JPS5864074A - Sic blue light emitting element - Google Patents

Sic blue light emitting element

Info

Publication number
JPS5864074A
JPS5864074A JP56163960A JP16396081A JPS5864074A JP S5864074 A JPS5864074 A JP S5864074A JP 56163960 A JP56163960 A JP 56163960A JP 16396081 A JP16396081 A JP 16396081A JP S5864074 A JPS5864074 A JP S5864074A
Authority
JP
Japan
Prior art keywords
type
type layer
substrate
light emitting
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56163960A
Other languages
Japanese (ja)
Inventor
Toshitake Nakada
中田 俊武
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd, Sanyo Denki Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP56163960A priority Critical patent/JPS5864074A/en
Publication of JPS5864074A publication Critical patent/JPS5864074A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/34Materials of the light emitting region containing only elements of Group IV of the Periodic Table
    • H01L33/343Materials of the light emitting region containing only elements of Group IV of the Periodic Table characterised by the doping materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Devices (AREA)

Abstract

PURPOSE:To obtain an SiC blue light emitting element having light emitting property and low contacting resistance with an electroce by composing an n type 6H-SiC substrate, the first p type layer having Al as p type impurity accumulated on the substrate and the second p type layer containing more Al then the first layer. CONSTITUTION:Si and Al of 2-5atm% to Si are filled in a crucible 13, and are heated and molten with a high frequency coil 12. The temperature of the molten liquid 16 of the Si and Al at this time is 1,600-1,650 deg.C, and Ar gas is used as atmospheric gas. Since the quartz reaction tube 11 tends to thermally deform at this temperature, it is preferred to provide cooling means for cooling only the tube 11. Then, an n type 6H-SiC substrate 1 mounted at the end of the substrate holder 17 is dipped and held in the liquid 16, thereby forming the first p type layer 2 of 510mum thick with 1-3X18/cm<2> of Al density. Further, Al is further added in the state that the substrate 1 is dipped in the liquid 16, thereby forming the second p type layer 3. In this case, the Al density is preferably more than 1-3X10<19>/cm<2>, and it is important to improve the ohmic characteristic.

Description

【発明の詳細な説明】 本発明はsic (シリコンカーバイド)青色発光素子
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a SIC (silicon carbide) blue light emitting device.

現在可視発光素子は赤色、緑色、黄色及び橙色の発光が
可能なものが実用化されている。また最遊では1つの発
光素子が赤から緑までの発光を順次可能となした多色発
光素子が開発され、実用化されつつある。ところが光の
三原色の一つである青色を発する青色発光素子に関して
は古くから研究されてはいるが未だに実用化できる段階
に到うていない。
Currently, visible light-emitting elements capable of emitting red, green, yellow, and orange light are in practical use. Furthermore, Saiyu has developed a multicolor light-emitting element in which a single light-emitting element can sequentially emit light from red to green, and is now being put into practical use. However, although blue light emitting elements that emit blue, which is one of the three primary colors of light, have been studied for a long time, they have not yet reached a stage where they can be put to practical use.

上記青色発光素子の材料としては、 81C,Gal。The material of the blue light emitting element is 81C, Gal.

2層B・、 ZnB 等が挙げられている。Two-layer B., ZnB, etc. are listed.

なかでもBICは高注入効率を示ii P −n接合が
比較岡谷勿に形成でき、かつ4 H@xagonalタ
イプのsic (以下6舅−jtcと記す、)は約3・
Vの禁止帯幅な有するので有望視されている。tた6区
−giCから青色発光U) P −n接合を得る場合P
型不純物としてはエネルギ一単位の観点から通常Al(
アルミニりム)が採用される。
Among them, BIC exhibits high injection efficiency, allows formation of P-n junctions with comparatively low injection efficiency, and 4H@xagonal type SIC (hereinafter referred to as 6-jtc) is approximately 3.
It is considered promising because it has a narrow forbidden band of V. When obtaining a P-n junction, P
As a type impurity, Al(
aluminum rim) is adopted.

