JPS5842141A - Pierce type electron gun - Google Patents

Pierce type electron gun

Info

Publication number
JPS5842141A
JPS5842141A JP56141172A JP14117281A JPS5842141A JP S5842141 A JPS5842141 A JP S5842141A JP 56141172 A JP56141172 A JP 56141172A JP 14117281 A JP14117281 A JP 14117281A JP S5842141 A JPS5842141 A JP S5842141A
Authority
JP
Japan
Prior art keywords
cathode
impregnated
electron gun
tube
pierce
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56141172A
Other languages
Japanese (ja)
Inventor
Kenichi Tsujikawa
辻川 賢一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56141172A priority Critical patent/JPS5842141A/en
Publication of JPS5842141A publication Critical patent/JPS5842141A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J23/00Details of transit-time tubes of the types covered by group H01J25/00
    • H01J23/02Electrodes; Magnetic control means; Screens
    • H01J23/06Electron or ion guns
    • H01J23/065Electron or ion guns producing a solid cylindrical beam

Abstract

PURPOSE:To obtain a pierce type electron gun employing an immersed cathode having good electron beam focus characteristic, by reducing the differential thermal expansion between the cathode tube and the wenelt electrode thereby suppressing the variation of the perviance at the operation. CONSTITUTION:The impregnated type cathode 10 is constructed such that a porous tungsten ingot having the porosity of 20% is prepared then impregnated with the non-oxygen copper and worked to make the angle of 67.5 degree against the outermost shell of the electron beam 80 for the purpose to provide the wenelt electrode at a portion. Then it is jointed to the molybdenum supporting tube 20 through the brazing or welding. Thereafter a heater 30 is arranged in said tube 20 together with the mixture of the alumina powder and the organic binder and sintered 40. Then barium oxide, calcium oxide and aluminum oxide are placed on a concave electron radiating face 11 then solved and impregnated. Thereafter a film 12 composed of metal such as tungsten is formed through the fused injection coating method on the surface portion of such impregnated type cathode 10 which functions as the wenelt. Said tubular cathode is jointed to the support 100 through the metallic supports 50, 60 thus to complete the pierce type electron gun.

Description

【発明の詳細な説明】 この発明は電子ビーム管に関し、特に會浸痘陰極を用い
たピアス形電子銃の改良に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron beam tube, and more particularly to an improvement in a pierce-type electron gun using an immersion cathode.

従来、電子ビーム管に紘多(の種類があるが、その中の
一つに電子銃と遅波回路とコレクタを有する電子ビーム
管がある・この種の電子ビーム管に属するものには進行
波管やフライスト四ンなどがある。
Conventionally, there are several types of electron beam tubes, one of which is an electron beam tube that has an electron gun, a slow wave circuit, and a collector. There are pipes, fly irons, etc.

第1図は含浸型陰極を用いた従来のピアス形電子銃の一
例の断面図である。ポーラスタングステン基体ニパリウ
ムーカルシウム・アルミニウムの酸化物を含浸させた陰
極lは、モリブデン製の支持円筒2にろう付または溶接
によつて取り付けられ、その中にヒータ3がアル識す焼
結体4の中に埋め込まれて、陰極筒が形成されている。
FIG. 1 is a cross-sectional view of an example of a conventional pierce-type electron gun using an impregnated cathode. A cathode l having a porous tungsten substrate impregnated with nipalium-calcium aluminum oxide is attached to a support cylinder 2 made of molybdenum by brazing or welding, and a sintered body 4 in which a heater 3 is attached is attached to the support cylinder 2 made of molybdenum by brazing or welding. The cathode tube is formed by being embedded in the tube.

