JPS5878417A - 薄膜形成真空装置 - Google Patents

薄膜形成真空装置

Info

Publication number
JPS5878417A
JPS5878417A JP56176361A JP17636181A JPS5878417A JP S5878417 A JPS5878417 A JP S5878417A JP 56176361 A JP56176361 A JP 56176361A JP 17636181 A JP17636181 A JP 17636181A JP S5878417 A JPS5878417 A JP S5878417A
Authority
JP
Japan
Prior art keywords
substrate
cooling
heating
holder
substrate support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56176361A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6256652B2 (OSRAM
Inventor
Kazuo Nakamura
一雄 中村
Shinya Homan
信也 宝満
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP56176361A priority Critical patent/JPS5878417A/ja
Publication of JPS5878417A publication Critical patent/JPS5878417A/ja
Publication of JPS6256652B2 publication Critical patent/JPS6256652B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/22—

Landscapes

  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP56176361A 1981-11-05 1981-11-05 薄膜形成真空装置 Granted JPS5878417A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56176361A JPS5878417A (ja) 1981-11-05 1981-11-05 薄膜形成真空装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56176361A JPS5878417A (ja) 1981-11-05 1981-11-05 薄膜形成真空装置

Publications (2)

Publication Number Publication Date
JPS5878417A true JPS5878417A (ja) 1983-05-12
JPS6256652B2 JPS6256652B2 (OSRAM) 1987-11-26

Family

ID=16012263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56176361A Granted JPS5878417A (ja) 1981-11-05 1981-11-05 薄膜形成真空装置

Country Status (1)

Country Link
JP (1) JPS5878417A (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6165421A (ja) * 1984-09-07 1986-04-04 Matsushita Electric Ind Co Ltd プラズマ化学気相堆積装置
JPH036366A (ja) * 1989-06-02 1991-01-11 Nippon Steel Corp 反応蒸着装置用基板ホルダー固定台
JP2016125107A (ja) * 2015-01-06 2016-07-11 株式会社カネカ 薄膜形成装置及びそれを用いた薄膜の製造方法、並びに有機ｅｌ装置の製造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03105540U (OSRAM) * 1990-02-09 1991-10-31
JPH0592310U (ja) * 1992-05-19 1993-12-17 丸井産業株式会社 構築用スペーサー

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6165421A (ja) * 1984-09-07 1986-04-04 Matsushita Electric Ind Co Ltd プラズマ化学気相堆積装置
JPH036366A (ja) * 1989-06-02 1991-01-11 Nippon Steel Corp 反応蒸着装置用基板ホルダー固定台
JP2016125107A (ja) * 2015-01-06 2016-07-11 株式会社カネカ 薄膜形成装置及びそれを用いた薄膜の製造方法、並びに有機ｅｌ装置の製造方法

Also Published As

Publication number Publication date
JPS6256652B2 (OSRAM) 1987-11-26

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