JPS59116340A - Production of shape memory alloy material - Google Patents

Production of shape memory alloy material

Info

Publication number
JPS59116340A
JPS59116340A JP23208082A JP23208082A JPS59116340A JP S59116340 A JPS59116340 A JP S59116340A JP 23208082 A JP23208082 A JP 23208082A JP 23208082 A JP23208082 A JP 23208082A JP S59116340 A JPS59116340 A JP S59116340A
Authority
JP
Japan
Prior art keywords
memory alloy
shape memory
heated
tini
diffusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23208082A
Other languages
Japanese (ja)
Inventor
Kazuo Sawada
澤田 和夫
Kazuhiko Hayashi
和彦 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP23208082A priority Critical patent/JPS59116340A/en
Publication of JPS59116340A publication Critical patent/JPS59116340A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain an NiTi memory alloy material with a simple production stage and high productivity by bringing an Ni material and a Ti material into tight contact with each other by a film forming method of press welding, plating or vapor deposition, heating the materials and forming an NiTi phase by reactive diffusion. CONSTITUTION:An Ni material and a Ti material are brought into tight contact with each other and thereafter the materials are heated and a TiNi phase is formed by reactive diffusion. The pure Ti rod 1 and pure Ni rod 2 are clad whereby the construction laminated with the Ti material and the Ni material can be obtd. in this case. The laminated rod is then heated to diffuse Ti to the Ni side and Ni to the Ti side. An intermetallic TiNi compd. layer 4 is formed in the central part by said diffusion. The layer 4 contains the three phases; Ti, Ni, TiNi and TiNi3. However if the Ti and Ni are beforehand so selected as to be incorporated at 1:1 by atom ratio and are heated for a long time, the intended shape memory alloy consisting of the rod of the single phase composed only of the TiNi phase 3 is obtd.

Description

【発明の詳細な説明】 発明の分野 この発明は、形状記憶合金材の製造方法、特にNI T
i系形状記憶合金材の製造方法に藺する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for manufacturing shape memory alloy materials, particularly NIT
We will discuss the manufacturing method of i-based shape memory alloy material.

先行技術の説明 一般に、Nt−「i糸形状!![!憶合金は、真空溶解
−均一化焼鈍−熱間加工−冷間加■−中間軟七(冷間加
工ど中間軟化の工程は繰返されるっ)−線材または条へ
の加工、形状記憶効果を与えるための熱処理−という一
連の工程を経て製造されtoしかしながら、上述したよ
うな従来の製造方法では、(イ2+とN1を溶解で合金
化するものであるため、目的組成の制御が困難であるこ
と、および酸素などのガス不純物、黒鉛るつほからの炭
素などの混入が避けられないことなどの欠点、(ロ)熱
間圧延を用いるため、鋳塊を再加熱が必要であることお
よび加熱により表面が酸化されや1いことなどの欠点、
ならびに(ハ)冷間圧延を行なうため1回の加工度を大
きくすることができず、したがって中間軟化を多数回繰
返す必要があること(1回あたりの加工度を大きくした
り、あるいは中間軟化の回数を減らした場合には、加工
の際に破11Jiが生じる。)および中間軟化の際に酸
化が発生づるごとなどの欠点が存在したつ結局、従来の
Nil”i糸形状記憶合金の製造方法では、極めて多数
の工程が必要であり、かつ酸化層などの影胃により本留
りが低いため、生産性が極めて悪くかつ]ストし高いも
のとなっていた。
Description of the Prior Art In general, Nt-"i-thread shape!![! Memory alloys are manufactured by vacuum melting, homogenization annealing, hot working, cold working, intermediate softening (the intermediate softening process such as cold working is repeated). However, in the conventional manufacturing method as described above, (I2+ and N1 are alloyed by melting Disadvantages include the difficulty in controlling the target composition and the unavoidable contamination of gaseous impurities such as oxygen and carbon from graphite melting. Disadvantages include the need to reheat the ingot and the surface being easily oxidized by heating.
and (c) because cold rolling is performed, it is not possible to increase the degree of work in one round, and therefore it is necessary to repeat intermediate softening many times (increasing the degree of work in each time, or If the number of times is reduced, fractures occur during processing) and oxidation occurs during intermediate softening. In this case, an extremely large number of steps are required, and the retention rate is low due to the effects of the oxidized layer, resulting in extremely low productivity and high stress.

