JPS5911258A - Electrostatic latent image writing apparatus for electrostatic recording - Google Patents
Electrostatic latent image writing apparatus for electrostatic recordingInfo
- Publication number
- JPS5911258A JPS5911258A JP11917182A JP11917182A JPS5911258A JP S5911258 A JPS5911258 A JP S5911258A JP 11917182 A JP11917182 A JP 11917182A JP 11917182 A JP11917182 A JP 11917182A JP S5911258 A JPS5911258 A JP S5911258A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- ion
- ion flow
- hole
- recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/22—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
- G03G15/32—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head
- G03G15/321—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head by charge transfer onto the recording material in accordance with the image
- G03G15/323—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head by charge transfer onto the recording material in accordance with the image by modulating charged particles through holes or a slit
Abstract
Description
【発明の詳細な説明】
この発明は、記録の制御電圧が低(、中間調記録が可能
であり、かつ記録速度の速い静電記録用静電潜像書きこ
み装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electrostatic latent image writing device for electrostatic recording that is capable of low recording control voltage (halftone recording) and high recording speed.
第1図は従来のこの種の静電記録用静電潜像書きこみ装
置の説明図であって、1はコーナイオン発生のためのワ
イヤ、2はイオン流を制御するための7パーチヤ電極、
3はイオン流を制御するための電圧発生回路、4はイオ
ン流、5はコpす荷電器である。アパーチャ電極2の構
成は、絶縁板21に穴22をあけ、一方の面に電極23
、他方の面に電極24が設けられ、両電極とも穴22に
一致する穴が形成されている。そして電極23゜24間
に電圧発生回路3の電圧が印加される。なお、穴22は
ワイヤ1の長さ方向に沿って多数形成されており、電極
23は1枚の導電板に穴22に合わせて穴を形成したも
のを用い、電極24の方は各穴22の周囲を囲むように
して、互に独立して設けられ、それぞれの電極24に電
圧発生日W&3の電圧が印加される。FIG. 1 is an explanatory diagram of a conventional electrostatic latent image writing device of this type for electrostatic recording, in which 1 is a wire for generating corner ions, 2 is a seven pertier electrode for controlling ion flow,
3 is a voltage generation circuit for controlling the ion flow, 4 is an ion flow, and 5 is a copier charger. The structure of the aperture electrode 2 is that a hole 22 is formed in an insulating plate 21, and an electrode 23 is formed on one surface.
, an electrode 24 is provided on the other side, and both electrodes have holes formed therein that correspond to the holes 22 . A voltage from the voltage generating circuit 3 is applied between the electrodes 23 and 24. Note that a large number of holes 22 are formed along the length direction of the wire 1, and the electrode 23 is made of one conductive plate with holes formed to match the holes 22, and the electrode 24 is formed by forming holes in each hole 22. The electrodes 24 are provided independently from each other so as to surround the periphery of the electrode 24, and a voltage of voltage generation date W&3 is applied to each electrode 24.
上記従来の装置は、このよ5にイオン流4をアパーチャ
電極2で制御し、そのイオン流4により靜電潜偉を形成
し記録を行っていたので、コpすにより発生するイオン
流4は密度が少ないため、ffi俺速変速度いという欠
点があった。In the above-mentioned conventional apparatus, the ion current 4 was controlled by the aperture electrode 2, and the ion current 4 was used to form a static current for recording, so the ion current 4 generated by copying was Because of the lack of speed, there was a drawback that the FFI speed change was slow.
この発明は、これらの欠点を解決するため、アパーチャ
電極とコロナイオン発生源の間に、アパーチャ電極に対
応して穴のあいた電極を配置し、イオン流が7バーチヤ
電極に収束するような電位を印加したものである。以下
、図面についてこの発明を説明する。In order to solve these drawbacks, this invention places an electrode with holes corresponding to the aperture electrode between the aperture electrode and the corona ion source, and applies a potential such that the ion flow converges on the 7-vertical electrode. This is what was applied. The invention will now be explained with reference to the drawings.
第2図はこの発明の一実施例であって、6はイオン流収
束用電源、Tはイオン流の収束用電極であり、中央には
穴71が形成されている。この穴T1の数は穴22の数
と同じで、中心を合わせてあり、穴22の直径φ1に対
し、穴71の直径φ5は大略2倍位にとっである。その
他は第1図と同じである。FIG. 2 shows an embodiment of the present invention, in which 6 is a power source for converging ion flow, T is an electrode for converging ion flow, and a hole 71 is formed in the center. The number of holes T1 is the same as the number of holes 22, and their centers are aligned, and the diameter φ5 of the hole 71 is about twice as large as the diameter φ1 of the holes 22. Other details are the same as in Figure 1.
これを動作するには、ワイヤ1に高電圧を印加し、イオ
ン流4′?!−生じさせろ。流れ出してきたイオン流4
を収束用電極7により収束させイオン密度を高め、イオ
ン制御の7パーチヤ電極2に導く。To operate this, a high voltage is applied to wire 1 and the ion flow 4'? ! -Let it happen. Ion flow that started flowing out 4
The ions are focused by the focusing electrode 7 to increase the ion density, and are guided to the 7-percha electrode 2 for ion control.
