JPS58217674A - 複数の蒸発源を備えたイオンプレ−テイング装置 - Google Patents
複数の蒸発源を備えたイオンプレ−テイング装置Info
- Publication number
- JPS58217674A JPS58217674A JP57098200A JP9820082A JPS58217674A JP S58217674 A JPS58217674 A JP S58217674A JP 57098200 A JP57098200 A JP 57098200A JP 9820082 A JP9820082 A JP 9820082A JP S58217674 A JPS58217674 A JP S58217674A
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- evaporation source
- downward
- ion
- evaporation sources
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57098200A JPS58217674A (ja) | 1982-06-08 | 1982-06-08 | 複数の蒸発源を備えたイオンプレ−テイング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57098200A JPS58217674A (ja) | 1982-06-08 | 1982-06-08 | 複数の蒸発源を備えたイオンプレ−テイング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58217674A true JPS58217674A (ja) | 1983-12-17 |
| JPH0229746B2 JPH0229746B2 (enExample) | 1990-07-02 |
Family
ID=14213357
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57098200A Granted JPS58217674A (ja) | 1982-06-08 | 1982-06-08 | 複数の蒸発源を備えたイオンプレ−テイング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58217674A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6226858A (ja) * | 1985-07-26 | 1987-02-04 | Stanley Electric Co Ltd | 遮光層を有する薄膜トランジスタ−アセンブリ− |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0450243U (enExample) * | 1990-08-31 | 1992-04-28 |
-
1982
- 1982-06-08 JP JP57098200A patent/JPS58217674A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6226858A (ja) * | 1985-07-26 | 1987-02-04 | Stanley Electric Co Ltd | 遮光層を有する薄膜トランジスタ−アセンブリ− |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0229746B2 (enExample) | 1990-07-02 |
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