JPS5892462A - Method of backwashing ion-exchange column - Google Patents

Method of backwashing ion-exchange column

Info

Publication number
JPS5892462A
JPS5892462A JP56189070A JP18907081A JPS5892462A JP S5892462 A JPS5892462 A JP S5892462A JP 56189070 A JP56189070 A JP 56189070A JP 18907081 A JP18907081 A JP 18907081A JP S5892462 A JPS5892462 A JP S5892462A
Authority
JP
Japan
Prior art keywords
backwashing
water
introduction
collection mechanism
water collection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56189070A
Other languages
Japanese (ja)
Other versions
JPS6220849B2 (en
Inventor
Kanroku Naganami
長南 勘六
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Infilco Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Infilco Co Ltd filed Critical Ebara Infilco Co Ltd
Priority to JP56189070A priority Critical patent/JPS5892462A/en
Publication of JPS5892462A publication Critical patent/JPS5892462A/en
Publication of JPS6220849B2 publication Critical patent/JPS6220849B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To efficiently remove suspended matter and to shorten the time for backwashing, by alternatively or concurrently performing the introduction of backwashing water from an intermediate water-collecting mechanism and the introduction of backwashing water from a lower water-collecting mechanism. CONSTITUTION:In backwashing an ion-exchange column, the introduction of backwashing water from an intermediate water-collecting mechanism C2 and the introduction of backwashing water from a lower water-collecting mechanism C1 are alternatively or concurrently performed. Hence, partial backwashing and entire backwashing are repeated, and resin at an upper part is backwashed at a high speed by the introduction of water from the intermediate water-collecting mechanism C2 during said entire backwashing, so that efficient backwashing can be performed. Consequently, the time for backwashing can be shortened, and the size of the apparatus can be made small.

Description

【発明の詳細な説明】 本発明は、イオン交換塔の逆洗方法の改良に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a method for backwashing an ion exchange column.

最近イオン交換塔の逆流方法については、従来の順流式
に代わって再生効率の良い向流式が採用されるようにな
ってきており、下向流通水上向流通薬方式の向流式では
、通常毎サイクルの逆洗は中間集水装置より上部の樹脂
層のみ行ない、全樹脂層の逆洗は数サイクルから数十サ
イクルに1回の割合で行なわれている。
Recently, as for the backflow method of ion exchange towers, a countercurrent method with high regeneration efficiency has been adopted instead of the conventional downflow method. Backwashing in every cycle is performed only on the resin layer above the intermediate water collecting device, and backwashing on all the resin layers is performed once every several cycles to several tens of cycles.

一般にこの逆洗流速は樹脂に付着している懸濁物を樹脂
同志の衝突によって剥離させるのに適した展開率に保ち
、樹脂同志の衝突が最大になるように逆洗流速を決める
必要がある。因みに一般のf過装置ではこの展開率は3
091@度がよいといわれている。
In general, this backwashing flow rate must be maintained at a development rate suitable for peeling off the suspended matter adhering to the resin through collisions between the resins, and the backwashing flow rate must be determined to maximize collisions between the resins. . By the way, with a general f-passing device, this expansion rate is 3.
It is said that 091@ degree is good.

イオン交換塔では、展開率を30%を基準にすると逆洗
流速がかなり小さくなり、逆洗効率を支配しているもう
一つの要因である剥離した懸濁物の運搬速度が小さくな
り、樹脂層の表層から旭環液排出口としての上部集水装
置まで運搬し排出するのにかなり時間を要してしまう。
In an ion exchange tower, when the expansion rate is set to 30%, the backwash flow rate becomes considerably small, and the transport speed of exfoliated suspended matter, which is another factor controlling the backwash efficiency, becomes small, and the resin layer It takes a considerable amount of time to transport and discharge the liquid from the surface layer to the upper water collection device that serves as the Asahi rinsing liquid outlet.

それ故現在逆洗流速は、剥離した懸濁物の排出を早くす
るために、カチオン交換塔でLV15%’h 、アニオ
ン交換塔でLV6Wy′h 程度が採用されている。こ
の場合の展開率は水温20.2℃でそれぞれ42Ls、
 6SS程度である。
Therefore, the current backwash flow rate is approximately LV15%'h for the cation exchange tower and LV6Wy'h for the anion exchange tower in order to speed up the discharge of the separated suspended matter. In this case, the development rate is 42Ls at a water temperature of 20.2℃,
It is about 6SS.

