JPS5842473A - Manufacture of thermal head - Google Patents

Abstract

PURPOSE:To easily obtain a layer excellent in wear resistance and heat conductivity on the surface of a heating element layer on a base plate by a method in which a reactive gas containing carbon is decomposed by a low-temperature plasma gas phase method to form a carbon-based wear-resistant layer on the heating element layer. CONSTITUTION:On the surface of a heating element layer 3 and an electrode 4 provided on a base plate 1 through a glazed glass layer 2 preferably, a wear- resistant protective layer 5 is formed by low-temperature (100-450 deg.C) plasma gas phase method. In short, a plasma is generated by producing glow or arc discharge by the addition of an electromagnetic energy of DC high-frequency or micro wave under a reduced pressure of 0.01-10 torr to activate and decompose a reactive gas, e.g., such hydrocarbon gases are ethylene, propane, etc., whereby a film made of non-crystalline or semi-noncrystalline insulating carbon or based on a carbon containing 30mol% H and Si is formed.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention is directed to a thermal head for thermal recording.In particular, the wear-resistant layer has a thermal conductivity that is among the highest among solids and is the highest.
It is intended to be made of carbon or carbon-based materials that have wear resistance.

In the present invention, the heating element layer is made of an amorphous (hereinafter referred to as AS) or a semi-amorphous (hereinafter referred to as SAS) having microcrystallinity with a size of 45 to 200A, which is formed by a plasma vapor phase method. ~450°C preferably 2
oO~35σ017) It is intended to be provided using a material whose main component is silicon or carbon, which is formed at a low temperature.

The present invention provides such wear resistance or heat generation, 1- by plasma vapor phase method, that is, by direct current, high frequency (500 KMZ to 50 MHz) or microwave (e.g. 2.45 GHz) frequency electromagnetic applying energy to generate a glow or arc discharge to turn it into plasma, and activating the vaporized reactive gas, such as a hydrocarbon gas such as ethylene or propane, by the electromagnetic energy;
By decomposing it, a film whose main component is insulating carbon of As or SAS or carbon containing 30 moles or less of hydrogen and silicon is formed.

In the present invention, carbon formed by such a plasma vapor phase method has an energy band width of 2.3θ■ or more, typically 3θ■
It is a 'P, hi body with a thermal conductivity of 2.
5.1-t): typically has an extremely high value of 5.0 (W/cm d, eg), which is close to 6.60 (W/cm d, eg) of diamond.

Furthermore, the hardness of 4500Kg/J≦-24
Specifically, we found an extremely excellent property of 6500 kg/nm' of hardness similar to that of diamond, and applied this property to the thermal head K i4 to provide excellent wear resistance and heat-sensitive high-speed response 5G properties.

Further, the present invention provides that when boron or phosphorus, which is a 111-valent or V-valent impurity, is added to the carbon of such AS or SAS made at 450°C or less per 0.1 to 3 mol strip per skin, 10" -106 air conductivity.Therefore, in this case, it is used as a heat generating element, and furthermore, due to its pseudomechanical!I!f properties, it has characteristics such as "1) It is not necessarily necessary to form a wear layer." Another feature is that it can be

Further, in the present invention, since the wear-resistant layer is used in the plasma vapor phase method of reduced pressure LIq, the side portions of the heat generating layer can be kept in the same thickness as the top surface.

Therefore, when the crack is made by sputtering, normal pressure vapor phase, etc., the wear-resistant layer needs to have a thickness of 2μ or more on the top surface (thickness of 0.2μ or more on the 11i11 surface) to cover this side surface. . However, in the present invention, the thickness of 0.1 to 0.3μ is sufficient for the top and side surfaces, and as a result, the thickness is reduced to about 1/10, so that the thermal response speed can be further improved. became.

In the present invention, the reactive gas is a hydrocarbon such as ethylene (
0,H,) Methane hydrocarbons (0,H2,,l) or other gases, tetramethylsilane ((c, Qs i), tetraethylsilane ((a,
Q, S 1) 'S= may also be used. In the former case, carbon has less than 30 moles of hydrogen, especially when 5A61 is used, it is 0.
．． Although 01-51-5 moles were present, the covalent bond between carbon atoms was strong and it had physical properties similar to those of diamond. In addition, in the latter case, hydrogen contains 0.01 to 20 mole,
Furthermore, silicon is 1/3 to carbon ↓ An example of Furuya is shown below according to the drawing.

FIG. 1 shows a vertical sectional view of a thermal printer used in the present invention. FIG. 1(B) shows the front view taken along line AA' in FIG. 1(A). (C) shows a cross section taken along line B-B'.

In the drawing, a glazed glass layer (2), a heating element layer (4), an electrode (4), and an abrasion-resistant layer (5) are laminated on a substrate, particularly a ceramic substrate. ．． i is provided. Also, as shown in Figure 1 (0), the area 1 where the R & hot paper is rubbed is
A J wear-resistant layer (5) is provided on and in contact with the L-L heating element layer (3).

In the present invention, this wear-resistant layer (5) is made of carbon or a material containing carbon as a main component, and is formed by a plasma vapor phase method, so that as shown in FIGS. 1(B) and (C), A feature is that the thickness of the side portions of the heat generating layer can be made approximately equal to the thickness of the top surface of the heat generating layer.

This is because even when performing the gas phase method under reduced pressure (0.01 to 10 torr) and the mean free path of the reactive gas being long, the bending to the sides is large. In addition, it turns into plasma and imparts a large amount of kinetic energy to the reactive gases, causing them to collide with each other, encouraging them to fly towards Yomo Hitoyoshi.

