JPS5882560A - Cmos集積回路 - Google Patents

Cmos集積回路

Info

Publication number
JPS5882560A
JPS5882560A JP56179653A JP17965381A JPS5882560A JP S5882560 A JPS5882560 A JP S5882560A JP 56179653 A JP56179653 A JP 56179653A JP 17965381 A JP17965381 A JP 17965381A JP S5882560 A JPS5882560 A JP S5882560A
Authority
JP
Japan
Prior art keywords
power source
electric power
power supply
terminal
control element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56179653A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0118587B2 (OSRAM
Inventor
Teruji Fujii
照司 藤井
Mutsuo Kataoka
片岡 睦雄
Takashi Hamano
浜野 隆
Atsushi Iwata
穆 岩田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Oki Electric Industry Co Ltd filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56179653A priority Critical patent/JPS5882560A/ja
Publication of JPS5882560A publication Critical patent/JPS5882560A/ja
Publication of JPH0118587B2 publication Critical patent/JPH0118587B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/854Complementary IGFETs, e.g. CMOS comprising arrangements for preventing bipolar actions between the different IGFET regions, e.g. arrangements for latchup prevention

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP56179653A 1981-11-11 1981-11-11 Cmos集積回路 Granted JPS5882560A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56179653A JPS5882560A (ja) 1981-11-11 1981-11-11 Cmos集積回路

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56179653A JPS5882560A (ja) 1981-11-11 1981-11-11 Cmos集積回路

Publications (2)

Publication Number Publication Date
JPS5882560A true JPS5882560A (ja) 1983-05-18
JPH0118587B2 JPH0118587B2 (OSRAM) 1989-04-06

Family

ID=16069531

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56179653A Granted JPS5882560A (ja) 1981-11-11 1981-11-11 Cmos集積回路

Country Status (1)

Country Link
JP (1) JPS5882560A (OSRAM)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4571505A (en) * 1983-11-16 1986-02-18 Inmos Corporation Method and apparatus of reducing latch-up susceptibility in CMOS integrated circuits
US4837460A (en) * 1983-02-21 1989-06-06 Kabushiki Kaisha Toshiba Complementary MOS circuit having decreased parasitic capacitance
JPH01220470A (ja) * 1988-02-29 1989-09-04 Fujitsu Ltd 相補型半導体集積回路装置
JP2014027279A (ja) * 2012-07-27 2014-02-06 Freescale Semiconductor Inc 半導体デバイスのためのシングルイベントラッチアップ防止技法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4837460A (en) * 1983-02-21 1989-06-06 Kabushiki Kaisha Toshiba Complementary MOS circuit having decreased parasitic capacitance
US4571505A (en) * 1983-11-16 1986-02-18 Inmos Corporation Method and apparatus of reducing latch-up susceptibility in CMOS integrated circuits
JPH01220470A (ja) * 1988-02-29 1989-09-04 Fujitsu Ltd 相補型半導体集積回路装置
JP2014027279A (ja) * 2012-07-27 2014-02-06 Freescale Semiconductor Inc 半導体デバイスのためのシングルイベントラッチアップ防止技法

Also Published As

Publication number Publication date
JPH0118587B2 (OSRAM) 1989-04-06

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