JPS5821891A - Noiseless discharge type carbon dioxide gas laser - Google Patents

Noiseless discharge type carbon dioxide gas laser

Info

Publication number
JPS5821891A
JPS5821891A JP12071881A JP12071881A JPS5821891A JP S5821891 A JPS5821891 A JP S5821891A JP 12071881 A JP12071881 A JP 12071881A JP 12071881 A JP12071881 A JP 12071881A JP S5821891 A JPS5821891 A JP S5821891A
Authority
JP
Japan
Prior art keywords
discharge
carbon dioxide
discharge type
type carbon
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12071881A
Other languages
Japanese (ja)
Inventor
Shigenori Yagi
重典 八木
Masaaki Tanaka
正明 田中
Shuji Ogawa
小川　周治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP12071881A priority Critical patent/JPS5821891A/en
Publication of JPS5821891A publication Critical patent/JPS5821891A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To lower the discharge starting voltage of a noiseless discharge type CO2 gas laser and to facilitate the control of discharge power by arranging a metal piece connected to the ground potential in the discharge space of the laser, thereby deforming the spatial electric field of the discharge space. CONSTITUTION:A high frequency high voltage is applied from a power supply 2 to a pair of dielectric electrodes 1, and is flowed in a direction designated in a laser gas 7 between the electrodes 1. Then, a voiceless discharge is uniformly formed in the discharge space 3, thereby exciting the laser gas. Then, the excited laser gas is oscillated by a fully reflecting mirror 4 and a partly reflecting mirror 5, and the output beam 6 is outputted from the mirror 5. Then, a metal piece 21 is arranged in the space 3, the spatial electric field is deformed in the space 3, and as the applied voltage is raised, the discharge is first produced from the periphery of the piece 21.

Description

【発明の詳細な説明】 この発明は無声放電式炭酸ガスレーザ装置（以下００２
１／−ザ装置と称する）に関するものであり、特に容易
にｈｋ電を開始できる００２レーザ装置に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION This invention relates to a silent discharge type carbon dioxide laser device (hereinafter referred to as 002
1/- laser device), and particularly relates to the 002 laser device, which can easily initiate hk electricity.

従来、この種の装置として第１図に示すものがあった。Conventionally, there has been a device of this type as shown in FIG.

図中、（１）は所定間隙を介して対向している一対の誘
電体電極であり、夫々金属電極（１１ａ）　（Ｉｌ　ｂ
）がガラス等の誘電体（１２ａ）　（＋２ｂ）で被覆さ
れたものである。（２）は一対の誘電体電極（１）に接
続された高電圧高周波電源であり１例えば１゜ＫＶ　、
　１００　ＫＨｚの電圧を供給している。（３）は放電
空間であり、一対の誘電体電極（１）間の間隙を示して
おり２例えば４９１１１程度となっている。（４）は全
反射鏡、（５）は部分反射鏡であり、放電空間（３）を
介して対向して配設されている。（６）は部分反射鋳（
５１Ｊ：り出力をれる出力ビームである。（７１は一対
の誘電体電極（１）間に流されるレーザガスの流れる方
向を示しており、レーザガスは９例えばＣ！０２−Ｃｏ
−Ｎ２−Ｈｅの混合気体からなり、圧力的１００　Ｔｏ
ｒｒ　、流速約５０ｍ／ｓで流される。なお一対の誘電
体電極（［）、全反射鏡（４）及び部分反射鏡（５）は
、密閉容器内に収納されている。この第１図に示された
従来装置を出力ビーム（６）の光軸方向から見た状態を
第２図に示しており、特に放電空間（３）の付近の様子
を示している。In the figure, (1) is a pair of dielectric electrodes facing each other with a predetermined gap in between, and each metal electrode (11a) (Il b
) is covered with a dielectric material (12a) (+2b) such as glass. (2) is a high-voltage, high-frequency power source connected to a pair of dielectric electrodes (1), for example, 1°KV,
It supplies a voltage of 100 KHz. (3) is a discharge space, which indicates the gap between the pair of dielectric electrodes (1), and is approximately 49,111 mm, for example. (4) is a total reflection mirror, and (5) is a partial reflection mirror, which are disposed facing each other with a discharge space (3) in between. (6) is partially reflective casting (
51J: This is the output beam that receives the output power. (71 indicates the direction in which the laser gas flows between the pair of dielectric electrodes (1), and the laser gas is 9, for example, C!02-Co
-N2-He mixture gas, pressure 100 To
rr, flowed at a flow rate of about 50 m/s. Note that the pair of dielectric electrodes ([), the total reflection mirror (4), and the partial reflection mirror (5) are housed in a closed container. FIG. 2 shows the conventional device shown in FIG. 1 viewed from the optical axis direction of the output beam (6), particularly showing the vicinity of the discharge space (3).

