JPS5832447B2 - Manufacturing method of image pickup tube face plate with built-in filter - Google Patents
Manufacturing method of image pickup tube face plate with built-in filterInfo
- Publication number
- JPS5832447B2 JPS5832447B2 JP53165632A JP16563278A JPS5832447B2 JP S5832447 B2 JPS5832447 B2 JP S5832447B2 JP 53165632 A JP53165632 A JP 53165632A JP 16563278 A JP16563278 A JP 16563278A JP S5832447 B2 JPS5832447 B2 JP S5832447B2
- Authority
- JP
- Japan
- Prior art keywords
- filter
- manufacturing
- substrate
- built
- face plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
Description
【発明の詳細な説明】
本発明は、小形カラーテレビカメラに最適なフィルタ内
蔵撮像管面板の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing an image pickup tube face plate with a built-in filter that is most suitable for a small color television camera.
一般に、色分解線条フィルタを撮像管面板に内蔵する方
法としては、主として次の2つの方法が挙げられる。Generally, there are two main methods for incorporating a color separation line filter into an image pickup tube surface plate.
第1の方法は、主に有機色分解線条フィルタ等を内蔵す
る際に用いられ、第1図のように、少なくとも1種類以
上の色分解線条フィルタ12が形成されたガラス基板1
1と、透明電極13及び光導電膜14が形成されたガラ
ス薄板15とを、接着材16によりはり合わせる方法で
、第2の方法としては、耐熱性、退色性に優れた無機ダ
イクロイック色分解線条フィルタを内蔵する際に用いら
れ、第2図の様に少なくとも1種類以上の色分解線条フ
ィルタ22が形成されたガラス基板21上に、主として
スパッタ蒸着法によりガラス薄膜23を被覆し、研摩に
より表面を平滑化した後、透明電極24を蒸着法又はス
プレー法等により形成し、光導電膜25を形成する方法
である。The first method is mainly used when incorporating an organic color separation line filter or the like, and as shown in FIG. 1, a glass substrate 1 on which at least one type of color separation line filter 12 is formed
1 and a thin glass plate 15 on which a transparent electrode 13 and a photoconductive film 14 are formed are glued together using an adhesive 16.The second method is to use an inorganic dichroic color separation line with excellent heat resistance and fading resistance. A glass thin film 23 is coated mainly by sputter deposition on a glass substrate 21, which is used when incorporating a striped filter, and has at least one type of color separation striped filter 22 formed thereon as shown in FIG. In this method, after the surface is smoothed by a method, a transparent electrode 24 is formed by a vapor deposition method, a spray method, etc., and a photoconductive film 25 is formed.
本発明は後者の製造方法に関するものであるが、この際
のガラス薄膜の被覆工程で、色分解線条フィルタに分光
特性の変化が生じる。The present invention relates to the latter manufacturing method, and the spectral characteristics of the color separation line filter change in the glass thin film coating step.
とりわけ、リップルの発生及び透過率の低下等が挙げら
れるが、これらはカラーカメラとして、光利用率の低下
、色の混色2画面のムラ等となって表われる。Particularly, the occurrence of ripples and a decrease in transmittance can be mentioned, but as a color camera, these appear as a decrease in light utilization efficiency, uneven color mixing between two screens, and the like.
前者のリップルの発生は、初期のフィルタ設計時の配慮
で軽減できるが、後者の設計時の予想を上回る透過率の
低下は製造条件によって大きく左右される。The former type of ripple generation can be reduced by consideration during initial filter design, but the latter type of decrease in transmittance that exceeds expectations at the time of design is largely influenced by manufacturing conditions.
よって本発明の目的は、透過率低下の少ないフィルタ内
蔵撮像管面板の製造法を提供することにある。Therefore, an object of the present invention is to provide a method for manufacturing an image pickup tube face plate with a built-in filter that causes less decrease in transmittance.
以下本実施例をS IO2−T r 02系のシアンフ
ィルタを例にとって述べる。This embodiment will be described below by taking an SIO2-T r 02 system cyan filter as an example.
ダイクロイックフィルタの蒸着は、電子ビーム蒸着装置
によって行なわれるが、透光性基板上にCu、Ag等の
リフト材を、フィルタパターンとは逆パターンになるよ
うに形成した後、基板温度を150℃以上に維持し、4
.0X10’−5〜1.5×10”−4Torrの酸素
雰囲気中でS t 02 、T t 02を交互に蒸着
する。Dichroic filters are deposited using an electron beam evaporator, and after forming a lift material such as Cu or Ag on a transparent substrate in a pattern opposite to the filter pattern, the substrate temperature is raised to 150°C or higher. 4
.. S t 02 and T t 02 are alternately deposited in an oxygen atmosphere of 0×10′-5 to 1.5×10”-4 Torr.
