JPS5845871A - Production method of grindstone - Google Patents

Production method of grindstone

Info

Publication number
JPS5845871A
JPS5845871A JP14206081A JP14206081A JPS5845871A JP S5845871 A JPS5845871 A JP S5845871A JP 14206081 A JP14206081 A JP 14206081A JP 14206081 A JP14206081 A JP 14206081A JP S5845871 A JPS5845871 A JP S5845871A
Authority
JP
Japan
Prior art keywords
abrasive grains
plating layer
nickel
diamond
grindstone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14206081A
Other languages
Japanese (ja)
Inventor
Takashi Suzuki
隆 鈴木
Mitsuru Ito
満 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP14206081A priority Critical patent/JPS5845871A/en
Publication of JPS5845871A publication Critical patent/JPS5845871A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

PURPOSE:To prevent grind particles from being dropped during the cutting process by applying the eutectoid plating layer of grind particles such as diamond and a metal such as nickel to a substratum then by applying a protective plating layer further to the remaining grind particles protruded through the plating layer. CONSTITUTION:The eutectoid plating of grind particles 1 such as diamond and a metal 2 such as nickel is applied to a substratum 3 such as stainless steel, then a protective plating layer 4 of a solution containing nickel sulfamic acid, nickel chloride, and boric acid is formed with such a thickness that the grind particles protruded through the eutectoid plating layer are not buried.

Description

【発明の詳細な説明】 本発明は金属材料、非金属材料、特にフェライト、水晶
、ガラス等の硬脆材料の切断加工等に使用される電着砥
石の製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an electrodeposited grindstone used for cutting metal materials, non-metal materials, particularly hard and brittle materials such as ferrite, crystal, and glass.

従来この種の電着砥石の製法として、砥粒を単に電気メ
ツキ浴中に懸濁させ、メッキ浴の底部においた台金上に
砥粒を沈積させ、余分な砥粒を払い落した後に電気ニッ
ケルメッキで結合させる方制すること、合金両面同時に
メッキすることが画盤でありかつメッキ厚が不均一とな
る欠点があった。この電着砥石の欠点を改善するため本
願発明者らはすでに特願昭65−56969.特願昭5
6−4811等において提案した。
Conventionally, the manufacturing method for this type of electrodeposited whetstone is to simply suspend the abrasive grains in an electroplating bath, deposit the abrasive grains on a base metal placed at the bottom of the plating bath, and after shaking off the excess abrasive grains, apply electricity. The method of joining with nickel plating, and plating both sides of the alloy at the same time, was a work in progress and had the disadvantage that the plating thickness was uneven. In order to improve the drawbacks of this electrodeposited grindstone, the inventors of the present invention have already filed Japanese Patent Application No. 65-56969. Special request 1977
6-4811 etc.

この方法はダイヤモンド等の砥粒がメッキ浴中で沈降せ
ずに均一に分散し、台金上に金属と砥粒とを同時に電着
共析させることが可能で■ダイヤモンド等の砥粒の析出
量の制御が可能である、■ダイヤモンド等の砥粒の析出
が均一である、■ダイヤモンド等の砥粒と金属イオンと
の共析メッキで密着力が9良い、■台金両面同時にメッ
キが可能である、といった効果を発揮するものである。
In this method, abrasive grains such as diamond are uniformly dispersed in the plating bath without settling, and metal and abrasive grains can be co-deposited simultaneously on the base metal.■ Deposition of abrasive grains such as diamond The amount can be controlled. ■ The deposition of abrasive grains such as diamond is uniform. ■ The adhesion is good due to the eutectoid plating of abrasive grains such as diamond and metal ions. ■ Both sides of the base metal can be plated at the same time. It exhibits the following effects.

