JPS59123247A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS59123247A
JPS59123247A JP22975182A JP22975182A JPS59123247A JP S59123247 A JPS59123247 A JP S59123247A JP 22975182 A JP22975182 A JP 22975182A JP 22975182 A JP22975182 A JP 22975182A JP S59123247 A JPS59123247 A JP S59123247A
Authority
JP
Japan
Prior art keywords
semiconductor device
cutting
semiconductor
frame
long frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22975182A
Other languages
Japanese (ja)
Inventor
Tadashi Katsura
正 桂
Takayoshi Shimomura
下村 隆義
Koji Yanagiya
柳谷 孝二
Mamoru Miyamoto
守 宮本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP22975182A priority Critical patent/JPS59123247A/en
Publication of JPS59123247A publication Critical patent/JPS59123247A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54473Marks applied to semiconductor devices or parts for use after dicing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Abstract

PURPOSE:To simplify the conveyance system for tests and markings without needing the supply in alignment according to the parts feeder as well as to prevent the deterioration of the plating parts on external leads by a method wherein a long frame is used. CONSTITUTION:Tie bar parts 6 are separated by cutting in the tie bar cutting process after the processes of foil-coating and die-bonding, wire-bonding, molding and solder dipping. A long frame is severed in the standard length, two out of three external leads are separated by cutting from a frame 7, and each of the severed frames is set as a semiconductor device series. Regarding the length to cut the long frame in the specified length, the degree that fifty pieces of semiconductor elements are included each strip is the optimum. In the test-marking process, elements are supplied to the tester in the unit of the semiconductor device strips and the positioning for the measuring is carried out using guide holes 81. The positions on the water are kept in the unit of the semiconductor device strip and each element can be dealt with relating with other elements, resulting in enabling to prevent the deteriorating of plating on the armored leads without using the parts feeder.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は半導体装置の製造方法に関するものであり、特
に組立を完了した半導体装置についての合理的な製造方
法を提供するものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a method of manufacturing a semiconductor device, and in particular provides a rational method of manufacturing a semiconductor device that has been assembled.

〔従来技術〕[Prior art]

従来の半導体装置の製造方法は、トランジスタを例とす
れば、第1図に示す様な、いわゆるフレーム(1)を用
い、このパッド部分(2)に半導体素子(図示せず)を
熱融着により公知の方法で載置し、しかるのち、半導体
素子とフレーム(1)のフィンガ部(3)とを、細い金
線(図示せず)を用いて公知である熱圧着法で接続し、
電気的接続を得る。
Taking a transistor as an example, the conventional manufacturing method of a semiconductor device uses a so-called frame (1) as shown in Fig. 1, and heat-seals a semiconductor element (not shown) to this pad portion (2). Then, the semiconductor element and the finger portion (3) of the frame (1) are connected by a known thermocompression bonding method using a thin gold wire (not shown).
Obtain an electrical connection.

その後、半導体素子と内部の金細線を保護するため、エ
ポキシ樹脂等を用いてこれらを包囲成形する。成形は第
1図の1点鎖線に示す範囲でなされ、これが第2図に示
すエポキシ樹脂(5)となる。
Thereafter, in order to protect the semiconductor element and the thin gold wire inside, they are surrounded and molded using epoxy resin or the like. The molding is carried out in the area shown by the dashed line in FIG. 1, and this becomes the epoxy resin (5) shown in FIG. 2.

その後タイバ部(6)(第2図に斜線部で示す)、及び
枠(7)のやや上部を、この後者については同図にA−
B線で示すあたりから切断分離し、外部リード線(4)
を半田材などで外装のメッキをなし、第3図に示す様な
トランジスタを得る。ここまでが、いわゆる従来方法に
よるトランジスタの組立方法である。
After that, the tie bar part (6) (shown as a shaded area in Figure 2) and the slightly upper part of the frame (7) are removed.
Cut and separate from the area indicated by line B, and connect the external lead wire (4)
The exterior is plated with a solder material or the like to obtain a transistor as shown in FIG. The steps up to this point are the so-called conventional method for assembling a transistor.

