JPS5834436A - Driving method of electro-optical device - Google Patents

Abstract

PURPOSE:To realize the DC driving and to facilitate a display of animations for an electro-optical device, by forming a liquid crystal light valve with a photoconductive layer having the rectifying properties. CONSTITUTION:A rectifying photoconductive layer 9 containing a base layer 9a, an i-layer 9b and an n-layer 9c is provided on a transparent electrode 2b on a transparent substrate 1b. A reflecting mirror 8, a transparent insulating layer 7 and a light shielding layer 5 are formed on the layer 9. Then a deflecting plate 10 and a transparent electrode 2a are provided on both surfaces of another transparent electrode 1a, and a liquid crystal layer 3 is enclosed between the layer 5 and the electrode 2a. Thus a light valve is obtained. The DC voltage adverse to the rectifying properties of the layer 9 is applied, and then the wirting optical signal is projected to form a projected image. While the projected image is erased by applying the DC voltage forward to the rectifying properties of the layer 9. Thus the DC driving is made possible, and a display of animations is facilitated.

Description

[Detailed Description of the Invention] [This °] and dawn, input one image by a circle to light +1-. Throw E +' by effect! The present invention relates to a method for driving an optical device that converts rfc'jA into:.

1) +2, '7i of this 111 gun? A liquid crystal light pulp (light 1'') is known as a gas optical device. , two transparent 'Ii (photoelectric sensitive layer C sandwiched between ladle 4) +1:pR
ii'
i, 'Crystallite pulp is disclosed. Then, the projection light incident from the -' city mirror P; This is necessary in order to reflect the light in front of the 5 bottles q1 far away.

)
i 02.5j02 Multi-layer 1+a is used. In this case, we will use a flat mirror that reflects light from "waves throughout the viewing area";
<r: Line 4・It is necessary to create a very advanced Iil! All manufacturing technology. Furthermore, even if a dielectric mirror is made with the above-mentioned objective 1, it is not possible to completely transmit the projected light to the actual lumi.
'+1. Iiii! A separate light-absorbing filter is provided between the mirror and the mirror, and its function can be removed.
・λ,.

Therefore, in the conventional cylindrical nodule valve, the desired function is not achieved by the light beam, resulting in a complicated structure. The cost was also high.

Furthermore, it has been difficult to drive the conventional liquid crystal light pulp using a DC voltage.

Accordingly, the present invention eliminates the various drawbacks of the conventional art, and also enables direct current driving, thereby facilitating the display of moving images.

Electro-optical device II, commonly called liquid crystal light valve
The main purpose of this invention is to provide a driving method for ``t''.

The present invention, which achieves such objects, comprises a liquid crystal layer and a liquid crystal layer;
For an electrical bar-shaped device that converts the projection into a projection by the tun effect, the direction opposite to the direction of the projection of the photoconductive layer is >IF.
, a process of forming a projected image on the liquid crystal layer by applying an Elf pressure and projecting an optical signal containing a dimension onto the front surface layer; and a step of applying a voltage in the forward direction to erase the projected image.

Hereinafter, the present invention will be explained in detail by way of specific examples using the drawings.

Figure 'fJ1 is a schematic sectional view of an example of a light valve device, and in the figure, 1. +1 It's a loud cry.

