JPS58208194A - Method for holding seed crystal for growing single crystal - Google Patents

Method for holding seed crystal for growing single crystal

Info

Publication number
JPS58208194A
JPS58208194A JP9067782A JP9067782A JPS58208194A JP S58208194 A JPS58208194 A JP S58208194A JP 9067782 A JP9067782 A JP 9067782A JP 9067782 A JP9067782 A JP 9067782A JP S58208194 A JPS58208194 A JP S58208194A
Authority
JP
Japan
Prior art keywords
crystal
seed
single crystal
shaft
crucible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9067782A
Other languages
Japanese (ja)
Inventor
Iesada Hirai
平井 家定
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9067782A priority Critical patent/JPS58208194A/en
Publication of JPS58208194A publication Critical patent/JPS58208194A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/32Seed holders, e.g. chucks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To hold stably a single crystal with the growth of a large sized crystal, by forming a seed shaft for rotating and moving a single crystal upward to a convergent taper bisected at the forward end and fitting and mounting a cylindrical seed crystal having a convergent taper to said end. CONSTITUTION:The forward end part of a seed shaft 7 is formed to a bisected jig having a convergent taper internally and a cylindrical seed crystal 6 having a convergent taper is fitted and mounted in said forward end part and is fastened by means of an Mo wire or the like 8 in a seed crystal producing device which grows a silicon single crystal by heating and melting single crystal silicon of high purity with a graphite heating element 2 to form a melt 5 in a crucible 1 consisting of two layers; a quartz crucible 3 and a graphite crucible 4, and immersing the seed crystal 6 mounted to the forward end of the shaft 7 in said melt and pulling the single crystal while rotating the shaft 7 in the direction opposite to the crucible 1. There is no possibility of slipping down or failure in the seed crystal 6 in the stage of growing a large-sized crystal.

Description

【発明の詳細な説明】 (a)  発明の技術分野 本発明は率鮎晶成長方法において特に、種結晶をシード
軸に内矩する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Technical Field of the Invention The present invention relates to a method of growing ayu crystals, particularly to a method of growing a seed crystal within the seed axis.

lb)  技術の背景 半導体集積回路はシリコン(Sl)、ガリウム砒素(G
aA、s)々どの単結晶基板上に形成されているが、こ
れらの単結晶は引上は法(別名チョクラルスキー法略称
C2法)か或は浮遊帝城浴ml法(別名フローティング
ゾーン法略称FZ法)にって作られ1いる。
lb) Technology background Semiconductor integrated circuits are made of silicon (Sl), gallium arsenide (G
aA, s) are formed on any single crystal substrate, but these single crystals are produced using the pulling method (also known as the Czochralski method, abbreviated as the C2 method) or the floating Teijyoku ML method (also known as the floating zone method). It is made by the FZ method (abbreviated as FZ method).

ここでCZ法は大型−径化の点でまたFZ法は高純度の
ものが得られ易い点に特徴がおるが現在大tβ分の用途
に対してCZ法により得られた単結晶が用いらnている
Here, the CZ method is characterized by its ability to increase the size and diameter, and the FZ method is characterized by the fact that it is easy to obtain high-purity products, but currently single crystals obtained by the CZ method are not used for applications with large tβ. There are n.

第1図は抵抗加熱形C2炉の引上げ機構の断面図を示す
もので以下ソリコン単結晶の引上げを例として本発明に
係る隼佑晶製造装置の種結晶保持方法を説明する。
FIG. 1 shows a cross-sectional view of the pulling mechanism of a resistance heating type C2 furnace.The seed crystal holding method of the Hayabusa crystal production apparatus according to the present invention will be explained below by taking the pulling of a solicon single crystal as an example.

第1図に示すC2炉は坩堝1の外側に黒鉛製発熱体2が
あり、これにより坩堝1は加熱されている。ここで坩堝
1は内側が石英坩堝3で外側が黒釦坩堝4を組合わせた
ものからなり、この甲に高純度の多結晶シリフンを入れ
黒鉛製発熱体2に成製を遡じて坩堝1を加熱することに
ょ多多粕晶シリコンを溶融して融液5とする。ここで炉
内にば化を防ぐためにアルゴン(Ar)の減圧雰囲気に
保たnて2り、また融液5の4度に暢セコ高温計を用い
±02℃以下の梢厩で珠持さnている。
The C2 furnace shown in FIG. 1 has a graphite heating element 2 outside the crucible 1, and the crucible 1 is heated by this. Here, the crucible 1 is made up of a combination of a quartz crucible 3 on the inside and a black button crucible 4 on the outside.High purity polycrystalline silicon is put in the former, and the graphite heating element 2 is made into the crucible 1. By heating, the polycrystalline silicon is melted to form a melt 5. Here, a reduced pressure atmosphere of argon (Ar) was maintained in the furnace to prevent oxidation, and the temperature of the melt was kept at 4 degrees Celsius using a Nobu Seko pyrometer and held in a canopy at a temperature below ±02 degrees Celsius. There are n.