展開率30チとなる流速がそれぞれLV12□、LV3
’Fl/h程度であるから、かなり早い流速を採用して
いるといえる。
The flow velocity at which the deployment rate is 30chi is LV12□ and LV3, respectively.
'Fl/h, so it can be said that a fairly high flow rate is used.

しかしながら、このような流速を採用していても懸濁物
の粒径、比重が大きい場合排出できにくく、これが樹脂
層上部にかなり残留すること、また圧力損失の増大をも
たらす微細化した樹脂が残留することはよく経験される
ところである。
However, even if such a flow rate is adopted, if the particle size and specific gravity of the suspended matter are large, it will be difficult to discharge, and a considerable amount of this will remain in the upper part of the resin layer, and finer resin will remain, causing an increase in pressure loss. It is a common experience to do this.

向流式のイオン交換塔においては、樹脂層を1800〜
3000mmとし、従来の層流式よりもかなり高くして
いるため、その分フリーボードの距離が長くなり、逆洗
時間も長くする必要がある。現在、下部集水装置からの
全逆洗を行なうのに1〜1.5時間と長時問掛かってい
る例も多い。
In a countercurrent type ion exchange tower, the resin layer is
Since it is 3000mm, which is much higher than the conventional laminar flow type, the freeboard distance is correspondingly longer, and the backwashing time must also be longer. Currently, in many cases, it takes a long time, 1 to 1.5 hours, to completely backwash the water from the lower water collection device.

本発明はこのような現状の問題点を改良し、効率良く懸
濁物の除去を行ない逆洗時間を短縮すると共に、必要な
フリーボードを従来より着しく小さくできる、イオン交
換塔の逆洗方法を提供することを目的とするものである
The present invention improves these current problems, and provides a method for backwashing an ion exchange column that efficiently removes suspended matter, shortens backwash time, and allows the required free board to be made smaller than before. The purpose is to provide the following.

すなわち本発明は、イオン交換塔内にイオン交換樹脂が
充填され、中間集水機構および下部集水機構を有するイ
オン交換装置の逆洗方法において、前記中間集水機構か
らの逆洗水の導入と前記下部集水機構からの逆洗水の導
入を交互又は同時に行なうことを特徴とするものである
That is, the present invention provides a method for backwashing an ion exchange device in which an ion exchange tower is filled with an ion exchange resin and has an intermediate water collection mechanism and a lower water collection mechanism, including introducing backwash water from the intermediate water collection mechanism. The present invention is characterized in that backwash water is introduced from the lower water collection mechanism alternately or simultaneously.

本発明の実施態様を説明すると、1水中に懸濁物が多く
含まれる場合は樹脂表層に懸濁物の皮膜が形成されると
きがあり、このような状態で下部集水機構から全逆洗を
行なうと皮膜の破壊が弱くマッドボール生成の一因とな
るので、これを避けるため第1段階として中間集水機構
から、従来よりも高流速く(カチオン塔の場合、LV 
20〜30m/h)で逆洗を行なってこのような皮膜を
破壊する(これを逆洗工11(1)、部分逆洗という)
。その後、下部集水機構より剥離作用が最大になるよう
な流速(従来よりは低流速)で逆洗する(これを逆洗工
程(II)、全逆洗という)。そして更に、剥離された
懸濁物、微細樹脂が樹脂層上部に集中した時点で再度中
間集水機構から逆洗して運搬を行なう(これを逆洗工程
(至)、部分逆洗という)。
To explain the embodiment of the present invention, if a large amount of suspended matter is contained in the water, a film of suspended matter may be formed on the resin surface layer, and in such a state, all backwashing is performed from the lower water collection mechanism. If this is done, the film will be weakly destroyed and will be a factor in the formation of mud balls, so in order to avoid this, the first step is to increase the flow rate from the intermediate water collection mechanism at a higher rate than before (in the case of a cation tower, the LV
20 to 30 m/h) to destroy such a film (this is called backwashing process 11 (1), partial backwashing).
. Thereafter, backwashing is performed from the lower water collecting mechanism at a flow rate (lower flow rate than before) that maximizes the stripping effect (this is called backwashing step (II), total backwashing). Furthermore, when the separated suspended matter and fine resin are concentrated on the upper part of the resin layer, they are backwashed and transported again from the intermediate water collection mechanism (this is called the backwashing step (end) or partial backwashing).