Both la and lb are transparent carded plates made of glass plates or resin plates. Also, both s 2 a% 2 b i1 are Saimei electrodes, such as 5n02, In, (S n ) Os Q
'P's #J Jl:aQ! Nosa, 500-3000 A
degree). 3 is a liquid crystal layer, and 4 is a spacer for sealing the liquid crystal I43 and adjusting the j-thickness, and a resin adhesive is used. Liquid crystal layer:
In addition to the current effect as in DSM, changes in the liquid crystal structure in 3) include the TN method (twisted nematic effect), I) AP (field-controlled tall PM refraction effect) method, phase transition method, or GH (guest) method. There are methods that use electric field effects, such as the host effect method, but in this illustrated example, G
The H method has been adopted as the preferred MM fx. Specifically, there are no particular restrictions on the liquid crystal used for this G■■ (guest host) liquid crystal layer 3, but in consideration of the temperature rise during driving, the clearing temperature IW should be 50°C or higher, preferably 60°C. As the dye to be mixed as a guest into the liquid crystal below 0.degree. C., it is preferable to use an anthraquinone dye, which has good light resistance. At this time, it depends on the dye content h1 in the liquid crystal and the extraction type of the liquid crystal, but usually! lj 1
It is 0.05 to 10 threads in 1%, preferably 0.1 to 5 threads. Furthermore, the thickness of this liquid crystal layer 3 is generally 1 to 20 μm.
An appropriate thickness is set depending on the properties of the liquid crystal (14 yen), response speed (14 yen), driving voltage, etc. Reference numeral 5 denotes a light-shielding layer, which is formed by depositing carbon or metal to a thickness of about 5008 to 2 μm. This light shielding layer 5 is
Figure 2 and 1 are cutaway plan views of A and A' in the figure.
? This light shielding layer 5 has a large number of 4 holes (
j is an array. Furthermore, one of the through holes 6 with and has a projection 1ψ
corresponds to one pixel in . Incidentally, the shape of the through hole 6 of η- is not limited to the square shown in the example shown, but can be any shape. Furthermore, 7 in FIG. 1 is a transparent insulating layer, which preferably has a volume IJ (resistance of 1 (JltΩ・on) or more. This is, for example, a glow discharge component sic formed by the Jγr method, A 5ioz film, Pb1'i0a, and 1-year-old ZT film formed by S:, N,) conversion, sputter evaporation method, etc.

It consists of a ferroelectric film such as polyvaraxylylene.

And the thickness Pi of the transparent insulating layer 7: 1. + (
It is preferable to set it in the range of 100A to 5μIII.

Reference numeral 8 denotes a reflecting mirror, which is composed of a deposition source of metal such as A/- having a thickness of about 500 A to 1 μl'11 forming a mirror surface.

A large number of these mirrors 8 are arranged so as to face all of the matching holes 6 through the insulating layer 7, and each mirror 8 is arranged at ]3 in FIG.
．． They are arranged as shown in Figure 3, which is a view of the cut HB direction at line B'. Note that one of the mirrors 8 is molded to have an area (width) at least larger than the area of the r+iJ Me xh hole 6 in order to prevent light from leaking from the valley mirror gap 811. is a light guiding layer that exhibits rectification, and the so-called rectification here has a broader concept than the rectification of ordinary diodes, as will be described later.

By the way, in the configuration example shown in FIG. 1, the transparent insulation layer 71tlll of the light shielding layer 5 has a
It is desirable to provide the S4 member to absorb the reflected light of the projection light by the mirror 8 in order to reduce the contrast of the projected image.

The reflective mirror 8 is made of conductive elements 1, li,
The reason why all of the reflecting mirrors 8 are separated is that if they are continuous, they will have the same potential and the potential difference will occur. This is because image formation becomes impossible because no image formation occurs.

Here, using another drawing, let'+LF shown in FIG.
Including) We will explain the operation of ζIJ liquid crystal light pulp in detail, and also explain the suppression of "rectification" in the present invention.
Make ξ clear. FIG. 4 is a schematic diagram illustrating the operating principle of the light valve device shown in FIG. Apply a DC electric field. At this time, in the area where the signal beam was projected, the gear rear (
Toyo (indicated by θ in the figure) moves to the reflecting mirror 8 due to the lifting resistance. As a result, the transparent electrode 2a and the opposite! 1
．． Between 1 and 8 mirrors? The lf pressure increases through the through hole 6 and 1
．． In the crystal layer 3, the liquid crystal molecules with positive dielectric anisotropy: 1α and the dye 3β change from a homogeneous orientation state to a pomeotropic orientation state. When the projection light is projected here through the polarizing plate 10, the polarized light passes through the through hole 6 and reaches the reflection mirror 8, where it is reflected, and the reflected light RL is ・1++0 On the other hand, the signal light beam does not enter. In this region, the first carrier does not occur, so the gear rear is jti light'11 (pole 2b
Therefore, in this case, the liquid crystal molecules 3α and the dye 3β are I was disappointed with the homogeneous orientation state for 7 hours.