こののち、切断分離されたトランジスタは、いわゆるパ
ーツフィーダを用いて整列され、自動選別機を用いて特
性の良、不良、及び、直流電流増巾率(hpE)に応じ
て、さらに必要に応じ耐圧その他の電気特性に応じて一
般に5〜10程度の分類がな1される。分類の後、さら
にパーツフィーダを用い、分類毎に形名の捺印とhFE
などの分類内容の表示、製造ロフト番号の表示を行なう
。さらに必要に応じ、プリント基板上の機器組立の便宜
をはかるため、外部リード線(4)を成形のうえ、包装
、出荷されることとなる。
Thereafter, the cut and separated transistors are arranged using a so-called parts feeder, and an automatic sorter is used to sort them according to their good or bad characteristics, as well as their direct current amplification factor (hpE), and if necessary, their breakdown voltage. Generally, about 5 to 10 classifications are made depending on other electrical characteristics. After the classification, a parts feeder is used to stamp the model name and hFE for each classification.
Displays the classification contents such as, and the manufacturing loft number. Furthermore, if necessary, in order to facilitate device assembly on the printed circuit board, external lead wires (4) are formed, packaged, and shipped.

この様な従来のトランジスタ製造方法は次の様な非合理
性乃至は不具合点を有している。
Such conventional transistor manufacturing methods have the following irrationality or drawbacks.

(1)組立後の、選別、捺印、外部リード線成形の各作
業の都度、パーツフィーダによる整列を必要とする。
(1) It is necessary to align the parts using a parts feeder each time after assembly, such as sorting, stamping, and forming external lead wires.

(2)パーツフィーダによる整列ではトランジスタに相
互の振動によるストレスが加わり、外部リード線のメッ
キに悪影響を及はす。
(2) Alignment using a parts feeder applies stress to the transistors due to mutual vibration, which adversely affects the plating of the external lead wires.

(3)  パーツフィーダによりトランジスタの整列、
供給を行なう(こは、供給系の製作、調整に経験を必要
とし、本質的に自動化、無人化が難かしい。
(3) Alignment of transistors by parts feeder,
Supply (this requires experience in manufacturing and adjusting the supply system, and is essentially difficult to automate or unmanned.

(4)従来のフレームは短−nh状であり、一般にトラ
7ジフ250個程度相当の長さを有し、組立に際し、フ
レームの供給、排出の機能を必要とする。
(4) Conventional frames have a short-nh shape and generally have a length equivalent to about 250 tiger 7 jiffs, and require functions for supplying and discharging frames during assembly.

さらに組立機の停止の相当の部分がこの機構に支配され
る。
Furthermore, a considerable portion of the assembly machine's stoppage is controlled by this mechanism.

〔発明の概要〕[Summary of the invention]

本発明は、ここに列挙された欠点を除くために、従来の
フレーム長からすれは、はぼ無限遠の、トランジスタ換
算にして10万個から100万個相当程度の長尺のフレ
ームを用いるようにした、新規な半導体装置の製造方法
を提供しようとするものである。
In order to eliminate the drawbacks enumerated here, the present invention uses a long frame that is almost infinitely far away from the conventional frame length, and is equivalent to 100,000 to 1 million transistors. The present invention aims to provide a novel method for manufacturing a semiconductor device.

〔発明の実施例〕[Embodiments of the invention]

以下、この発明の一実施例を図について説明する。 An embodiment of the present invention will be described below with reference to the drawings.

第4図は本発明の一実施例による半導体装置の製造方法
をフロー表示したもので、以下同図を用いて製造工程に
ついて順次説明する。
FIG. 4 is a flowchart showing a method for manufacturing a semiconductor device according to an embodiment of the present invention, and the manufacturing steps will be sequentially explained below using the same diagram.

箔材・グイポンダニ程(10)では、長尺のフレーム、
いわゆるフープ状のフレームを、箔材・ダイボンダ部に
供給し、半導体素子をフレームのパッド部(2)に載置
する。ワイヤポンダニ程(11)ではフレームのフィン
ガ部(3)と半導体素子をワイヤボンダにより接続させ
る。さらにモールド工程f121では第2図1に示した
のと同様に、エポキシ樹脂(5)により封止する。パリ
取り工程03)ではモールドにより発生したいわゆるパ
リに対し、バリ数機を用いていわゆるパリ取りを行なう
。半田デイツプ工程(14)では外部リード(4)に半
田デイツプ装置で外装メッキを施し、その後タイバーカ
ット工程(15)で第2図で示すタイバ一部t6) 7
>N’切断分離される。ここまでが長尺で一貫的に加工
が施されるSlの工程であり、この後節2の工程に入る
For foil material/guipondani process (10), long frames,
A so-called hoop-shaped frame is supplied to the foil/die bonder section, and the semiconductor element is placed on the pad section (2) of the frame. In the wire bonding step (11), the finger portions (3) of the frame and the semiconductor element are connected using a wire bonder. Furthermore, in a molding step f121, sealing is performed with an epoxy resin (5) in the same manner as shown in FIG. 2. In the deburring step 03), so-called deburring is performed using a deburring machine to remove deburrs generated by the mold. In the solder dip process (14), exterior plating is applied to the external lead (4) using a solder dip device, and then in the tie bar cut process (15), the tie bar part t6) shown in FIG. 2 is cut.
>N' cleavage separation. The steps up to this point are the Sl process in which long pieces are processed consistently, and the next step is Section 2.