ヒータ3によって陰極lは約1050℃に加熱され熱電
子が放射される。前記陰極筒はタンタル、コバーなどの
金属性支持体5,6を介してウェネルト電極7に支持さ
れている。尚、金m性支持体5は、ヒータ電力を低減す
るために1例えばトライ4?ツドタイプ(3本吊構造)
等が使われる。陰極1と同電位のウェネルト電極7の集
束作用によって電子ビーム8となって陽極9の穴を通し
て遅波回路(図示せず)に導ひき入れられる。尚前記ウ
エネルF電極7は電子ビーム8の最外殻と67.5度(
ピアス角と称す)に形成される。このような構成の電子
銃を研究者にちなんでピアス形電子銃と呼んでいる。こ
のようなピアス形電子銃において陰極1とウェネルト電
極7の電極間隔及び陰極1と陽極9の電極間隔、即ちパ
ービアンスを設計値に一致させる事は電子ビーム集束上
大切なことである。特に間隔のせまい陰極とウェネルト
間の寸法精度を出すことが重要となる。
The cathode 1 is heated to about 1050° C. by the heater 3 and thermoelectrons are emitted. The cathode tube is supported by a Wehnelt electrode 7 via metal supports 5 and 6 made of tantalum, covar, or the like. Incidentally, the gold-based support 5 is made of 1, for example, Tri 4?, in order to reduce the heater power. Tudo type (3 hanging structure)
etc. are used. Due to the focusing action of the Wehnelt electrode 7 having the same potential as the cathode 1, an electron beam 8 is formed and guided into a slow wave circuit (not shown) through a hole in the anode 9. Note that the Uenel F electrode 7 is at an angle of 67.5 degrees (
(referred to as the pierce angle). An electron gun with this configuration is called a pierce-type electron gun after the researcher. In such a piercing type electron gun, it is important for electron beam focusing to match the electrode spacing between the cathode 1 and Wehnelt electrode 7 and the electrode spacing between the cathode 1 and anode 9, that is, the perveance, to design values. In particular, it is important to achieve dimensional accuracy between the narrowly spaced cathode and Wehnelt.

しかしながら、従来の含浸型陰極を用いたピアス形電子
銃では陰極1の動作温度が約10!So℃と高(、陰極
筒全体が高温になるのに対し、ウェネルト電極7は陰極
筒からの輻射熱及び伝導熱の影響を受けても部分的に約
400’C1i度迄しか上がらず、陰極筒とウェネルト
電極間に紘大きな温度差を生じていた。このことは陰極
筒を形成するポーラスタングステン、毫リンデン等が持
つ物質固有の熱膨張率及び一般的に銅から形成されたウ
ェネルト電極の熱膨張率の違いから、両電極は動作時複
雑な寸法変化を生じ、パービアンスを設計値に合わせる
ことは、かなりむずかしいことでありた。特に、第2図
に拡大して示す様に陰極1とウェネルト電極70間隔d
が変化した場合(人は陰極が出過ぎた場合%Bは陰極が
下がりすぎた場合、点線が設計位置)、陰極1の端部か
ら放射された電子は電子ビーム8の最外殻を形成してい
る関係から、陽極9あるいは遅波回路(図示せず)へ衝
突しやすく、ウェネルト電極の集束作用を効果的にする
ことができず良好な電子ビーム集束特性が得られないと
いう欠点がありだ。又同一仕様の電・ 子管においてビ
ーム集束特性に大きなバラツキを有する間層があった。
However, in the conventional piercing type electron gun using an impregnated cathode, the operating temperature of the cathode 1 is about 10! The temperature of the entire cathode tube becomes high (So℃), whereas the Wehnelt electrode 7 only partially heats up to about 400'C1i degrees even under the influence of radiant heat and conduction heat from the cathode tube. There was a large temperature difference between the electrode and the Wehnelt electrode.This is due to the inherent coefficient of thermal expansion of the materials such as porous tungsten and linden that form the cathode tube, and the thermal expansion of the Wehnelt electrode, which is generally made of copper. Due to the difference in ratio, both electrodes undergo complicated dimensional changes during operation, and it is quite difficult to match the perveance to the design value.In particular, as shown enlarged in Figure 2, cathode 1 and Wehnelt electrode 70 interval d
If %B changes (if the cathode protrudes too far, if the cathode falls too low, the dotted line is the design position), the electrons emitted from the end of the cathode 1 form the outermost shell of the electron beam 8. Because of this relationship, the electron beam tends to collide with the anode 9 or the slow wave circuit (not shown), and the focusing effect of the Wehnelt electrode cannot be made effective, making it difficult to obtain good electron beam focusing characteristics. Furthermore, there were layers with large variations in beam focusing characteristics among electron tubes with the same specifications.