ところで、Nl’liは絹成比約1対1の金属開化合物
である。金石間化合物の製造方法としては、川伝SNb
、Snl材の製造などに応用されている反応拡散法が知
られている。この反応拡散法がNi1i形状記憶合金の
製造に応用することができれば、極めて安価にNi T
ll系状記憶合金材を製造することが可能である。そこ
で、反応拡散法による形状記憶合金材の製造方法の開発
が望まれていた。
By the way, Nl'li is a metal open compound with a silk ratio of approximately 1:1. Kawaden SNb is a method for producing chalcolithic compounds.
A reaction-diffusion method is known, which is applied to the production of Snl materials. If this reaction-diffusion method can be applied to the production of Ni1i shape memory alloy, NiT
It is possible to produce a ll-based memory alloy material. Therefore, it has been desired to develop a method for producing shape memory alloy materials using a reaction diffusion method.

発明の目的 それゆえに、この発明の主たる目的は、上述した従来の
製)貴方法の欠点を解消し、簡略な製造工程からなる生
産性に優れたNll’i系形状記憶合金材の製造方法を
提供することにある。
Purpose of the Invention Therefore, the main purpose of the present invention is to provide a method for manufacturing Nll'i-based shape memory alloy materials that has a simple manufacturing process and excellent productivity by eliminating the drawbacks of the conventional manufacturing method described above. It is about providing.

この発明は、要約すれば、Nl材と7i材とを、圧接ま
たはめっきもしくは蒸着等の膜形成法により、密着させ
て加熱し、反応拡散によりTi Ni材を得ることを特
徴とする、形状記憶合金材の製造方法である。水明m書
におい了、「トj1材」および「1川材」とは、それぞ
れ、N1およびT1からなるたとえば条または線などの
形状の材料を言うものとづる。Nl材とTi材との反応
拡散に先立つ「【L;は、に1)11条とN1条との圧
接、(b ) ’N  (Ni )条へのNl  (T
I >めっき(4式め)きおよび乾式めっきのいずれで
もよい、、)、(C)■2N+>パイプへのNi  (
Ti)線の挿入・圧接ならびに(d )Tt  (Ni
 )線へのN1 (TI)蒸着などの様々な方法により
行ない得る。
In summary, the present invention is a shape memory material characterized in that a Nl material and a 7i material are brought into close contact with each other by pressure welding or a film forming method such as plating or vapor deposition, and then heated to obtain a TiNi material by reaction diffusion. This is a method for manufacturing an alloy material. In Suimei M-sho, "Toj1 material" and "Ichikawa material" refer to materials in the shape of strips or lines, respectively, made of N1 and T1. Prior to the reaction and diffusion between the Nl material and the Ti material, [L;
I > Either plating (4-type plating) or dry plating is acceptable, ), (C) ■2N+>Ni to pipe (
Ti) Insertion and pressure welding of wire and (d) Tt (Ni
) can be done by various methods, such as N1 (TI) evaporation onto the wire.

この発明の製造方法は、上述したNi材とTi材とを密
着させた後、加熱し反応拡散によりTlN1柑を1!7
るものである。第1図ないし第3図は、この発明の詳細
な説明覆るだめの断面図である。
The manufacturing method of the present invention is to bring the above-mentioned Ni material and Ti material into close contact with each other, and then heat and react and diffuse 1 to 7 pieces of TlN.
It is something that 1 to 3 are cross-sectional views of a casing for detailed explanation of the invention.

第1図に示マように、n−r+条1とllll条2とを
クラッドすることにより、Ti材とNi材とを張合わせ
た11造を17にとができる、1次に、張合:l) I
Iた条を加熱づることにJ:す、T1がNi側へ、Ni
がTi側に相豆拡故する。このとき、第2図に示すよう
iこ、中央部にT1Ni金薦間化合物層4が生成する。
As shown in Fig. 1, by cladding n-r+ strip 1 and llll strip 2, 11 structures made of Ti and Ni materials can be made into 17. :l) I
When heating the I strip, T1 moves to the Ni side, and the Ni
The soybean spreads to the Ti side. At this time, as shown in FIG. 2, a T1Ni intermetallic compound layer 4 is formed in the central portion.