次に、第１図及び第２図に示した従来装置の動作につい
て説明する。先ず、一対の誘電体電極（１）に電源（２
）から高周波高電圧を印加し、一対の電極（１１間にレ
ーザガス（７１に示す方向に流す。Next, the operation of the conventional device shown in FIGS. 1 and 2 will be explained. First, a power source (2) is connected to a pair of dielectric electrodes (1).
), and a laser gas (71) is caused to flow between the pair of electrodes (11).

これにともない、放電空間（３）に無声放電が均一（３
） に形成され、レーザガスが励起される。次に。Along with this, silent discharge is uniformly distributed (3) in the discharge space (3).
) is formed and the laser gas is excited. next.

励起されたレーザガスは、全反射鏡（４）及び部分反射
鏡（５）により発振させられ２部分反射鏡（５）から出
力ビーム（６）が出力される。この出力ビーム（６）が
レーザ加工性の用途に用いられることになる。The excited laser gas is oscillated by a total reflection mirror (4) and a partial reflection mirror (5), and an output beam (6) is output from the two partial reflection mirrors (5). This output beam (6) will be used for laser processing purposes.

ところで、この様にして出力ビーム（６）を得る場合、
一対の誘電体電極（１）に印加する電圧の上昇に対する
放電電力の変化を第３図に示す。００２レーザ装置でｔ
まレーザガスを約５０　”／ｓ程度の高速で流している
〃め、相当に大きな電圧ｆｆ５）に至ったとき放電か開
始されることになる。この電圧（Ｖｓ）は、　Ｌ／−ザ
ガスを低速で流したときに放電が開始される。電圧（■
１）より著しく大きなものとなる。また、放電開始時の
電圧（ｖｓ）付近の印加電圧では放電電力にバラツキが
生じ、放電電力の？１ｔｌｌ　ｆｔｌが困難となる問題
があった。これらの問題は無声放電式のＣＯ２ノーレー
ザでは、レーザガスを高速で流１〜でいることにより、
放電空間（３）が過電圧状態になってから放電を開始す
（４） るためと考えられ、この種レーザ装置特有の問題である
。By the way, when obtaining the output beam (6) in this way,
FIG. 3 shows the change in discharge power with respect to the increase in voltage applied to the pair of dielectric electrodes (1). 002 laser equipment
Since the laser gas is flowing at a high speed of about 50"/s, the discharge will start when a considerably large voltage ff5) is reached. This voltage (Vs) is used to flow the laser gas at a low speed of about 50"/s. Discharge starts when the voltage (■
1) It becomes significantly larger. In addition, at the applied voltage near the voltage (vs) at the start of discharge, variations occur in the discharge power, causing the discharge power to vary. There was a problem that 1tll ftl was difficult. These problems can be solved with silent discharge type CO2-free lasers by flowing the laser gas at high speed.
This is thought to be because the discharge starts (4) after the discharge space (3) enters an overvoltage state, and this is a problem unique to this type of laser device.

この発明は、上述した問題に鑑みてなされたものであり
、無声放電式の００２レーザ装置の放電開始電圧を下げ
、放電電力の制御を容易に行なえるようにするために、
電伶近傍に電界集中部を設けた無声放電式の００２レー
ザ装置を提供することを目的とするものである。This invention was made in view of the above-mentioned problems, and in order to lower the discharge starting voltage of a silent discharge type 002 laser device and to easily control the discharge power.
It is an object of the present invention to provide a silent discharge type 002 laser device in which an electric field concentration section is provided near the wire.

以下１図面に基づくこの発明装置を詳述する。The apparatus of the present invention will be described in detail below based on one drawing.

第４図は、この発明の一実施例装置を示しており２図中
第１図及び第２図に示した従来装置と同−捷たは相当部
分には同一符号を付しである。この実施例装置は、従来
装置にさらに接地電位に接続された金属片（２１）を、
一対の誘電体電極（１）間の放電空間（３）に配設した
ものである。この金属片（２１１による放電空間（３）
の短絡率は約５０チであり、また金属片（２１）はセラ
ミックス等の無機絶縁物にとりつけられ、光軸方向（６
）の要所に配設されており、その大きさはレーザガスの
ガス流（７）を乱さない程間の太きさとしである。FIG. 4 shows an apparatus according to an embodiment of the present invention, and in FIG. 2, the same or equivalent parts as those of the conventional apparatus shown in FIGS. 1 and 2 are given the same reference numerals. This embodiment device further includes a metal piece (21) connected to ground potential in addition to the conventional device.
It is arranged in a discharge space (3) between a pair of dielectric electrodes (1). Discharge space (3) due to this metal piece (211)
The short circuit rate of
), and its size is such that it does not disturb the gas flow (7) of the laser gas.

