JPS5823018A - Liquid crystal display element - Google Patents

Liquid crystal display element

Info

Publication number
JPS5823018A
JPS5823018A JP12143281A JP12143281A JPS5823018A JP S5823018 A JPS5823018 A JP S5823018A JP 12143281 A JP12143281 A JP 12143281A JP 12143281 A JP12143281 A JP 12143281A JP S5823018 A JPS5823018 A JP S5823018A
Authority
JP
Japan
Prior art keywords
substrate
liquid crystal
crystal display
display element
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12143281A
Other languages
Japanese (ja)
Inventor
Hiroshi Watabe
渡部 寛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Display Corp
Original Assignee
Kyocera Display Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Display Corp filed Critical Kyocera Display Corp
Priority to JP12143281A priority Critical patent/JPS5823018A/en
Publication of JPS5823018A publication Critical patent/JPS5823018A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1345Conductors connecting electrodes to cell terminals

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PURPOSE:To enhance the reliability of a liq. crystal display element by forming an Ni-Cr alloy layer having a specified thickness on a transparent electrode at the lead takeout part to prevent the corrosion of the lead takeout part. CONSTITUTION:A front transparent substrate 1 and a back transparent substrate 2 having transparent electrodes 5, 6 formed on the insides, respectively are sealed with sealants 3, 4. A transfer 7 is formed in the sealant 4 to connect the electrode 6 to the front substrate side, thereby forming a lead takeout part 8 together with the electrode 5. On the part 8 an alloy layer 9 of an Ni-Cr alloy consisting of 70-90wt% Ni and 10-30wt% Cr or an Ni-Cr-Fe alloy consisting of 40-90wt% Ni, 10-30wt% Cr and 0-30wt% Fe is formed by sputtering in 100-10,000Angstrom thickness.

Description

【発明の詳細な説明】 本発明は、゛′tl−11極取り出し用のリード取り出
し部の耐蝕性を改善した液比表示振子に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a liquid ratio display pendulum in which the corrosion resistance of the lead extraction part for extracting 11 poles is improved.

液晶表示素子(LCD)は、低消費知力の平面型表示素
子として、時計、電卓等を中心に数多く使用されている
。このLCDは消費電力が少ないだめ通常基板上に工n
203−8n02の透明電極を蒸着しており、リード取
シ出し部にまでこの#た層を姑長し、外部回路との接続
をしているものが多い。
2. Description of the Related Art Liquid crystal display devices (LCDs) are widely used as low-intellectual, flat-panel display devices, mainly in watches, calculators, and the like. This LCD has low power consumption and is usually built on a board.
A transparent electrode of 203-8n02 is vapor-deposited, and in many cases, this # layer is extended to the lead extraction portion for connection to an external circuit.

しかし、この透明電極は極めて薄く、llCDのセル外
に設けられるリード取り出し部では、外気にさらされ、
その空気中の水分により腐蝕を生じやすく、LCDの信
頼性を低下させるものであった。これは特に非密閉下で
かつ温度差が大きい条件下におかれる場合には極めて問
題となるものであった。
However, this transparent electrode is extremely thin and is exposed to the outside air at the lead extraction part provided outside the llCD cell.
The moisture in the air tends to cause corrosion, reducing the reliability of the LCD. This is particularly problematic when the device is placed in an unsealed environment with a large temperature difference.

この腐蝕を防止するために、従来では、クロム、金等の
真空蒸着、電解メッキによる方法、導電性ペーストによ
るスクリーン印刷、撥水−剤の塗布、又は金属リードの
固着、回路接続後の樹脂封止等が行表われていた。
To prevent this corrosion, conventional methods include vacuum deposition of chromium, gold, etc., electrolytic plating, screen printing with conductive paste, coating of water repellent, fixation of metal leads, and resin sealing after circuit connection. There were many signs of suspension.

しかし、真空蒸着法では、蒸着装置内で基板が加熱され
るため、マスクの精度が出しにくく、電解メッキ法では
湿式1程が入るためロット間のバラツキがでやすく、か
つ生産性が悪く、スクリーン印刷法では、10μ以下の
薄膜印刷は困難であり、あまシ厚いと基板の間隙を広け
てしまうためシールの不良及びLCDの特性の不良を生
じやすく問題が多いものであった。又、撥水剤を塗布す
る方法は、撥水剤が洗浄工程でとれるため、1個のLC
Dに組立てた後に撥水剤を付与することとなシ作業能率
が悪く、又、取り扱いが悪いと撥水剤が落ちてしまうこ
とがあり、充分な効果を生かせないことが多かった。
However, in the vacuum evaporation method, the substrate is heated in the evaporation equipment, making it difficult to achieve mask precision, and in the electrolytic plating method, a wet process is required, which tends to lead to lot-to-lot variations, poor productivity, and In the printing method, it is difficult to print a thin film of 10 μm or less, and if it is too thick, the gap between the substrates becomes wide, which tends to cause poor sealing and poor LCD characteristics, which is problematic. In addition, the method of applying a water repellent is that the water repellent can be removed during the cleaning process, so one LC
Applying a water repellent after assembly to D results in poor work efficiency, and if handled improperly, the water repellent may fall off, so the full effect is often not achieved.