その後、リフト材はエツチングにより除去される。The lift material is then removed by etching.
一方、フィルターが形成されたガラス基板上にガラス薄
膜を形成する工程においては、基板温度上昇の少ないマ
グネトロンタイプの高周波スパッタ蒸着装置が用いられ
、ターゲットには、フィルタ蒸着基板と同質のガラス基
板を用いた。On the other hand, in the process of forming a glass thin film on a glass substrate on which a filter has been formed, a magnetron-type high-frequency sputter deposition device is used, which causes a small rise in substrate temperature, and a glass substrate of the same quality as the filter deposition substrate is used as a target. there was.
このガラス薄膜の蒸着の工程においては、ターゲットに
設けられた電極と基板ホルダに設けられた電極の間隔が
55m@、スパッタガスAr+10%02゜基板プリヒ
ート130℃、入力パワー600Wの条件下で行なうこ
とにより付着力の強いガラス薄膜が効率良く得ることが
できる。In the process of vapor deposition of this glass thin film, the distance between the electrodes provided on the target and the electrodes provided on the substrate holder is 55 m@, the sputtering gas Ar + 10% 02°, the substrate preheating is 130°C, and the input power is 600W. As a result, a glass thin film with strong adhesion can be efficiently obtained.
ガラス薄膜蒸着時の基板表面温度の変化を第3図に示す
。FIG. 3 shows the change in substrate surface temperature during glass thin film deposition.
第3図から明らかなように、600Wのパワーで蒸着し
た場合シャッタ開披急速に表面温度が上昇し、約5分後
には250℃にも達し、その後300〜350℃程度に
上昇する。As is clear from FIG. 3, when vapor deposition is performed with a power of 600 W, the surface temperature rises rapidly when the shutter is opened, reaches 250° C. after about 5 minutes, and then rises to about 300 to 350° C.
この時、基板ホルダを水冷する事により温度上昇を少な
くする事が出来るが、水冷し得られたガラス薄膜は内部
歪が大きく耐熱性に乏しい。At this time, the temperature rise can be reduced by water-cooling the substrate holder, but the glass thin film obtained by water-cooling has large internal strains and poor heat resistance.
これに対し、高い基板温度で得られたガラス薄膜は耐熱
性に優れ、透明電極の形成時又は光導電膜形成工程中の
300〜550℃の温度上昇に耐える。On the other hand, a glass thin film obtained at a high substrate temperature has excellent heat resistance and can withstand a temperature rise of 300 to 550° C. during the formation of a transparent electrode or photoconductive film formation process.
ところで前記のダイクロイックフィルタを基板に形成す
る工程中において、基板温度が300℃以下の条件下で
フィルタが形成されたものは、ガラス薄膜の被覆工程中
で透過率の低下が大きいことが分かった。By the way, it has been found that during the step of forming the dichroic filter on a substrate, when the filter is formed under conditions where the substrate temperature is 300° C. or lower, the transmittance decreases significantly during the glass thin film coating step.
この様子を第4図に示す。このように、フィルタ形成時
の基板温度が低いものは、フィルタを形成した基板とガ
ラス薄膜を接着材等によりはり合わせる前述の方法にお
いては問題ないが、本発明が係るガラス薄膜を蒸着によ
り形成する方法においては透過率低下が大きく高品位な
画質が得られない。This situation is shown in FIG. In this way, when the substrate temperature is low during filter formation, there is no problem with the above-mentioned method of bonding the substrate on which the filter is formed and the glass thin film with an adhesive, etc., but the glass thin film according to the present invention is formed by vapor deposition. In this method, the transmittance decreases significantly and high image quality cannot be obtained.
ガラス薄膜形成時における基板温度の上昇をさけるため
、第3図に示すようにさらに低い、200Wのパワーで
スパッタ蒸着を行なったが、実際の表面温度は170℃
程度にも達し十分低くならない。In order to avoid an increase in the substrate temperature during the formation of the glass thin film, sputter deposition was performed at an even lower power of 200 W as shown in Figure 3, but the actual surface temperature was 170°C.
It doesn't get low enough.
第4図に示す様にフィルタ形成時の基板温度260℃の
ものは理論計算による透過率に大部近ずいてくるが15
0’Cのものはまだかなりの透過率の低下をきたしてい
ることがわかる。As shown in Figure 4, when the substrate temperature during filter formation is 260°C, the transmittance is almost close to the theoretically calculated transmittance.
It can be seen that in the case of 0'C, the transmittance is still significantly reduced.
又S i02. T i02によるフィルタ形成時の基
板温度300℃以上のものは、透過率低下も少なく、付
着強度の強いオーバーコート膜が高パワーで効率よく付
着できる利点がある。Also S i02. A substrate temperature of 300° C. or higher during filter formation using T i02 has the advantage that there is little decrease in transmittance and that an overcoat film with strong adhesion strength can be efficiently adhered with high power.
