なるのは4個のターゲット6.9がすべて
同一の磁性材からなることである。すなわち、同じ磁性
膜を基体11の各面について各々2回に分けて成膜する
ことにより、基体11の受ける熱の影響を第3図の場合
と同様にしようとするものである。
FIG. 5 shows another embodiment of the present invention, which differs from the embodiment of FIG. 5 in that all four targets 6.9 are made of the same magnetic material. That is, by forming the same magnetic film twice on each surface of the base 11, the effect of heat on the base 11 is made similar to that in the case of FIG. 3.

第6図は第5図の装置により形成される磁性膜の順序を
示したものであり、磁性膜13.13“。
FIG. 6 shows the order of magnetic films formed by the apparatus of FIG. 5, with magnetic films 13, 13''.

15.15’は同・−磁性材であるが、基体の受ける熱
的影響は第6図及び第4図で説明したので同様であるこ
とは容易に理解できよう。
15 and 15' are the same magnetic materials, and it can be easily understood that the thermal influence on the substrate is the same as that explained in FIGS. 6 and 4.

また、第7図に本発明の別の実施例を示したが、この実
施例の場合、第5図の場合と異なるのは基体11の第2
の面の成膜を2個のターゲットに分けて行なわず、1個
のターゲット9で必要な膜厚の磁性膜を形成する点であ
る。即ち。
Another embodiment of the present invention is shown in FIG. 7, but this embodiment is different from the case of FIG.
The point is that the magnetic film of the required thickness is formed using one target 9 instead of forming the film on the surface using two targets. That is.

本実施例の場合、基体11の第2の面の成膜の時間の経
過が異なるのみで、基体11の受ける熱的影響は第3図
や第5図の場合とほぼ同様と考えてよい。このことは、
第8図に示した本実施例による磁性膜の形成順序をみる
と、容易に理解されるであろう。すなわち、第8図の磁
性膜16は磁性膜13’、15’のほぼ半分の膜厚を有
しており、第8図と第6図を比較すればわかるように成
膜の時間的経過が異なるのみである。
In the case of this embodiment, the only difference is the elapse of time for film formation on the second surface of the substrate 11, and the thermal influence on the substrate 11 can be considered to be almost the same as in the cases of FIGS. 3 and 5. This means that
The order of forming the magnetic film according to this embodiment shown in FIG. 8 will be easily understood. That is, the magnetic film 16 in FIG. 8 has approximately half the thickness of the magnetic films 13' and 15', and as can be seen by comparing FIG. 8 and FIG. 6, the time course of film formation is They are only different.

以北のように本発明は、基体の両面に磁性膜を形成する
場合に基体の第1の面と第2の面への成;摸時に基体が
受ける熱の影響をほぼ等しくすることにより、?a磁気
記録媒体そりを著しく小さくしようとするものである。
As described above, the present invention is capable of forming a magnetic film on both sides of a substrate by making the effects of heat on the substrate substantially equal during the formation on the first and second surfaces of the substrate; ? a This is an attempt to significantly reduce the warpage of a magnetic recording medium.

本発明で製造した磁気記録媒体と第1図に示した製造法
により製造した固気記録・媒体とのそりのはを比較する
と、第9図に示すように水平面21上に直径5.25イ
ンチ(約133mn)のディスクである磁気記録媒体2
0をおいた時、水平面から一番師れた高さを11とする
と、第1図のものは、h−20〜50wであり9本発明
のものは、h−0〜5Bとなり、一本発明では磁気記録
媒体のそりが著しく小さくなっていることがわかる。
Comparing the warpage of the magnetic recording medium manufactured according to the present invention and the solid air recording medium manufactured by the manufacturing method shown in FIG. (approximately 133 mm) magnetic recording medium 2
When 0 is placed, and the highest height from the horizontal plane is 11, the one in Figure 1 is h-20 to 50W, 9 The one of the present invention is h-0 to 5B, and one It can be seen that in the invention, the warpage of the magnetic recording medium is significantly reduced.

以−ヒ説明したように9本発明によれば、基体の両面に
各々膜を形成する膜製造方法及び薄膜製造装置であって
、膜が形成された基体のそりを極小におさえることがで
きる膜製造方法及び膜製造装置を得ることができる。
As explained below, according to the present invention, there is provided a film manufacturing method and a thin film manufacturing apparatus for forming films on both sides of a substrate, which can minimize warping of the substrate on which the film is formed. A manufacturing method and a membrane manufacturing apparatus can be obtained.

