JPS5877008U - Resistor pattern misalignment inspection mask - Google Patents
Resistor pattern misalignment inspection maskInfo
- Publication number
- JPS5877008U JPS5877008U JP17111781U JP17111781U JPS5877008U JP S5877008 U JPS5877008 U JP S5877008U JP 17111781 U JP17111781 U JP 17111781U JP 17111781 U JP17111781 U JP 17111781U JP S5877008 U JPS5877008 U JP S5877008U
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- resistor
- resistor pattern
- inspection mask
- misalignment inspection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Adjustable Resistors (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図ａは抵抗体パターン群の平面図、第１図すは抵抗
体パターン個片のずれ状態の拡大平面図。
第２図ａおよびｂは本考案による抵抗体パターン群のず
れ検査マスクの平面図および部分拡大平面図。
１．１１・・・・・・小孔、２・・・・・・絶縁基板、
３・・・・・・抵抗体パターン、４・・・・・・透明薄
板、５・・・・・・（検査用の）正常パターン、６・・
・・・・位置ずれ許容範囲パターン、７・・・・・・（
抵抗体パターンの）位置ずれ検査マスク。FIG. 1a is a plan view of a group of resistor patterns, and FIG. 1 is an enlarged plan view of a state in which individual resistor pattern pieces are shifted. FIGS. 2a and 2b are a plan view and a partially enlarged plan view of a resistor pattern group misalignment inspection mask according to the present invention. 1.11...Small hole, 2...Insulating substrate,
3... Resistor pattern, 4... Transparent thin plate, 5... Normal pattern (for inspection), 6...
...Positional deviation tolerance pattern, 7... (
Resistor pattern) positional deviation inspection mask.
Claims (2)
の抵抗体パターンと、前記抵抗体パターンと相対する位
置に複数の円弧状の抵抗体パターンと一致する整合パタ
ーンと、前記整合パターン外周に密接形成された抵抗体
パターンの位置ずれ許容パターンとを設けたことを特徴
とする抵抗体の位置ずれ検査マスク。(1) An arc-shaped resistor pattern formed on an insulating substrate with the center hole as a reference, a matching pattern that matches a plurality of arc-shaped resistor patterns at a position facing the resistor pattern, and the matching pattern 1. A mask for inspecting positional deviation of a resistor, characterized in that a resistor pattern positional deviation tolerance pattern is provided closely formed on the outer periphery of the resistor pattern.
別したことを特徴とする実用新案登録請求の範囲第（１
）項記載の抵抗体の位置ずれ検査マス々(2) Utility model registration claim No. 1 (1) characterized in that the matching pattern and the misalignment tolerance pattern are color-coded.
) Positional displacement inspection squares of resistor described in section
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17111781U JPS5877008U (en) | 1981-11-17 | 1981-11-17 | Resistor pattern misalignment inspection mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17111781U JPS5877008U (en) | 1981-11-17 | 1981-11-17 | Resistor pattern misalignment inspection mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5877008U true JPS5877008U (en) | 1983-05-24 |
Family
ID=29963059
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17111781U Pending JPS5877008U (en) | 1981-11-17 | 1981-11-17 | Resistor pattern misalignment inspection mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5877008U (en) |
-
1981
- 1981-11-17 JP JP17111781U patent/JPS5877008U/en active Pending
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