JPS5891683A - 光導電部材 - Google Patents
光導電部材Info
- Publication number
- JPS5891683A JPS5891683A JP56190037A JP19003781A JPS5891683A JP S5891683 A JPS5891683 A JP S5891683A JP 56190037 A JP56190037 A JP 56190037A JP 19003781 A JP19003781 A JP 19003781A JP S5891683 A JPS5891683 A JP S5891683A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- atoms
- layer region
- amorphous
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
- G03G5/08214—Silicon-based
- G03G5/08235—Silicon-based comprising three or four silicon-based layers
- G03G5/08242—Silicon-based comprising three or four silicon-based layers at least one with varying composition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/10—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices being sensitive to infrared radiation, visible or ultraviolet radiation, and having no potential barriers, e.g. photoresistors
- H10F30/15—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices being sensitive to infrared radiation, visible or ultraviolet radiation, and having no potential barriers, e.g. photoresistors comprising amorphous semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Light Receiving Elements (AREA)
- Photoreceptors In Electrophotography (AREA)
- Silicon Compounds (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56190037A JPS5891683A (ja) | 1981-11-26 | 1981-11-26 | 光導電部材 |
US06/443,656 US4460669A (en) | 1981-11-26 | 1982-11-22 | Photoconductive member with α-Si and C, U or D and dopant |
GB08233457A GB2111708B (en) | 1981-11-26 | 1982-11-24 | Photoconductive member |
DE3243891A DE3243891C2 (de) | 1981-11-26 | 1982-11-26 | Elektrofotografisches Aufzeichnungsmaterial |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56190037A JPS5891683A (ja) | 1981-11-26 | 1981-11-26 | 光導電部材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5891683A true JPS5891683A (ja) | 1983-05-31 |
JPS6316915B2 JPS6316915B2 (enrdf_load_stackoverflow) | 1988-04-11 |
Family
ID=16251305
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56190037A Granted JPS5891683A (ja) | 1981-11-26 | 1981-11-26 | 光導電部材 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5891683A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61180426A (ja) * | 1984-11-05 | 1986-08-13 | エナージー・コンバーション・デバイセス・インコーポレーテッド | p形アモルファス半導体を堆積させる方法及び電子写真用光受容体の製造方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03129513U (enrdf_load_stackoverflow) * | 1990-04-11 | 1991-12-26 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5513939A (en) * | 1978-07-17 | 1980-01-31 | Shunpei Yamazaki | Photoelectronic conversion semiconductor device |
-
1981
- 1981-11-26 JP JP56190037A patent/JPS5891683A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5513939A (en) * | 1978-07-17 | 1980-01-31 | Shunpei Yamazaki | Photoelectronic conversion semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61180426A (ja) * | 1984-11-05 | 1986-08-13 | エナージー・コンバーション・デバイセス・インコーポレーテッド | p形アモルファス半導体を堆積させる方法及び電子写真用光受容体の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6316915B2 (enrdf_load_stackoverflow) | 1988-04-11 |