JPS59104454U - Electron beam equipment equipped with an X-ray analyzer - Google Patents
Electron beam equipment equipped with an X-ray analyzerInfo
- Publication number
- JPS59104454U JPS59104454U JP19888682U JP19888682U JPS59104454U JP S59104454 U JPS59104454 U JP S59104454U JP 19888682 U JP19888682 U JP 19888682U JP 19888682 U JP19888682 U JP 19888682U JP S59104454 U JPS59104454 U JP S59104454U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- upper limit
- limit value
- signal
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
図は本考案の一実施例装置の構成概略図である。
１：電子線、２：フィラメント、３：ウェネルト電極、
４：陽極、５：試料、６：半導体検出器、７：特性Ｘ線
、８：入射窓、９：波高分析計、１０：加速電源、ｌｌ
：ＤＡ変換器、１２：制御回路、１３ａ。
１３ｂ、１３Ｃ：定電圧電源、１４１切換スイツチ、
−１５＝加速電圧指定回路。The figure is a schematic diagram of the configuration of a device according to an embodiment of the present invention. 1: electron beam, 2: filament, 3: Wehnelt electrode,
4: anode, 5: sample, 6: semiconductor detector, 7: characteristic X-ray, 8: entrance window, 9: pulse height analyzer, 10: accelerating power supply, ll
: DA converter, 12: Control circuit, 13a. 13b, 13C: Constant voltage power supply, 141 changeover switch,
-15=acceleration voltage specification circuit.
Claims (1)
生するＸ線を検出するＸ線検出器と、該検出器の近傍に
設けられＸ線透過率の異る複数の窓材が交換可能に挿入
される入射窓と、該入射窓に挿入される窓材の種類に応
じて前記電子銃における電子線の加速電圧の上限値を設
定する上限値設定手段と、前記電子銃における加速電圧
を指定する電圧指定手段と、該電圧指定手段からの信号
と前記上限値設定手段からの信号とを比較する手段を有
する制御手段と、該制御手段からの信号によって前記電
子銃における加速電圧を制御するように構成したことを
特徴とするＸ線分析装置を備 ・えた電子線装置。An electron gun that emits an electron beam to irradiate the sample, an X-ray detector that detects the X-rays generated from the sample, and multiple window materials with different X-ray transmittances installed near the detector are replaceable. an entrance window inserted into the entrance window; an upper limit value setting means for setting an upper limit value of the acceleration voltage of the electron beam in the electron gun according to the type of window material inserted into the entrance window; a control means having a voltage specifying means, a means for comparing a signal from the voltage specifying means and a signal from the upper limit value setting means, and controlling an accelerating voltage in the electron gun by the signal from the control means. An electron beam device equipped with an X-ray analysis device configured as follows.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19888682U JPS59104454U (en) | 1982-12-28 | 1982-12-28 | Electron beam equipment equipped with an X-ray analyzer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19888682U JPS59104454U (en) | 1982-12-28 | 1982-12-28 | Electron beam equipment equipped with an X-ray analyzer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59104454U true JPS59104454U (en) | 1984-07-13 |
Family
ID=30424442
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19888682U Pending JPS59104454U (en) | 1982-12-28 | 1982-12-28 | Electron beam equipment equipped with an X-ray analyzer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59104454U (en) |
-
1982
- 1982-12-28 JP JP19888682U patent/JPS59104454U/en active Pending
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