アパーチャ電極2においては、制御信号によりイオン通
過順方向電界が電極2゛3と24により穴22内に形成
されている場合はイオン流4が通過でき、また、逆に制
御信号によりイオン通過逆方向電界が形成されている場
合はイオン流4が阻止される。In the aperture electrode 2, the control signal allows the ion flow 4 to pass if the ion flow forward direction electric field is formed in the hole 22 by the electrodes 2, 3 and 24, and vice versa. If an electric field is formed, the ion flow 4 is blocked.
上記に説明したように、イオン流4を収束用室ff17
により収束して7パーチヤ電極2に導き、このアパーチ
ャ電極2によりイオン流4の通過を制御しているので、
イオン流4中のイオン密度が増大し、記録速度を速くす
ることができる。また、イオン流制御法の利点である制
御電圧が低くてよい点及び電極と被書きこみ部の距離の
精度が厳しくない点はそのまま保持されている。As explained above, the ion flow 4 is transferred to the focusing chamber ff17.
The ions are converged and guided to the 7 aperture electrode 2, and the aperture electrode 2 controls the passage of the ion flow 4.
The ion density in the ion flow 4 increases, and the recording speed can be increased. In addition, the advantages of the ion flow control method, such as the fact that the control voltage can be low and the accuracy of the distance between the electrode and the writing target area are not strict, are maintained.
さらに、収束用電極Tは、ステンレス等の薄い板にエツ
チング等により穴をあけることにより容易に作成するこ
とができ、構造が簡単であるという利点がある。Furthermore, the focusing electrode T can be easily made by etching a hole in a thin plate made of stainless steel or the like, and has the advantage of having a simple structure.
収束用電極Tの穴71の直径φ、が、アパーチャ電極2
の穴22の直径φ1より大きいため、なるべく穴22の
間隔を離しておかないと穴T1が対応して形成できな(
なるため穴22の配置を工夫する必要が生ずる。ここで
は、−例を第3図(a)。The diameter φ of the hole 71 of the focusing electrode T is the diameter of the aperture electrode 2.
Since the diameter φ1 of the hole 22 is larger than that of the hole T1, the hole T1 cannot be formed correspondingly unless the holes 22 are spaced apart as much as possible (
Therefore, it is necessary to devise the arrangement of the holes 22. Here, an example is shown in FIG. 3(a).
(b)に示す。第3図(a)に示すよ5に電極23には
穴22が斜めに配置されている。また、第3図(b)に
示すように、電極24は各穴22の周9を取り囲んでそ
れぞれ独立に設けられ、かつリード線25がそれぞれ取
り付けられている。アパーチャ電極2の穴22の配置に
対応して、収束用電極Tの穴T1の配置も第4図に7F
、すように斜めになり、したがって隣接するものが接触
しないで形成でき、収束効果を持った収束用電極7が可
能となる。収束用電極7の収束効果の実験例を示すと次
のよ5である。Shown in (b). As shown in FIG. 3(a), holes 22 are arranged diagonally in the electrode 23. As shown in FIG. Further, as shown in FIG. 3(b), the electrodes 24 are provided independently surrounding the periphery 9 of each hole 22, and lead wires 25 are attached to each electrode. Corresponding to the arrangement of the hole 22 of the aperture electrode 2, the arrangement of the hole T1 of the focusing electrode T is also shown in FIG.
, so that adjacent electrodes can be formed without contacting each other, and the focusing electrode 7 can have a focusing effect. An experimental example of the convergence effect of the convergence electrode 7 is as follows.
アパーチャ電極2の穴22の直径φ1が100〜400
μmで、この直径φ、と等距離に、2倍の直径φbを持
つ穴11を有する収束用電極71に配置し、収束用電極
Tと7バ一チヤ電極20間に5 X 10’ V/mの
電界を加えたところ、収束用電極7がないときに比べ約
9倍の収束効果があった。The diameter φ1 of the hole 22 of the aperture electrode 2 is 100 to 400
μm, and placed at a convergence electrode 71 having a hole 11 with twice the diameter φb equidistant from this diameter φ, and a voltage of 5×10' V/ When an electric field of m was applied, the focusing effect was about 9 times greater than when the focusing electrode 7 was not provided.
第5図はアパーチャ電極2の他の実施例を示すもので、
第3図(b)に対応するものである。この実施例では穴
22’4−斜めの2本の直線上に配置するようにしてい
る。すなわち、第3図(b)では穴22が斜めの1本の
直線上にあるが、これを1つ置きに下方に下げて他の斜
めの直線上に配置したものである。この実施例によると
穴22相互間の距離がさらに大きくとれ、したがって、
収束用電極Tの穴T1の直径を大きくとっても支障がな
いようになる。FIG. 5 shows another embodiment of the aperture electrode 2.