したがって、この発明の目的はピアス形電子銃を形成す
る陰極筒とウェネルト電極間の熱膨張差を小さくし動作
時のパービアンス変化を抑え、良好な電子ビーム集束特
性が得られる含浸型陰極を用いたピアス形電子銃を提供
することにある。
Therefore, the purpose of this invention is to reduce the difference in thermal expansion between the cathode cylinder and the Wehnelt electrode that form the pierced electron gun, suppress perveance changes during operation, and use an impregnated cathode that can obtain good electron beam focusing characteristics. The purpose of the present invention is to provide a piercing type electron gun.

この発明による電子銃は、バリウム・カルシウム・アル
ミニウムの酸化物を含浸させた陰極と前記ウェネルト電
極をボーラスタングステン基体で一体形成したことを特
徴としている。
The electron gun according to the present invention is characterized in that the cathode impregnated with oxides of barium, calcium, and aluminum and the Wehnelt electrode are integrally formed with a bolus tungsten base.

次に実施例について説明する。、 第3図は1本発明によるウェネルト付含浸型陰極10と
そリプデン製の支持円筒20およびアルミナ焼結体40
の中に埋め込まれたヒータ30の陰極筒を示している。
Next, an example will be described. , FIG. 3 shows an impregnated cathode 10 with Wehnelt according to the present invention, a support cylinder 20 made of Solipden, and an alumina sintered body 40.
The cathode tube of the heater 30 is shown embedded in the heater 30.

含浸型陰極10紘次やような工程でつくられる。まず、
約5tり璽ンの粒径のタングステン粉末をプレスし約2
200℃で焼結して気孔率20%の多孔質タングステン
のインゴットをつくる。ついで、例えば無酸素銅を含浸
させて機械加工性を良くし本発明であるウェネルト付陰
極影状に加工する。この陰極10as一部をウェネルト
電&とする為に、CADにて設計された電子ビーム80
の最外殻と67.5度の角度となる様に加工されている
。銅は1800℃の真空処理を行なうことによって完全
に除去される。次に四−付あるいは溶接によってモリブ
デン客待円筒20に接合させる。そのあと、あらかじめ
タングステンの細線をコイル状に巻回してつくられたヒ
ータ30をアルミナ粉末と有機バインダの混線物といっ
しょにモリブデン円筒20の中に設置して約1700℃
で混練物を焼結40させる。ついで、醸化バリウム・醸
化カルシウム会酸化アルミニウムを(4:1:1)のモ
ル比に調合したものを、凹球最、ett子放おヵ、1゜
上に。ヤ、1600’Cで溶融−含浸させる。このよう
にしてつくられた含浸型陰極10のウェネルトとして作
用する表面部分にタングステン等の金属から成る被膜1
2を溶融噴射コーティング法にて形成する。こOタング
ステン彼[12は、タングステン粉末をプラズマ)aン
スプレーガン内で70007で燃焼、溶融し、圧縮空気
でスプレーする方法により形成される。この被膜の厚さ
は自由に制御出来、この場合5〜10μ程度で良い。こ
れで本発明の陰極筒が出来上がる。次にこの陰極筒を金
m製支持体50゜60を介して支持体100に接合させ
ピアス形電子銃が完成する。
Impregnated cathodes are made using a similar process. first,
Tungsten powder with a particle size of about 5 tons is pressed and about 2
A porous tungsten ingot with a porosity of 20% is produced by sintering at 200°C. Then, it is impregnated with, for example, oxygen-free copper to improve machinability and processed into the Wehnelt cathode shape of the present invention. In order to make a part of this cathode 10as a Wehnelt electron, the electron beam 80 was designed using CAD.
It is machined so that it forms an angle of 67.5 degrees with the outermost shell. Copper is completely removed by vacuum treatment at 1800°C. Next, it is joined to the molybdenum reception cylinder 20 by attaching or welding. After that, a heater 30 made by winding a thin tungsten wire into a coil shape is placed in the molybdenum cylinder 20 together with a mixture of alumina powder and an organic binder, and heated to approximately 1700°C.
The kneaded material is sintered at 40°C. Next, a mixture of barium fermentation and calcium fermentation aluminum oxide in a molar ratio of (4:1:1) was placed on a concave sphere at an angle of 1°. Melt-impregnate at 1600'C. A coating 1 made of a metal such as tungsten is applied to the surface portion of the impregnated cathode 10 thus produced, which acts as a Wehnelt.
2 is formed by a melt spray coating method. This tungsten material is formed by burning and melting tungsten powder in a plasma spray gun and spraying it with compressed air. The thickness of this coating can be freely controlled, and in this case may be about 5 to 10 microns. This completes the cathode tube of the present invention. Next, this cathode tube is joined to a support 100 via a gold support 50.degree. 60 to complete a pierced electron gun.

