JPS5823144A - Formation of fluorescent screen for cathode-ray tube - Google Patents

Formation of fluorescent screen for cathode-ray tube

Info

Publication number
JPS5823144A
JPS5823144A JP12107981A JP12107981A JPS5823144A JP S5823144 A JPS5823144 A JP S5823144A JP 12107981 A JP12107981 A JP 12107981A JP 12107981 A JP12107981 A JP 12107981A JP S5823144 A JPS5823144 A JP S5823144A
Authority
JP
Japan
Prior art keywords
photosensitive resin
resin layer
parts
light absorbing
residual
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12107981A
Other languages
Japanese (ja)
Other versions
JPH0373087B2 (en
Inventor
Takumi Adachi
巧 安達
Kenji Ishikawa
石川 謙治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP12107981A priority Critical patent/JPS5823144A/en
Publication of JPS5823144A publication Critical patent/JPS5823144A/en
Publication of JPH0373087B2 publication Critical patent/JPH0373087B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22Applying luminescent coatings
    • H01J9/227Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines
    • H01J9/2278Application of light absorbing material, e.g. between the luminescent areas

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)

Abstract

PURPOSE:To obtain a fluorescent screen, which is provided with thin black-light absorbing parts having a small width and finely-chiseled side edges, by forming residual photosensitive resin layer parts, which restrict the width of the said thin black-light absorbing parts dividedly in two times. CONSTITUTION:After a first photosensitive resin layer 12 is formed by applying a photosensitive resin over a glass panel 11, the layer 12 is subjected to the first exposure carried out through an electron-beam-reaching-position determination mask 13, and is subjected to a development treatment. Next, the unexposed parts of the layer 12 are removed, and the remaining parts of the layer 12 are hardened so as to form stripped first residual photosensitive resin layer parts 12'. Following that, a photosensitive resin is appied over the whole surfaces of the parts 12' to form a second photosensitive layer 16, the layer 16 is subjected to exposure carried out through the mask 13 in the same manner as the first exposure, and a development and a hardening treatment are performed so as to form second residual photosensitive resin layer parts 16'. Next, thin black- light absorbing parts 17' are formed by means of the photosensitive resin layer parts 12' and 16'. After that, phosphors with various emission colors are provided on the parts 17', in order, so as to complete a fluorescent screen.

Description

【発明の詳細な説明】 本発明は陰極線管の螢光面の形成方法に関し、特に、カ
ラー陰極線管に於ける各色値光体間に黒色光吸収部が配
された螢光面の形成方法に関する、。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of forming a fluorescent surface of a cathode ray tube, and more particularly to a method of forming a fluorescent surface in which a black light absorbing portion is arranged between each color value light body in a color cathode ray tube. ,.

カラー陰極線管の螢光面はストライプ状あるいはドツト
状の各色発光螢光体が配されて形成されるが、電子ビー
ムのランディング余裕度の向上やコントラストの改善等
を目的として、各螢光体ストライブあるいは各螢光体ド
ツト間に黒色光吸収部を配したものが提案されている。
The phosphor surface of a color cathode ray tube is formed by disposing striped or dot-shaped phosphors of each color. A method in which a black light absorbing portion is arranged between live or individual phosphor dots has been proposed.

斯かる黒色光吸収部を有する螢光面の形成にあたっては
、先ずガラスパネル上に黒色光吸収部が形成され、その
後ガラスパネル上の黒色光吸収部が形成されていない部
分に所定の各色発光螢光体部が形成される。
In forming such a fluorescent surface having a black light absorbing portion, first the black light absorbing portion is formed on the glass panel, and then predetermined color emitting fluorescents are applied to the portion of the glass panel where the black light absorbing portion is not formed. A light body portion is formed.

