JPS589936B2 - 光重合性組成物 - Google Patents
光重合性組成物Info
- Publication number
- JPS589936B2 JPS589936B2 JP52028752A JP2875277A JPS589936B2 JP S589936 B2 JPS589936 B2 JP S589936B2 JP 52028752 A JP52028752 A JP 52028752A JP 2875277 A JP2875277 A JP 2875277A JP S589936 B2 JPS589936 B2 JP S589936B2
- Authority
- JP
- Japan
- Prior art keywords
- carbon atoms
- component
- alkyl
- radiation
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US66753676A | 1976-03-17 | 1976-03-17 | |
| US75869977A | 1977-01-17 | 1977-01-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52111985A JPS52111985A (en) | 1977-09-20 |
| JPS589936B2 true JPS589936B2 (ja) | 1983-02-23 |
Family
ID=27099703
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52028752A Expired JPS589936B2 (ja) | 1976-03-17 | 1977-03-17 | 光重合性組成物 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS589936B2 (en:Method) |
| CA (1) | CA1103084A (en:Method) |
| DE (1) | DE2710417C3 (en:Method) |
| FR (1) | FR2344869A1 (en:Method) |
| GB (1) | GB1547548A (en:Method) |
| NL (1) | NL183583C (en:Method) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE852517A (fr) * | 1976-03-17 | 1977-09-16 | Du Pont | Composition photopolymerisable contenant un compose o-nitroaromatique comme photoinhibiteur et procedes de formation d'images a partir de cette composition |
| BE881232R (fr) * | 1978-06-08 | 1980-07-18 | Du Pont | Composition photopolymerisable contenant un compose o-nitro-aromatique comme photoinhibiteur et procedes de formation d'images a partir de cette composition |
| US4276152A (en) * | 1979-09-24 | 1981-06-30 | Mobil Oil Corporation | Reforming of sulfur-containing charge stock |
| US4268667A (en) | 1980-04-21 | 1981-05-19 | E. I. Du Pont De Nemours And Company | Derivatives of aryl ketones based on 9,10-dihydro-9,10-ethanoanthracene and p-dialkyl-aminoaryl aldehydes as visible sensitizers for photopolymerizable compositions |
| US4477556A (en) * | 1982-08-18 | 1984-10-16 | E. I. Du Pont De Nemours And Company | Acidic o-nitroaromatics as photoinhibitors of polymerization in positive working films |
| DE10326324B4 (de) * | 2003-06-11 | 2007-02-08 | Kodak Polychrome Graphics Gmbh | Lithographiedruckplatten-Vorläufer mit 1,4-Dihydropyridin-Sensibilisator enthaltender Beschichtung, Verfahren zum Bebildern und Bebilderte Lithographiedruckplatte |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3895952A (en) * | 1973-02-09 | 1975-07-22 | American Can Co | Phototropic compounds as acid catalyst for epoxy materials |
-
1977
- 1977-03-10 DE DE19772710417 patent/DE2710417C3/de not_active Expired
- 1977-03-15 CA CA273,994A patent/CA1103084A/en not_active Expired
- 1977-03-16 FR FR7707823A patent/FR2344869A1/fr active Granted
- 1977-03-16 GB GB1111077A patent/GB1547548A/en not_active Expired
- 1977-03-17 JP JP52028752A patent/JPS589936B2/ja not_active Expired
- 1977-03-17 NL NL7702887A patent/NL183583C/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| NL7702887A (nl) | 1977-09-20 |
| DE2710417C3 (de) | 1980-08-14 |
| GB1547548A (en) | 1979-06-20 |
| JPS52111985A (en) | 1977-09-20 |
| FR2344869A1 (fr) | 1977-10-14 |
| FR2344869B1 (en:Method) | 1981-04-10 |
| NL183583C (nl) | 1988-12-01 |
| DE2710417A1 (de) | 1977-09-29 |
| DE2710417B2 (de) | 1979-12-06 |
| CA1103084A (en) | 1981-06-16 |
| NL183583B (nl) | 1988-07-01 |
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