The projected light (antistatic) incident here is absorbed by the dichroic dye 3β of the liquid crystal layer 3A, and the reflected light 1 is reflected by the reflection mirror 8.
．． has less halo 1 than the reflected light [(T-, , ).

In this way, a projected image (image for projection) based on the difference in the amount of reflected light is formed, and the image reflected in the liquid crystal layer 3 is enlarged and projected onto a screen (not shown), etc. .

11゛I rebelled against ``At the second Jf.
If it leaks out to the side, the projection light will be blocked from entering the light conduit layer 9.

In the 81J1 example of the second work of the father, the projection formed in the liquid crystal layer 3.
Special projection) Even if it does not depend on t, the projected image is 1 with indoor light of 1
You can also observe the first celebration.

Next, using Figure 5, we will discuss concrete examples of 1iH and 4 examples.
ltJIJ.

In the first 41q formation example, the transparent substrate 1b is attached to the samurai shown in FIG.
Transparent '11:! , Pt on pole 2b, pd
, A, u or 1'j: Mo k 2 [1-500
A, W, preferably 30 to 2 oo', are attached to form a base 9a.

Then, the gas mainly composed of 5il14 is separated by electric discharge to form a-8i-H7m 9 b on the active layer 9a.

The a-8i-H layer 9b becomes an n-type semiconductor and forms a single barrier layer between it and the layer m9a. still,
a Si fl 119 b Itj-, s usually,
It is called the i-layer. The thickness of this layer 91) is determined depending on the relationship with other layers, especially the liquid crystal layer 3, but usually,
It is in the range of 5000 A to 20 μm.

PPrl'' Mashikake, mixed with 1.000~1100OO camphor tree and subjected to sheet decomposition.s) Speed 100~3000A, ``di-
The dark current photoconductive layer 9 is formed by forming six layers 9c deposited at 501) to 2000A.

Next, after forming a reflective mirror 8 made of At, a reflective insulator In 7 , and a photonic layer 5 at the same 4>R as in the embodiment shown in FIG. deflection root 10
An example of a light pulp device is constructed by providing a transparent electrode 2a and a GI liquid crystal layer 3 along with a miscellaneous light layer 5 and a transparent electrode 2a. Light valve device 6 obtained in this way
The band diagram of the light guide '; 4i layer ≤) is shown in FIG.
The voltage applied between the transparent electrodes 2a and 2) is 1k, with the 2d side being negative. At this time, without forming a shotogy barrier layer, a 8
i 117 (ili'>) If 9b is provided, the injection of the gear rear (... if il- is left over, Shigeko) will be carried out from pole 21+. Therefore, if the 1li4 resistance of the W layer 9 is 10'Ωon-1-0'Ω/7+1, then f''f%j
The result is an immediate conclusion. On the other hand, as in this example, 7
When a γ layer is formed, carrier injection into the optical layer 9 is)sii, IIZ, and >s
The dark resistance of 'ilt high 9 is 1012Ω'an1 mino,
When it becomes 1-, it is possible to form a projected image exactly as 1-1 [11 becomes main].

In addition, the n-layer 9C in "E 19') is a reflection mirror 8 that receives the four carriers II (formula,
From Bokumei City 1) 1 meeting 2 b Sweep the IIC photo carrier with V, +1. It has the effect of stably enabling.

Karasaku 1 ice cube 13th go, Mirat; and during episode 1, 't
'I split it into two uncles, and I feel like it's Ainrei 1pi-11-
It is necessary for children to attend the festival, and there is a small drop on the floor in Figure 5 at the l'A festival.
>'k using the shahaku i'r method, mirror 8 and i'r,
``i same 11ζ butter y l/7-+ig is formed.