第2の工程であるフレーム切断工程(]6)ではこの長
尺フレームを定尺に分断する。この定尺切断の長さは、
一般的に50個の半導体素子を含む程度か最適である。
In the second step, the frame cutting step (]6), this long frame is cut into regular lengths. The length of this standard cut is
Generally, it is optimal to include 50 semiconductor elements.

この定尺切断と同時にあるいはその後に第3の工程であ
る外部リード切断形成工程(I7)において、第2図に
ハツチングで示す様に、トランジスタであれば、その3
木の外部リード線(4)のうち2本までを枠(7)から
切断分離し、第5図に示す半導体装置連を得る。この実
施例では半導体装置50個相当分の長さきなっている。
At the same time as or after this cutting to a specified length, in the third step of cutting and forming external leads (I7), as shown by hatching in FIG.
Up to two of the wooden external lead wires (4) are cut and separated from the frame (7) to obtain the semiconductor device series shown in FIG. In this embodiment, the length is equivalent to 50 semiconductor devices.

この後の加工はこの50個単位の半導体装直達で加工が
実行されることとなる。そして第4の工程であるテスト
・マーク工程081ては、半睨体%W連単位てテスタに
供給され、測定のための位論決めは、ガイド穴(81)
を用いて行から構成することは極めて容易であり、本実
施例についてもその様に構成されている。また一般にウ
ェハ内で近傍に存在する半導体素子の汁気的特性は良く
揃ったものか得られる。これはトランジスタの場合のそ
の分類のための1つの亀気粕性である直流電流増巾率に
ついても同様であり、1つの半導体装直達は単一の直流
電流増巾率で構成されることとなる。この様に本実施例
方法では、ウェハ上の位置を半導体装箭連単位で保存し
、関連づけて処理することが′i5]能であり、また搬
送上極めて能率が向上し、さらにパーツツイータを使用
せず、外装リードメッキの劣化も防止することができる
。さらに本実施例では、テスタで不良と判定されるか、
直流電流増巾率がアイテムより外れるものは、他の1本
の外部リード(枠体(7)と接がっているもの)をも切
断することでさらにこれらをも別棟のものとして分類す
ることができる。
The subsequent processing will be carried out directly in units of 50 semiconductor devices. Then, in the fourth step, the test mark step 081, the hemiplane % W series is supplied to the tester, and the position for measurement is determined by the guide hole (81).
It is extremely easy to configure the line using lines, and this embodiment is also configured in the same way. In addition, in general, it is possible to obtain well-equalized characteristics of semiconductor elements that are present in the vicinity of the wafer. The same is true for the DC current amplification rate, which is a characteristic for classifying transistors, and one semiconductor device is composed of a single DC current amplification rate. Become. As described above, in the method of this embodiment, it is possible to save the position on the wafer in units of semiconductor devices and process them in association with each other, and the efficiency in transportation is greatly improved. This also prevents deterioration of the exterior lead plating. Furthermore, in this embodiment, whether the tester determines that the
If the DC current amplification rate is out of line with the item, cut the other external lead (the one connected to the frame (7)) and classify these as belonging to a separate building. I can do it.

テストの完了した半導体装直達は、マーキング部に移動
し、形名、直流電流増巾率を表わす記号、製造ロフト時
期を示す記号が捺印されたのち、包装工程09)で包装
され出荷される。ここで捺印に際しては、半導体装他運
対応て直流電9流増中率が固定されているので、捺印機
構を簡易なものとすることができる。
The semiconductor devices that have been tested are moved to the marking section, where the model name, symbol representing the DC current amplification rate, and symbol representing the manufacturing loft period are stamped, and then packaged and shipped in the packaging step 09). At the time of stamping, since the DC current increase rate of 9 current is fixed in accordance with the semiconductor device operation, the stamping mechanism can be simplified.

なお、上記実施例はトランジスタについて開示したか、
半導体集積回路についても同様の作用、効果が得られる
ことは明らかである。
In addition, whether the above embodiment discloses a transistor or not,
It is clear that similar actions and effects can be obtained with semiconductor integrated circuits.