更に本発明によれば、基体の両面に各、々磁性膜が形成
された磁気記録媒体のそりを極小におさえることができ
る磁気記録媒体の製造方法及び製造装置を得ることがで
き、従って、高品質の情報の記録再生を行なうことがで
きる高品質の磁気記録媒体を得ることができ、工業的価
値は極めて太きい。
Further, according to the present invention, it is possible to obtain a method and apparatus for manufacturing a magnetic recording medium that can minimize the warpage of a magnetic recording medium in which magnetic films are formed on both sides of a substrate. A high-quality magnetic recording medium capable of recording and reproducing quality information can be obtained, and the industrial value is extremely large.

なお1本発明は、上述した実施例に限定されず、該実施
例に種々の変形や変更を施したものをも含むことはもち
ろんである。例えば、基体支持電極の形状や基体送り機
構を変更しても本発明の主旨を逸脱しないことは明らか
である。
Note that the present invention is not limited to the embodiments described above, and of course includes various modifications and changes to the embodiments. For example, it is clear that the shape of the substrate supporting electrode or the substrate feeding mechanism may be changed without departing from the spirit of the present invention.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の磁気記録媒体の製造装置の概略構成を示
した図、第2図は第1図の装置による磁性膜の形成順序
を説明するための図、第3図、第5図及び第7図はそれ
ぞれ本発明の磁気記録媒体の製造装置の概略構成を示し
た図、第4図、第6図及び第8図はそれぞれ第6図、第
5図及び第7図の装置による1aP4:膜の形成順序を
説明するための図、第9図は磁気記録媒体のそりを示す
図である。 1・・・真空容器、2・・・送り出しロール、3・・・
巻き取りロール、4及び41・・・ガイドロール、5゜
6.8及び9・・・ターゲット、  7.10.16.
17.18及び19・・・基体支持電極、11・・・基
体、 12.13゜13’、14.15及び151・・
・磁性膜、20・・・磁気記録媒体、21・・・水平面
。 第1図 第4図 /′
FIG. 1 is a diagram showing a schematic configuration of a conventional magnetic recording medium manufacturing apparatus, FIG. 2 is a diagram for explaining the order of forming a magnetic film by the apparatus of FIG. 1, FIGS. FIG. 7 is a diagram showing a schematic configuration of the magnetic recording medium manufacturing apparatus of the present invention, and FIGS. 4, 6, and 8 are diagrams showing 1aP4 using the apparatus shown in FIGS. 6, 5, and 7, respectively. : A diagram for explaining the order of film formation. FIG. 9 is a diagram showing warpage of a magnetic recording medium. 1... Vacuum container, 2... Delivery roll, 3...
Take-up roll, 4 and 41...Guide roll, 5°6.8 and 9...Target, 7.10.16.
17.18 and 19...substrate supporting electrode, 11...substrate, 12.13°13', 14.15 and 151...
- Magnetic film, 20... Magnetic recording medium, 21... Horizontal surface. Figure 1 Figure 4/'

Claims (1)