ところが、析るアルミニウムの添装置によシP型層の特
性は大きく変化する・りtシ、P型層中のアルIニクム
澁度が1〜S X 10”/at程度では結晶性及び発
光特性゛は良好となるがオーミック特性が低下して接触
抵抗が高くなるという問題が生じ、またアルミニワヘ濃
度を上記値以上とするとオー【ツク特性は良好となるが
結晶性が悪(な、るという問題がありた。
However, the characteristics of the P-type layer vary greatly depending on the aluminum addition device used for the deposition.If the aluminum concentration in the P-type layer is about 1 to S x 10"/at, crystallinity and luminescence will decrease. Although the properties are good, the ohmic properties are deteriorated and the contact resistance is high.Also, if the aluminum wire concentration is higher than the above value, the ohmic properties are good, but the crystallinity is poor. There was a problem.

本発明は、上記の間融点に鑑みてなされたもので以′F
実施例につき説明T′る。
The present invention was made in view of the above-mentioned melting point.
An explanation will be given regarding the embodiment.

第1図は本発明のsic青色発光素子の一実施例を示し
、(1)はn型、6l−81C4板、(2)はff1M
板(1)上に堆積した不純物として、五lを含むP型6
1−810からなる第1P型層であシ、該第1r型層る t2Jは、1〜!IX 10 ”/ed程度のムl濃度
を有ることが望しく、このとき結晶性が良好となシ正孔
の移動度は10〜15−/マ・seaとなうて優れた発
光特性を示Toまた祈る第1P型層(2)の層厚は発光
メカニズムの観点から5〜10μ声厚であることが!l
ましい。(3)は上E第1r塾層(2)上に堆積したP
型4M−B’iCからなる第27型層でTo31゜該第
2P型層(3)のムl濃度は上記第1P型層(2)のそ
れよシ高< * 5 x 1o”7a#以上が良く更に
1−5X10”リーであることが好ましい。(4J (
5)は夫々基板(1)裏面及び第2Pm層(37上に形
成された第1及び@2電極である。
FIG. 1 shows an embodiment of the SIC blue light emitting device of the present invention, (1) is an n-type, 6l-81C4 board, (2) is an ff1M
As an impurity deposited on the plate (1), P-type 6 containing 5L
The first P type layer is composed of 1-810, and the t2J of the first r type layer is 1~! It is desirable to have a mulliconcentration of about IX 10"/ed, in which case the crystallinity is good and the hole mobility is 10 to 15"/ma sea, which shows excellent light emission characteristics. Also, the thickness of the first P-type layer (2) should be 5 to 10 μm thick from the viewpoint of the light emission mechanism!
Delicious. (3) is the P deposited on the upper E 1st layer (2).
In the 27th type layer consisting of type 4M-B'iC, To31° The mulliconcentration of the second P type layer (3) is higher than that of the first P type layer (2) < * 5 x 1o"7a# or more It is preferable that the size is 1-5×10”. (4J (
5) are the first and @2 electrodes formed on the back surface of the substrate (1) and the second Pm layer (37), respectively.

本実施例素子では、n型晟板(1)とでPn接合を形成
する%1P1P型2)のムI濃度が1〜5×510”/
−と低いのでその結晶性は非常に良好となり、上記P 
−n接合付近で所望の青色発光を得ることができる。ま
た、上巳第2P型層(3JはAj濃度が5X10”/−
と非常に高く従りてオーミツ(なる。
In this example device, the muI concentration of the %1P1P type 2) that forms a Pn junction with the n-type plate (1) is 1 to 5×510”/
-, the crystallinity is very good, and the above P
Desired blue light emission can be obtained near the -n junction. In addition, the second P-type layer (3J has an Aj concentration of 5X10"/-
It is very high and therefore Omitsu (becomes).