しかしこ\に提案した電着砥石は第1図の砥石断面拡大
図に示す通り、最上層のダイヤモンド砥粒1は共析メッ
キ層2よシ突出した状態となっている。このためダイヤ
モンド砥粒1の保持力が弱く、切断加工時にダイヤモン
ド砥粒が脱落し、砥石先端及び側面の摩耗が著るしい。
However, in the electrodeposited grindstone proposed here, as shown in the enlarged cross-sectional view of the grindstone in FIG. 1, the diamond abrasive grains 1 in the uppermost layer protrude beyond the eutectoid plating layer 2. For this reason, the holding power of the diamond abrasive grains 1 is weak, and the diamond abrasive grains fall off during cutting, resulting in significant wear on the tip and side surfaces of the whetstone.

本発明はダイヤモンド等の砥粒と金属イオンとの共析メ
ッキにおけるダイヤモンド等の砥粒の保持力を強化し、
耐摩耗性を向上させる電着砥石の製造法を提案するもの
である。
The present invention strengthens the holding power of abrasive grains such as diamond in eutectoid plating of abrasive grains such as diamond and metal ions,
This paper proposes a manufacturing method for electrodeposited grindstones that improves wear resistance.

以下本発明の実施例を第2〜6図により説明する。Embodiments of the present invention will be described below with reference to FIGS. 2 to 6.

〔実施例1〕 先ず素材5US304厚さ0.061Bを通常の7オト
エノチング法により第2図に示すように円形状に加工し
、脱脂、酸洗及びストライクニッケイレメッキ等の工程
を経て処理した後に下記に示す方法で、ダイヤモンド砥
粒とニッケルとの共析メッキを実施した。
[Example 1] First, the material 5US304 with a thickness of 0.061B was processed into a circular shape as shown in Fig. 2 by the usual 7-oto-etching method, and after being processed through processes such as degreasing, pickling, and strike nickel plating. Eutectoid plating of diamond abrasive grains and nickel was performed by the method shown below.

次に、上記共析メッキの最上層のダイヤモンド低粒の保
持力を強化するため下記条件で保護メッキを実施した。
Next, protective plating was carried out under the following conditions in order to strengthen the holding power of the diamond small grains in the uppermost layer of the eutectoid plating.

上記で製作した砥石の断面拡大図を第3図に示す。第3
図より台金3上のダイヤモンド砥粒とニッケルとの共析
メッキ層2よシ突出したダイヤモンド砥粒1が保護メッ
キ層4によって被覆され、第1図に示す様な従来の砥石
よりダイヤモンド砥粒の保持が強化されたことがわかる
Figure 3 shows an enlarged cross-sectional view of the grindstone manufactured above. Third
As shown in the figure, the diamond abrasive grains 1 protruding from the eutectoid plating layer 2 of diamond abrasive grains and nickel on the base metal 3 are covered with the protective plating layer 4, and the diamond abrasive grains It can be seen that the retention of was strengthened.

更に上記で製作した砥石の切断加工テストを下記の条件
で実施した。
Furthermore, a cutting test was conducted on the grindstone manufactured above under the following conditions.

砥石の側面の摩耗状況を第4図に示す。第一図の曲線6
は従来のダイヤモンド砥粒とニッケルメッキとの共析メ
ッキ砥石を示し、共析メッキの厚さは26μで保護メッ
キはしていない。
Figure 4 shows the wear status of the side surface of the grindstone. Curve 6 in Figure 1
shows a conventional eutectoid plated grindstone with diamond abrasive grains and nickel plating, the thickness of the eutectoid plating is 26μ, and no protective plating is applied.

曲線6は実施例1で述べた方法により製作した砥石を示
す。曲#i!5と曲線6を比較すると明らかに実施例1
の砥石の側面摩耗が少ない。このことより保護メッキが
ダイヤモンド砥粒の保持力を強化する効果を示すことが
わかった。
Curve 6 shows a grindstone manufactured by the method described in Example 1. Song #i! 5 and curve 6, it is clear that Example 1
There is less side wear of the grinding wheel. This indicates that protective plating has the effect of strengthening the holding power of diamond abrasive grains.

〔実施例2〕 実施例1に述べた保護メッキ法のかわりに下記条件にて
保護メッキを実施した。
[Example 2] Instead of the protective plating method described in Example 1, protective plating was performed under the following conditions.