このTi Ni金5間化合物Fi14は、ri y N
i 、 TI Ni J3J:びlN1.(7)3個の
相を含む。しかしながら、予め11とN1とが原子比で
1対1となるように選定し、長時間加熱ずれば、第3図
に示1ようにTiNt相3のみからなる単相の条が製造
()得る。
This Ti Ni gold pentate compound Fi14 is ri y N
i, TI Ni J3J:bilN1. (7) Contains three phases. However, if 11 and N1 are selected in advance in an atomic ratio of 1:1 and heated for a long time, a single-phase strip consisting only of the TiNt phase 3 can be produced () as shown in Fig. 3. .

第4図ないし第(3図は、この発明の¥J造方法の他の
例を説明するための概略斜視図である。第4図に示すよ
うに、N1バイブ10に−ri fil 1を挿入後伸
線することにより、TI とN1とを圧接させるつごの
ようt、、L/て接合し)だ構造体を加熱することによ
り、第1図ないし第3図に示【ノた例と同様に°1−i
Niのみからなる単相の紳3を1りることができる。、
なお、第5図は、第1の例の第2図と同様に、拡散過程
の途中の状態を示1図である。
4 to 3 (FIG. 3 is a schematic perspective view for explaining another example of the ¥J manufacturing method of the present invention. As shown in FIG. 4, -ri fil 1 is inserted into the N1 vibrator 10. After wire drawing, TI and N1 are brought into pressure contact by heating the structure, which is joined by t, , L/. Similarly °1−i
It is possible to produce a single-phase conductor 3 consisting only of Ni. ,
Note that, like FIG. 2 of the first example, FIG. 5 is a diagram showing a state in the middle of the diffusion process.

好ましい実施例によれば、Ni材とTi材とは、Niが
50〜60重it%となるように、圧接またはめっきな
どが施されて密着される。Nlのr量比をこの範1!J
lに選ぶことにより、より優れた形状記憶効果を夷づる
ことが可能だからである。
According to a preferred embodiment, the Ni material and the Ti material are brought into close contact with each other by pressure welding or plating so that the Ni content is 50 to 60% by weight. The r amount ratio of Nl is in this range 1! J
This is because by selecting l, it is possible to obtain a more excellent shape memory effect.

また、Nil’i自身は、加工性が栖めて悪い。Further, Nil'i itself has poor workability.

すなわち鋳造、熱間加工(+5 J:び冷間加工4ζど
の種々の加Tを行なうことが極めて困難な月利である。
In other words, it is extremely difficult to carry out various types of processing such as casting, hot working (+5 J: and cold working 4ζ).

他方、Niあるいはltは比較的加工しやすい材わ1で
ある。したがって、好ましい実施例では、予めNi材お
よび、′またはl−を材を加I L Tおき、所望の組
成を1りるように密着・加熱することにより、所望の形
状のN+T+形状記憶合金材を得ることが可能であるっ
間挿に、Ni材とTi材との密着後、冷間もしくは)温
間で加工を施し所望の形状にした後に加熱してもよい。
On the other hand, Ni or lt is a material 1 that is relatively easy to process. Therefore, in a preferred embodiment, the N+T+ shape memory alloy material in the desired shape is obtained by adding Ni material and ' or l- to the material in advance, and then adhering and heating the material to obtain the desired composition. In order to obtain the desired shape, the Ni material and the Ti material may be brought into close contact with each other, and then subjected to cold or warm processing to form a desired shape, and then heated.

好ましい実施例では、冷間もしくは温間で少なくとも1
0%以上の減面率で加工が行なわれる。拡散が起こりい
すく、かつ製品強度に旧れるからである。
In a preferred embodiment, at least 1 cold or warm
Processing is performed with an area reduction rate of 0% or more. This is because diffusion is more likely to occur and the strength of the product deteriorates.

この発明に用いるrll材」おJ、びrTiUJは純粋
なN1あるいは1:からなる材r1のみならず、一部が
CIJ、Δf1.V、Zr、MO,Cr。
The rll materials "J" and "rTiUJ" used in this invention include not only the material r1 consisting of pure N1 or 1: but also a portion of which is CIJ, Δf1. V, Zr, MO, Cr.