<F h ’)−ドの固着は、特定の用途のものには有
用であるが、生産性が極めて悪く一般LCD全てには応
用できなく、又、樹脂封止はLCDの交換ができなくな
υ実用的とは言えない。
<F h ') - Although it is useful for specific applications, the productivity is extremely poor and it cannot be applied to all general LCDs, and resin sealing makes it impossible to replace the LCD. υI can't say it's practical.

本発明は、かかる欠点を防止しつつ生産住良(LCDを
製造できることを目的としたものであり、基板上に設け
られた透明電極の一部をそのままリード取り出し部とし
て使用する液晶表示菓子において、該リード取り出し部
の透明電析上にニッケルとクロムを主成分とする合金層
がスパッタリングにより厚さ100〜1ooo。
The present invention aims to be able to manufacture LCDs while preventing such drawbacks, and in a liquid crystal display confectionery in which a part of the transparent electrode provided on the substrate is used as a lead extraction part. An alloy layer containing nickel and chromium as main components is formed on the transparent electrodeposition of the lead extraction portion by sputtering to a thickness of 100 to 100 mm.

Xとなるように設けられていることを特徴とする液晶表
示素子である。。
This is a liquid crystal display element characterized in that it is arranged in the shape of an X. .

本発明の液晶表示素子はN1−C!r系の合金層が透明
電極上に緻密に設けられているため、空気中の湿気によ
りリード取り出し部が腐蝕することがなく、LCDの信
頼性が高いものであり、又、スパッタリングで行なうた
めマスク及び基板が高温に加熱されなく、精度も高く、
同時に多数のLCDを製造する場合においても又、大型
のLCDでリード取り出し部が多数形成され−る場合に
おいても高精度の合金層が形成可能である。
The liquid crystal display element of the present invention is N1-C! Since the r-based alloy layer is densely provided on the transparent electrode, the lead extraction part will not be corroded by moisture in the air, making the LCD highly reliable.Also, since it is performed by sputtering, it does not require a mask. And the substrate is not heated to high temperatures, and the precision is high.
Even when a large number of LCDs are manufactured at the same time, and even when a large number of lead extraction portions are formed in a large LCD, a highly accurate alloy layer can be formed.

又、合金層の厚さも100〜1oooof程度自由に制
御でき、耐腐蝕性を充分得るとともに゛シール不良を生
じなくすることが可能である。
Furthermore, the thickness of the alloy layer can be freely controlled to the order of 100 to 1000, making it possible to obtain sufficient corrosion resistance and to prevent sealing defects from occurring.

次いで図面を参照しつつさらに詳しく説明する。Next, a more detailed explanation will be given with reference to the drawings.

第1図は、本発明のLCDの代表的例の端面説明図であ
り、表側透明基板(1)と裏側透明基板(2)がシール
材(8) 、 (4)でシールされており、該基板(1
) 、 (2)の内面には透明電極(5) 、 (6)
が形成されている。該シール材の内、右側のシール材(
菊ハその内部に表側透明電極と裏側透明電極を導電接続
するだめのトランスファー(7)が形成されている。
FIG. 1 is an explanatory end view of a typical example of the LCD of the present invention, in which the front transparent substrate (1) and the rear transparent substrate (2) are sealed with sealants (8) and (4). Substrate (1
), (2) have transparent electrodes (5), (6) on their inner surfaces.
is formed. Of these sealants, the sealant on the right side (
A transfer (7) is formed inside the chrysanthemum for electrically connecting the transparent electrode on the front side and the transparent electrode on the back side.

このトランスファーによシ裏側透明電極は表側基板側へ
接続され、表側透明電極とともに図の右端にリード取り
出し部(8)を形成している。
Through this transfer, the back side transparent electrode is connected to the front side substrate side, and together with the front side transparent electrode, a lead extraction portion (8) is formed at the right end of the figure.

このリード取り出し部上に本発明のニッケルとクロムを
主成分とする合金層(9)が形成されている。
An alloy layer (9) of the present invention whose main components are nickel and chromium is formed on this lead extraction portion.

ここに示したLCD0例は単なる例示で、これに限定さ
れるものではなく、種々の応用が可能なものであり、以
下に簡単に説明する。
The LCD0 example shown here is merely an example, and is not limited thereto, and various applications are possible, which will be briefly explained below.

