JPS58223323A - 電子ビ−ム描画装置 - Google Patents

電子ビ−ム描画装置

Info

Publication number
JPS58223323A
JPS58223323A JP10716582A JP10716582A JPS58223323A JP S58223323 A JPS58223323 A JP S58223323A JP 10716582 A JP10716582 A JP 10716582A JP 10716582 A JP10716582 A JP 10716582A JP S58223323 A JPS58223323 A JP S58223323A
Authority
JP
Japan
Prior art keywords
cathode
electron
image
beams
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10716582A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0415609B2 (enExample
Inventor
Isao Sasaki
勲 佐々木
Tadahiro Takigawa
忠宏 滝川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP10716582A priority Critical patent/JPS58223323A/ja
Publication of JPS58223323A publication Critical patent/JPS58223323A/ja
Publication of JPH0415609B2 publication Critical patent/JPH0415609B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP10716582A 1982-06-22 1982-06-22 電子ビ−ム描画装置 Granted JPS58223323A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10716582A JPS58223323A (ja) 1982-06-22 1982-06-22 電子ビ−ム描画装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10716582A JPS58223323A (ja) 1982-06-22 1982-06-22 電子ビ−ム描画装置

Publications (2)

Publication Number Publication Date
JPS58223323A true JPS58223323A (ja) 1983-12-24
JPH0415609B2 JPH0415609B2 (enExample) 1992-03-18

Family

ID=14452128

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10716582A Granted JPS58223323A (ja) 1982-06-22 1982-06-22 電子ビ−ム描画装置

Country Status (1)

Country Link
JP (1) JPS58223323A (enExample)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5332677A (en) * 1976-09-08 1978-03-28 Toshiba Corp Electron beam exposure apparatus
JPS5648029A (en) * 1979-09-26 1981-05-01 Toshiba Corp Electron gun
JPS56132736A (en) * 1980-03-21 1981-10-17 Toshiba Corp Electron gun

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5332677A (en) * 1976-09-08 1978-03-28 Toshiba Corp Electron beam exposure apparatus
JPS5648029A (en) * 1979-09-26 1981-05-01 Toshiba Corp Electron gun
JPS56132736A (en) * 1980-03-21 1981-10-17 Toshiba Corp Electron gun

Also Published As

Publication number Publication date
JPH0415609B2 (enExample) 1992-03-18

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