このようにしてつくられた含浸型@極のウェネルト部分
は、タングステン被膜によって封孔されてバリウムの単
原子層が形成されないのでこの部分から電子は放射され
ずウェネルト電極としての作用を充分に行なうことが出
来る。
The Wehnelt part of the impregnated @electrode made in this way is sealed by the tungsten coating and no monoatomic layer of barium is formed, so electrons are not emitted from this part and it functions well as a Wehnelt electrode. I can do it.

以上本発明によるウェネルト付含浸型敗極を有するピア
ス形電子銃は、陰極とウェネルト電極部がポーラスタン
グステン基体で一体形成されているので、動作温度であ
る約1050℃に加熱されでも、従来陰−の様に論極−
ウエネルト電−間11ddが変化する事がない。即ちパ
ービアンスを設計値に合わせることが出来、@−鰯部か
ら放射した電子に対しても十分な作用を及ぼすことがで
き電子ビーム集束上の問題を惹起しない良好なピアス形
電子銃な得ることができる。
As described above, in the pierce-type electron gun having an impregnated negative electrode with Wehnelt according to the present invention, the cathode and the Wehnelt electrode part are integrally formed with a porous tungsten base. Argumentative as in
The Wehnelt voltage 11dd does not change. In other words, a good pierce-type electron gun can be obtained that allows the perveance to be adjusted to the design value, has a sufficient effect on the electrons emitted from the sardine part, and does not cause problems in electron beam focusing. can.

【図面の簡単な説明】[Brief explanation of drawings]

#/s1図と第2図は含浸型陰極を用いた従来のピアス
形電子銃の断面図及び一部拡大図である。第3wIは本
発明の実施例におけるピアス形電子銃の断面図である。 l・・・含浸1M陰極、10・・・ウェネルト電極付含
浸型陰極、2.20・・・モリブデン騙支持円筒、3゜
30・・・ヒータ、4.40・・・アルミナ焼結体、5
゜50・・・トライボッド型金JII[支持体、6.6
0・・・金j4III支持体、7・・・従来のウェネル
ト電極、8゜80・・・電子ビーム、9・・°陽極、1
00・・・金属製支持体、11・・・電子放射面、12
・・・タングステン被膜。
Figures #/s1 and 2 are a sectional view and a partially enlarged view of a conventional piercing type electron gun using an impregnated cathode. 3rd wI is a cross-sectional view of a pierce-type electron gun in an embodiment of the present invention. l... Impregnated 1M cathode, 10... Impregnated cathode with Wehnelt electrode, 2.20... Molybdenum support cylinder, 3°30... Heater, 4.40... Alumina sintered body, 5
゜50... Tri-bod type metal JII [Support, 6.6
0... Gold j4III support, 7... Conventional Wehnelt electrode, 8°80... Electron beam, 9...° anode, 1
00... Metal support, 11... Electron emission surface, 12
...Tungsten coating.