In this case, the projection 9 entered in Y7 (lower line) is projected to j■man mirror 8.
l, - when struck 1r, C11 solid nJ so 9c's J
It is necessary to make II11 equal to or slightly wider than that of mirror 8. By the way, it's hard n Illi9c's 1 river 4
;"1 is busy with me 2-8" When both are small, 1=i
Z &;
), it appears to be effective.

In addition, if this 4 layer 9c is not provided and the a-8i-0 layer 9b is treated as an anti-3T 1mirror 8 and 11' is formed on the a-8i-0 layer 9b (the interface of the rJ field A barrier may be formed, and a barrier may be formed at the door of the first carrier. (Tanshi, upper iiL barrier is shape 1) 1
The n-layer 9c can also be omitted if there is no such case.

By the way, when sweeping the first gear rear, this example device Ii
The voltage applied to the liquid crystal layer 3 has a threshold value, il
As long as the transparent electrode 2b is not connected to the transparent electrode 2a, either the forward direct current 1 voltage or r#,' voltage may be used.

Next, the second configuration will be explained. In this example, the transparent electrode 2b-L- contains B21f in a gas mainly composed of SiH4, total 50-2Of'1100pp%-W, or 200-1. (Contains 1 (l old) ppm and performs glow group'"Emolecule)" to thicken, 3 () ~ 100 (] A
, P: 9a was formed in the moat 50-300A. The individual thickness of the Pj so 9a, the absorption amount of the No. 14 ray, and the two layers 9a and the a-
S4-11. It is determined by the relationship between the formation of a depletion layer between l# (i to -7)91).

Next, in the same way as in the configuration example of;Fang↓1, a
St 11 layer 9b, γL layer 9c, reflection mirror 8
, Light 1"l: After sequentially laminating the 8 insulating caps and the aX layer 5, the liquid crystal layer 3 is sealed in the same way as the 2a of the Ill, and the light valve system (d is being completed). The band diagram of the light guiding layer 9 in this device is shown in FIG. Same, Moon, Tsu, Same (moth effect is 144).

Father, also in book V/+1, photo carrier reflection mirror 8
Sweeping from to the transparent electrode 2b can be performed in the same manner as in the case of 4) 71.

In addition to the above, the second layer 9a includes 5ill.

Deposition 1 [(P type a-8i
-C-H]+Q) to a St Jl) f49 b
A heterojunction obtained by forming the same may be used, and exactly the same effect can be obtained.

Furthermore, in a third configuration example, the liquid crystal light valve device f is produced in the same manner except that the configuration of the light guiding layer 9 is different from the second example described in (-) above. In this example, d1, the photoconductive layer 9 is prepared as follows. That is, a-8i- on the transparent ′[1-likelihood pole 2b
N-II film tSio, I+% or polyparaxylylene group thickness, 50-1.000 OA.

Preferably, the thickness is 100 to 3000 A and the transparent insulating layer 9a is provided.
4 a-St-I-i layer 9b% n layer 9c
The i-th layer is laminated.

FIG. 6(c) shows a band diagram of the light guide '11L layer 9 in this example of ]s3.

9 in one column for 4;]:,? A light'+l+: 1m 2 b
Since carrier injection from a, SI, f (M(ild) 9b to M(ild) 9b is blocked by the insulating layer 9a, and since the a-8I H layer 91) is an n-type semiconductor, the projection 1'J! The 1-pressure polarity applied when forming the 11] force 11 is exactly the same as in the case of the above-mentioned / column, and the same desired effect can be obtained. Father, Photo Gearia's Sweep II'ψ work can also be done in the same way as these.

In the following 234+ll liquid crystal light valve device, S
01. Five optical layers such as PI so, a Si H1m (1 layer), and n layer were formed by discharging a gas with a living body.
Similarly to the above, P layer (B, l-1, etc. are used as doping gas), a-8i -F-1-i layer (i layer ), an n-layer (PtT3 or the like is used as a doping gas).

Incidentally, a-8t (a-8i-11, a-8t -1i
The preparation method, properties, doping effects, etc. of ``-■) are described in detail in ``Amorphous 1st Material Utilization Technology Tosei'' (Science Forum Publishing, 15th old) and other documents, so please refer to them. can do.

