JPS5825472A - Vacuum deposition method - Google Patents

Abstract

PURPOSE:To reduce the time required for depositing considerably by evaporating a vapor depositing material beforehand in an electric furnace provided separately from a bell-jar, and injecting the vapor thereof onto a substrate in the bell-jar maintained under a vacuum. CONSTITUTION:A vapor depositing material is introduced into an electric furnace 1 provided on the outside of a bell-jar 10, and the inside of the furnace 1 is evacuated with a rotary pump 7 to a vacumm and is heated to evaporate the vapor depositing material. On the other hand, the inside of the bell-jar 10 is maintained at a prescribed degree of vacuum with a diffusion pump 26. A valve 12 is opened to conduct the vapor material having a depositing state in the furnace 1 to the injection nozzle 16 in the bell-jar through a conduit 14. The vapor of the vapor depositing material is injected onto the surface of a substrate, for example, an aluminum substrate 18, through the nozzle 16, whereby said material is vapor deposited on the substrate.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a vacuum evaporation method used in the production of electrophotographic photoreceptors, etc. Conventional electrophotographic photoreceptors have been made of aluminum or copper.

It has been manufactured by depositing a photoreceptor layer containing selenium as a main component on a conductive support such as nickel using a vacuum evaporation method. When depositing on the support, /X10-
In a bell jar maintained at a vacuum level of T@rr, the evaporation material was heated and evaporated by resistance heating, radiation heating, or an electron beam, and was deposited on a support.

In this way, the vacuum evaporation method (K) involves directly heating the evaporation material in a bell jar and depositing it on the support.

When heating the evaporation material, a central boiling phenomenon occurs, resulting in the formation of protrusions on the surface of the photoreceptor coated on the support.In addition, when evaporating the evaporation material, the evaporation material must be heated individually. Tol+ has the drawbacks that it takes time to deposit and wastes the deposited material because of the need for deposition.Also, due to segregation and fractional distillation, a concentration gradient of the deposited material occurs in the film thickness direction. However, there was a problem in that a uniform photoreceptor layer could not be provided on a support.The present invention is an attempt to solve this drawback.
J) It is possible to significantly shorten the time required for depositing the vapor deposition material, eliminate waste of the vapor deposition material, and provide a photoreceptor layer with a uniform composition in the film thickness direction. The present invention aims to provide a method for depositing a vapor deposition material on a substrate that can prevent the formation of protrusions on the surface of a photoreceptor due to central boiling.

The vapor deposition material is heated in advance in an electric furnace installed separately from the bell jar to form a vapor, and this vapor is introduced onto a substrate installed in a bell jar maintained at a predetermined degree of vacuum and sprayed. It is characterized by

Hereinafter, a method for depositing a vapor deposition material onto a support according to the present invention will be described in detail with reference to one drawing.

The figure is a schematic diagram of an apparatus used to carry out the method of the present invention.

The apparatus includes an electric furnace 1 for heating a vapor deposition material to steam, and a bell jar 10 provided separately from the electric furnace 1.
It is equipped with The electric furnace l and the bell jar 10 are connected to the outside of the conduit through the pulp lug.
44 extends to the center of the bell jar 10 (>l), and its tip is bent upward at a right angle and further tapered to form an injection nozzle 76. Above the injection nozzle 14, an aluminum drum substrate/I is rotatably supported.

The lower end of the Belljar IO is served by a conventional vacuum line. That is, one end of the main vacuum line L1 is attached to approximately the center of the base plate W forming the lower end of the bell jar 10.

The main vacuum line L1 is connected to the rotary pump via a main pulp pump, a diffusion pump, and a roughing pulp pump in this order. Also, this main vacuum line L1 has a bypass vacuum line Ll.
The bypass vacuum line L2 connects the coarse pulp U, the base plate J of the main vacuum line L1, and the main valve. By using the rotary pump and the diffusion pump in combination.

Inside Pelge q10 l×10-ra~/X10-'Tor
The electric furnace 1, which can be maintained at a vacuum level of rli degrees, is surrounded by a refractory ceramic wall JK. A vacuum line L5 is provided at the bottom of this refractory ceramic wall J, and this vacuum line L5 is made of rough pulp! It terminates at the rotary pump 7 via.

Next, using this device, for example, selenium was evaporated onto an Alba drum substrate (1!). An example will be explained.

Example: Selenium was introduced into electric furnace I, and ct-Merry I was
1. The electric furnace was then heated to OX 10-' Torr and maintained at about 100°C ic/hour or more.

On the other hand, the Pelger was evacuated using the T-, Cx- tally pump and the diffusion pump, and the Almadora 5 board holding the O×IO'Torrl IC was heated and maintained at about 10°C. Next, the valve l was heated. The thickness of the selenium film deposited on the aluminum drum substrate is as follows.

After checking with a quartz crystal monitor and obtaining the desired film thickness, the valve was closed.

[Brief explanation of the drawing]

The diagram shows the method of this invention! I! FIG. l...Electric furnace, IO...Bell jar, /A...Injection nozzle. IT...Aluminum drum board applicant's agent Kiyoshi Nagisa

Claims (1)

[Claims] Vacuum evaporation characterized by heating the evaporation material in an electric furnace installed outside the bell jar to make it into a vapor state, and introducing and injecting this vapor into the bell jar maintained at a predetermined degree of vacuum to deposit it on the substrate. Law O