浴組成   スルフアミノ酸ニッケル  450 g/
l塩化ニッケル      101i1μホウ酸   
     309μ 上記で製作した砥石の断面拡大図を第6図に示す。第6
図よシ台、金3上のダイヤモンド砥粒す8■とニッケル
との共析メッキ層2よシ突出したダイヤモンド砥粒1が
保護メッキ層8によって被覆きれ、保持されているのが
ゎがる0又保護メッキ層自身も≠2000のダイヤモン
ド砥粒9とニッケルとの共析メッキ層からなっている。
Bath composition: Nickel sulfamino acid 450 g/
l Nickel chloride 101i1μ boric acid
309μ FIG. 6 shows an enlarged cross-sectional view of the grindstone manufactured above. 6th
As shown in the figure, the diamond abrasive grains 1 protruding from the eutectoid plating layer 2 of diamond abrasive grains 8■ on gold 3 and nickel are completely covered and held by the protective plating layer 8. The protective plating layer itself also consists of a eutectoid plating layer of diamond abrasive grains 9 of ≠2000 and nickel.

次に上記で製作した砥石の切断加工テストを実施例1で
述べた同様の方法で実施した。
Next, a cutting test of the grindstone manufactured above was carried out in the same manner as described in Example 1.

その結果を第4図曲線7で示す。第4薗より実施例1よ
シも更に砥石側面の摩耗は少なく、ターイヤモント“砥
粒の保持を強化する効果を示すと同時に耐摩耗性の向上
に役立っていることがわかった。
The results are shown by curve 7 in FIG. From the fourth example, it was found that there was even less wear on the side surface of the grinding wheel in both Example 1 and Example 1, showing the effect of reinforcing the retention of the abrasive grains and at the same time helping to improve the wear resistance.

以上実施例について述べたがダイヤモンド等の砥粒とニ
ッケル等の金属イオンとの共析メッキ砥石における最上
層のダイヤモンド砥粒を保持する保護メッキ方法として
、実施例以外の銅、スズ。
Although the embodiments have been described above, as a protective plating method for retaining the uppermost layer of diamond abrasive grains in a eutectoid plating grindstone in which abrasive grains such as diamond and metal ions such as nickel are plated, copper and tin other than those in the embodiments can be used.

亜鉛、クロム等のメッキ或いはそれらの合金メッキでも
実施可能である。
It is also possible to perform plating with zinc, chromium, etc. or an alloy thereof.

以上、本発明によみと以下の効果を奏する。As described above, the present invention has the following effects.

(1)保護メッキによってダイヤモンド砥粒の保持が強
化され、ダイヤモンド砥粒の脱落が大巾に減少した。
(1) The protective plating strengthened the retention of diamond abrasive grains, and the dropout of diamond abrasive grains was greatly reduced.

(2)砥石の側面摩耗量が大巾に減少し、砥石の厚さが
安定化し、高精度の加工が可能である。
(2) The amount of wear on the side surface of the grinding wheel is greatly reduced, the thickness of the grinding wheel is stabilized, and high-precision machining is possible.

【図面の簡単な説明】[Brief explanation of the drawing]

例における砥石の部分断面図、第4図は砥石の側面摩耗
テスト結果の説明図、第5図は本発明の他の実施例にお
ける砥石の部分断面図である。 1・・・・・・ダイヤモンド砥粒、2・・・・・・共析
メッキ層、3・・・・・・台金、4・・・・・・保護メ
ッキ層、8・・・・・・保護メッキ層。 第2図 @ 3 図 !
FIG. 4 is an explanatory diagram of the results of a side abrasion test of the grindstone, and FIG. 5 is a partial cross-sectional view of the grindstone in another embodiment of the present invention. 1...Diamond abrasive grains, 2...Eutectoid plating layer, 3...Base metal, 4...Protective plating layer, 8...・Protective plating layer. Figure 2 @ Figure 3!