基板は、ガラス、プラスチック等の透明基板が使用でき
、裏側基板のみは不透明基板とされても良い。この基板
の内面には工n20ト日now等の透明軍1極が所望の
パターンに形成され、必要に応じて8102、ポリイミ
ド、ポリシロキサン等のオーバーコート層、アンダコー
ト層が形成される。
A transparent substrate such as glass or plastic can be used as the substrate, and only the back side substrate may be an opaque substrate. On the inner surface of this substrate, a transparent coating layer made of 20-day-to-day material is formed in a desired pattern, and an overcoat layer and an undercoat layer of 8102, polyimide, polysiloxane, etc. are formed as necessary.

この電極は、積層されていても良く、又、裏側基板が不
透明々場合には反射電極とされても良く、2層以上の液
晶層を設ける場合には、中間基板には両面に透明電極が
形成される。
This electrode may be laminated, or may be a reflective electrode if the back substrate is opaque, and if two or more liquid crystal layers are provided, the intermediate substrate has transparent electrodes on both sides. It is formed.

LCDでは一般に1個のコネクタで接続できるように一
方の基板にリード取り出し部が集中されるようにされる
ことが多く、第1図に示す如くのシール内トランスファ
ーをはじめとする側基板間のトランスファーにより接続
される。
Generally, in LCDs, the lead extraction part is often concentrated on one board so that connection can be made with one connector, and transfer between side boards, including transfer within a seal as shown in Figure 1, is common. Connected by

これはもちろん夫々の基板から取シ出すようにしても良
く、又、セル端面のトランスファー、基板のスルーホー
ルを通して導電接続されても良い。
Of course, this may be taken out from each substrate, or may be conductively connected through a transfer on the end face of the cell or through a through hole in the substrate.

−この電極には、必要に応じて配向層が形成され、斜め
蒸着法、ラビング法等で形成され、又必要に応じて垂直
配向剤を付与しても良い。
- An alignment layer is formed on this electrode as necessary, and is formed by an oblique vapor deposition method, a rubbing method, etc., and a vertical alignment agent may be applied as necessary.

本発明においては、透明電極形成後、シール前にニッケ
ルとクロムを主成分とする合金層をスパッタリングで形
成する。
In the present invention, after forming the transparent electrode and before sealing, an alloy layer containing nickel and chromium as main components is formed by sputtering.

このスパッタリング工程は、通常のスパッタリング装置
が使用でき、通常10  Torr以上の真空度でNi
−0r又はNi−0,r−B’e糸の合金を用いて厚さ
100〜xooooAの厚みに合金層を形成する。
This sputtering process can be carried out using ordinary sputtering equipment, and is usually performed under a vacuum of 10 Torr or higher.
An alloy layer is formed to a thickness of 100 to xooooA using an alloy of -0r or Ni-0, r-B'e yarn.

とのNiとOrを主成分とする合金は、Ni70〜90
 wtチ、Or 10〜30 wtチであり、N1−C
!r−Fe系の合金では、Ni 40〜90 vrt%
、Or ] O〜30 wt%、IFe O〜30 w
t%とされ、この範囲内で耐腐蝕性に優れた合金被膜を
容易に形成できる。
The alloy whose main components are Ni and Or is Ni70~90
wt Chi, Or 10-30 wt Chi, N1-C
! In r-Fe alloys, Ni 40-90 vrt%
, Or] O~30 wt%, IFe O~30 w
t%, and an alloy coating with excellent corrosion resistance can be easily formed within this range.

又、合金層の厚さは100〜100OOXとされ、1o
oX以上で耐腐蝕性が著しく向上し、1OOOOズを越
えるとシール不良を生じる危険性が生じる。fHましく
は300〜5oooXとされる。
In addition, the thickness of the alloy layer is 100 to 100OOX, and 1o
If it exceeds 1000 x, the corrosion resistance will be significantly improved, and if it exceeds 100 x, there will be a risk of seal failure. fH is preferably 300 to 5oooX.

もつとも生産性及び経済性からみれば300〜2000
X程度とされる。基板上に所望形状に成形されたメタル
マスクを配し、スパッタリング装置内に配して合金層を
形成する。
However, from the viewpoint of productivity and economy, it is 300 to 2000
It is said to be about X. A metal mask formed into a desired shape is placed on the substrate and placed in a sputtering device to form an alloy layer.

シール材も通常のシール材料が使用でき、エポキシ樹脂
、シリコン樹脂、ガラスフリット等熱硬化型樹脂、光硬
化型樹脂、無機封止剤等が使用でき、シール材中又はセ
ル中にガラス繊維、AlzOa粒子等のスペーサーを配
して使用される。
For the sealing material, ordinary sealing materials can be used, such as epoxy resin, silicone resin, thermosetting resin such as glass frit, photocuring resin, inorganic sealant, etc. Glass fiber, AlzOa, etc. can be used in the sealing material or in the cell. Used with spacers such as particles.

