JPS58206135A - Mos型ダイオ−ドの界面における少数キヤリアトラツプ準位測定方法 - Google Patents
Mos型ダイオ−ドの界面における少数キヤリアトラツプ準位測定方法Info
- Publication number
- JPS58206135A JPS58206135A JP8873982A JP8873982A JPS58206135A JP S58206135 A JPS58206135 A JP S58206135A JP 8873982 A JP8873982 A JP 8873982A JP 8873982 A JP8873982 A JP 8873982A JP S58206135 A JPS58206135 A JP S58206135A
- Authority
- JP
- Japan
- Prior art keywords
- type diode
- signal
- interface
- pulse wave
- trap level
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8873982A JPS58206135A (ja) | 1982-05-27 | 1982-05-27 | Mos型ダイオ−ドの界面における少数キヤリアトラツプ準位測定方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8873982A JPS58206135A (ja) | 1982-05-27 | 1982-05-27 | Mos型ダイオ−ドの界面における少数キヤリアトラツプ準位測定方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58206135A true JPS58206135A (ja) | 1983-12-01 |
| JPH0115141B2 JPH0115141B2 (enExample) | 1989-03-15 |
Family
ID=13951284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8873982A Granted JPS58206135A (ja) | 1982-05-27 | 1982-05-27 | Mos型ダイオ−ドの界面における少数キヤリアトラツプ準位測定方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58206135A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5922337A (ja) * | 1982-07-28 | 1984-02-04 | Fujitsu Ltd | 界面電気伝導評価方法 |
| JP2008014668A (ja) * | 2006-07-03 | 2008-01-24 | Toyota Central Res & Dev Lab Inc | 有機材料の評価装置及び評価方法 |
| JP2015040816A (ja) * | 2013-08-23 | 2015-03-02 | 株式会社Screenホールディングス | 検査装置および検査方法 |
| JP2021197452A (ja) * | 2020-06-15 | 2021-12-27 | 信越半導体株式会社 | シリコン試料中の酸素濃度測定方法 |
-
1982
- 1982-05-27 JP JP8873982A patent/JPS58206135A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5922337A (ja) * | 1982-07-28 | 1984-02-04 | Fujitsu Ltd | 界面電気伝導評価方法 |
| JP2008014668A (ja) * | 2006-07-03 | 2008-01-24 | Toyota Central Res & Dev Lab Inc | 有機材料の評価装置及び評価方法 |
| JP2015040816A (ja) * | 2013-08-23 | 2015-03-02 | 株式会社Screenホールディングス | 検査装置および検査方法 |
| JP2021197452A (ja) * | 2020-06-15 | 2021-12-27 | 信越半導体株式会社 | シリコン試料中の酸素濃度測定方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0115141B2 (enExample) | 1989-03-15 |
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