このように本発明は3段階で逆洗を行なうことを基本と
するが、懸濁物が少ない場合、逆洗工程(1)を省いて
もよく、また、懸濁物が多い場合はこれらの逆洗を繰り
返し行なうのである。このように、逆洗の機能を剥離作
用と運搬の二つに分けてそれぞれに好適なように逆洗を
行なうこと1;より剥離作用が最大となり、剥離操作の
ための時間が短縮され、また運搬のための流速も大きく
しているので、従来方法よりも逆洗時間が短縮されるの
である。
As described above, the present invention is based on performing backwashing in three stages, but if there are few suspended substances, the backwashing step (1) may be omitted, and if there are many suspended substances, these steps may be omitted. Backwashing is performed repeatedly. In this way, the function of backwashing is divided into two, stripping action and transportation, and backwashing is performed in a manner suitable for each.1; The stripping action is maximized, the time for stripping operation is shortened, and Because the flow rate for transportation is also increased, backwashing time is shorter than with conventional methods.

一般に、イオン交換塔のフリーボードはカチオン交換塔
で樹脂層の75%、アニオン交換塔で100SS度とし
ているが、この値は剥離作用に好適の流速により決めた
ものではなく運搬時間も考慮して大きめに設定されてい
る。例えば、アニオン交換塔において水温が低い場合、
展開率が801になったときにも更に安全率20饅を見
込み100チとしている。これに対して本発明方法に従
えば、従来法よりも樹脂層の展開率が小さくとれ、全逆
洗時で30−〜40−に設定されるため、更(:安全率
を20〜30チ見込んでも従来より7リーボードをかな
り小さくできるやである。
Generally, the freeboard of the ion exchange tower is set to 75% of the resin layer in the cation exchange tower and 100 SS degrees in the anion exchange tower, but these values are not determined based on the flow rate suitable for stripping action, but also take into account the transportation time. It is set large. For example, when the water temperature is low in an anion exchange tower,
Even when the deployment rate reaches 801, the safety factor is set at 100, with an additional safety factor of 20. On the other hand, according to the method of the present invention, the development rate of the resin layer can be kept smaller than that of the conventional method, and it is set at 30 to 40 at the time of full backwashing. Even if we estimate it, it is possible to make the 7-lead board much smaller than before.

次に、本発明による逆洗工程の実施例を図面を参照して
説明する。
Next, an example of a backwashing process according to the present invention will be described with reference to the drawings.

実施例 図においてC1+ ex r Csはそれぞれ下部集水
機構、中間集水機構、上部集水機構であり、& e R
2はそれぞれ下部樹脂層、上部樹脂層である。また、1
゜2及び3は弁を、Hは塔高を、hは逆洗時の樹脂面を
、tlは下部樹脂層の層高を、t2は上部樹脂層の層高
をそれぞれ表わしている。
In the example diagram, C1+ ex r Cs are a lower water collection mechanism, an intermediate water collection mechanism, and an upper water collection mechanism, respectively, & e R
2 are a lower resin layer and an upper resin layer, respectively. Also, 1
゜2 and 3 represent the valves, H represents the tower height, h represents the resin surface during backwashing, tl represents the layer height of the lower resin layer, and t2 represents the layer height of the upper resin layer.

逆洗工程(I):採水終了後弁2、弁3を開としカチオ
ン交換塔テLv2o〜251′I@//hテ5〜15分
間、アニオン交換塔でLV8〜14m/hで5〜15分
関逆洗を行なう。
Backwash step (I): After water sampling is completed, valves 2 and 3 are opened, and the cation exchange tower is heated at Lv2o~251'I@//h for 5~15 minutes, and the anion exchange tower is heated at LV8~14 m/h for 5~15 minutes. Perform backwashing for 15 minutes.

逆洗工程(H):次いで弁2を閉、弁1を開とし、カチ
オン交換塔テLv8〜121/hテ30〜40分間、ア
ニオン交換塔でLV3〜4 m/hで勿〜旬分間逆洗を
行なう。
Backwash step (H): Next, close valve 2, open valve 1, and reverse wash the cation exchange tower at Lv 8 to 121/h for 30 to 40 minutes, and the anion exchange tower at LV 3 to 4 m/h for 30 to 40 minutes. Perform washing.

逆洗工程@:次いで弁1を閉とし2〜3分間の沈静処理
後弁2を開とし逆洗工程(1)と同様の操作を行なう。
Backwash step @: Next, valve 1 is closed, and after 2 to 3 minutes of calming treatment, valve 2 is opened and the same operation as in backwash step (1) is performed.

なお、逆洗時間は樹脂の汚染状況によって適宜決定する
Note that the backwashing time is appropriately determined depending on the contamination status of the resin.

