JPS58197819A - パタ−ン形成法 - Google Patents

パタ−ン形成法

Info

Publication number
JPS58197819A
JPS58197819A JP57080040A JP8004082A JPS58197819A JP S58197819 A JPS58197819 A JP S58197819A JP 57080040 A JP57080040 A JP 57080040A JP 8004082 A JP8004082 A JP 8004082A JP S58197819 A JPS58197819 A JP S58197819A
Authority
JP
Japan
Prior art keywords
film
silicon oxide
pattern
oxide film
graft polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57080040A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6219052B2 (OSRAM
Inventor
Masao Morita
雅夫 森田
Saburo Imamura
三郎 今村
Toshiaki Tamamura
敏昭 玉村
Osamu Kogure
小暮　攻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP57080040A priority Critical patent/JPS58197819A/ja
Publication of JPS58197819A publication Critical patent/JPS58197819A/ja
Publication of JPS6219052B2 publication Critical patent/JPS6219052B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57080040A 1982-05-14 1982-05-14 パタ−ン形成法 Granted JPS58197819A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57080040A JPS58197819A (ja) 1982-05-14 1982-05-14 パタ−ン形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57080040A JPS58197819A (ja) 1982-05-14 1982-05-14 パタ−ン形成法

Publications (2)

Publication Number Publication Date
JPS58197819A true JPS58197819A (ja) 1983-11-17
JPS6219052B2 JPS6219052B2 (OSRAM) 1987-04-25

Family

ID=13707128

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57080040A Granted JPS58197819A (ja) 1982-05-14 1982-05-14 パタ−ン形成法

Country Status (1)

Country Link
JP (1) JPS58197819A (OSRAM)

Also Published As

Publication number Publication date
JPS6219052B2 (OSRAM) 1987-04-25

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