例えば、ストライプ状螢光体を有する螢光面の場合には
、先ず、ガラスパネル上に多数の所定幅の細条黒色光吸
収部が形成され、その後各細条黒色光吸収部間に各色光
を発する螢光体ストライプが順次形成されていく。従来
の斯かる螢光面の形成方法を図面の第1図の工程図及び
第2図を用いて説明するに、第1図Aに示される如く、
ガラスパネルl上に全面に亘ってポIJ eビニル・ア
ルコール等の感光性樹脂を塗布して感光性樹脂層コを形
成し、この感光性樹脂層コに多数の細孔条スリットを有
する電子ビーム到達位置決定用マスクを介した光を当て
て露光する。この露光は、第2図に示される如く、マス
ク3のスリットダを通して、感光性樹脂層コに、先ず、
赤色光発生用電子ビームの到達位置に到達する光5Rを
照射し、次に緑色光発生用電子ビームの到達位置に到達
する光tCを照射し、さらに、青色光発生用電子ビーム
の到達位置に到達する光を照射して行われる。なお、こ
の場合、各党、5−R,、li’G及びsBの光源の夫
々を固定して行うのみならず、夫々の位置を多少移動せ
しめて各党5R,5G及びiBの夫々の照射を2回に分
けて行うようにすることも行われる。次に、露光された
感光性樹脂層コに現像処理を施して所定光量以上の光が
当らなかった部分を除去し、乾燥させて、第1図Bに示
される如く、ストライプ状の残留感光性樹脂層部2′を
形成する。
For example, in the case of a phosphor surface having striped phosphors, a large number of black light absorbing strips of a predetermined width are first formed on a glass panel, and then each color light is emitted between each strip of black light absorbing regions. Fluorescent stripes that emit light are formed one after another. The conventional method for forming such a fluorescent surface will be explained using the process diagram of FIG. 1 and FIG. 2. As shown in FIG. 1A,
A photosensitive resin layer such as polyvinyl alcohol is applied over the entire surface of the glass panel to form a photosensitive resin layer, and an electron beam having a large number of pores and slits is applied to this photosensitive resin layer. Exposure is performed by applying light through a mask for determining the destination position. In this exposure, as shown in FIG. 2, the photosensitive resin layer is first exposed through the slit of the mask 3.
The light 5R that reaches the arrival position of the red light generation electron beam is irradiated, then the light tC that reaches the arrival position of the green light generation electron beam is irradiated, and then the light tC that reaches the arrival position of the blue light generation electron beam is irradiated. This is done by irradiating the light that reaches it. In this case, the light sources for each party, 5-R, , li'G, and sB are not only fixed, but also their respective positions are slightly moved to irradiate each party 5R, 5G, and iB twice. It may also be done in separate sessions. Next, the exposed photosensitive resin layer is developed to remove the areas that were not exposed to more than a predetermined amount of light, and dried, resulting in striped residual photosensitivity as shown in Figure 1B. A resin layer portion 2' is formed.

次に、第3図Cに示される如く、ガラスパネルlの露出
部及び残留感光性樹脂層部2′上に黒色物質6、例えば
、カーボ/と水ガラスの混合液を全面に亘って塗布し、
乾燥させる。そして、これに過沃素酸(HIOII)等
による処理を施して残留感光性樹脂層部2′を、その上
に塗布された黒色物質乙の一部とともに除去することに
より、第1図りに示される如くの、ガラスパネルl上に
残留す゛る黒色物質乙による細条黒色光吸収部6′を形
成する。
Next, as shown in FIG. 3C, a black material 6, for example, a mixture of carboxylic acid and water glass, is applied over the entire surface of the exposed portion of the glass panel l and the remaining photosensitive resin layer portion 2'. ,
dry. Then, by treating this with periodic acid (HIOII) or the like to remove the residual photosensitive resin layer 2' together with a part of the black material B applied thereon, the result shown in the first diagram is The black material A remaining on the glass panel 1 forms striped black light absorbing portions 6'.

その後、ガラスパネルl上の各細条黒色光吸収部6′間
に各色発光用の螢光体ストライプが配されて、螢光面が
完成されるのである。
Thereafter, phosphor stripes for emitting light of each color are arranged between the black light absorbing strips 6' on the glass panel 1 to complete the phosphor surface.