その後、セル内に液晶を注入し、注入口を封止する。After that, liquid crystal is injected into the cell and the injection port is sealed.

以上の説明では、基本的LCDの構造についてのみ説明
したが、固楚表示部分を設ける、基板に文字、記号等を
印刷する、偏光板、カラ一層して設けても良く、又、2
層以上の多層LCDとすることもできる。
In the above explanation, only the basic structure of the LCD has been explained, but it is also possible to provide a fixed display part, print characters, symbols, etc. on the substrate, provide a polarizing plate in one layer, or 2.
It is also possible to form a multilayer LCD with more than one layer.

又、本発明では、同時に多数のLCDを製造する製法に
適しておシ、シール前の個々に切断されていない基板上
に一度に多数のNi−0rの合金層を形成できるため生
産性が極めて良い。
In addition, the present invention is suitable for manufacturing a large number of LCDs at the same time, and has extremely high productivity because a large number of Ni-0r alloy layers can be formed at once on a substrate that is not individually cut before sealing. good.

次いで実施例に基づいて説明する。Next, an explanation will be given based on examples.

パターンとしては、時計用時分表示パターンを用い、両
側にリード取シ出し部を形成するように表、裏父互に電
極パターンをガラス基板上にエツチングによ多形成し、
このリード取シ出し部にメタルマスクを用いてNi−C
r系合金層を形成した。
As the pattern, a clock hour and minute display pattern was used, and electrode patterns were formed on the glass substrate by etching on the front and back sides so as to form lead extraction parts on both sides.
Using a metal mask on this lead extraction part, Ni-C
An r-based alloy layer was formed.

このスパッタリングには、約60分間かけて装置内を2
 X 10 ” Torrとし、次いでNi 80wt
%、Cr20vvt%の合金を用いて05分間、010
分間スパッタリング処理を行なった。
This sputtering takes approximately 60 minutes to
X 10” Torr, then Ni 80wt
%, Cr20vvt% alloy for 05 minutes, 010
A sputtering process was performed for a minute.

この結果、■では約500 X f) Ni−Cr層、
■では約zoooXのNi−Cr層が形成した。
As a result, in ■, approximately 500 × f) Ni-Cr layer,
In case (2), a Ni--Cr layer of about zooooX was formed.

その後ラビングを行ない、エポキシ樹脂シール材でシー
ルし、液晶を注入し、エポキシ樹脂で封止し、個々のセ
ルに切断した。
Thereafter, it was rubbed, sealed with an epoxy resin sealant, liquid crystal was injected, sealed with epoxy resin, and cut into individual cells.

このLCDのセルは、いずれも80℃、90%RH,5
00時間の耐湿試験においてもリード取り出し部に不良
を生じなく優れたものであった。
The cells of this LCD are all 80℃, 90%RH, 5
Even in the 00-hour moisture resistance test, the lead extraction part showed no defects and was excellent.

本発明は以上の如く、リード取シ出し部の耐腐蝕性を著
しく向上させたものであり、今後種々の用途に応用可能
な優れたものである。
As described above, the present invention significantly improves the corrosion resistance of the lead extraction portion, and is an excellent product that can be applied to various uses in the future.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明のLCDの代表例の端面説明図。 1.2・・・基 板 5.6・・・透明電極 9・・・合金層 FIG. 1 is an explanatory end view of a typical example of the LCD of the present invention. 1.2... Base board 5.6...Transparent electrode 9...Alloy layer

Claims (1)

【特許請求の範囲】[Claims] (1)  基板上に設けられた透明電極の一部をそのま
ま・リード取り出し部として使用する液晶表子素子にお
いて、該リード取り出し部の透明箱極上にニッケルとク
ロムを主成分とする合金層がスパッタリングにより厚さ
100〜10000 Aとなるように設けられているこ
とを特徴とする液晶表示素子。
(1) In a liquid crystal display element in which a part of the transparent electrode provided on the substrate is used as it is as a lead extraction part, an alloy layer mainly composed of nickel and chromium is sputtered on top of the transparent box of the lead extraction part. 1. A liquid crystal display element, characterized in that the liquid crystal display element is provided to have a thickness of 100 to 10,000 A.
JP12143281A 1981-08-04 1981-08-04 Liquid crystal display element Pending JPS5823018A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12143281A JPS5823018A (en) 1981-08-04 1981-08-04 Liquid crystal display element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12143281A JPS5823018A (en) 1981-08-04 1981-08-04 Liquid crystal display element

Publications (1)

Publication Number Publication Date
JPS5823018A true JPS5823018A (en) 1983-02-10

Family

ID=14810990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12143281A Pending JPS5823018A (en) 1981-08-04 1981-08-04 Liquid crystal display element

Country Status (1)

Country Link
JP (1) JPS5823018A (en)

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