〔発明の効果〕〔Effect of the invention〕

以上の様に本発明によれば、テスト、マーキングが簡易
となり、このテスト、マーキングで従来使われていたパ
ーツツイータによる半導体装置の整列、供給を必要とし
ないので、搬送が簡易となり、併せて外部リード線のメ
ッキ部の劣化を防止
As described above, according to the present invention, testing and marking are simplified, and there is no need to align and supply semiconductor devices using a parts tweeter, which was conventionally used for testing and marking. Prevents deterioration of the lead wire plating part

【図面の簡単な説明】[Brief explanation of drawings]

るための半導体装歓迎の要部拡大図である。 00)〜(15)・・・箔材・ダイポンダニ程、ワイヤ
ポンダニ程、モールド工程、パリ取り工程、半田デイツ
プ工程、タイバーカット工程(第1の工程)、06)・
・・フレーム切断工程(第2の工程)、0η・・・外部
リード切断成形工程(第3の工程)、(I8)・・・テ
スト・マーク工程(第4の工程)、(4)・・・外部リ
ード線。 なお図中同一符号は同−又は相当部分を示す。 代  理  人       葛  野  信  −第
2図 11,4  図
This is an enlarged view of the main parts of the semiconductor device welcome. 00) ~ (15)...Foil material/diaponder mite processing, wire ponder mite processing, molding process, deburring process, solder dip process, tie bar cutting process (first process), 06)
... Frame cutting process (second process), 0η... External lead cutting and forming process (third process), (I8)... Test mark process (fourth process), (4)...・External lead wire. Note that the same reference numerals in the figures indicate the same or equivalent parts. Agent Makoto Kuzuno - Figure 2 11, 4

Claims (2)

【特許請求の範囲】[Claims] (1)長尺フレームを用いて複数個の半導体装置を同一
平面上に連続的に整列して9th生る第1の工程と、上
記長尺フレームを所定個の半導体装置毎に定尺に切断し
て定尺の半導体装布速を分離する第2の工程と、上記定
尺の半導体装布速の外部リード部を一括して切断整形す
る第3の工程と、上記定尺の半導体装置連単位で半導体
装置に検査、捺印を行なう第4の工程とを倫えたことを
特徴とする半導体装置の製造方法。
(1) A first step in which a plurality of semiconductor devices are continuously arranged on the same plane using a long frame, and the long frame is cut into a fixed length for each predetermined number of semiconductor devices. a second step of separating the standard length semiconductor packaging speed; a third step of collectively cutting and shaping the external lead portions of the standard length semiconductor packaging speed; A method for manufacturing a semiconductor device, comprising a fourth step of inspecting and stamping the semiconductor device in units.
(2)  上記第βの工程における外部リード部の一括
切断を各半導体装置につきその外部リード線数より1本
生ない本数について行なうことを特徴とする特許請求の
範囲第1項記載の半導体装置の製造方法。
(2) The semiconductor device according to claim 1, characterized in that the batch cutting of the external lead portions in the β-th step is performed for each semiconductor device for one less than the number of external lead wires. Production method.
JP22975182A 1982-12-28 1982-12-28 Manufacture of semiconductor device Pending JPS59123247A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22975182A JPS59123247A (en) 1982-12-28 1982-12-28 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22975182A JPS59123247A (en) 1982-12-28 1982-12-28 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS59123247A true JPS59123247A (en) 1984-07-17

Family

ID=16897110

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22975182A Pending JPS59123247A (en) 1982-12-28 1982-12-28 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS59123247A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01266726A (en) * 1988-04-18 1989-10-24 Sanyo Electric Co Ltd Assembling apparatus for semiconductor device and measuring method therefor

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5240074A (en) * 1975-09-26 1977-03-28 Hitachi Ltd Method for inspection of electrical characteristics of resin molded t ype transistors
JPS5259573A (en) * 1975-11-11 1977-05-17 Mitsubishi Electric Corp Production of semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5240074A (en) * 1975-09-26 1977-03-28 Hitachi Ltd Method for inspection of electrical characteristics of resin molded t ype transistors
JPS5259573A (en) * 1975-11-11 1977-05-17 Mitsubishi Electric Corp Production of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01266726A (en) * 1988-04-18 1989-10-24 Sanyo Electric Co Ltd Assembling apparatus for semiconductor device and measuring method therefor
JPH0646641B2 (en) * 1988-04-18 1994-06-15 三洋電機株式会社 Semiconductor device assembling apparatus and its measuring method

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