JPS583217B2 - カンコウブザイ - Google Patents
カンコウブザイInfo
- Publication number
- JPS583217B2 JPS583217B2 JP48078973A JP7897373A JPS583217B2 JP S583217 B2 JPS583217 B2 JP S583217B2 JP 48078973 A JP48078973 A JP 48078973A JP 7897373 A JP7897373 A JP 7897373A JP S583217 B2 JPS583217 B2 JP S583217B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- pattern
- chalcogenide
- photoresist
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Surface Treatment Of Glass (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48078973A JPS583217B2 (ja) | 1973-07-12 | 1973-07-12 | カンコウブザイ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48078973A JPS583217B2 (ja) | 1973-07-12 | 1973-07-12 | カンコウブザイ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5028327A JPS5028327A (enrdf_load_stackoverflow) | 1975-03-22 |
| JPS583217B2 true JPS583217B2 (ja) | 1983-01-20 |
Family
ID=13676832
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP48078973A Expired JPS583217B2 (ja) | 1973-07-12 | 1973-07-12 | カンコウブザイ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS583217B2 (enrdf_load_stackoverflow) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5139121B2 (enrdf_load_stackoverflow) * | 1971-10-11 | 1976-10-26 |
-
1973
- 1973-07-12 JP JP48078973A patent/JPS583217B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5028327A (enrdf_load_stackoverflow) | 1975-03-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4269935A (en) | Process of doping silver image in chalcogenide layer | |
| US5314772A (en) | High resolution, multi-layer resist for microlithography and method therefor | |
| US4276368A (en) | Photoinduced migration of silver into chalcogenide layer | |
| JPS6333134B2 (enrdf_load_stackoverflow) | ||
| JP2002202584A5 (enrdf_load_stackoverflow) | ||
| CN1672098B (zh) | 形成和修正具有间隙缺陷的光刻版的方法 | |
| JPS5827653B2 (ja) | レジストホウホウ | |
| US3567447A (en) | Process for making masks photographically | |
| US3639125A (en) | Process for producing photographic relief patterns | |
| US4252891A (en) | Method of manufacturing embossed articles of preset configuration | |
| JPS583217B2 (ja) | カンコウブザイ | |
| US3824100A (en) | Transparent iron oxide microcircuit mask | |
| US3811893A (en) | Photomask | |
| JPS6022346B2 (ja) | フオトマスクのパタ−ン修正方法 | |
| EP3893055B1 (en) | Method of making a picoscopic scale/ nanoscopicscale circuit pattern | |
| US3716363A (en) | Method of making photomasks of the type used in the fabrication of microelectronic circuits | |
| JPS6041340B2 (ja) | ホトマスクの製造方法 | |
| US4199357A (en) | Compositions for recording materials | |
| Chapman et al. | Single step direct-write photomask made from bimetallic Bi/In thermal resist | |
| EP0042109B1 (en) | Lithographic process and resulting article | |
| JPS5854494B2 (ja) | パタ−ンブザイ ノ ケイセイホウ | |
| JPS58204532A (ja) | パタ−ン形成方法 | |
| JPS59124133A (ja) | ネガテイブ型レジスト像の形成方法 | |
| JPS62500202A (ja) | 非漂白性の光吸収剤を含むポジのフォトレジストを用いる改良されたフォトリソングラフィ方法 | |
| JPS5917824B2 (ja) | パタ−ン形成方法 |