JPS5830125A - Apparatus for film formation using glow discharge - Google Patents

Abstract

PURPOSE:To obtain an even-thickness film through glow discharge by distributing a plurality of gas ejection nozzles in the longitudinal direction of a gas leading pipe and furnishing a reaction room with evenly-distributed gas. CONSTITUTION:To evenly eject gas from a plurality of nozzles two methods are considered: nozzles are positioned at the same interval with the area of each nozzle increased correspondingly with increasing distance from the supply source; or nozzles having the same area are positioned with the interval increased with increasing distance from the source. In this constitution the portion of a gas leading pipe at which the gas pressure is high provides small conductance, while the portion with low pressure of gas provides large conductance; therefore, the amount of gas ejected from each ejection nozzle along the pipe becomes virtually the same, thereby generating even plasma around a sample to yield the accumulation of a film with even thickness.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to refreshing the QJ gas introduction section into the reaction chamber of an apparatus number ζ for forming a film by decomposing a predetermined gas by glow discharge.

Recently, a technique of forming amorphous silicon (a-8j) by decomposing H3 pace gin gas by glow discharge has been attracting attention. Conventional equipment for film formation using this method is
11r! It is configured like M;J. 1 is a reaction chamber, the gas introduction pipe 2 is connected to the upper part, and the exhaust pipe S is connected to the lower part.
There is an induction coil 4 around the 1 reaction fil connected to the
The sample substrate 6 is placed inside, supported by a support stand 5.

With such a configuration, apart from the gas introduction f2η), the gas f2η) is supplied to the reaction chamber so as to be approximately 0.5 Torr, and high-frequency power is applied to the induction coil 4 to generate a glow. By generating electric discharge, the 1-8 film can be deposited on the sample substrate 6.

As shown in Figure 1, in the conventional equipment of this type, gas is introduced)
It was common to carry out the reaction from the upper part of the reaction chamber. However, with this configuration, even if it is possible to form a uniform film on a flat sample 1 such as a silicone plate, a glass plate, a quartz plate, a metal plate, etc.
For example, it is difficult to form a 1-81 film to a uniform thickness on a cylindrical metal sample such as an electrophotographic drum. When an electrophotographic drum is used in which a uniform film thickness cannot be obtained, there is a drawback that significant non-uniformity occurs in image formation.

The present invention provides gas introduction sJ! - To provide a film forming apparatus using glow discharge which has been improved so as to be able to form a uniform layer even on six different samples than flat plates.

That is, the present invention uses a gas introduction pipe having 4M gas outlets distributed in the longitudinal direction, and inserts this into a reaction chamber to uniformly supply gas from a plurality of gas outlets marked with # into one reaction chamber. It is characterized by being configured as follows.

In this case, in order to uniformly eject gas from the plurality of gas ejection ports, the plurality of gas ejection ports are either (1) formed at equal intervals so that the area increases as the distance from the gas supply S increases; or (2) they are formed to have the same area and to be formed so that the distance from the gas supply source increases as the distance from the gas supply source increases. When rubbing in this way, the conductance is small in the areas of the gas introduction pipe where the gas pressure is high, and the conductance is large in the areas where the gas pressure is low, so the amount of gas flowing out from each jet port along the gas introduction pipe is Since the plasma is almost constant and uniform plasma is formed around the sample, a film of uniform thickness is deposited.

Next, the f14t of the present invention will be explained in detail using one embodiment thereof. Figure 2 shows an example of an apparatus for forming 1-8 particles on the outer surface of a cylindrical sample made of At. (a) is a schematic rdwtr view, and (b) is a schematic plan view of the inside of the reaction chamber. There is.

11 is a reaction chamber, which is connected to a common gas supply source!
The four gas introduction pipes 12 (Nos. 121 to 12) that were
An induction coil 14 is placed outside the 8-reaction Mll, which is inserted into the reactor and whose lower part is connected to the exhaust pipe 11.
A cylindrical sample 16 made of Aj supported on a support stand 15 in the center of the interior
is placed. The cylindrical sample 16 is an electrophotographic drum, and has an outer diameter of 0 mm, a height of 270 mm, and a thickness of 2 mm.
It can be contained within.