[e 、 Co 、 @土類元素からなる群から選択さ
れる一種以上の元素を含有するものでもよい。このよう
な元素を含有づる材料を用いることにより、斐態温度の
制計Bが可能どなる。
[It may contain one or more elements selected from the group consisting of e, Co, and @earth elements. By using a material containing such elements, it becomes possible to control the state temperature B.

この発明のその他の目的および特徴は、図面を参照して
行なう以下の詳細な説明により一層明らかとなろう。
Other objects and features of the invention will become more apparent from the following detailed description with reference to the drawings.

実施例の説明 実施例 第′1図に断面図C示ずように、芹さl n1m、幅1
()tnmc’) in l i条1および)li N
 i条2を槍ねて、温間圧延ど冷間圧延どにより全体を
)Vさ0.2mmにクラッドした。次に、真空甲にL1
2い(100(J℃の温度(10(J時間加熱した。こ
のとき生成したrl Nl iのりみは0.−1m+n
であり、この他に生成JるTi 2 Niおよびri 
Ni 、よりも厚かった。このようにして形成された条
を、直線状に固定し、500℃115分間保持すること
により、直線形状を記憶させ、0℃の氷水中で曲線状に
変形した後、70℃の温水中に浸漬づると、完全にもと
の直線形状に戻った。
DESCRIPTION OF THE EMBODIMENTS Embodiment As shown in the cross-sectional view C in Fig.
()tnmc') in l i Article 1 and) li N
The i-strip 2 was rolled and the whole was clad to a V height of 0.2 mm by warm rolling or cold rolling. Next, L1 on the vacuum instep
Heated at a temperature of 2 (100 (J℃) for 10 (J hours). The rl Nl i glue generated at this time was 0.-1 m +
In addition to this, Ti 2 Ni and ri
It was thicker than Ni. The thus formed strips were fixed in a straight line and held at 500°C for 115 minutes to memorize the linear shape, deformed into a curved shape in ice water at 0°C, and then placed in warm water at 70°C. When immersed, it completely returned to its original straight shape.

実施例2 第4図に示すように、内径1 mm1JRF10 、2
11111(7)純Niパイプ10に、外径0.8++
+mノl ri l111を挿入し、0.51!111
1φまC伸線し、N1と11とを完全に密着させた。次
に、真空中で900℃の温度で100時間加熱した。こ
のとき、線材は第6図に示1ような単一の1−tN+N
i材なった。
Example 2 As shown in Fig. 4, inner diameter 1 mm 1 JRF10, 2
11111 (7) Pure Ni pipe 10, outer diameter 0.8++
Insert +m no l ri l111, 0.51!111
C wire was drawn to 1φ, and N1 and 11 were completely brought into contact. Next, it was heated in vacuum at a temperature of 900° C. for 100 hours. At this time, the wire rod is a single 1-tN+N as shown in FIG.
It became i material.

この線′4Aを外径2011111の銅棒にコイル状に
巻回固定した状態で、550℃の温度で10分間保持し
、コイル形状を記憶させた。次に、0℃氷水中で引延ば
した後、60℃の温水中に浸漬りると、もとのコイル形
状に完全に回復した。
This wire '4A was wound and fixed in a coil around a copper rod having an outer diameter of 20111111 and held at a temperature of 550° C. for 10 minutes to memorize the coil shape. Next, the coil was stretched in ice water at 0°C, and then immersed in warm water at 60°C, completely recovering its original coil shape.