ここで、細条黒色光吸収部6′の幅、側縁部の端整さ、
螢光面全体に亘っての均一さ等は、残留感光性樹脂層部
2′の形成状況で決められ、従って、感光性樹脂層2の
露光に於ける光量分布特性と現像、乾燥条件で決められ
る。光量分布に関して、従来は、光源の形状や位置等を
種々配慮して望ましい特性を得るようにしていたが、電
子ビーム到達位置決定用マスクのスリットのピッチが小
(例えば、0.3 m m程度)で各細条黒色光吸収部
6′の幅が小(例えば、50μm以下)なるものが要求
される場合には、露光時に於けるマスクの隣シ合うスリ
ットからの光の相互影響が強くなるのでこの相互影響を
極力抑えるようにして、しかも、小なる幅の細条黒色光
吸収部6′を形成するための所定幅の残留感光性樹脂層
部2′を良好に形成するに適した光量分布特性を得るこ
とが難しく、このため、小なる幅の細条黒色光吸収部6
′を良好な状態で有する螢光面を形成することが困難で
あった。
Here, the width of the striped black light absorbing portion 6', the neatness of the side edges,
Uniformity over the entire fluorescent surface is determined by the formation status of the residual photosensitive resin layer 2', and is therefore determined by the light amount distribution characteristics during exposure of the photosensitive resin layer 2 and the development and drying conditions. It will be done. Conventionally, various considerations have been made to the shape and position of the light source in order to obtain desired characteristics regarding the light intensity distribution. ), if the width of each black light absorbing strip 6' is required to be small (for example, 50 μm or less), the mutual influence of light from adjacent slits of the mask during exposure becomes strong. Therefore, this mutual influence is suppressed as much as possible, and the amount of light is suitable for forming well the residual photosensitive resin layer portion 2' of a predetermined width for forming the striped black light absorbing portion 6' of small width. It is difficult to obtain the distribution characteristics, and for this reason, it is difficult to obtain the narrow black light absorbing portion 6 with a small width.
It was difficult to form a fluorescent surface having a good condition.

例えば、光源を固定して露光する場合、ガラスパネルの
中央部での各露光部に於ける光量分布は第3図Aの曲線
aの如くになり、前述の相互影響を抑えるため曲線aの
勾配の険しい部分の幅を大とすることができ々いので、
小なる幅、例えば、50μm以下の細条黒色光吸収部6
′を得るべく残留感光性樹脂層部2′の幅dを大にしよ
うとすると、幅dを光量分布曲線aの勾配の緩やかな部
分を用いて画さなければならないことになり、その側縁
部を端整に形成することができなくなる。また、光源を
移動して露光を2回に分けて行なう場合には、ガラスパ
ネル中央部での各露光部に於ける光量分布は総合的に第
3図Bの曲線すの如くになり、例えば、goμm以下の
小なる幅の細条黒色光吸収部6′を得るための残留感光
性樹脂層部2′の幅dを、やはシ、光量分布曲線すの勾
配の緩やかな部分で画さなければならなくなシ、その側
縁部を端整にすることができない。細条黒色光吸収部6
′の側縁部は残留感光性樹脂層部2′の側縁部に応じて
形成されるものである″から、上述のいずれの場合も、
端整な側縁部をもった細条黒色光吸収部6′を得ること
はできない。
For example, when exposing with a fixed light source, the light intensity distribution at each exposed area in the center of the glass panel will be as shown by curve a in Figure 3A, and in order to suppress the mutual influence mentioned above, the slope of curve a Since it is difficult to increase the width of the steep part of the
Striped black light absorbing portion 6 with a small width, for example, 50 μm or less
In order to increase the width d of the residual photosensitive resin layer 2' in order to obtain the width d, the width d must be defined using the gentle slope part of the light intensity distribution curve a, and the side edge It becomes impossible to form the parts neatly. In addition, when the light source is moved and the exposure is performed in two parts, the overall light intensity distribution in each exposed area at the center of the glass panel becomes as shown in the curve shown in Figure 3B, for example. The width d of the residual photosensitive resin layer 2' to obtain the striped black light absorbing part 6' with a small width of . Otherwise, the side edges cannot be made neat. Striped black light absorption section 6
The side edges of ' are formed according to the side edges of the residual photosensitive resin layer section 2', so in any of the above cases,
It is not possible to obtain striped black light absorbing portions 6' with neat side edges.

斯かる点に鑑み本発明は、細条黒色光吸収部の幅を規制
する残留感光性樹脂層部を2回に分けて形成するように
することにより、小なる幅の細条黒色光吸収部を形成す
るに必要な幅を有した残留感光性樹脂層部を、その側縁
部を露光光量分布曲線の勾配の険しい部分を用いて画す
ることにより得ることができるようにし、その結果、小
なる幅でしかも端整な側縁部を有した細条黒色光吸収部
が形成された螢光面を得ることができる陰極線管螢光面
の形成方法を提案するものである。以下、図面の第9図
以降を参照して本発明の実施例について述べる。
In view of the above, the present invention has been developed by forming the residual photosensitive resin layer portion that regulates the width of the striped black light absorbing portion in two steps, thereby forming the striped black light absorbing portion with a small width. A residual photosensitive resin layer having the width necessary to form a small area can be obtained by demarcating its side edges using a steep part of the exposure light distribution curve, and as a result, a small The present invention proposes a method for forming a fluorescent surface of a cathode ray tube, which can obtain a fluorescent surface on which striped black light absorbing portions are formed, each having a width of 100 mm and neat side edges. Embodiments of the present invention will be described below with reference to FIG. 9 and subsequent drawings.