This corresponds to FIG. 3(b). In this embodiment, the holes 22'4 are arranged on two diagonal straight lines. That is, in FIG. 3(b), the holes 22 are on one diagonal straight line, but every other hole is lowered downward and placed on another diagonal straight line. According to this embodiment, the distance between the holes 22 can be further increased, and therefore,
Even if the diameter of the hole T1 of the focusing electrode T is made large, there will be no problem.
なお、上記実験は、ワイヤ1に+6KVの電圧を印加し
、7パーチヤ電極2を通過した電流をエレクトロメータ
で測定することにより行った。さらに、収束用電極7の
穴径とそこに加える電圧を増大すれば、さらに収束する
ことも可能である。The above experiment was conducted by applying a voltage of +6 KV to the wire 1 and measuring the current passing through the seven percha electrodes 2 with an electrometer. Further, by increasing the hole diameter of the focusing electrode 7 and the voltage applied thereto, further focusing is possible.
以上説明したように、この発明は、イオン流制御用の7
パーチヤ電極とコロナワイヤの間に収束用電極l配置し
、イオン流を収束させるようにしたので、記録の制御電
圧が低(てすみ、また、中間調記録が可能で、かつ記録
速度の速い静電記録用静電潜像書きこみ装置を簡単な機
構で実現できる利点がある。As explained above, the present invention provides seven
A converging electrode is placed between the pertier electrode and the corona wire to converge the ion flow, so the control voltage for recording is low. There is an advantage that an electrostatic latent image writing device for electrorecording can be realized with a simple mechanism.
構成略図、第3図(a) 、 (b)はこの発明の7
パーチヤ、電極の一例を示す表面図および裏面図、第4
図は同じく収束用電極の平面図、第5図はアパーチャ電
極の他の例を示す裏面図である。
図中、1はワイヤ、2はアパーチャ電極、3は電圧発生
回路、4はイオン流、5はコpす荷電器、6はイオン流
収束用電極、γは収束用電極、21は絶縁板、22は穴
、23.24は電極、25はリード線、T1は穴である
。
第1図
第2図
へ1Schematic diagrams of the configuration, FIGS. 3(a) and 3(b) are 7 of this invention.
Percha, front view and back view showing an example of electrode, 4th
This figure is also a plan view of the focusing electrode, and FIG. 5 is a back view showing another example of the aperture electrode. In the figure, 1 is a wire, 2 is an aperture electrode, 3 is a voltage generation circuit, 4 is an ion flow, 5 is a copier charger, 6 is an ion flow focusing electrode, γ is a focusing electrode, 21 is an insulating plate, 22 is a hole, 23 and 24 are electrodes, 25 is a lead wire, and T1 is a hole. Figure 1 Go to Figure 2 1
Claims (1)
する7パーチヤ電極との間に、前記7バーチヤ電極の穴
の位置に対応して、その穴径より大きい穴径を有する収
束用電極を配置し、この収束用電極にコロナイオン流を
前記アパーチャ電極の穴に収束させる電位を印加したこ
とを特徴とする静電記録用静電潜像書きこみ装置。A focusing electrode having a hole diameter larger than the hole diameter is arranged between the corona ion generation source and the 7-pertier electrode that electrically controls the +2n ion flow, corresponding to the hole position of the 7-pertier electrode. An electrostatic latent image writing device for electrostatic recording, characterized in that a potential for converging the corona ion flow into the hole of the aperture electrode is applied to the focusing electrode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11917182A JPS5911258A (en) | 1982-07-10 | 1982-07-10 | Electrostatic latent image writing apparatus for electrostatic recording |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11917182A JPS5911258A (en) | 1982-07-10 | 1982-07-10 | Electrostatic latent image writing apparatus for electrostatic recording |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5911258A true JPS5911258A (en) | 1984-01-20 |
JPH0410430B2 JPH0410430B2 (en) | 1992-02-25 |
Family
ID=14754664
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11917182A Granted JPS5911258A (en) | 1982-07-10 | 1982-07-10 | Electrostatic latent image writing apparatus for electrostatic recording |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5911258A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60206672A (en) * | 1984-03-30 | 1985-10-18 | Toshiba Corp | Ion current modulator |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5087330A (en) * | 1973-12-05 | 1975-07-14 | ||
JPS5697358A (en) * | 1979-12-29 | 1981-08-06 | Sony Corp | Ion current controlling electrostatic recorder |
JPS58129439A (en) * | 1982-01-27 | 1983-08-02 | Konishiroku Photo Ind Co Ltd | Electrostatic recording device |
-
1982
- 1982-07-10 JP JP11917182A patent/JPS5911258A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5087330A (en) * | 1973-12-05 | 1975-07-14 | ||
JPS5697358A (en) * | 1979-12-29 | 1981-08-06 | Sony Corp | Ion current controlling electrostatic recorder |
JPS58129439A (en) * | 1982-01-27 | 1983-08-02 | Konishiroku Photo Ind Co Ltd | Electrostatic recording device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60206672A (en) * | 1984-03-30 | 1985-10-18 | Toshiba Corp | Ion current modulator |
Also Published As
Publication number | Publication date |
---|---|
JPH0410430B2 (en) | 1992-02-25 |
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