Furthermore, as it may be easily recalled, the rectifying layer according to the present invention;
A laminate of tSes, CdS, Cd', l'e, etc. and a transparent insulating layer, or a laminate of Cd5 ('n type) and Cd'l'e
(P-type) heterojunction etc. can also be applied.

Further, the present invention will now be described in detail with reference to specific examples.

Example 1 In on Corning 7059 slide glass Ib,
(Sn)Os (manufactured by Matsuzaki Vacuum) is used as the transparent electric body 2b,
This is then subjected to an electron beam.
= ] X 1.0 'l'orr
Steaming + "f rate Q<) = L A, /S, cutting board temperature (Ts) - Steaming to a thickness of 40A at -80℃ ii L
/I P t J□□□9a was provided.

Next, an R-Si-11 layer 9b was deposited on the valley 11 to a thickness of 0 μl by a bonding type glow emission 7L decomposition method as follows. Both anode and cathode are 200φ,
SiH4/1 was placed in the reactor with a distance #'Jt of 50 mm on that day.
a2-oz gradient gas k 20 SCCM L'n, enter, pB
= I
05Torr, Ts = 250℃, tt
li' = 1.3.561VIHz, Rfi' power = 15W, glow emission '1℃ minute lW L, a S
I Put the HV on the slide glass.

1 - 10 hours edition - = 01 Sasashii stacked slide glass demon hanode + 1llI set in 0 this one year (
The 4+ a SiH layer exhibits excellent photo-2Ct conductivity (
Resistivity at He-Ne laser, 1 m W/r-4)
=10'Ω·nn.

Next, At was deposited on this a-8i-HJmQb to a thickness of 2000A by vapor deposition using an electronic vibrator.

At this time, Xn = 1. X1. OTnrr,
Ts = 60°C, to R-10 shade.

Then, by photolithography, one piece was 9011n]X 9
(9, +
', 3) A reflecting mirror 8 (having a pattern as shown in the figure) was formed and laminated. At this time, using the same device used to film a-8i-TI, set the Jk plate that had gone through the above manufacturing process on the anode 1 liter, and use PI (= I
Under 'i'orr, SiH4/82 = to 5 SCCM, pure N[], 20 SCCM 4A, #S) 13 +1.
151. "orr" and deposited for 5 hours under the conditions of Ts -250°C, I-jF power -5, W.The volume resistivity of the a-Si-N-11 layer thus obtained was 10 Ω.
・Child by m or more. Next, At was vapor-deposited on this aSI N H & photosensitive insulating layer 7 in a zoooo' manner, and the light-shielding layer 5 having the pattern shown in FIG. 2 was photographed so that the overlap with the reflecting mirror 8 in FIG. Patterning was performed using an etching method. Therefore, the tM opening of the opening 6 is 80 μm x 80
I'll be happy with μI'll. Polyparaxylylene (100A LvJ)
It was deposited more than this. The polyparaxylylene was rubbed with a cotton cloth to orient the product. Around the light-shielding layer 50 (the polyvaraxylylene in that part is removed), it is necessary to thicken the epoxy resin in which the powder is dispersed around the vC% process so as to have a cheap opening (Aj', l,). Polyvaraxylylene J subjected to orientation treatment
7059 striped glass 1at pressure 4.4 with "contamination"+M pole 2a, with hm (thickness to 2ooo). Heat-cure enough 1 part 1 part epoxy resin and place it in an empty tank along with the guesthos l-A'i- product, and pump 1 part with a rotary pump. X 10 ``J, I felt like it was going to be 4Jl. Next, I used Kest Post L to block ``-1, [previously set up] this i+il r-1.'' While gradually leaking, the inside of the vacuum chamber was filled. I made it an Imo and interrupted it. Note that the alignment of this liquid crystal is homogeneous alignment. 131) Ansuyaginon-based blue dye 1] manufactured by II Chemical Co., Ltd. was dispersed in a guest-host liquid crystal at a ratio of 0.5 to 0.5. The clearing point of the above liquid crystal is 1 ()
The temperature was 7°C, and the threshold pressure was 2.2. Transparent substrate 1
a-to 11 Higashiyama-Nini polarizing film NPF'-Q
A guest-host crystal light valve device (not shown in Fig. 1) was completed by attaching a neutral clay to I 2 (neutral clay). In FIG.
03, a lens for condensing the projection light onto the mirror 104;
105 is a guest-host liquid crystal display device 106 that forms a 4/C projected image on the screen 101.
It is a lens that expands by 1 in 41 Mi. 107 is emitted from the polygon mirror C11 worship light 109 and focused by the condensing lens 108.
It is reflected by a spot of 00μnlφ.

