JPS5912016B2 - Glass mold type semiconductor device - Google Patents
Glass mold type semiconductor deviceInfo
- Publication number
- JPS5912016B2 JPS5912016B2 JP12933578A JP12933578A JPS5912016B2 JP S5912016 B2 JPS5912016 B2 JP S5912016B2 JP 12933578 A JP12933578 A JP 12933578A JP 12933578 A JP12933578 A JP 12933578A JP S5912016 B2 JPS5912016 B2 JP S5912016B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- type semiconductor
- mold type
- glass mold
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
Description
【発明の詳細な説明】
本発明は半導体片の両面に設けられた電極に接触する電
極体と一体になつた接続導体を用いるガラスモールド型
半導体装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a glass mold type semiconductor device using a connecting conductor integrated with an electrode body that contacts electrodes provided on both sides of a semiconductor piece.
従来のガラスモールド型半導体装置、例えばダイオード
は第1図のように半導体片1とそれにろラ付された電極
体2をガラス層3で被覆し、電極体2にはリード線4が
接続されている。A conventional glass mold type semiconductor device, for example a diode, has a semiconductor piece 1 and an electrode body 2 attached to it covered with a glass layer 3, as shown in FIG. 1, and a lead wire 4 is connected to the electrode body 2. There is.
電極体2は熱膨脹係数がガラスと整合する金属材料、例
えばタングステン、モリブデンなどの単体金属、あるい
はコバールなどの合金から造られる。このような電極体
を形成する金属材料は電気伝導度が低いこと、線にして
も可撓性に乏しいこと、ならびに高価なことから電気の
良導体、例えば銅から成るリード線4と溶接される。し
かしこの溶接部の剥離や異種金属の接触部が露出してい
るため電食の発生のおそれがあること、あるいは溶接の
費用を要することなどの欠点がある。本発明はこのよう
な半導体装置と異り、製造原10価が低くしかも機械的
、化学的に安定である電極体およびリード線を有するガ
ラスモールド型半導体装置を提供することを目的とする
。The electrode body 2 is made of a metal material whose coefficient of thermal expansion matches that of glass, for example a single metal such as tungsten or molybdenum, or an alloy such as Kovar. The metal material forming such an electrode body has low electrical conductivity, poor flexibility even when made into a wire, and is expensive, so it is welded to a lead wire 4 made of a good electrical conductor, for example, copper. However, there are drawbacks such as peeling of the welded parts, exposed contact parts of dissimilar metals, which may cause electrolytic corrosion, and high welding costs. Unlike such a semiconductor device, an object of the present invention is to provide a glass mold type semiconductor device having an electrode body and a lead wire that have low manufacturing cost and are mechanically and chemically stable.
この目的は半導体片の各電極に、外面の長手方向のすべ
てにわたつて、ガラスの熱膨脹係数に近15似した熱膨
脹係数を有する金属材料で覆われた電気の良導体である
金属材料から成る複合導体の接続導体を接触させること
によつて達成される。The purpose of this is to attach a composite conductor made of a metal material, which is a good conductor of electricity, to each electrode of the semiconductor chip and covered with a metal material having a coefficient of thermal expansion approximately 15 similar to that of glass over the entire length of the outer surface. This is accomplished by contacting the connecting conductors.
以下第2図に示す実施例に関して本発明を説明する。半
導体1には電極体を介さないで直接複合20リード線5
がろう付などの方法で接続される。複−〜合リード線5
は中心部分6が電気の良導体である、例えば銅から成り
、被覆部7は熱膨脹係数がカラ−スと近似するW、Mo
などの単体金属あるいはコー バールなどの合金から成
る。複合リード線5の端25部には頭部8を備え、また
必要によりモールドガラス層3の付着強度を高めるため
の突起9を端部の近くに設けてもよい。頭部8および突
起9はヘッダ加工により成形されるので、従来の電極体
の溶接コストにくらべて低い原価でできる。中心部30
6の断面積は通電容量に応じて変えることがで鼻るが、
銅の弾性係数は被覆部7の金属材料の弾性係数にくらべ
て小さいため、その断面積の占める割合が全断面積に対
して高くなければ複合材料としてのリード線5の熱膨脹
係数は被覆材料7の熱35膨脹係数に近いものであり、
モールドガラス層3の熱膨脹係数に近似してモールド時
あるいは使用中のガラスの割れを回避することができ、
また半導体片1の熱膨脹係数との差も銅を直接ろう付し
た場合に比してはるかに小さいので、熱変動が半導体片
1に及ぽす応力も小さくてすむ。なお半導体片は1枚の
半導体板に限らず高圧ダイオードのような積層半導体板
の場合でも全く同様に本発明が実施できる。さらに本発
明に用いる複合接続導体の被覆部は、銅に比して常温の
空気中で腐食しにくいため、銅を表面にした複合導体、
例えばジユメツト線の場合のように防食のために表面に
メツキを施こす必要がなく経済的である。The invention will now be described with reference to the embodiment shown in FIG. The composite 20 lead wire 5 is directly connected to the semiconductor 1 without using an electrode body.
are connected by methods such as brazing. Composite to composite lead wire 5
The center part 6 is made of a good electrical conductor, for example, copper, and the covering part 7 is made of W, Mo, which has a coefficient of thermal expansion similar to that of color.