さて単結晶の育成1”を種結晶6を元廟に1ん定しであ
る/−ド@7を徐々に降下させて@液5につけるが、こ
の際の融液5の温度は41結晶6の先端が壜かにWA解
しつつ均り合いが保たれる温度に設定してあり、平衝に
達した後毎分3〜5 h+1:] 6f81上げ、4度
で結晶を細く救って種結晶にある転位を外周に追い出す
と共に転位の発生を抑えて無転位化する。
Now, to grow a single crystal 1'', the seed crystal 6 is set at the source, and the seed crystal 6 is gradually lowered to the liquid 5, but the temperature of the melt 5 at this time is 41 crystals. The temperature is set at such a temperature that the tip of the 6F is maintained at a temperature that maintains equilibrium while dissolving the WA in a bottle, and after reaching equilibrium, the temperature is raised at 3 to 5 h+1:] 6F81 and the crystal is thinned at 4 degrees. Dislocations in the seed crystal are expelled to the outer periphery, and the generation of dislocations is suppressed to eliminate dislocations.

次にシード軸7の引上げ迷吸を下げ、また温度も保々に
下降させて布望する直径Kまで太らせると共に長き方向
に早縛晶を成長せしめる。
Next, the pulling stray suction of the seed shaft 7 is lowered, and the temperature is also constantly lowered to increase the diameter K to the desired diameter and to grow early bound crystals in the longitudinal direction.

なお精品育成中を萼じて融液5の攪拌と温度を均一に株
つため種結晶6を保持するシード軸7と坩堝lはそtそ
れ反対方向に回転ばせている。たかる構造金とるCZ炉
において大曲、径化の袈求から咲在育成さノ1ているS
i本粘晶は直径4インチのものが普通であり、5インチ
のものも作らnるようになった。
Incidentally, in order to uniformly stir the melt 5 and keep the temperature uniform during the growth of a fine product, the seed shaft 7 holding the seed crystal 6 and the crucible 1 are rotated in opposite directions. In the CZ furnace that takes structure metal, Saki is growing from the demand of Omagari and diameter enlargement.
Normally, viscous crystals have a diameter of 4 inches, and 5-inch diameters are now being produced.

さて、CZ法による単結晶成長は今まで説明したようK
m績晶6を固定したシート@7を回転させ乍ら引上げる
ことにより行われるが、直径5インチ其さ80〔α〕に
も達したSi率結晶の塩頂は20〔〜〕にも達し、この
ような議会シード軸7への種結晶6の固定は充分の強緻
をもって行なわれている必要があり、今まですれ落ち或
は折損による改鋳、が起き易かった。
Now, as explained above, single crystal growth by the CZ method is
This is done by rotating and pulling up the sheet @ 7 on which the crystal 6 is fixed, and the salt peak of the Si content crystal, which has a diameter of 5 inches and a length of 80 [α], reaches 20 [~]. The fixing of the seed crystal 6 to the assembly seed shaft 7 must be done with sufficient strength, and until now, recasting due to slipping or breakage has easily occurred.

(c)  従来技術と問題点 引上げ云によって直径が2〜3インチの小型単結晶を成
長させるには従来第2図で示す形状の同定方法かとらn
ている。/′Aわち存B晶6を角柱状にfjJAll 
710工すると共にモリフ゛デン(MO)、ステンレス
などからなる円筒状のシード軸7の先端をね結晶が獣舎
するように切削したものを設け、両者を試合させた状態
でMO級8を用いて固縛している。
(c) Conventional techniques and problems In order to grow a small single crystal with a diameter of 2 to 3 inches, there is a conventional shape identification method shown in Fig. 2.
ing. /'A and existing B crystal 6 into a prismatic fjJAll
At the same time, the tip of a cylindrical seed shaft 7 made of molyphdenum (MO), stainless steel, etc. was cut in such a way that the crystals were covered, and the two were made to match and then fixed using MO class 8. It's tied up.