Here, we will briefly explain the formation, erasure, and results of projection images on the screen in this embodiment.
Then, a writing I(e-Ne laser was applied to the photoconductive layer 9 through the transparent substrate 1b. Application time: 20 msec, obtained laser intensity: 20 msec.
The guest host LCD screen was scheduled to be projected at 0 μW/lsl on 1007/I.

W/l. The projected image was projected onto a screen 10 using projection light from an i+].logen lamp. The resulting screen
-The contrast of the image is determined by the intensity of reflected light in the bright and dark areas? The ratio was 6:1 for dogs. Erasing the projected image is transparent '1'l'c2
1 between a and 2b. KHz AC” direct pressure 2V 2
The voltage was applied for 0 msec. At this time, light guide i1.
J? The reverse dark resistivity of J9 was 1013 Ω·m or more, and the 1114 resistivity in the ilhi direction was 108 to 10 Ω·m (although there were variations in places).

Me, the polyvaraxylylene is 2a or μmm
It effectively works to prevent ion implantation from outside the light emitting layer and extend the life of the liquid crystal.

Example 2 9b was given a sore throat. This a F”lt I i
Layer 9 1) Add n layer 9c to 1.
o o o A (Drll is 1 (.

Accumulated.

〈Deposited matter〉 PB = I
ilL /11t= 10% gas at 28CCI
Introducing 108CCU of v't%PH3A-1t=100PPM gas and changing the gas) 1- to 0.
1 Torr, Ts = 20 (1 °C, Rl
i” power = 8 W for 16 minutes lttl, 1 i (-multiply.

The n-layer thus obtained was patterned in the same manner as the reflecting mirror shown in Figure 3 by photolithography. Incidentally, the band diagram of the conductive layer 9 at this time is shown in FIG. 6(a).
It will look like this.

Next, the obtained n I', n 9 c, and J2 are shown in Example 1.
In the same manner as above, a reflective mirror 8, a transparent insulating layer 7, and a light layer 5 are formed.2, a guest host liquid crystal is placed between a light shielding layer 5 having an aligned polyparaxylylene layer and a transparent electrode 2a. After sealing, place the polarizing plate 10 on the transparent old plate 1a with K%
The liquid crystal light valve device of this example was completed. Using the device shown in FIG. 7 incorporating this light valve device,
An image corresponding to the 14-inclusive optical signal was produced on the screen 101 by operating in the same manner as in Example 1. However, when forming a projected image, the voltage applied to the transparent electrodes 2a and 2b is 4.3
■It was. The operation of erasing the projected image was also performed under the same conditions as in Example 1, but the forward dark resistivity of the photoconductive layer 9 was 108Ω.
・M and there was little unevenness in location.

Example 3 P 1m Q a was deposited to a thickness of 10 OA on a transparent electrode (In, (Sn) Os ) 2 a on a transparent substrate (7059 slide glass) la under the following conditions. I x 10' S under Torr
iH4/HU = 10% gas at 4 SCCM
, B, He/乍2 = 100 PPM gas at 10 SC
CM it was done by one person, the gas pressure was set to 0.1 Torr, TS = 250°C, RF power = 1. 100 in OW
Deposited in seconds. On the thus obtained P layer 9a-1-, a Si n layer 9b was deposited in the same manner as in Example 1, and then one layer 9c was deposited and patterned 17 under the same conditions as in Example 2, followed by Example-1. Reflection mirror 8. Transparent insulating layer 7. A light-shielding layer 5 was formed, and a guest was completed between the light-shielding layer 5 having an oriented polyvaraxylylene layer and a transparent conductor (m2a).
The band diagram of is as shown in Figure 6(b), and the reverse dark resistivity is 1013Ω・cm or more, and the forward dark resistivity is 1013Ω・cm or more.
1 (The resistivity is 108Ω・cnl, and there is little unevenness in location.)
is. An image corresponding to the M stray light signal was generated on the screen 101 in the same manner as in Example 1. The driving applied voltage for projection image formation at this time is 4.3 2 as in the actual application. The operation of erasing the projected image could also be performed under the same conditions as in Example 1.