本発明に係る陰極線管螢光面の形成方法の一例を、第9
図に示されているその工程図に従って説明する。先ず、
ガラスパネル//上にポリ・ビニル・アルコール等の感
光性樹脂を全面的に塗布して第一の感光性樹脂層12を
形成し、この第一の感光性樹脂層12に多数の細孔条ス
リットを有する電子ビーム到達位置決定用マスクを介し
た光を当てて第一回目の露光をする。この第一回目の露
光は、第5図に示される如く、電子ビーム到達位置決定
用マスク13のスリット/ダを通して感光性樹脂層12
に、先ず、赤色光発生用電子ビームの到達位置Prに到
達する光/&Rを照射し、次に、緑色光発生用電子ビー
ムの到達位置Pgに到達する光15Gを照射し、さらに
、青色光発生用電子ビームの到達位置Pbに到達する光
75Bを照射して行なわれるが このとき、発光15R
115G及び/3Bの光源は、発光lりR1/SG及び
lsBが各位置PrXPg及びPbの図に於ける左半分
側に夫々到達するような方向に配される。次に、露光さ
れた感光性樹脂層12に現像処理を施して所定光量以上
の光が当らなかった部分を除去し、硬膜処理を施すとと
もに乾燥させて、第v図Bに示される如く、ストライプ
状の第一の残留感光性樹脂層部/2’を形成する。この
第一の残留感光性樹脂層部/2’は最終的に得んとする
残留感光性樹脂層部の夫々の略半分の部分を形成するも
ので幅は比較的小であり、その一方の側縁部、この場合
には、左側の側縁部/2eが後に形成される細条黒色光
吸収部の一方の側縁部を規制するものとなる。次に、第
q図Cに示す如く、ガラスパネル//の露出部及び第一
の残留感光性樹脂層部/2’上に再び感光性樹脂を全面
的に塗布して第二の感光性樹脂層16を形成し、この第
二の感光性樹脂層l乙に、第一回目の露光の場合と同じ
電子ビーム到達位置決定用マスクを用い、これを介した
光を当てて第二回目の露光を行う。この第二回目の露光
は、第6図に示される如く、第一回目の露光と同様に光
/!p、、/!Q及びlsBにより行なわれるが、この
とき発光/SR,/、!tQ及び/j13の光源は、第
一回目の露光のときの位置から移動せしめられ、発光1
SR175G及びlりBが上述の各位置Pr、Pg及び
Pbの図に於ける右半分側に夫々到達するような方向に
配される11次に、露光された第二の感光性樹脂層l乙
に現像処理を施して所定光量以上の光が当らなかった部
分を除去し、硬膜処理を施すとともに乾燥させて、第ダ
図りに示される如く、第一の残留感光性樹脂層部/2’
に加えて、同じくストライプ状の第二の残留感光性樹脂
層部/A’を形成する。この第二の残留感光性樹脂層部
t b /は最終的に得んとする残留感光性樹脂層部の
夫々の残りの略半分の部分を形成するもので幅は比較的
小であり、その一方の側縁部、この場合には、右側の側
縁部/l、eが後に形成される細条黒色光吸収部の他方
の側縁部を規制するものとなる。これら第−及び第二の
残留感光性樹脂層部/2’及び/&’により、所望のス
トライプ状残留感光性樹脂層部が形成されるのである。
An example of the method for forming a fluorescent surface of a cathode ray tube according to the present invention is described in the ninth section.
The explanation will be given according to the process diagram shown in the figure. First of all,
A first photosensitive resin layer 12 is formed by coating the entire surface of a glass panel with a photosensitive resin such as polyvinyl alcohol, and a large number of pores are formed in this first photosensitive resin layer 12. A first exposure is performed by applying light through a mask having a slit for determining the electron beam arrival position. In this first exposure, as shown in FIG.
First, the light /&R that reaches the arrival position Pr of the electron beam for generating red light is irradiated, then the light 15G that reaches the arrival position Pg of the electron beam for generating green light is irradiated, and then the blue light This is done by irradiating the light 75B that reaches the arrival position Pb of the generation electron beam, but at this time, the light emission 15R
The 115G and /3B light sources are arranged in such a direction that the light emitted from them R1/SG and IsB reaches the left half of each position PrXPg and Pb in the figure, respectively. Next, the exposed photosensitive resin layer 12 is subjected to a development process to remove the portions that have not been exposed to a predetermined amount of light, and is then subjected to a hardening process and dried, as shown in FIG. A striped first residual photosensitive resin layer portion/2' is formed. This first residual photosensitive resin layer part/2' forms approximately half of each residual photosensitive resin layer part to be finally obtained, and its width is relatively small; The side edge, in this case the left side edge /2e, regulates one side edge of the striped black light absorbing portion to be formed later. Next, as shown in Fig. q. A second photosensitive resin layer 16 is formed, and the second photosensitive resin layer is exposed to light using the same mask for determining the electron beam arrival position as in the first exposure. I do. As shown in FIG. 6, this second exposure is performed in the same manner as the first exposure. p,,/! Q and lsB, but at this time light emission /SR, /,! The light sources tQ and /j13 are moved from their positions during the first exposure, and
11 Next, the exposed second photosensitive resin layer L is arranged in such a direction that the SR175G and the L-B reach the right half side in the figure of each of the above-mentioned positions Pr, Pg, and Pb. A developing process is performed to remove the portions that are not exposed to a predetermined amount of light, and a hardening process is performed and dried to form the first residual photosensitive resin layer part/2' as shown in the second diagram.
In addition, a second residual photosensitive resin layer portion /A' having a stripe shape is also formed. This second residual photosensitive resin layer portion t b / forms approximately the remaining half of each residual photosensitive resin layer portion to be finally obtained, and has a relatively small width. One side edge, in this case, the right side edge /l, e, will restrict the other side edge of the striped black light absorbing portion that will be formed later. A desired striped residual photosensitive resin layer portion is formed by these first and second residual photosensitive resin layer portions /2' and /&'.