As shown in the sgJs diagram, each gas introduction pipe 12 has five gas jet ports it formed along the longitudinal direction Φ, and these gas jet ports 17 have diameters of 1 in order from the gas supply source side η1. .5 blasphemy 2. Qm.

It is larger at 2.5■, 3.0-s3.5mm,
〃) The spacing 1 between the two is set equal, and the reaction chamber ti
It opens toward the center.

With such a configuration, the inside of the reaction chamber IJ is first evacuated to a pressure of about I X 10 Torr (1.3 X 10 Pm).
to reach. At this time, the At cylindrical sample 16 is mixed at 250° C. by a heater provided in the cylinder, and introduced into the reaction chamber 11 from the gas injection tube 2 through the gas introduction pipe 11f. Here, the pressure inside the reaction chamber 11 is set to 0.5 Torr by pulp operation of the exhaust system, and then the high frequency power source is turned on and the induction coil 14 wound on the outside of the room is connected to the
．． A reaction of 17111
A glow discharge is generated within the battery, resulting in an input power of 50W.

At this time, a uniform plasma was formed within the reaction Mll.

In this state, a-81 group was deposited on the At cylindrical sample 16 for 10 hours, and then the single frequency power was turned off and the heater was turned off.
The sample temperature was lowered, the gas supply system was closed, and the sample was taken out after a sufficient par 9 was performed.

The thickness of the formed a-81 film was 20μ, and the At cylinder sample 1
6. There is no unevenness throughout the film, and the variation in film thickness is 10%.
It was within Furthermore, when the formed a-8i film was used as a photosensitive material for electrophotography, an electrophotographic image with no unevenness was obtained.

Similar effects were obtained when a plurality of gas ejection ports provided in the gas introduction pipe had the same area and were distributed so as to become denser as the distance from the gas supply al111 increased.

Note that the gas introduction tube is not limited to introducing the gas from the upper part ηλ of the reaction chamber as in the above embodiment, but may be introduced into the reaction layer from any part η). Needless to say, the shape is not limited and may be a flat plate.

Furthermore, in the above embodiment, plasma was generated using an inductive coupling method, but a capacitive coupling method may also be used.

As described above, the present invention is advantageous in that it is possible to form a uniform film even on a non-flat sample, such as a cylindrical sample, by improving the gas introduction system and generating a uniform plasma in the reaction area. Membrane shape renovation *7 can be provided by Glow Houki.

[Brief explanation of the drawing]

FIG. 1 is a schematic cross-sectional view showing a conventional scissors holder. This is a diagram. Nod...Reaction chamber #12 (12SP-12,) ---Gas introduction pipe, J j-...Exhaust pipe, 14...Induction coil,
lII...Support stand, 11F・-htgB cylindrical sample%
J7...Gas outlet. Ex-input patent attorney Takehiko Suzue

Claims (1)

[Claims] (1) Pfr'ij! in the reaction chamber. A plurality of gas ejection ports were distributed in the longitudinal direction in an apparatus that introduced a gas of 1. A film-forming apparatus using glow discharge, characterized in that a gas introduction pipe is inserted into the reaction chamber to uniformly supply gas from the plurality of gas jet ports η) into one reaction chamber. (2) The film forming apparatus using glow discharge according to claim 1, wherein the plurality of gas ejection ports are formed at equal intervals of η) such that the area increases as the distance from the gas supply source η1 increases. (37 * number of gas ejection ports have one area or the same area, η) The range of affnt required is formed by Φ, the distance from which increases as the distance from the gas supply S increases. [iformation m. (Membrane type device by glow discharge according to claim 1, wherein the sample is cylindrical and placed in the center of the reaction chamber, and a plurality of gas introduction tubes are placed so as to surround the sample Jk. .