大亙凰1 0.5%のl”eを含む厚さ30μmのNi台金シート
に、真空魚名により、「iを厚さ50μmに(=J着さ
せ、これを軽く圧延した。次に、980℃の温度で70
時間真空中で加熱した。作成したシートに張力をイ’J
 ’lして平たい形状にしつつ、450’Cの温度で約
15分間加熱した。次に、室温でこの平lζいシー1−
をくしヤくしヤに丸めて装置したら、もどの平面+1ジ
状に回復した(咄づ・11性挙動)なお、種々の実験を
(jなったれ5果、純114目および朴Ni相が配?l
きると、T1Ni相を厚く生成させるには高湿、長時間
の熱処理が必要であることがわかった。たとえば100
0℃の温度で100U1間加熱することにより、約0.
1mmのT1Ni層が生成した。したがって板厚が薄い
ほど、あるいは線材の径が小さいほど右利にTi Ni
層を得ることがわかる。それゆえに、従来の製造方法で
は特に困難であった簿いNlTi合金ある(Aは極細の
Ni T1合金線を極めて簡単に得ることが可能である
Taiyangou 1 A Ni base metal sheet with a thickness of 30 μm containing 0.5% l”e was coated with “I” (= J) to a thickness of 50 μm, and this was lightly rolled. Next, , 70 at a temperature of 980℃
Heated in vacuo for an hour. Apply tension to the created sheet.
It was heated at a temperature of 450'C for about 15 minutes while being flattened. Next, at room temperature, this flat lζ sheet 1-
When I rolled it up into a comb and put it into a device, it recovered to its original plane + 1 ji shape (Matsu-11 characteristic behavior). ?l
It was found that heat treatment at high humidity and for a long time is necessary to form a thick T1Ni phase. For example 100
By heating for 100 U1 at a temperature of 0°C, approximately 0.
A 1 mm T1Ni layer was produced. Therefore, the thinner the plate thickness or the smaller the diameter of the wire, the more Ti Ni
You can see that you get layers. Therefore, it is possible to obtain very thin NlTi alloy wires (A) very easily, which has been particularly difficult with conventional manufacturing methods.

発明の効果 以上のように、この発明によれば、N1材とTi材とを
、圧接またはめつきもしくは蒸着等の膜形成法により、
密着させて加熱し、反応拡散によりTi Ni材を得る
ことが可能であるため、加工工程を極めて効果的に単純
化することができる。
Effects of the Invention As described above, according to the present invention, N1 material and Ti material are bonded together by a film forming method such as pressure welding, plating, or vapor deposition.
Since it is possible to obtain a TiNi material by heating in close contact and reaction diffusion, the processing process can be simplified very effectively.

すなわち、従来の製造方法で必要であった熱間加1およ
び冷間加工などの多数の工程ならびにこれらの工程に付
随して必要であった再加熱工程および中間軟化工程など
を省略することができるので、加工工程を大幅に簡略化
し得る。また、予め1i1AとN1t4との接合の際に
加工を加えることにより、所望の形状・寸法に近いもの
を極めて容易に1!7ることが1きる。さらに、1川月
J3よUN i材の当初の厚みが薄いほど拡散距離が短
くて済むため加熱時間を短縮づることがて゛き、したが
って薄板および細線などの製造を短時間て′行ないlワ
る。
That is, it is possible to omit a large number of steps such as hot heating 1 and cold working that were necessary in conventional manufacturing methods, as well as reheating steps and intermediate softening steps that were necessary in conjunction with these steps. Therefore, the processing process can be greatly simplified. Further, by applying processing in advance when joining 1i1A and N1t4, it is possible to extremely easily produce a shape and size close to the desired shape and dimensions. Furthermore, the thinner the original thickness of the UNi material is, the shorter the diffusion distance, which makes it possible to shorten the heating time, and therefore to manufacture thin plates, thin wires, etc. in a shorter time.

また、工程数を減少−することがてきるので歩留りの向
上も果たぜ、したがってNil’i形状配憤合金材のコ
ス[−を極めて効果的に低減することも可能どなる。
Further, since the number of steps can be reduced, the yield can be improved, and therefore, it is also possible to extremely effectively reduce the cost of the Nil'i-shaped tempering alloy material.