次に、第す図Eに示される如く、ガラスパネル//の露
出部及び第−及び第二の残留感光性樹脂層部/2’及び
/A’上に、例えば、カーボンと水ガラスの混合液から
成る黒色物質17を全面的に塗布し、乾燥させる。そし
て、これに過沃素酸(HIO41)等に゛よる処理を施
して第−及び第二の残留感光性樹脂層部12′及び/A
’を、その上に塗布された黒色物質/’)諸共除去して
、第ダ図Fに示される如く、ガラスパネル//上に残留
する黒色物質17による細条黒色光吸収部/?’を形成
する。その後、ガラスパネル//上の各細条黒色光吸収
部/7’間に赤色発光用、緑色発光用及び青色発光用の
各螢光体ストライプが順次配されて、螢光面が完成され
る。。
Next, as shown in FIG. A black substance 17 consisting of a liquid is applied over the entire surface and dried. Then, this is treated with periodic acid (HIO41) or the like to form the first and second residual photosensitive resin layer portions 12' and /A.
After removing the black material 17 coated on it, as shown in FIG. ' to form. Thereafter, phosphor stripes for red light, green light, and blue light are sequentially arranged between each strip of black light absorbing section 7' on the glass panel // to complete the fluorescent surface. . .

上述の工程に於いて、第一回目の露光時及び第二回目の
露光時の各露光部に於ける光量分布は、夫々、第7図に
於ける曲線C/及びC2の如くになる。そして、第一の
感光性樹脂層12に対する第一回目の露光、現像で得ら
れる各第−の残留感光性樹脂層部/2’の幅d、は比較
的小でよいので。
In the above-mentioned process, the light amount distribution at each exposed portion during the first exposure and the second exposure becomes as shown by curves C/ and C2 in FIG. 7, respectively. The width d of each residual photosensitive resin layer portion/2' obtained by the first exposure and development of the first photosensitive resin layer 12 may be relatively small.