次に上記素子の製i11方法について説明Tる。Next, a method for manufacturing the above element will be explained.

れた石英製の反応管、 (13は該反応管αυに配設さ
れ九載置台14上に載置されたカーボン振の坩堝、−は
該坩堝Iを囲むように上記載置台Q4よル垂設した熱遮
蔽板である。
(13 is a carbon shaken crucible arranged in the reaction tube αυ and placed on the mounting table 14, - is a crucible hanging from the above-mentioned mounting table Q4 so as to surround the crucible I. This is a heat shield plate installed.

祈る装置を用いた製造方法を以下に説明する。。The manufacturing method using the praying device will be explained below. .

まず、第1工程としてSl及び所るiiiに対して2〜
5 ate %の量のAjを共に坩堝日内に入れ。
First, as the first step, 2 to 3
Aj in an amount of 5 ate % was also put into the crucible.

gであシ、また雰囲気ガスとしてはAr(アルゴンンガ
スを用いる。両所る温度では石英製の反応管t1は熱変
形を住じる危惧があるので図示してm−ないが所る反応
管σ劾のみを冷却する冷却手段を設ける仁とが好まし鱒
In addition, Ar (argon gas) is used as the atmospheric gas.There is a risk that the quartz reaction tube t1 may be thermally deformed at both temperatures, so the reaction is not shown in the figure. It is preferable to use a cooling means to cool only the trout.

次−で第2工程として基板保持具lη先端に装着され九
n型4l−81CJli板(1)を溶融液1e中に浸漬
所る場合、溶融液αGは1600〜1650℃とめう高
温に保持されているため溶融液−は坩堝0中で対流を生
じると共に、坩堝(1mを形成するカーパイながら温度
勾配が生じる。これら−要因によシ轟板(D上にデ型4
M−81Cからなる第1P型層(2)が約10声sw/
hの速度でエピタキシャル成長Tる。*断る@1p1P
型1)のムl濃度は1〜S X 10”/siμ度左な
りた。また第1P型層(2)は既述したように5〜10
声1llI11度の厚さを必要とするめで、約1時間浸
漬保持して約10声鯛厚とした。
In the next second step, when the 9N type 4L-81CJli plate (1) attached to the tip of the substrate holder lη is immersed in the melt 1e, the melt αG is maintained at a high temperature of 1600 to 1650°C. As a result, the molten liquid causes convection in the crucible 0, and a temperature gradient occurs in the crucible (which forms 1 m).
The first P type layer (2) consisting of M-81C has approximately 10 voices sw/
Epitaxial growth T at a rate of h. *Reject @1p1P
The mulch concentration of type 1) was 1 to S
The sea bream required a thickness of 11 degrees, and was soaked and held for about 1 hour to obtain a thickness of about 10 degrees.

最終工程は、基板(1)を溶融液ttS中に浸漬保持し
た状態で所る溶融液συ中にAjを更に添加し第2r型
層(3)を形成する。
In the final step, Aj is further added to the melt συ while the substrate (1) is kept immersed in the melt ttS to form a second r-type layer (3).