この発明の製造))ン人目1、感温索子、バイメタル、
各種のアクヂ:1エーク、超弾性はねおよび防振材料な
どの様々な形状記憶合金々4の製造に応用することがで
き、イの産室的ダ)県は仲めて大きい。
Manufacture of this invention)
It can be applied to the production of various shape memory alloys such as superelastic springs and anti-vibration materials, and its production chamber size is relatively large.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図ないし第3図IJ、この発明の製造方法の一例を
説明するための断面図であり、第1図は]1拐とNi月
どの接合状態を示づ図でルンリ、第2図は拡散過程の途
中を示づ図で6)す、第3図は相互拡散が゛)(了した
状態を示づ図てル]る。、第/1図ないしQ 6図は、
この発明の製造方法の他の例を示す概略斜視図(あり、
第11図(まN+パイプとT(線との接合状態を示−4
図であり、第5図【ま拡散の途中の状態を示り゛図Cあ
り、516図は拡散終了+1¥の状態を示づ図(ある。 図Vl 63 イ+、 、、 I Gj T i条、2
 ハN を条、3 +、+ −ri N ! i’U、
10はl動バイブ、11はT1倉LC134、び12は
FINi相を示゛丈。 特許出願人 住友電気工業株式会社 1!(、+、、・
1 to 3 are cross-sectional views for explaining an example of the manufacturing method of the present invention. Figure 3 shows the state in the middle of the diffusion process, Figure 3 shows the state in which mutual diffusion has completed.
A schematic perspective view showing another example of the manufacturing method of the present invention (with
Figure 11 (shows the connection state between the N+ pipe and the T(wire) -4
Figure 5 shows the state in the middle of diffusion (Fig. Article 2
HaN wo article, 3 +, + -ri N! i'U,
10 is the l-motion vibrator, 11 is the T1 warehouse LC134, and 12 is the FINi phase. Patent applicant: Sumitomo Electric Industries, Ltd. 1! (,+,,・

Claims (5)

【特許請求の範囲】[Claims] (1)Ni材とLi材とを、圧接またはめつきもL’ 
<はだ着等の膜形成法により、密着さくトて加熱し、反
応拡散によつrTtNi相を得ることを1!5徴とづる
、形状記憶合金材のvb)方法。
(1) Pressure welding or plating of Ni material and Li material is also possible L'
<vb) method for shape memory alloy materials, which is described as 1!5 characteristics in which the rTtNi phase is obtained by reaction diffusion by closely plating and heating by a film forming method such as soldering.
(2) 前記Ni材とF;材とは、Niが50・〜(3
0ffT h’−96となるようにN1もしくはTiか
らなる条、線もしくはパイプと、TiもしくはN+1)
+ +らなる条、紗もしくはパイプとの接合により圧接
さ1する、特許請求の範囲第1項記載の形状記憶合金材
の製造方法。
(2) The above-mentioned Ni material and F; material have Ni of 50.
0ffT h'-96 with a strip, wire or pipe made of N1 or Ti, and Ti or N+1)
A method for producing a shape memory alloy material according to claim 1, wherein the shape memory alloy material is pressure-welded by joining with a strip, a gauze, or a pipe.
(3) 前記Ni材と11材とは、1°iが50−60
重量%となるように、NiもしくはTiの条または1ね
こ、]1もしくはN1を乾式または湿式めっき中ろこと
により密着される、特許請求の範囲第1JT!i記載の
形状記憶合金材の製造方法。
(3) The Ni material and the 11 material have 1°i of 50-60.
Claim 1 JT! A method for producing a shape memory alloy material according to i.
(4) 前記N1材とTi材の密着の慢、冷間もしくは
湿間で少なくとも10%以上の減面率の加工を施した後
に、加熱が施される、特iF′l!求の範囲第3項また
は第4項記載の形状記憶合金材の製造方法。
(4) Special iF'l! where the N1 material and Ti material are in close contact with each other and are heated after being processed to reduce the area by at least 10% in cold or wet conditions. A method for producing a shape memory alloy material according to claim 3 or 4.
(5) 前記N1材およびTlI4の少なくとも一方が
、Cu、Fe、Co、Am、V、Zr、MO0希土類元
素を含む群から選択される一種以上の元素を含有してお
り、加熱1多にはN1またはYlの多くとも20重員%
が前記金石元素により置換されている、特許請求の範囲
第1項ないし第4項のいずれかに記載の形状記憶合金材
の製造方法。
(5) At least one of the N1 material and TlI4 contains one or more elements selected from the group including Cu, Fe, Co, Am, V, Zr, and MO0 rare earth elements, and the heating At most 20% by weight of N1 or Yl
The method for producing a shape memory alloy material according to any one of claims 1 to 4, wherein is replaced with the goldite element.
JP23208082A 1982-12-24 1982-12-24 Production of shape memory alloy material Pending JPS59116340A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23208082A JPS59116340A (en) 1982-12-24 1982-12-24 Production of shape memory alloy material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23208082A JPS59116340A (en) 1982-12-24 1982-12-24 Production of shape memory alloy material