12. In the wear-resistant layer. I was then produced as follows. That is, a substrate having a surface to be formed is sealed in a reaction vessel, the reaction volume g3 is evacuated to 10 tOrr, and the substrate is heated at 100 to 450''C in a heating furnace.
If the temperature is 200-350'O, for example, 300°C. IA with this for this reason? Hydrogen was added to the atmosphere. For example, 13.56MH2, 50 to 500 W, and the actual
The distance between the Rr-like electrodes was set to be 15 to 150 cm. Carbon, which is a reactive gas when turned into plasma, is an extremely stable material, so it imparts high energy to each primitive rope or associated molecule of carbon, and the carbon particles mutually interact with each other.
This is to create a bond. Regarding the formed film, when the output was 50 to 150 WK, the As was 250 to 50 OW, SAS was mixed, and in the middle, they were mixed: 11 cases were observed by electron beam diffraction.

Furthermore, ash gas such as methylene or propane was added to this plasma atmosphere for 2.1 h. Then, this reactive gas was dehydrogenated, the carbon bonds were covalently bonded to each other, and a broken carbon film was formed on the surface to be formed.

When the temperature of the substrate is 100 to 200°C, the hardness is slightly low, and the -17 resistance to the substrate is not necessarily desirable, but at +f of 200°C or higher, the hardness is slightly low.
At 19°C, it had an extremely stable and strong tight shoulder to the formed surface of 19mm.

If the heating temperature is set to 450'O or more, there is a problem that stress will be generated due to the difference in thermal expansion coefficient with the substrate.
The coating formed of 50-450'O was a coating whose main component was carbon. Even with this, the hardness was 4) R, which is the same as that of carbon alone.

The heat transfer degree was 5W/cm deg only for carbon, but 2
It was as low as ~3 W/am deg.

The carbon-based coating formed as described above has a carbonaceous coating of 0.05 to 0.0.
Even with a thickness of 2μ, which is 115 to 1/10 of the conventional thickness, it can be used for more than 101 hours.
, had some problems.

Actually, this actual % i flJ is the case where the heat generating layer was formed using a thermal printer with the same hardness as in Example 1 using the same plasma vapor phase method as in Example 1.

The small "! structure was made using the plasma vapor phase method under the same conditions as in Example 1. However, the formed film was conductive (resistance, !f:
) (d) To ensure that the film is conductive, the formed film is free of commercially available or V-valent impurities such as boron,
Or, it was formed without adding phosphorus.

In other words, in place of the ``fluorophore'', silane (SinHl, n'?1) was used as the starting material, silicon tetrafluoride was used, and 200
Formed at ~350"C. High volume 1 skin energy is 13
．． 56MHz 10~50W As,' or 50
(9) SAS was formed at ~200 W. ■For example, boron is a material that cannot be used in painting.
LHI, wo use ite, mata v11Ili no fu, 1IIIl
For example, phosphorus was used after being slightly doped or non-doped using PH as described above. Although the formed gas contained less than 20 moles of hydrogen, it was released to the outside by generating heat.

Furthermore, for carbon, methylene as in Example 1 was used. Here B, V'O, H, = O, tl ~3%, PH
y'0, HL, 0.01-3%. As a result, the electrical conductivity is 10 to 10 (-ncm) or more than 0.
~450'O clothing-wise 250~400'0 special K 30
Considering the conventional method of forming mJILil at 0°C, it is possible to form JIL at a low temperature. In particular, the value of 500'O or less is extremely low for the distortion caused by thermal expansion when glass is used as the substrate material, and the heat generation of the screen is greatly reduced due to the warping of the curtain plate due to conventional high-profile processing. I was only able to make a book with a diameter of 1mm, but
I am now able to leak this to 1 out of 24 people.

As is clear from the above description, the present invention has an energy band width of 2. Insulating photosensitive carbon with a voltage higher than OeV, typically 2.5 to 3eV, is used as a wear-resistant material.
Furthermore, it is characterized in that carbon or a resistor or semi-Jj body containing carbon as a main component is used as the heat generating layer. To this end, the present invention allows one or both of them to be formed by a plasma vapor phase method, and can be formed at a temperature of 500'O or less, which is 300 to 500'O lower than the temperature formed by a conventional vapor phase method. It had a large degree of freedom in terms of the distance and rectangle of the substrate material, and had extremely excellent characteristics in terms of low 1+li rating.

The present invention mainly describes the plasma vapor phase method.

However, in an IJQ system that can obtain such resistance to 4-year-old heat, electromagnetic energy such as ion blating or other plasma or laser, or optical energy may be used.

The structure shown in FIG. 1 in the embodiment of the present invention shows one example, and the heat generating layer may be made of single AI+N crystal and may have a transistor structure, and may also be used for a silicon mesa structure, a planar structure, etc. Can be done.

[Brief explanation of the drawing]

FIG. 1 shows a vertical sectional view of the thermal printer of the present invention.

Claims (1)

[Claims] 1. A reactive gas containing carbon is decomposed on a surface on which a heat generating layer is selectively formed on a substrate by a plasma vapor phase method at a temperature of 100 to 450'C. , a thermal head manufacturing method characterized by forming a wear-resistant layer mainly composed of reacted carbon or carbon. 2. In claim 1, a reactive gas containing silicon or carbon is decomposed and reacted on a substrate by a plasma vapor phase method at a temperature of 100-450°C. Selectively amorphous '81. 1. A method for manufacturing a thermal head, comprising forming a heating layer mainly composed of semi-amorphous silicon or carbon having microcrystallinity. \1/