この実施例装置において、レーザ出力を得るための動作
は従来装置と同様でちるが、一対の誘電体電極（１）に
印加する電圧の上昇に対する放電電力の変化をみると第
５図の如くなる。即ち金属片（２１）を放電空間（３）
に配設したことにより。In this example device, the operation for obtaining laser output is the same as in the conventional device, but the change in discharge power with respect to the increase in voltage applied to the pair of dielectric electrodes (1) is as shown in Figure 5. . That is, the metal piece (21) is placed in the discharge space (3).
By placing it in.

放電空間（３）の空間電界が歪せられることになり。The spatial electric field in the discharge space (3) will be distorted.

印加電圧の上昇にともない、先ず金属片（２１）の周囲
から放電が起こることに々る。このため、この実施例装
置における放電開始電圧は、レーザガスを高速で流して
いるにも拘らず低い電圧（Ｖｓ’１となり、金属片（２
１）を配設せずにレーザガスを低速で流したときの電圧
（■１）よりも低い電圧で放電が開始され、さらに印加
電圧と放電電力の関係はなめらかな曲線にすることがで
きることに力る。従って、放電電力の制御を容易に行な
えることに々る。As the applied voltage increases, discharge occurs first from around the metal piece (21). Therefore, the discharge starting voltage in this example device is a low voltage (Vs'1) even though the laser gas is flowing at high speed, and the metal piece (2
1) The discharge is started at a voltage lower than the voltage when the laser gas is flowed at a low speed without installing (■1), and the relationship between the applied voltage and the discharge power can be made into a smooth curve. Ru. Therefore, the discharge power can often be easily controlled.

なお、この実施例装置で（（−１，放電空間（３）の空
間短絡率か約５０９６のものについて股、明１−７だが
。In addition, in this example device, ((-1), the spatial short-circuit rate of discharge space (3) is about 5096, and it is 1-7.

印加電圧との関係において適当な値と々るように、金属
片（２１）の大きさを適宜設定すればよい。The size of the metal piece (21) may be appropriately set so as to reach an appropriate value in relation to the applied voltage.

以」−の保に、この発明装置は、無声放電式の００２レ
ーザ装置の放電空間に接地電位に接読された金属片を配
設したものであり、この金属片により放電空間の空間電
界を歪ませているので。In order to keep this in mind, the device of this invention is a silent discharge type 002 laser device in which a metal piece connected to the ground potential is placed in the discharge space of the 002 laser device. Because it's distorted.

放電が金属片の周囲から開始されることになり。The discharge will start from around the metal piece.

放電開始電圧を下げることができ、さらに放電電力の制
御を容易に行えるという利点がある。This has the advantage that the discharge starting voltage can be lowered and the discharge power can be easily controlled.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は、従来の無声放電式００２レーザ装置の構成原
理図、第２図は、第１図の電極部分を光軸方向から見た
図、第３図は、従来装置における印加電圧と放電電力の
関係を示す特性図。 第４図は、この発明の実施例装置を示す図、第５図は、
第４図の実施例装置における印加電圧と放電電力の関係
を示す特性図である。図中。 同一または相当部分には同一符号が付しである。 （２）・・・高電圧高層ｊｈ　％源、（４）・・・全反
射鏡、（５）・・・部分反射鏡、（７）・・・レーザガ
ス、　（Ｉｌａ）、（Ｉｌｂ）・・・金属型４Ｊ’＜、
　（＋２ａ）、（＋２ｂ）　・＝誘電体、　＋２１１−
・・金属片（７） 第７図 蕗３図 ＶＩ　　　　　　　Ｖ５ 第５図Figure 1 is a diagram of the configuration principle of a conventional silent discharge type 002 laser device, Figure 2 is a diagram of the electrode portion in Figure 1 viewed from the optical axis direction, and Figure 3 is a diagram showing applied voltage and discharge in the conventional device. A characteristic diagram showing the relationship between power. FIG. 4 is a diagram showing an embodiment of the device of the present invention, and FIG.
5 is a characteristic diagram showing the relationship between applied voltage and discharge power in the embodiment device of FIG. 4. FIG. In the figure. Identical or equivalent parts are given the same reference numerals. (2)...High voltage high-rise jh% source, (4)...Total reflection mirror, (5)...Partial reflection mirror, (7)...Laser gas, (Ila), (Ilb)...・Metal type 4J'<,
(+2a), (+2b) ・=dielectric, +211−
...Metal piece (7) Figure 7 Fushimi Figure 3 VI V5 Figure 5