この第一の残留感光性樹脂層部/2’はその側縁部を光
量分布曲線CIの勾配が倹しい部分で画することができ
るものとなり、従って、端整な切れのよい側縁部を有し
たものとされている。また、第二の感光性樹脂層/6に
対する第二回目の露光、現像によって得られる各第二の
残留感光性樹脂層部11. /の幅d2も比較的小でよ
いので、この第二の残留感光性樹脂層部76′もその側
縁部を光量分布曲線C2の勾配が険しい部′分で画する
ことができるものとなり、従って、端整で切れのよい側
縁部を有したものとされている。そして、例えば、り0
μm以下の小なる幅の細条黒色光吸収部を形成するに必
要なストライプ状残留感光性樹脂層部の幅d。が、第−
及び第二の残留感光性樹脂層部/2’及びt 6/の合
体により得られているのであり、結局、所望の幅doを
もつストライプ状残留感光性樹脂層部が端整な側縁部/
2e及び/Aeを有して形成される。これにより、各ス
トライプ状残留感光性樹脂層部間に、小なる幅の細条黒
色光吸収部77′が側縁部/2e及び/beで規制され
た端整で切れのよい側縁部をもって形成されるのである
。実験結果では、幅かり03mで端整な両側線部を有す
る細条黒色光吸収部を、容易に形成することができだ。
This first residual photosensitive resin layer portion/2' can have its side edge defined by a portion where the slope of the light intensity distribution curve CI is modest, and thus has a neat and sharp side edge. It is said that it was done. Further, each second residual photosensitive resin layer portion 11. obtained by the second exposure and development of the second photosensitive resin layer/6. Since the width d2 of / may be relatively small, the side edge of the second residual photosensitive resin layer portion 76' can be defined by a portion where the light intensity distribution curve C2 has a steep slope. Therefore, it is said to have a neat and sharp side edge. And, for example, ri0
Width d of the striped residual photosensitive resin layer portion necessary to form a striped black light absorbing portion with a small width of μm or less. But, the -th
and the second residual photosensitive resin layer part /2' and t6/, and as a result, the striped residual photosensitive resin layer part with the desired width do forms a neat side edge part /2'.
2e and /Ae. As a result, a striped black light absorbing portion 77' with a small width is formed between each striped residual photosensitive resin layer portion with a neat and sharp side edge regulated by side edges /2e and /be. It will be done. Experimental results show that it is possible to easily form a striped black light absorbing portion having a width of 03 m and neat line portions on both sides.

以上説明した如く、本発明に係る方法によれば。As explained above, according to the method according to the present invention.

電子ビーム到達位置決定用マスクの細孔状スリットのピ
ッチが小で、小なる幅の細条黒色光吸収部が要求される
場合にも、細条黒色光吸収部の両側縁部を規制するスト
ライプ状残留感光性樹脂層部の側縁部を、露光光量分布
曲線の勾配の険しい部分で画することができて、端正な
切れのよいものとすることができ、従って、小なる幅で
、端正な切れのよい両側縁部を有した細条黒色光吸収部
が形成された螢光面を得ることができる。また、残留感
光性樹脂層部を2回の露光、現像工程で略半分ずつ形成
するようにしているので、各露光工程での光Iを減少す
ることができ、光量分布曲線の裾の広がり部分のレベル
を小とでき、この裾の広がり部による悪影響を軽減する
ことができる。
Even when the pitch of the pore-like slits of the mask for determining the electron beam arrival position is small and a thin black light absorbing portion with a small width is required, stripes are used to regulate both side edges of the thin black light absorbing portion. The side edge of the residual photosensitive resin layer can be defined by the steep part of the exposure light distribution curve, making it possible to create a neat and sharp cut. It is possible to obtain a fluorescent surface in which striped black light absorbing portions with sharply cut side edges are formed. In addition, since the residual photosensitive resin layer is formed by approximately half each in two exposure and development steps, it is possible to reduce the amount of light I in each exposure step, and the widening part of the tail of the light amount distribution curve The level of this can be reduced, and the negative effects caused by the widening part of the hem can be reduced.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の陰極線管螢光面の形成方法の各工程を示
す断面図、第2図及び第3図は従来の陰極線管螢光面の
形成方法に於ける露光工程の説明に用いられる図、第1
図は本発明に係る陰極線管螢光面の形成方法の一例の各
工程を示す断面図、第3図、第6図及び第7図は本発明
に係る陰極線管螢光面の形成方法に於ける露光工程の説
明に用いられる図である。 図中、//はガラスパネル、12及び/6は感光性樹脂
層、/:l’及び/A’は残留感光性樹脂層部、13は
電子ビーム到達位置決定用マスク、/4’はスリット、
/7は黒色物質、/7’は細条黒色光吸収部である。
Figure 1 is a sectional view showing each step of a conventional method for forming a fluorescent surface of a cathode ray tube, and Figures 2 and 3 are used to explain the exposure process in the conventional method of forming a fluorescent surface of a cathode ray tube. Figure, 1st
The figure is a sectional view showing each step of an example of the method for forming a fluorescent surface of a cathode ray tube according to the present invention, and FIGS. FIG. 3 is a diagram used to explain an exposure process. In the figure, // is a glass panel, 12 and /6 are photosensitive resin layers, /:l' and /A' are residual photosensitive resin layer parts, 13 is a mask for determining the electron beam arrival position, /4' is a slit ,
/7 is a black material, and /7' is a striped black light absorbing portion.