Claims (2)

【特許請求の範囲】[Claims] (1)バリウム・カルシウム−アル之ニウムの酸化物を
含浸させた陰極と、電子ビーム集束作用を有するウェネ
ルト電極を、ポーラスタングステン基体で一体形成した
ことを特徴とするピアス形電子銃。
(1) A pierce-type electron gun characterized in that a cathode impregnated with a barium-calcium-aluminum oxide and a Wehnelt electrode having an electron beam focusing function are integrally formed on a porous tungsten base.
(2)前記ポーラスタングステン基体の一部に金属被膜
をコーティングし、この部分をウェネルト電極としたこ
とを特徴とする特許請求の範囲第1項記戦のピアス形電
子銃。
(2) The pierce-type electron gun according to claim 1, wherein a part of the porous tungsten base is coated with a metal film, and this part is used as a Wehnelt electrode.
JP56141172A 1981-09-08 1981-09-08 Pierce type electron gun Pending JPS5842141A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56141172A JPS5842141A (en) 1981-09-08 1981-09-08 Pierce type electron gun

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56141172A JPS5842141A (en) 1981-09-08 1981-09-08 Pierce type electron gun

Publications (1)

Publication Number Publication Date
JPS5842141A true JPS5842141A (en) 1983-03-11

Family

ID=15285809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56141172A Pending JPS5842141A (en) 1981-09-08 1981-09-08 Pierce type electron gun

Country Status (1)

Country Link
JP (1) JPS5842141A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6340778A (en) * 1986-08-05 1988-02-22 株式会社アスク Heat retainer for spraying
WO2002015218A1 (en) * 2000-08-17 2002-02-21 Gesellschaft für Schwerionenforschung mbH Device and method for ion beam acceleration and electron beam pulse formation and amplification
CN100461327C (en) * 2004-12-30 2009-02-11 中国科学院电子学研究所 Method for preparing metal nanometer thin film dipped barium-tungsten cathode
CN105874555A (en) * 2013-12-30 2016-08-17 迈普尔平版印刷Ip有限公司 Cathode arrangement, electron gun, and lithography system comprising such electron gun
RU2673702C1 (en) * 2018-07-11 2018-11-29 Публичное акционерное общество "Русполимет" Method of electron-beam melting lateral surface ingots of heat-resistant alloys

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6340778A (en) * 1986-08-05 1988-02-22 株式会社アスク Heat retainer for spraying
JPH034510B2 (en) * 1986-08-05 1991-01-23 Ask Corp
WO2002015218A1 (en) * 2000-08-17 2002-02-21 Gesellschaft für Schwerionenforschung mbH Device and method for ion beam acceleration and electron beam pulse formation and amplification
CN100461327C (en) * 2004-12-30 2009-02-11 中国科学院电子学研究所 Method for preparing metal nanometer thin film dipped barium-tungsten cathode
CN105874555A (en) * 2013-12-30 2016-08-17 迈普尔平版印刷Ip有限公司 Cathode arrangement, electron gun, and lithography system comprising such electron gun
KR20160104712A (en) * 2013-12-30 2016-09-05 마퍼 리쏘그라피 아이피 비.브이. Cathode arrangement, electron gun, and lithography system comprising such electron gun
KR20160104711A (en) * 2013-12-30 2016-09-05 마퍼 리쏘그라피 아이피 비.브이. Cathode arrangement, electron gun, and lithography system comprising such electron gun
JP2017502469A (en) * 2013-12-30 2017-01-19 マッパー・リソグラフィー・アイピー・ビー.ブイ. Cathode assembly, electron gun, and lithography system having such an electron gun
US10622188B2 (en) 2013-12-30 2020-04-14 Asml Netherlands B.V. Focusing electrode for cathode arrangement, electron gun, and lithography system comprising such electron gun
RU2673702C1 (en) * 2018-07-11 2018-11-29 Публичное акционерное общество "Русполимет" Method of electron-beam melting lateral surface ingots of heat-resistant alloys

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