Claims (4)

【特許請求の範囲】[Claims] （１）誘電体に被覆された一方の金属電極、上記一方の
金属電極と所定間隙を介して対向配設され誘電体に被覆
された他方の金属電極、上記一方及び他方の金属電極間
に流されるレーザガス、上記一方及び他方の金属電極に
接続された高電圧高周波電源、上記一方及び他方の金属
電極間に上記レーザガスを、介１〜で対向して配設され
た全反射鏡及び部分反射鏡、−ヒ記一方及び他方の金属
電極と全反射鏡及び部分反射鏡を密閉状態に収納する密
閉容器、上記一方及び他方の金属電極の対向間隙に配設
され接地電位に接続された金属片を備えたことを特徴と
する無声放電式炭酸ガスレーザ装置。(1) One metal electrode covered with a dielectric, another metal electrode placed opposite the one metal electrode with a predetermined gap and covered with a dielectric, and a current flowing between the one and other metal electrodes. a high-voltage, high-frequency power source connected to the one and the other metal electrodes, a total reflection mirror and a partial reflection mirror disposed facing each other through the intervening means 1 to 1 to supply the laser gas between the one and the other metal electrodes; , - H. An airtight container housing the one and the other metal electrodes, the total reflection mirror, and the partial reflection mirror in a sealed state, and a metal piece arranged in the opposing gap between the one and the other metal electrodes and connected to the ground potential. A silent discharge type carbon dioxide laser device characterized by: （２）　　金属片はレーザガスの流通を妨げ々い程度の
太きさとしたことを特徴とする特許請求の範囲第（１）
項記載の無声放電式炭酸ガスレーザ装置。(2) Claim No. (1), characterized in that the metal piece is so thick that it hardly obstructs the flow of laser gas.
Silent discharge type carbon dioxide laser device as described in . （３）　　金属片は無機絶縁物に取り付は保持されてい
ることを特徴とする特許請求の範囲第（１）項または第
（２）項記載の無声放電式炭酸ガスレーザ装置。(3) A silent discharge type carbon dioxide laser device according to claim (1) or (2), wherein the metal piece is attached to and held by an inorganic insulator. （４）無機絶縁物はセラミックスであることを特徴とす
る特許請求の範囲第（３１項記載の無声放電式炭酸ガス
レーザ装置。(4) The silent discharge type carbon dioxide laser device according to claim 31, wherein the inorganic insulator is ceramic.
JP12071881A 1981-08-03 1981-08-03 Noiseless discharge type carbon dioxide gas laser Pending JPS5821891A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12071881A JPS5821891A (en) 1981-08-03 1981-08-03 Noiseless discharge type carbon dioxide gas laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12071881A JPS5821891A (en) 1981-08-03 1981-08-03 Noiseless discharge type carbon dioxide gas laser

Publications (1)

Publication Number Publication Date
JPS5821891A true JPS5821891A (en) 1983-02-08

Family

ID=14793275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12071881A Pending JPS5821891A (en) 1981-08-03 1981-08-03 Noiseless discharge type carbon dioxide gas laser

Country Status (1)

Country Link
JP (1) JPS5821891A (en)

Similar Documents

Publication Publication Date Title
US4677637A (en) TE laser amplifier
JPS5821891A (en) Noiseless discharge type carbon dioxide gas laser
GB1276367A (en) High power carbon monoxide gas laser
JPH06181050A (en) Rare gas discharge lamp apparatus
JPS5846687A (en) Gas circulating type laser
US3846716A (en) Method of regulating light emitting power of laser and apparatus for effecting same
JPS60178681A (en) Gas laser device
JPS6225911Y2 (en)
JPH02281671A (en) Gas laser oscillation device
JPS56134789A (en) Lateral exciting type laser oscillator
JPS6052070A (en) Coaxial type laser oscillator
JP2726058B2 (en) Laser device
JPS5850788A (en) Lateral mode excitation type gas laser device
JPH01216584A (en) Sealed type co2 laser tube
JPS5851581A (en) Lateral excitation type gas laser
JPS6358884A (en) Silent discharge type gas laser device
JPS6195588A (en) Gas laser oscillator
JPS595686A (en) Gas laser oscillator
JPS5933276B2 (en) Laser device
JPS61159780A (en) Silent discharge type gas laser device
JPS6339113B2 (en)
JPS58124283A (en) Gas laser device
JPS6026311B2 (en) gas laser equipment
JPS58115876A (en) Silent discharge type gas laser device
JPH01173678A (en) Carbon dioxide laser apparatus