Example 4 Transparent electrode (Int (Sn) Os) 2a on transparent substrate (7059 slide glass) a-8i-
The translucent insulating layer 9a made of N-H was heated to 200 OA under the same conditions as those for forming the translucent insulating layer 7 in Example 1.
It was formed to a thickness of . Then, in the same manner as in Example 1, a-8
After depositing the i-H layer (9b), a layer (n') 9c was formed and patterned under the same conditions as in Example 2. Next, in the same manner as in Example 1, a reflecting mirror 8. Transparent insulating layer 7. A light shielding layer 5 is formed, a guest host g crystal is sealed between the light shielding layer 5 having an oriented polyparaxylylene film and the transparent Ia electrode 2a, and a polarizing plate 10 is mounted on the transparent substrate 1a. The liquid crystal light valve device (α5) of this example has been completed. The band diagram of the photoconductive layer 9 in this example is shown in FIG.
c), and as in Example 2 and Example 3, the reverse dark resistivity is 013 Ω・m or more, the forward dark resistivity is 1l-1:108 Ω・m, and the location unevenness is There weren't many. Using the device shown in FIG. 7 incorporating this liquid crystal light valve device d, writing optical signals U could be carried out in the same manner as in Example 1.

The present invention, which has been explained in detail above, has the following features: 1. Display using the electro-optic effect is possible by direct current voltage driving, and in this case, moving images can be easily displayed.

2. The voltage l'' can be widened, making it easy to control the driving voltage.

3. When a projected image is formed, the image W is stable over the entire display surface.

4. The equipment has a long lifespan.

5. The structure of the device components, especially the anti-fouling mirror, is simple and the device can be made compact.

6. Receiving photo carriers in direct current t IF, driving by the reflective mirror element is f li'i.

Various effects such as this can be obtained.

[Brief explanation of the drawing]

Figures 1 to 3 are schematic diagrams illustrating one example of the configuration of the device according to the present invention. Figure 5 shows details of the photoconductive layer in the device N according to the present invention; Figure 7 is a diagram showing the l+!t% layout of the projection optical system including the liquid crystal light pulp device.
α (C1 liquid crystal molecule, 3 β is dye, 5 is light shielding J-hiro 7 is No. 1 photosensitive insulating layer, 8 is reflective mirror, 9 is Kohiro'rl (Ii7
．． 9ake M )te s or P layer or impossibility k f(
d, 91) is one layer, 9c is γLIl'1J110 is a single-sided light plate, 101t is a screen, 102 Ij: halogen lamp, 103° 108 is a condensing lens, 104 is a projection light reflecting mirror, 105 is a projected image magnifying lens, 106 is a light valve device, 107 is a polygon mirror, and 109 is an elaser source. Gikoto Mitsusa (6th z 2 Shi Mushi q Shi Riko 3・□ Fig. 5 7, lθ \it) +1 Zullj no IV

Claims (1)

[Claims] The electro-optical device is equipped with a photoconductive layer having a liquid crystal layer and a photoconductive layer having a property of Direct current voltage to rectify the layer 1'1° (reverse) 5 directions) is stamped J111
The light ♂j''f, '(4
Layer rectification ze 1゛ and 1111' 4 in one direction! +1(-.,'5A optical device jf', j driving Jj method, characterized in that the previous 1f12 throw by applying -°C11 includes a process of erasing the bottom).