このような手順によって、濁度0.5度の原水を処理す
る向流式イオン交換塔において10〜2oサイクルに1
回の割合でカチオン交換塔を逆洗したが、従来方法では
60−90分逆洗に要したのに対し本発明方法では次の
如く45分程度で充分であり、逆洗状態は良好であった
Through this procedure, in a countercurrent ion exchange tower that treats raw water with a turbidity of 0.5 degrees, one cycle is generated every 10 to 2 o cycles.
The cation exchange tower was backwashed at a rate of 1.5 times, and while the conventional method required 60-90 minutes for backwashing, the method of the present invention only required about 45 minutes, as shown below, and the backwashing conditions were good. Ta.

逆洗工程(15−・−LV25m/h、  5分1  
(10・−・・・LM 12 m/h、 30分合計 
45分 一方、イオン交換塔の必要高さについて検討した結果に
ついては、別表のとおりである。すなわち、前記t1を
1700mm%L2を700mの一定値とし、本発明方
法では上記手順によって部分逆洗と全逆洗な、従来方法
では全逆洗のみをそれぞれ別表の条件に従って行なった
結果はぼ同程度の逆洗効果を得ることができたが、別表
のようにhの最大値(※印)は本発明方法による方が従
来方法よりも著しく小さく、その差はカチオン交換塔で
は380帛、アニオン交換塔では720 mmとなった
Backwash process (15-・-LV25m/h, 5 minutes 1
(10...LM 12 m/h, 30 minutes total
45 minutes On the other hand, the results of the study on the required height of the ion exchange tower are shown in the attached table. That is, when the t1 is set to a constant value of 1,700 mm% and L2 is a constant value of 700 m, the results are almost the same when partial backwashing and full backwashing are performed according to the above procedure in the method of the present invention, and only full backwashing is performed in the conventional method according to the conditions in the attached table. However, as shown in the attached table, the maximum value of h (marked with *) is significantly smaller in the method of the present invention than in the conventional method, and the difference is 380 in the cation exchange column and At the exchange tower, it was 720 mm.

これを更に具体的に説明すると、従来方法では逆洗時の
樹脂流失の危険がないように(:H−h)を300馴程
度にとり、最も展開率の大きいとき(水温が低いとき、
5℃)の値にこの300mmを加えると、だデ1ン交換
塔ではH= 3890 + 300中4200鴫、アニ
オン交換塔ではH=4440+300中4800nt!
I@もの塔高が必要となる。すなわち充填層のそれぞれ
7H1゜1001Gの7リーボードを必要とする。辷れ
に比べて本発明方法にように場合は、同様に[1−h)
を300 mmとするとカチオン交換塔でH= 35)
10+300中3900mm、アニオン交換塔でH−3
720+300中4100鯛となり、更に安全を見込ん
で(H−h)を400mmとしてもH= 3720 +
 400中4200mmとなり必要な7リーボードはそ
れぞれ60〜651.70−80−で充分である。
To explain this more specifically, in the conventional method, in order to avoid the risk of resin loss during backwashing, (:H-h) is set at about 300 degrees, and when the development rate is the highest (when the water temperature is low),
By adding this 300mm to the value of 5°C), in the deion exchange tower H = 3890 + 4200 nt out of 300, and in the anion exchange tower H = 4440 + 4800 nt out of 300!
The tower height of I@ is required. That is, 7 Leeboards of 7H1°1001G are required for each filling layer. Similarly, in the case of the method of the present invention compared to the slippage [1-h)
300 mm, H = 35 in the cation exchange tower)
3900mm in 10+300, H-3 in anion exchange tower
The result is 4100 sea bream out of 720 + 300, and even if (H-h) is set to 400 mm to ensure safety, H = 3720 +
4200 mm out of 400, and the required 7 Lee boards are 60 to 651.70-80, respectively.

このように本発明方法によれば、アニオン交換塔におい
ては従来方法に比べて塔高(H)が600〜700mm
も小さくでき、塔高が小さくできることによって、洗浄
時の置換水量の減少、洗浄時間の短縮、さらには排水量
の減少など数々のメリットが生じる。
As described above, according to the method of the present invention, the anion exchange column has a column height (H) of 600 to 700 mm compared to the conventional method.
By reducing the height of the tower, there are many benefits such as a reduction in the amount of water replaced during cleaning, a reduction in cleaning time, and a reduction in the amount of waste water.