以上はS 102TiO2によるシアンフィルタの例に
ついて述べたが黄色フィルタについても全く同じである
。The above has described an example of a cyan filter using S 102TiO2, but the same applies to a yellow filter.
また、MgF2−CeO2によるダイクロイックフィル
タについても同様な結果が得られた。Similar results were also obtained for the dichroic filter made of MgF2-CeO2.
以上述べたように、本発明による製造方法は、グイクロ
イックストライプフィルタを、ガラス薄膜を蒸着被覆し
、研摩によって表面を平滑化するフィルタ内蔵撮像管画
板の製造方法において、フィルタ形成時の基板温度を、
ガラス薄膜被覆工程中の基板表面温度より高くすること
により、光利用率の高い、光の混色2画面ムラの少ない
、高品位な簡易型カラーカメラに適したフィルタ内蔵撮
像管面板の製造方法である。As described above, the manufacturing method according to the present invention is a method for manufacturing a filter-embedded image pickup tube picture plate in which a gicroic stripe filter is coated with a glass thin film by vapor deposition and the surface is smoothed by polishing. of,
This is a method for manufacturing an image pickup tube face plate with a built-in filter that is suitable for a high-quality simple color camera, which has a high light utilization efficiency and less unevenness in color mixing on two screens, by raising the temperature of the substrate surface higher than the substrate surface temperature during the glass thin film coating process. .
第1図は有機フィルタ等のフィルタ内蔵撮像管面板の製
造方法を示す図、第2図はダイクロイックフィルタのフ
ィルタ内蔵撮像管面板の製造方法を示す図、第3図はガ
ラス薄膜のスパッタ蒸着中の基板表面温度の変化を示す
図、第4図はフィルタ蒸着基板温度によるガラス薄膜被
覆工程中の透過率の低下の変化を示す図である。
21・・・・・・透光性基板、22・・・・・・ストラ
イプフィルタ、23・・・・・・ガラス薄膜、24・・
・・・・透明電極、25・・・・・・光導電膜。Figure 1 is a diagram showing a method for manufacturing an image pickup tube face plate with a built-in filter such as an organic filter, Figure 2 is a diagram showing a manufacturing method of an image pickup tube face plate with a built-in filter such as a dichroic filter, and Figure 3 is a diagram showing a method for manufacturing a camera tube face plate with a built-in filter such as a dichroic filter. FIG. 4 is a diagram showing changes in substrate surface temperature, and FIG. 4 is a diagram showing changes in transmittance reduction during the glass thin film coating process depending on filter deposition substrate temperature. 21... Transparent substrate, 22... Stripe filter, 23... Glass thin film, 24...
...Transparent electrode, 25...Photoconductive film.
Claims (1)
と、上記色分解線条フィルタ及び上記透光性基板上にガ
ラス薄膜を蒸着によって形成する工程とを備え、上記色
分解線条フィルタの形成時の上記基板温度が、上記ガラ
ス薄膜の蒸着時の上記基板表面温度より高くすることを
特徴とするフィルタ内蔵撮像管面板の製造方法。 2 色分解線条フィルタはSiO2,TiO2を含んで
おり、前記フィルタの形成時、基板温度を300℃以上
に維持することを特徴とする特許請求の範囲第1項に記
載のフィルタ内蔵撮像管面板の製造方法。[Scope of Claims] 1. A method comprising the steps of forming a color-separating striped filter on a light-transmitting substrate, and forming a glass thin film on the color-separating striped filter and the light-transmitting substrate by vapor deposition, A method of manufacturing an imaging tube face plate with a built-in filter, characterized in that the temperature of the substrate during formation of the color separation line filter is higher than the surface temperature of the substrate during deposition of the glass thin film. 2. The image pickup tube face plate with a built-in filter according to claim 1, wherein the color separation line filter contains SiO2 and TiO2, and the substrate temperature is maintained at 300° C. or higher when forming the filter. manufacturing method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53165632A JPS5832447B2 (en) | 1978-12-28 | 1978-12-28 | Manufacturing method of image pickup tube face plate with built-in filter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53165632A JPS5832447B2 (en) | 1978-12-28 | 1978-12-28 | Manufacturing method of image pickup tube face plate with built-in filter |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5591534A JPS5591534A (en) | 1980-07-11 |
JPS5832447B2 true JPS5832447B2 (en) | 1983-07-13 |
Family
ID=15816043
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53165632A Expired JPS5832447B2 (en) | 1978-12-28 | 1978-12-28 | Manufacturing method of image pickup tube face plate with built-in filter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5832447B2 (en) |
-
1978
- 1978-12-28 JP JP53165632A patent/JPS5832447B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5591534A (en) | 1980-07-11 |
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