JPS5827993A - 微小部分メツキ方法及びその装置 - Google Patents
微小部分メツキ方法及びその装置Info
- Publication number
- JPS5827993A JPS5827993A JP56125783A JP12578381A JPS5827993A JP S5827993 A JPS5827993 A JP S5827993A JP 56125783 A JP56125783 A JP 56125783A JP 12578381 A JP12578381 A JP 12578381A JP S5827993 A JPS5827993 A JP S5827993A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- plating
- nozzle
- plated
- plating solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/026—Electroplating of selected surface areas using locally applied jets of electrolyte
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S204/00—Chemistry: electrical and wave energy
- Y10S204/07—Current distribution within the bath
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Electroplating Methods And Accessories (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56125783A JPS5827993A (ja) | 1981-08-10 | 1981-08-10 | 微小部分メツキ方法及びその装置 |
US06/508,659 US4483749A (en) | 1981-08-10 | 1983-06-28 | Method and apparatus for plating minute parts |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56125783A JPS5827993A (ja) | 1981-08-10 | 1981-08-10 | 微小部分メツキ方法及びその装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5827993A true JPS5827993A (ja) | 1983-02-18 |
JPH0143035B2 JPH0143035B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-09-18 |
Family
ID=14918735
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56125783A Granted JPS5827993A (ja) | 1981-08-10 | 1981-08-10 | 微小部分メツキ方法及びその装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US4483749A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
JP (1) | JPS5827993A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5931883A (ja) * | 1982-08-12 | 1984-02-21 | Sonitsukusu:Kk | 極微小部分メツキ処理部材 |
JPS61138691A (ja) * | 1984-12-10 | 1986-06-26 | ハノ−バ−・リサ−チ・コ−ポレイシヨン | 固体から軽質油を除去する為の方法及び装置 |
JPS6296694A (ja) * | 1985-10-15 | 1987-05-06 | サントル・ド・ルシエルシユ・メタリユルジク | 電着装置とその使用方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS616817A (ja) * | 1984-06-20 | 1986-01-13 | Canon Inc | シ−トコイルの製造方法 |
FR2592895B1 (fr) * | 1986-01-16 | 1990-11-16 | Selectrons France | Installation pour la realisation de traitements electrolytiques localises de surfaces. |
GB8708945D0 (en) * | 1987-04-14 | 1987-05-20 | Atomic Energy Authority Uk | Electrolytic polishing device |
US5389961A (en) * | 1991-11-25 | 1995-02-14 | Eastman Kodak Company | Ink jet printer with variable-force ink declogging apparatus |
US5597412A (en) * | 1995-02-15 | 1997-01-28 | Fujitsu Limited | Apparatus for forcing plating solution into via openings |
JP3949504B2 (ja) * | 2002-04-25 | 2007-07-25 | 英夫 吉田 | 母材表面の活性化処理方法および活性化処理装置 |
EP1653788A1 (de) * | 2004-10-28 | 2006-05-03 | Delphi Technologies, Inc. | Schattenmaske zur erzeugung eines elektrisch leitenden bereiches auf einem dreidimensionalen schaltungsträger |
US9583125B1 (en) * | 2009-12-16 | 2017-02-28 | Magnecomp Corporation | Low resistance interface metal for disk drive suspension component grounding |
CN113737264B (zh) * | 2021-09-22 | 2023-05-23 | 中国计量大学 | 一种微孔前处理和电镀一体化装置及方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2987460A (en) * | 1958-10-21 | 1961-06-06 | United States Steel Corp | Holder for sheet-metal sample |
US3536594A (en) * | 1968-07-05 | 1970-10-27 | Western Electric Co | Method and apparatus for rapid gold plating integrated circuit slices |
JPS56102590A (en) * | 1979-08-09 | 1981-08-17 | Koichi Shimamura | Method and device for plating of microarea |
-
1981
- 1981-08-10 JP JP56125783A patent/JPS5827993A/ja active Granted
-
1983
- 1983-06-28 US US06/508,659 patent/US4483749A/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5931883A (ja) * | 1982-08-12 | 1984-02-21 | Sonitsukusu:Kk | 極微小部分メツキ処理部材 |
JPS61138691A (ja) * | 1984-12-10 | 1986-06-26 | ハノ−バ−・リサ−チ・コ−ポレイシヨン | 固体から軽質油を除去する為の方法及び装置 |
JPS6296694A (ja) * | 1985-10-15 | 1987-05-06 | サントル・ド・ルシエルシユ・メタリユルジク | 電着装置とその使用方法 |
Also Published As
Publication number | Publication date |
---|---|
US4483749A (en) | 1984-11-20 |
JPH0143035B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-09-18 |