Claims (1)

【特許請求の範囲】[Claims] ガラスパネル上に第一の感光性樹脂層を形成し、次いで
多数の細孔状スリットを有する電子ビーム到達位置決定
用マスクを介して第一の所定方向よ、りの光を照射して
上記第一の感光性樹脂層を露光し、次いで上記露光され
た第一の感光性樹脂層を現像して、上記ガラスパネル上
に形成すべき各細条黒色光吸収部の一方の側縁を規制す
る第一の残留感光性樹脂層部を形成し、次いで上記第一
の残留感光性樹脂層部が形成されたガラスパネル上に第
二の感光性樹脂層、を形成し、次いで上記マスクを介し
て第二の所定方向よシの光を照射して上記第二の感光性
樹脂層を露光し、次いで上記露光された第二の感光性樹
脂層を現像して、上記各細条黒色光吸収部の他方の側縁
を規制する第二の残留感光性樹脂層部を形成し、次いで
上記第−及び第二の残留感光性樹脂層部が形成されたガ
ラスパネル上に上記各細条黒色光吸収部を形成するだめ
の黒色物質を塗布し、次いで上記第−及び第二の残留感
光性樹脂層部をそれらの上にも塗布された上記黒色物質
とともに除去して、上記ガラス・シネル上に残留する上
記黒色物質により上記各細条黒色光吸収部を形成し、し
かる後上記ガラスノ(ネル上の上記各細条黒色光吸収部
間に所定の螢光体部を形成するようにした陰極線管螢光
面の形成方法1゜
A first photosensitive resin layer is formed on a glass panel, and then light is irradiated from a first predetermined direction through a mask for determining the electron beam arrival position having a large number of pore-like slits. exposing one photosensitive resin layer to light, and then developing the exposed first photosensitive resin layer to control one side edge of each striped black light absorbing portion to be formed on the glass panel. A first residual photosensitive resin layer is formed, and then a second photosensitive resin layer is formed on the glass panel on which the first residual photosensitive resin layer is formed, and then a second photosensitive resin layer is formed through the mask. The second photosensitive resin layer is exposed by irradiating light in a second predetermined direction, and then the exposed second photosensitive resin layer is developed to form each of the striped black light absorbing portions. A second residual photosensitive resin layer is formed to regulate the other side edge of the black light absorbing strip. and then removing said first and second residual photopolymer layer parts along with said black material also applied thereon to form a residual black material on said glass cinel. The cathode ray tube is constructed of a cathode ray tube in which each of the striped black light absorbing portions is formed using the black material, and then a predetermined phosphor portion is formed between each of the striped black light absorbing portions on the glass plate (flannel). How to form a light surface 1゜
JP12107981A 1981-08-02 1981-08-02 Formation of fluorescent screen for cathode-ray tube Granted JPS5823144A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12107981A JPS5823144A (en) 1981-08-02 1981-08-02 Formation of fluorescent screen for cathode-ray tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12107981A JPS5823144A (en) 1981-08-02 1981-08-02 Formation of fluorescent screen for cathode-ray tube

Publications (2)

Publication Number Publication Date
JPS5823144A true JPS5823144A (en) 1983-02-10
JPH0373087B2 JPH0373087B2 (en) 1991-11-20

Family

ID=14802328

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12107981A Granted JPS5823144A (en) 1981-08-02 1981-08-02 Formation of fluorescent screen for cathode-ray tube

Country Status (1)

Country Link
JP (1) JPS5823144A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6414424B1 (en) 1999-02-24 2002-07-02 Sony Corporation Electron gun, color cathode ray tube, and display apparatus using same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6414424B1 (en) 1999-02-24 2002-07-02 Sony Corporation Electron gun, color cathode ray tube, and display apparatus using same

Also Published As

Publication number Publication date
JPH0373087B2 (en) 1991-11-20

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