JPS5848402A - 酸化物半導体素子の電極形成方法 - Google Patents

酸化物半導体素子の電極形成方法

Info

Publication number
JPS5848402A
JPS5848402A JP56145421A JP14542181A JPS5848402A JP S5848402 A JPS5848402 A JP S5848402A JP 56145421 A JP56145421 A JP 56145421A JP 14542181 A JP14542181 A JP 14542181A JP S5848402 A JPS5848402 A JP S5848402A
Authority
JP
Japan
Prior art keywords
electrode
oxide semiconductor
semiconductor element
ion
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56145421A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0221128B2 (enExample
Inventor
西岡 道博
隆明 伊藤
古川 雅啓
小寺 和佳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Mining and Cement Co Ltd
Mitsubishi Industries Cement Co Ltd
Original Assignee
Mitsubishi Mining and Cement Co Ltd
Mitsubishi Industries Cement Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Mining and Cement Co Ltd, Mitsubishi Industries Cement Co Ltd filed Critical Mitsubishi Mining and Cement Co Ltd
Priority to JP56145421A priority Critical patent/JPS5848402A/ja
Publication of JPS5848402A publication Critical patent/JPS5848402A/ja
Publication of JPH0221128B2 publication Critical patent/JPH0221128B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Thermistors And Varistors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Ceramic Capacitors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
JP56145421A 1981-09-17 1981-09-17 酸化物半導体素子の電極形成方法 Granted JPS5848402A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56145421A JPS5848402A (ja) 1981-09-17 1981-09-17 酸化物半導体素子の電極形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56145421A JPS5848402A (ja) 1981-09-17 1981-09-17 酸化物半導体素子の電極形成方法

Publications (2)

Publication Number Publication Date
JPS5848402A true JPS5848402A (ja) 1983-03-22
JPH0221128B2 JPH0221128B2 (enExample) 1990-05-11

Family

ID=15384855

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56145421A Granted JPS5848402A (ja) 1981-09-17 1981-09-17 酸化物半導体素子の電極形成方法

Country Status (1)

Country Link
JP (1) JPS5848402A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01287902A (ja) * 1988-05-13 1989-11-20 Murata Mfg Co Ltd 正特性サーミスタ

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513576A (ja) * 1974-06-27 1976-01-13 Murata Manufacturing Co Sankabutsuhandotaisoshino denkyokukeiseiho
JPS54152145A (en) * 1978-05-22 1979-11-30 Tdk Electronics Co Ltd Method of forming electrode for electronic component
JPS55152161A (en) * 1979-05-12 1980-11-27 Murata Mfg Co Ltd Thermal treatment of copper coating

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513576A (ja) * 1974-06-27 1976-01-13 Murata Manufacturing Co Sankabutsuhandotaisoshino denkyokukeiseiho
JPS54152145A (en) * 1978-05-22 1979-11-30 Tdk Electronics Co Ltd Method of forming electrode for electronic component
JPS55152161A (en) * 1979-05-12 1980-11-27 Murata Mfg Co Ltd Thermal treatment of copper coating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01287902A (ja) * 1988-05-13 1989-11-20 Murata Mfg Co Ltd 正特性サーミスタ

Also Published As

Publication number Publication date
JPH0221128B2 (enExample) 1990-05-11

Similar Documents

Publication Publication Date Title
US3589965A (en) Bonding an insulator to an insulator
US3477935A (en) Method of forming thin film resistors by cathodic sputtering
US3847658A (en) Article of manufacture having a film comprising nitrogen-doped beta tantalum
US3479269A (en) Method for sputter etching using a high frequency negative pulse train
US3257305A (en) Method of manufacturing a capacitor by reactive sputtering of tantalum oxide onto a silicon substrate
US2339613A (en) Selenium rectifier and method of making it
US4065370A (en) Method of ion plating a thin metallic strip for flashlamp starting
US3499799A (en) Process for preparing dense,adherent boron nitride films and certain articles of manufacture
WO1993007306A1 (en) Adherent metal coating for aluminum nitride surfaces
US3325393A (en) Electrical discharge cleaning and coating process
US3616406A (en) Preparation of glue layer for bonding gold to a substrate
US2922730A (en) Method of forming thin films of barium titanate
US6154119A (en) TI--CR--AL--O thin film resistors
US4803094A (en) Metallized coating
US2833676A (en) Metal coated dielectrics and method for producing same
JPS5848402A (ja) 酸化物半導体素子の電極形成方法
US3114868A (en) Electrical article comprising a thin film of barium titanate
US3463715A (en) Method of cathodically sputtering a layer of silicon having a reduced resistivity
JPS61266568A (ja) コ−テイング装置
US2295759A (en) Capacitor
US3414435A (en) Process for making boron nitride film capacitors
US3738919A (en) Technique for adjusting temperature coefficient of resistance of tantalum aluminum alloy films
US3647662A (en) Technique for the fabrication of hafnium nitride resistor
Mattox Metallizing ceramics using a gas discharge
US3382100A (en) Rhenium thin film resistors