断る場合第2P型層(3)は既述したようにムを濃度を
5 X 10”/−以上、好しくは1〜5×10″′/
d以上となし、オーミック特性を良好となTことが1要
であ)、従りて上記Al@加置装、溶融液0中で81に
対して10〜15atm%となる瞳とした・またこのよ
うな溶融液−中で成員した第2P型層り)は五118度
が1〜2×10°/−となり、断る成長層表面に第1図
のように第2′w1極(5)を形成したとき電極の接触
抵抗は低く、オーミック特性も良好でありたゆ 向本実施例では第1P型層(2)及び第2P型層(3)
を液相エピタキシャル成長法で形成したが、気相成長法
等の他の成長法で形成してもよい仁とは当然である・ 以上の説明から明らかな如く、本発明の81C青色発光
素子はn型4N−81C基板、該基板上に堆積しP型不
純物として^lを含有Tる第1P型層。
If refused, the second P-type layer (3) should have a concentration of 5 x 10''/- or more, preferably 1 to 5 x 10''/-, as described above.
d or more, and good ohmic characteristics (T is one of the requirements), therefore, in the above Al @ addition device, the pupil was set to be 10 to 15 atm% with respect to 81 in the melt 0. The 2nd P-type layer (formed in such a melt) has a 5118 degree angle of 1 to 2 x 10 degrees/-, and a 2'w1 pole (5) on the surface of the growing layer as shown in Figure 1. In this example, the contact resistance of the electrode was low and the ohmic properties were good.In this example, the first P-type layer (2) and the second P-type layer (3)
Although the 81C blue light-emitting element of the present invention is formed by liquid phase epitaxial growth, it is natural that it may be formed by other growth methods such as vapor phase growth.As is clear from the above explanation, the 81C blue light emitting element of the present invention A type 4N-81C substrate, a first P-type layer deposited on the substrate and containing ^l as a P-type impurity.

1こ 原第11型層鳥欅積し斬る第1P型層よシAlを多く含
有するWi2ν型層からなるので1発光特性及び電極と
の接触抵抗の妓いsic青色発光素子を得ることができ
る。
The 11th type layer consists of the first P type layer and the Wi2ν type layer containing a large amount of Al, so it is possible to obtain a SIC blue light emitting device with excellent light emitting characteristics and contact resistance with the electrode. .

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例素子を示T断面図、第2図はf
s1図の素子を装造Tるための製造装置を示す断面図で
ある。 m”−n型6 H−81CML (2)−151FW 
(6H−’5ic)層、 (3)−第2P型(6H81
0)層。 第1図 第2図
FIG. 1 is a T sectional view showing an example element of the present invention, and FIG. 2 is a f
s1 is a sectional view showing a manufacturing apparatus for manufacturing the element shown in FIG. m”-n type 6 H-81CML (2)-151FW
(6H-'5ic) layer, (3)-second P type (6H81
0) layer. Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] (1)ni4M−810基板、 ff1j&板上に堆積
シP型不純物としてA/を含有する第1を型6厘−81
C層、該WIIP型411−1000層上に堆積し斬る
第1P型6M−81A層よIAJIを多く含有する第2
P型1.H−11ONIからなるgic胃色発色発光素
(1) Ni4M-810 substrate, deposited on the ff1j & 6-81 type 6-81
C layer, the first P type 6M-81A layer deposited on the WIIP type 411-1000 layer, and the second P type 6M-81A layer containing a large amount of IAJI.
P type 1. Gic gastric chromogenic luminescent pigment consisting of H-11ONI
JP56163960A 1981-10-13 1981-10-13 Sic blue light emitting element Pending JPS5864074A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56163960A JPS5864074A (en) 1981-10-13 1981-10-13 Sic blue light emitting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56163960A JPS5864074A (en) 1981-10-13 1981-10-13 Sic blue light emitting element

Publications (1)

Publication Number Publication Date
JPS5864074A true JPS5864074A (en) 1983-04-16

Family

ID=15784084

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56163960A Pending JPS5864074A (en) 1981-10-13 1981-10-13 Sic blue light emitting element

Country Status (1)

Country Link
JP (1) JPS5864074A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5387804A (en) * 1988-12-28 1995-02-07 Sharp Kabushiki Kaisha Light emitting diode
US5416342A (en) * 1993-06-23 1995-05-16 Cree Research, Inc. Blue light-emitting diode with high external quantum efficiency

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5387804A (en) * 1988-12-28 1995-02-07 Sharp Kabushiki Kaisha Light emitting diode
US5416342A (en) * 1993-06-23 1995-05-16 Cree Research, Inc. Blue light-emitting diode with high external quantum efficiency

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