Publications (1)

Publication Number Publication Date
JPS59116340A true JPS59116340A (en) 1984-07-05

Family

ID=16933677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23208082A Pending JPS59116340A (en) 1982-12-24 1982-12-24 Production of shape memory alloy material

Country Status (1)

Country Link
JP (1) JPS59116340A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0226826A2 (en) * 1985-11-19 1987-07-01 Nippon Seisen Co., Ltd. Method for making titanium-nickel alloys
JPH03162532A (en) * 1989-11-20 1991-07-12 Nippon Yakin Kogyo Co Ltd Manufacture of ni-ti intermetallic compound
EP0927771A1 (en) * 1997-12-24 1999-07-07 Wyman Gordon Corporation Fabrication of metallic articles using precursor sheets
CN1298876C (en) * 2005-01-13 2007-02-07 四川大学 Method for preparing NiTiHf shape memory alloy film by cold rolling ultra-thin laminated alloy foil
CN1330781C (en) * 2005-01-13 2007-08-08 四川大学 Production of CuALNiMn shape memory alloy thin membrane by cold rolling superthin laminated alloy
CN100342050C (en) * 2005-01-13 2007-10-10 四川大学 Production of TiNiCu shape memory alloy thin membrane by cold rolling superthin laminated alloy
CN111893348A (en) * 2020-07-03 2020-11-06 广东省材料与加工研究所 Preparation method of nickel-titanium alloy material

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49114389A (en) * 1973-02-27 1974-10-31
JPS5152944A (en) * 1974-11-06 1976-05-11 Nippon Musical Instruments Mfg Arupaamugokinno seizoho
JPS5857944A (en) * 1981-10-02 1983-04-06 ヤマハ株式会社 Composite metallic pipe and its manufacture
JPS5983735A (en) * 1982-11-05 1984-05-15 Nippon Gakki Seizo Kk Preparation of frame parts of spectacles
JPS5983733A (en) * 1982-11-01 1984-05-15 Mitsubishi Electric Corp Preparation of shape memory alloy
JPS59116341A (en) * 1982-12-24 1984-07-05 Sumitomo Electric Ind Ltd Production of shape memory alloy material

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49114389A (en) * 1973-02-27 1974-10-31
JPS5152944A (en) * 1974-11-06 1976-05-11 Nippon Musical Instruments Mfg Arupaamugokinno seizoho
JPS5857944A (en) * 1981-10-02 1983-04-06 ヤマハ株式会社 Composite metallic pipe and its manufacture
JPS5983733A (en) * 1982-11-01 1984-05-15 Mitsubishi Electric Corp Preparation of shape memory alloy
JPS5983735A (en) * 1982-11-05 1984-05-15 Nippon Gakki Seizo Kk Preparation of frame parts of spectacles
JPS59116341A (en) * 1982-12-24 1984-07-05 Sumitomo Electric Ind Ltd Production of shape memory alloy material

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0226826A2 (en) * 1985-11-19 1987-07-01 Nippon Seisen Co., Ltd. Method for making titanium-nickel alloys
US4830262A (en) * 1985-11-19 1989-05-16 Nippon Seisen Co., Ltd. Method of making titanium-nickel alloys by consolidation of compound material
JPH03162532A (en) * 1989-11-20 1991-07-12 Nippon Yakin Kogyo Co Ltd Manufacture of ni-ti intermetallic compound
EP0927771A1 (en) * 1997-12-24 1999-07-07 Wyman Gordon Corporation Fabrication of metallic articles using precursor sheets
CN1298876C (en) * 2005-01-13 2007-02-07 四川大学 Method for preparing NiTiHf shape memory alloy film by cold rolling ultra-thin laminated alloy foil
CN1330781C (en) * 2005-01-13 2007-08-08 四川大学 Production of CuALNiMn shape memory alloy thin membrane by cold rolling superthin laminated alloy
CN100342050C (en) * 2005-01-13 2007-10-10 四川大学 Production of TiNiCu shape memory alloy thin membrane by cold rolling superthin laminated alloy
CN111893348A (en) * 2020-07-03 2020-11-06 广东省材料与加工研究所 Preparation method of nickel-titanium alloy material

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