黙し/Pりこの抹持方法は引上は結晶の1酋が2〜3〔
4〕のものには適しているがMtが20 (即)にも堰
する大型結晶に対してはすり俗ちる危に性が多く不適当
である。そこで従来は第3図に示すように種結晶6の先
端とシード噂7を鍵部としこれによりづj抜けを防ぐ処
方がとられていた。然しこの方法では砂結晶6の鍵部9
に荷重がかかるためにクラックが入り棟洒晶6が破損す
る一部か起り易く、株す守−xc@とじては不光分であ
った。
Silence/P Riko's method of erasure is that one crystal is 2-3 [
4], but it is unsuitable for large crystals with Mt as high as 20 (immediately), as there is a risk of smearing. Therefore, conventionally, as shown in FIG. 3, the tip of the seed crystal 6 and the seed crystal 7 were used as key parts to prevent the dropout. However, in this method, the key part 9 of the sand crystal 6
Due to the load applied to it, cracks were likely to occur in some parts of the ridgeline crystal 6 and damage was likely to occur.

fdJ  発明の目的 本発明に単結晶成長方法において大型結晶の成長にも充
分に耐えられるシード軸の株情晶保持方法を8供するこ
とを目的とする。
fdJ OBJECTS OF THE INVENTION It is an object of the present invention to provide a method for maintaining the stock status of a seed axis that can sufficiently withstand the growth of large crystals in a single crystal growth method.

tel  発明の構成 本発明の目的は種結晶を固定するシード軸の・先端部が
内部に先ndすのテーパーをもつ2分割した治具から形
成されておシ、この先端部に先細りのテーパーをもつ円
筒状種結晶を歇合仰着し2て使用することを特徴とする
′g殆晶の保持構造の採用によりi成することができる
tel Structure of the Invention The purpose of the present invention is to fix a seed crystal by forming a jig divided into two parts, the tip of which has an internal taper. By employing a nearly crystalline holding structure characterized by the use of cylindrical seed crystals arranged one after the other, it is possible to produce a crystal.

(fJ  発明の実施例 M4[141Jは不発明に1ホる保狩狗遣の断面図1、
第5区は種結晶の珠付和・の刷王丘図また亮6図はシー
ト軸先端に設けた保持構造を示す斜視図である。
(fJ Invention Example M4
The 5th section is a diagram of the seed crystal beads attached to the crown, and the 6th section is a perspective view showing the holding structure provided at the tip of the sheet shaft.

不発明に第5図に示すように裡結直保持部の中m−1に
、取灸方同での種結晶6の鵬四杉状か、その反対方向で
のぞnよシ小さい断面形状を南するテーパ一部10かあ
り、V保持都の上部では大きい同心円の円狂となるよう
に切削7jfJ工すると共に上も0円柱部11の一部1
2を削り落した形状とする。
Uninventively, as shown in FIG. 5, the seed crystal 6 has a cross-sectional shape in the same direction as the moxibustion direction, or has a smaller cross-sectional shape in the opposite direction. There is a taper part 10 going south, and the upper part of the V holding capital is cut 7jfJ so that it becomes a large concentric circular discrepancy, and the upper part 1 of the cylindrical part 11 is also 0.
2 is shaved off.

tP:、:えに種結晶6の上部円柱部11σ訂径約10
(m+s)長さ約10 〔p、r;〕にまた下部円柱部
に直径約8〔1z〕長さ約90〔龍〕に形成しである。
tP:,:Eni Seed Crystal 6 Upper Cylindrical Part 11σ Diameter Reduction Approximately 10
(m+s) and has a length of about 10 [p, r;], and the lower cylindrical part has a diameter of about 8 [1z] and a length of about 90 [dragon].

次にシード@7の先端は第6図に示すようにシード軸の
中央に切り割ジ13を入れて2分割すると共に、この内
部t1に第5図の杉次の種結晶が歇曾するように切61
」加工して溝が設けである。なおシード軸7の太きさと
しては直径20〔11I戸〕程度のもりが用いられてい
る。ここでシード軸70先端を2分割して功p−1tQ
13を設ける理由は種結晶6の神看勿谷勿にすbためと
シード軸1を構成するIVIO。
Next, as shown in Fig. 6, the tip of the seed @7 is divided into two parts by inserting a slit 13 in the center of the seed shaft, and the Sugitsugi seed crystal shown in Fig. 5 is placed in the inside t1. Nikiri 61
” It is machined and grooved. As for the thickness of the seed shaft 7, a harpoon with a diameter of about 20 [11I doors] is used. Here, divide the tip of the seed shaft 70 into two and use p-1tQ.
The reason why 13 is provided is to prevent the seed crystal 6 from being damaged and the IVIO that constitutes the seed axis 1.

ステンレスなとの金輌と種結晶との膨張糸数の相違によ
る糧纜晶の=損を防ぐ役駒ジをしている。
Its role is to prevent loss of food crystals due to the difference in the number of expansion threads between the stainless steel metal and the seed crystal.