【特許請求の範囲】 1、基体の両面に各々膜を形成する膜製造方法において
、前記基体の一方の面に第1の膜を形成する第1の工程
と、該第1の工程の後に、前記基体の他方の面に第1の
膜を形成する第2の工程と、該第2の工程の後に、前記
基体の他方の面に第2の膜を形成する第3の工程と、該
第6の工程の後に、前記基体の一方の面に第2の膜を形
成する第4の工程とを含むことを特徴とする膜製造方法
。 2、第1及び第4の工程において基体の一方の面に形成
される第1及び第2の膜が実質的に異なる膜であり、第
2及び第3の工程において基体の他方の面に形成される
第1及び第2の膜が実質的に異なる膜である特許請求の
範囲第1項記載の膜製造方法。 3、第1及び第4の工程において基体の一方の面に形成
される第1及び第2の膜が実質的に同じ膜であり、第2
及び第6の工程において基体の他方の面に形成される第
1及び第2の膜が実質的に同じ膜である特許請求の範囲
第1項記載の膜製造方法。 4、第2及び第6の工程が連続的な一工程として行なわ
れる特許請求の範囲第3項記載の膜製造方法。 5、基体の両面に各々膜を形成するための膜製造装置に
おいて、真空容器と、該真空容器の所定方向に前記基体
を移動きせるための基体送り機構と、前記基体の移動始
端寄りに設けられ。 前記基体の一方の面に第1の膜を形成させるための第1
のターゲット、該第1のターゲットよりも前記基体の移
動終端寄りに設けられ、前記基体の他方の面に第1の膜
を形成するための第2のターゲットと、該第2のターゲ
ットよりも前記基体の移動終端寄りに設けられ、前記基
体、〆の他方の面に第2の膜を形成するための第6のタ
ーゲットと、該第6のターゲットよりも前記基体の移動
路端寄りに設けられ、@記基体の一方の面に第2の膜を
形成するための第4のターゲットとを備えたことを特徴
とする膜製造装置。 6、第1及び第4のターゲットによって基体の一方の面
に形成される第1及び第2の膜が実質的に異なる膜であ
り、第2及び第3のターゲットによって基体の他方の面
に形成される第1及び第2の膜が実質的に異なる膜であ
る特許請求の範囲第5項記載の膜製造装置。 Z第1及び第4のターゲットによって基体の一方の面に
形成される第1及び第2の膜が実質的に同じ膜であり、
第2及び第3のターゲットによって形成される第1及び
第2の膜が実質的に同じ膜である特許請求の範囲第5項
記載の膜製造装置。 8、第2及び第6のターゲットが一つのターゲットによ
って兼用されている特許請求の範囲第7項記載の膜製造
装置。
[Claims] 1. A film manufacturing method in which films are formed on both sides of a substrate, including a first step of forming a first film on one surface of the substrate, and after the first step, a second step of forming a first film on the other surface of the substrate; a third step of forming a second film on the other surface of the substrate after the second step; A method for producing a film, the method comprising the step of forming a second film on one surface of the substrate after step 6. 2. The first and second films formed on one surface of the substrate in the first and fourth steps are substantially different films, and the films are formed on the other surface of the substrate in the second and third steps. 2. The method of manufacturing a membrane according to claim 1, wherein the first and second membranes are substantially different membranes. 3. The first and second films formed on one surface of the substrate in the first and fourth steps are substantially the same film;
The method for producing a film according to claim 1, wherein the first and second films formed on the other surface of the substrate in the sixth step are substantially the same film. 4. The film manufacturing method according to claim 3, wherein the second and sixth steps are performed as one continuous step. 5. A film manufacturing apparatus for forming films on both sides of a substrate, including a vacuum container, a substrate feeding mechanism for moving the substrate in a predetermined direction of the vacuum container, and a substrate feeding mechanism provided near the starting end of movement of the substrate. . a first film for forming a first film on one surface of the substrate;
a second target provided closer to the movement end of the base body than the first target and for forming a first film on the other surface of the base body; a sixth target provided near the end of the movement of the substrate for forming a second film on the other surface of the substrate; and a sixth target provided closer to the end of the movement path of the substrate than the sixth target. , and a fourth target for forming a second film on one surface of a substrate. 6. The first and second films formed on one surface of the substrate by the first and fourth targets are substantially different films, and the films are formed on the other surface of the substrate by the second and third targets. 6. The film manufacturing apparatus according to claim 5, wherein the first and second films are substantially different films. Z The first and second films formed on one surface of the base by the first and fourth targets are substantially the same film,
6. The film manufacturing apparatus according to claim 5, wherein the first and second films formed by the second and third targets are substantially the same film. 8. The film manufacturing apparatus according to claim 7, wherein a single target serves as the second and sixth targets.
JP104183A 1983-01-10 1983-01-10 Method and device for manufacturing film Pending JPS59126620A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP104183A JPS59126620A (en) 1983-01-10 1983-01-10 Method and device for manufacturing film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP104183A JPS59126620A (en) 1983-01-10 1983-01-10 Method and device for manufacturing film

Publications (1)

Publication Number Publication Date
JPS59126620A true JPS59126620A (en) 1984-07-21

Family

ID=11490471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP104183A Pending JPS59126620A (en) 1983-01-10 1983-01-10 Method and device for manufacturing film

Country Status (1)

Country Link
JP (1) JPS59126620A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62236141A (en) * 1986-04-07 1987-10-16 Matsushita Electric Ind Co Ltd Production of magnetic recording medium

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785972A (en) * 1980-11-17 1982-05-28 Anelva Corp Thin film former

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785972A (en) * 1980-11-17 1982-05-28 Anelva Corp Thin film former

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62236141A (en) * 1986-04-07 1987-10-16 Matsushita Electric Ind Co Ltd Production of magnetic recording medium

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