本発明方法と従来方法の比較 但し、tl、 t2はそれぞれ1700mm 、 70
0mm本発明は部分逆洗と全逆洗を繰り返すものである
が、この全逆洗中に中間集水機構からも水を導入し上部
の樹脂は高流速で逆洗することによっても効率的な逆洗
を行なうことができる。また、このとき中間集水機構か
らの水の導入を間欠的に行なうのも好ましい方法である
Comparison of the method of the present invention and the conventional method However, tl and t2 are 1700 mm and 70 mm, respectively.
0mm The present invention repeats partial backwashing and full backwashing, but during this full backwashing, water is also introduced from the intermediate water collection mechanism and the upper resin is backwashed at a high flow rate, making it more efficient. Backwashing can be performed. Further, at this time, it is also a preferable method to introduce water intermittently from the intermediate water collecting mechanism.

以上述べたように本発明によれば、簡便な操作で従来方
法に比べてより短時間で効率良く逆洗を行なうことがで
きるうえ、イオン交換塔の塔高も低くてすみ、装置のコ
ンパクト化が可能となるなどの利点が得られると共に、
本発明方法は向流式であると混床式であるとを問わず中
間集水機構を備えた塔に対し広く適用できるものである
As described above, according to the present invention, backwashing can be performed more efficiently in a shorter time than with conventional methods with simple operations, and the height of the ion exchange column can also be lowered, resulting in a more compact device. In addition to obtaining advantages such as being able to
The method of the present invention can be widely applied to towers equipped with an intermediate water collection mechanism, regardless of whether they are countercurrent type or mixed bed type.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明の実施態様を示す系統説明図である。 H・・・塔高、h・・・逆洗時の樹脂面、Ll・・・下
部樹脂層の層高、t2・・・上部樹脂層の層高、C1・
・・下部集水機構、C2・・・中間集水機構、C5・・
・上部集水機構。
The drawings are system explanatory diagrams showing embodiments of the present invention. H... tower height, h... resin surface during backwashing, Ll... layer height of lower resin layer, t2... layer height of upper resin layer, C1.
・Lower water collection mechanism, C2 ・Intermediate water collection mechanism, C5...
・Upper water collection mechanism.

Claims (1)

【特許請求の範囲】 1、 イオン交換塔内にイオン交換樹脂が充填され、中
間集水機構および下部集水機構を有するイオン交換装置
の逆洗方法において、前記中間集水機構からの逆洗水の
導入と前記下部集水機構からの逆洗水の導入を交互又は
同時に行なうことを特徴とするイオン交換塔の逆洗方法
。 2、 前記中間集水機構からの逆洗水流速を前記下部集
水機構からの逆洗水流速よりも大きくして行なう特許請
求の範囲第1項記載の方法。
[Claims] 1. In a method for backwashing an ion exchange device in which an ion exchange tower is filled with an ion exchange resin and has an intermediate water collection mechanism and a lower water collection mechanism, backwash water from the intermediate water collection mechanism is provided. A method for backwashing an ion exchange tower, characterized in that the introduction of water and the introduction of backwash water from the lower water collection mechanism are carried out alternately or simultaneously. 2. The method according to claim 1, wherein the flow rate of backwash water from the intermediate water collection mechanism is made higher than the flow rate of backwash water from the lower water collection mechanism.
JP56189070A 1981-11-27 1981-11-27 Method of backwashing ion-exchange column Granted JPS5892462A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56189070A JPS5892462A (en) 1981-11-27 1981-11-27 Method of backwashing ion-exchange column

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56189070A JPS5892462A (en) 1981-11-27 1981-11-27 Method of backwashing ion-exchange column

Publications (2)

Publication Number Publication Date
JPS5892462A true JPS5892462A (en) 1983-06-01
JPS6220849B2 JPS6220849B2 (en) 1987-05-09

Family

ID=16234793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56189070A Granted JPS5892462A (en) 1981-11-27 1981-11-27 Method of backwashing ion-exchange column

Country Status (1)

Country Link
JP (1) JPS5892462A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012086123A (en) * 2010-10-18 2012-05-10 Japan Organo Co Ltd Method for separating mixed resin of mixed bed resin packed column

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5372786A (en) * 1976-12-10 1978-06-28 Kubota Ltd Back washing method for ion exchange resin

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5372786A (en) * 1976-12-10 1978-06-28 Kubota Ltd Back washing method for ion exchange resin

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012086123A (en) * 2010-10-18 2012-05-10 Japan Organo Co Ltd Method for separating mixed resin of mixed bed resin packed column

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JPS6220849B2 (en) 1987-05-09

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