JPS5861277A - 金属薄膜の化学エツチング方法 - Google Patents

金属薄膜の化学エツチング方法

Info

Publication number
JPS5861277A
JPS5861277A JP56160581A JP16058181A JPS5861277A JP S5861277 A JPS5861277 A JP S5861277A JP 56160581 A JP56160581 A JP 56160581A JP 16058181 A JP16058181 A JP 16058181A JP S5861277 A JPS5861277 A JP S5861277A
Authority
JP
Japan
Prior art keywords
light
etching
thin film
substrate
metal thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56160581A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6249353B2 (enExample
Inventor
Tsukasa Sawaki
澤木　司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56160581A priority Critical patent/JPS5861277A/ja
Publication of JPS5861277A publication Critical patent/JPS5861277A/ja
Publication of JPS6249353B2 publication Critical patent/JPS6249353B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
JP56160581A 1981-10-07 1981-10-07 金属薄膜の化学エツチング方法 Granted JPS5861277A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56160581A JPS5861277A (ja) 1981-10-07 1981-10-07 金属薄膜の化学エツチング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56160581A JPS5861277A (ja) 1981-10-07 1981-10-07 金属薄膜の化学エツチング方法

Publications (2)

Publication Number Publication Date
JPS5861277A true JPS5861277A (ja) 1983-04-12
JPS6249353B2 JPS6249353B2 (enExample) 1987-10-19

Family

ID=15718052

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56160581A Granted JPS5861277A (ja) 1981-10-07 1981-10-07 金属薄膜の化学エツチング方法

Country Status (1)

Country Link
JP (1) JPS5861277A (enExample)

Also Published As

Publication number Publication date
JPS6249353B2 (enExample) 1987-10-19

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