漕たシ軸晶6の上部円柱郁11の一部12を削シ洛しで
ある理由は結晶の引−ヒげ操作中椹結晶6のリード噛7
との辷りを防ぐためでるる。なお2分割したシード軸の
先端部d*41i71c示すようにMO練8などにより
固縛される。このような固定構造をとる場合ri稙糺晶
6はテーパー10をもつ上部円柱%11によシ保持され
ているので大ff1M晶の成長が行われた鳩舎でも安定
に保持されておシ、ずシ洛ちることもなくまたり2ツク
発生による破損の恐れもない。
The reason why the part 12 of the upper cylinder 11 of the cylindrical crystal 6 is removed is due to the reed cutting 7 of the crystal 6 while manipulating the crystal's pull.
It comes out to prevent tripping. In addition, as shown in the tip part d*41i71c of the seed shaft divided into two, it is secured by MO kneading 8 or the like. When such a fixed structure is adopted, the RI strand crystal 6 is held by the upper cylinder 11 having a taper 10, so it is stably held even in the pigeonhole where large ff1M crystals are grown. There is no risk of damage due to double cracking and there is no chance of damage.

(g)  発明の効果 本発明の実施によりIL&5インチ長さSOcmKも及
ぶ大型のSi単結晶の引上げに際しても種結晶は安定に
シード軸に固定しておシ、ずp落ち戚ri破払なとの縦
来の故障を無くすることができた。
(g) Effects of the Invention By implementing the present invention, even when pulling a large Si single crystal with a length of IL and 5 inches, the seed crystal can be stably fixed to the seed shaft and can be broken without falling. We were able to eliminate long-term failures.

【図面の簡単な説明】[Brief explanation of drawings]

払1図1よCZ炉の引上げ機楕のwT面図、塾2内と第
3図#−i従来の1f−IikS晶保持菫造の説明図、
第4面〜組6因は本発明に係る種M晶保持構造で、第4
図LLT曲図、島5図は椋結晶の斜視図また第6図はシ
ード軸先端部の斜視図である。
Figure 1: WT view of CZ furnace pulling machine ellipse, interior of cram school 2 and Figure 3 #-i: explanatory diagram of conventional 1f-IikS crystal-retaining violet construction,
The 4th surface to the 6th factor are seed M crystal holding structures according to the present invention;
Figure LLT curve diagram, Figure 5 is a perspective view of the Muku crystal, and Figure 6 is a perspective view of the tip of the seed shaft.

Claims (1)

【特許請求の範囲】[Claims] 扁臨で融解している坩堝中の#?[ヘシード軸の先端に
備えた種結晶を浸漬し平衡を珠ち乍ら前記シード軸を回
転上昇させることによりm結晶を核として単結晶をエピ
タキシャル成長させる単結晶製造装置において、棟δ、
5晶を固定するシード軸の先端部が内部に先細りのテー
パーをもつ2分割した茫具から形成されて幹り、該先端
部に先細9のテーパーをもつ円筒状槍結77、を嵌合装
着して使用することを特徴とする血結晶成長〆lの種結
晶保持方法。
# in the crucible melting in the crucible? [In a single crystal manufacturing apparatus in which a single crystal is epitaxially grown using the m crystal as a core by immersing a seed crystal provided at the tip of a heseed shaft and rotating and raising the seed shaft while maintaining equilibrium, the ridge δ,
The tip of the seed shaft for fixing the 5 crystals is formed from a two-part stem with a tapered inner part, and a cylindrical spear knot 77 with a taper of 9 is fitted and attached to the tip. A method for holding seed crystals for blood crystal growth, characterized in that the method is used as a seed crystal for blood crystal growth.
JP9067782A 1982-05-28 1982-05-28 Method for holding seed crystal for growing single crystal Pending JPS58208194A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9067782A JPS58208194A (en) 1982-05-28 1982-05-28 Method for holding seed crystal for growing single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9067782A JPS58208194A (en) 1982-05-28 1982-05-28 Method for holding seed crystal for growing single crystal

Publications (1)

Publication Number Publication Date
JPS58208194A true JPS58208194A (en) 1983-12-03

Family

ID=14005165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9067782A Pending JPS58208194A (en) 1982-05-28 1982-05-28 Method for holding seed crystal for growing single crystal

Country Status (1)

Country Link
JP (1) JPS58208194A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0497864U (en) * 1991-01-10 1992-08-25
CN102978693A (en) * 2012-12-11 2013-03-20 哈尔滨秋冠光电科技有限公司 Seed chuck structure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0497864U (en) * 1991-01-10 1992-08-25
CN102978693A (en) * 2012-12-11 2013-03-20 哈尔滨秋冠光电科技有限公司 Seed chuck structure

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