JPS5819414B2 - Electrolytic buffing processing equipment - Google Patents

Electrolytic buffing processing equipment

Info

Publication number
JPS5819414B2
JPS5819414B2 JP51117742A JP11774276A JPS5819414B2 JP S5819414 B2 JPS5819414 B2 JP S5819414B2 JP 51117742 A JP51117742 A JP 51117742A JP 11774276 A JP11774276 A JP 11774276A JP S5819414 B2 JPS5819414 B2 JP S5819414B2
Authority
JP
Japan
Prior art keywords
electrode
polished
tool
electrolytic
support plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51117742A
Other languages
Japanese (ja)
Other versions
JPS5343298A (en
Inventor
田宮勝恒
本田昭一
木本康雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Zosen Corp
Original Assignee
Hitachi Zosen Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Zosen Corp filed Critical Hitachi Zosen Corp
Priority to JP51117742A priority Critical patent/JPS5819414B2/en
Publication of JPS5343298A publication Critical patent/JPS5343298A/en
Publication of JPS5819414B2 publication Critical patent/JPS5819414B2/en
Expired legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23HWORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H5/00Combined machining
    • B23H5/10Electrodes specially adapted therefor or their manufacture

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Description

【発明の詳細な説明】 この発明は、電解による被研摩物の金属の陽極溶出作用
と、被研摩物表面に生成する不働態化酸化皮膜を研摩材
による機械的な擦過作用で除去する研摩作用とを複合さ
せ、ステンレス鋼などの表面を鏡面に仕上げる電解パフ
研摩加工装置に関する。
DETAILED DESCRIPTION OF THE INVENTION This invention utilizes an anodic elution action of the metal of the polished object through electrolysis, and a polishing action that removes the passivated oxide film formed on the surface of the polished object through the mechanical abrasion action of an abrasive. This relates to an electrolytic puff polishing device that combines the above to finish the surface of stainless steel, etc., to a mirror finish.

従来、ステンレス鋼などを鏡面に仕上げする場合、被研
摩物と電極とを電解液浴中に対向して浸漬し、電解研摩
する方法が行なわれている。
Conventionally, when finishing stainless steel or the like to a mirror surface, a method has been used in which an object to be polished and an electrode are immersed facing each other in an electrolyte bath, and electrolytic polishing is performed.

しかし、この方法は被研摩物表面に発生する陽極性不働
態化酸化皮膜を電気化学的に除去し、電解を促進するも
のであるため、電流密度に制限を受け、0.2〜0.7
A/crAと小さい値しか流すことができない。
However, since this method electrochemically removes the anodic passivation oxide film generated on the surface of the object to be polished and promotes electrolysis, it is limited by the current density, which is 0.2 to 0.7
Only a small value of A/crA can flow.

このため研摩速度が遅く、除去加工性が極めて小さいた
め、主として下地仕上げされた小物に対する鏡面仕上げ
に適用されている。
For this reason, the polishing speed is slow and the removal workability is extremely low, so it is mainly applied to mirror finishing small items that have been finished with a base.

したがって長尺・大面積を有する被研摩物の鏡面仕上げ
加工方法としては、研摩速度が小さいこと、換言すれば
被研摩面の下地仕上を必要とすることは、大きな欠点で
あり、このため実用化が困難とされている。
Therefore, as a method for mirror-finishing long and large-area objects, the slow polishing speed, or in other words, the need for surface finishing of the surface to be polished, is a major drawback, and this is why it is not practical. is considered difficult.

そこで、被研摩物表面に発生する不働態化酸化皮膜を除
去するために、研摩材を用いて強制的に擦過除去するこ
とにより電流密度を高くすることができる電解パフ研摩
加工方法が有効な手段である。
Therefore, in order to remove the passivated oxide film that occurs on the surface of the object to be polished, an effective method is the electrolytic puff polishing method, which uses an abrasive to forcibly remove the film and increases the current density. It is.

この発明は、前記の点に留意し、電解パフ研摩加工方法
を一層効果的に行なうことのできる加工装置を提供する
ものであり、以下図面とともに実施例について詳細に説
明する。
The present invention takes the above-mentioned points into consideration and provides a processing apparatus that can carry out the electrolytic puff polishing method more effectively.Examples will be described in detail below with reference to the drawings.