It consists of a single metal such as or an alloy such as Kovar. The end 25 of the composite lead wire 5 is provided with a head 8, and if necessary, a protrusion 9 may be provided near the end to increase the adhesion strength of the molded glass layer 3. Since the head 8 and the protrusion 9 are formed by header processing, the cost is lower than the welding cost of conventional electrode bodies. center 30
The cross-sectional area of 6 can be changed depending on the current carrying capacity, but
Since the elastic modulus of copper is smaller than the elastic modulus of the metal material of the sheathing part 7, the thermal expansion coefficient of the lead wire 5 as a composite material will be lower than that of the sheathing material 7 unless its cross-sectional area is high in proportion to the total cross-sectional area. It is close to the thermal expansion coefficient of 35,
By approximating the coefficient of thermal expansion of the molded glass layer 3, it is possible to avoid cracking of the glass during molding or use.
Furthermore, since the difference between the coefficient of thermal expansion of the semiconductor piece 1 is much smaller than that in the case where copper is directly brazed, the stress exerted on the semiconductor piece 1 due to thermal fluctuations is also small. Note that the present invention is not limited to a single semiconductor board, and the present invention can be implemented in the same manner even in the case of a stacked semiconductor board such as a high-voltage diode. Furthermore, since the covering portion of the composite connecting conductor used in the present invention is less likely to corrode in air at room temperature than copper, composite conductors with copper as the surface,
For example, it is economical because there is no need to plate the surface for corrosion prevention as in the case of aluminum wire.
上述のように本発明によりリード線の剥離や電食のおそ
れがなく信頼性の高いガラスモールド型半導体装置を経
済的に製造することが可能になる。As described above, the present invention makes it possible to economically manufacture a highly reliable glass mold type semiconductor device without fear of peeling of lead wires or electrolytic corrosion.
第1図は従来のガラスモールド型ダイオードの縦断面図
、第2図は本発明の一実施例のガラスモールド型ダイオ
ードの縦断面図である。
1 ・・・半導体片、3・・・ガラス層、5・・・複合
接続導体。FIG. 1 is a vertical sectional view of a conventional glass molded diode, and FIG. 2 is a vertical sectional view of a glass molded diode according to an embodiment of the present invention. 1...Semiconductor piece, 3...Glass layer, 5...Composite connection conductor.
Claims (1)
し、半導体片と接続導体の一部が一体としてガラスによ
り被覆されるものにおいて、接続導体が外面を長手方向
のすべてにわたつて、ガラスの膨脹係数に近似した燃膨
脹係数を有する金属材料で覆われた電気の良導体である
金属材料から成る複合導体であることを特徴とするガラ
スモールド型半導体装置。1 In a device in which a connecting conductor contacts electrodes provided on both sides of a semiconductor piece, and a portion of the semiconductor piece and the connecting conductor are integrally covered with glass, the connecting conductor covers the entire outer surface in the longitudinal direction. 1. A glass mold type semiconductor device characterized in that it is a composite conductor made of a metal material that is a good conductor of electricity and covered with a metal material having a combustion expansion coefficient close to the expansion coefficient of .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12933578A JPS5912016B2 (en) | 1978-10-20 | 1978-10-20 | Glass mold type semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12933578A JPS5912016B2 (en) | 1978-10-20 | 1978-10-20 | Glass mold type semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5556653A JPS5556653A (en) | 1980-04-25 |
JPS5912016B2 true JPS5912016B2 (en) | 1984-03-19 |
Family
ID=15007053
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12933578A Expired JPS5912016B2 (en) | 1978-10-20 | 1978-10-20 | Glass mold type semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5912016B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5964531U (en) * | 1982-10-22 | 1984-04-28 | オ−バル機器工業株式会社 | Positive displacement flowmeter rotor |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4440911B2 (en) | 2006-10-13 | 2010-03-24 | ニチコン株式会社 | Solid electrolytic capacitor |
-
1978
- 1978-10-20 JP JP12933578A patent/JPS5912016B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5964531U (en) * | 1982-10-22 | 1984-04-28 | オ−バル機器工業株式会社 | Positive displacement flowmeter rotor |
Also Published As
Publication number | Publication date |
---|---|
JPS5556653A (en) | 1980-04-25 |
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