Claims (1)

【特許請求の範囲】[Claims] ステンレス等の基材にダイヤモンド、立方晶窒化ホウ素
等の砥粒とニッケル等の金属との共析メッキを行なった
後、スルフアミノ酸ニッケル、塩化ニッケル、ホウ酸を
有する溶液により、厚さが前記共析メッキ層より突出し
た前記砥粒が残存する程度の保護メッキ層を形成し、前
記共析メッキ層よシ突出した前記砥粒の保持を保護メッ
キによって強化した砥石の製造方法。
After performing eutectoid plating of abrasive grains such as diamond or cubic boron nitride and metal such as nickel on a base material such as stainless steel, a solution containing nickel sulfur amino acid, nickel chloride, and boric acid is used to coat the base material to the desired thickness. A method for manufacturing a grindstone, in which a protective plating layer is formed to such an extent that the abrasive grains protruding from the eutectoid plating layer remain, and retention of the abrasive grains protruding from the eutectoid plating layer is strengthened by the protective plating.
JP14206081A 1981-09-08 1981-09-08 Production method of grindstone Pending JPS5845871A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14206081A JPS5845871A (en) 1981-09-08 1981-09-08 Production method of grindstone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14206081A JPS5845871A (en) 1981-09-08 1981-09-08 Production method of grindstone

Publications (1)

Publication Number Publication Date
JPS5845871A true JPS5845871A (en) 1983-03-17

Family

ID=15306482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14206081A Pending JPS5845871A (en) 1981-09-08 1981-09-08 Production method of grindstone

Country Status (1)

Country Link
JP (1) JPS5845871A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61270075A (en) * 1985-05-22 1986-11-29 Nachi Fujikoshi Corp Manufacture of grinding wheel
JPS6288574A (en) * 1985-10-14 1987-04-23 Mitsubishi Metal Corp Grinding wheel
JPS6327258U (en) * 1986-07-29 1988-02-23
US7009284B2 (en) * 1998-07-14 2006-03-07 Denso Corporation Semiconductor apparatus with heat radiation structure for removing heat from semiconductor element
JP2008246633A (en) * 2007-03-30 2008-10-16 Mitsubishi Materials Corp Electrodeposition tool
EP2072186A1 (en) * 2007-12-17 2009-06-24 Robert Bosch GmbH Abrasive coated bit
CN103205792A (en) * 2013-04-15 2013-07-17 河南科技大学 Plating solution for nickel-cubic boron nitride film through electroplating method and preparation method thereof
CN107297689A (en) * 2017-07-28 2017-10-27 义乌市台荣超硬制品有限公司 A kind of ceramic bond diamond or CBN tool tyre case powder

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5143288A (en) * 1974-10-11 1976-04-13 Tomioka Kogaku Kk DENCHAKUTOISHI

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5143288A (en) * 1974-10-11 1976-04-13 Tomioka Kogaku Kk DENCHAKUTOISHI

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61270075A (en) * 1985-05-22 1986-11-29 Nachi Fujikoshi Corp Manufacture of grinding wheel
JPS6288574A (en) * 1985-10-14 1987-04-23 Mitsubishi Metal Corp Grinding wheel
JPS6327258U (en) * 1986-07-29 1988-02-23
US7009284B2 (en) * 1998-07-14 2006-03-07 Denso Corporation Semiconductor apparatus with heat radiation structure for removing heat from semiconductor element
JP2008246633A (en) * 2007-03-30 2008-10-16 Mitsubishi Materials Corp Electrodeposition tool
EP2072186A1 (en) * 2007-12-17 2009-06-24 Robert Bosch GmbH Abrasive coated bit
CN103205792A (en) * 2013-04-15 2013-07-17 河南科技大学 Plating solution for nickel-cubic boron nitride film through electroplating method and preparation method thereof
CN103205792B (en) * 2013-04-15 2015-12-02 河南科技大学 Electrochemical plating prepare plating solution of nickel-cubic boron nitride film and preparation method thereof
CN107297689A (en) * 2017-07-28 2017-10-27 义乌市台荣超硬制品有限公司 A kind of ceramic bond diamond or CBN tool tyre case powder

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