まず、この発明の研摩加工装置の一例を示した第1図お
よび第2図について説明する。
First, FIG. 1 and FIG. 2, which show an example of the polishing apparatus of the present invention, will be explained.

同図において1は駆動軸に接続され駆動装置により回転
される工具、2は工具1の下部の加工面側に形成された
円板上の電極支持板、3は電極支持板2に導電性接着材
で接着された電導性でかつ弾力性を有するゴム弾性体か
らなる電極、4は電極支持板2および電極3に複数個透
設された電解液5の流出口、6は電極3の下面に形成さ
れた十字状の露出面、7は電極3の下面に露出面6を残
して電気的には絶縁性の接着材8で接着されたパフ、研
摩布、あるいは不織布等の研摩材であり、適宜砥粒を含
有したものでもよい。
In the figure, 1 is a tool connected to a drive shaft and rotated by a drive device, 2 is an electrode support plate on a disk formed on the processing surface side of the lower part of tool 1, and 3 is conductive adhesive bonded to the electrode support plate 2. 4 is a plurality of outlets for electrolytic solution 5 provided through the electrode support plate 2 and the electrode 3; 6 is an electrode on the bottom surface of the electrode 3; The formed cross-shaped exposed surface 7 is an abrasive material such as a puff, abrasive cloth, or a nonwoven fabric, which is adhered with an electrically insulating adhesive 8, leaving the exposed surface 6 on the lower surface of the electrode 3. It may contain appropriate abrasive grains.

そして、電解液5が駆動軸を通して圧送され、流出口4
から研摩材7を通して工具1の外へと流れる。
Then, the electrolytic solution 5 is pumped through the drive shaft and the outflow port 4
from the abrasive material 7 to the outside of the tool 1.

9は工具1から電解液5を通じて流れる漏れ電流を防ぐ
ために工具1の周面に塗布された絶縁皮膜であり、以上
の構成のもとに、工具1の電極3と工具1の下面に対向
して設置される被研摩物に、直流あるいはパルス電源の
陰極側と陽極側がそれぞれ接続される。
Reference numeral 9 denotes an insulating film applied to the circumferential surface of the tool 1 in order to prevent leakage current from flowing from the tool 1 through the electrolyte 5. Based on the above configuration, the electrode 3 of the tool 1 and the lower surface of the tool 1 are opposed to each other. The cathode and anode sides of a direct current or pulsed power source are connected to the object to be polished, which is installed in a vacuum cleaner.

そして研摩加工に際し、工具1の電極3と被研摩物に直
流又はパルス電圧を印加するとともに、その間に電解液
5を供給し、工具1を被研摩物に押付けつつ回転させる
ことにより、電解作用で被研摩物金属の電解溶出を行な
い、かつ、被研摩物表面に生成された不働態化酸化皮膜
を研摩材γにより擦過除去し、被研摩物表面の凹凸部の
凸部を、優先的・選択的に電解を促進させることができ
、被研摩物表面を鏡面に仕上げることができる。
During polishing, a direct current or pulse voltage is applied to the electrode 3 of the tool 1 and the object to be polished, and an electrolytic solution 5 is supplied between the electrodes 3 and the object to be polished, and the tool 1 is rotated while being pressed against the object to be polished, thereby producing electrolytic action. The metal to be polished is electrolytically eluted, and the passivated oxide film generated on the surface of the polished object is removed by abrasive material γ, and the convex portions of the irregularities on the surface of the polished object are preferentially and selectively removed. Electrolysis can be effectively promoted, and the surface of the object to be polished can be finished to a mirror finish.

またこの発明の大きな特徴は、電極3に電導性を有しか
つ弾力性をもつものを使用することにより、電解研摩効
率を一層飛躍増大させることに成功したものであり、つ
ぎにその実験結果について説明する。
Furthermore, a major feature of this invention is that by using a conductive and elastic electrode 3, we succeeded in further increasing the electrolytic polishing efficiency.Next, we will discuss the experimental results. explain.

第3図および第4図は実験に用いた工具の断面形状を図
示したものであり、ともに工具の電極に直径150m1
φ(工具面積177cd)、十字状の電極露出面の面積
40crA、研摩材は厚み8〜10mmの不織製研摩材
で#600〜800の砥粒が含着されたもの、電解液は
重量比20%の硝酸ソーダ(NaN03)水溶液を用い
、工具に3 l /mvtQ圧送供給し、電極と被研摩
物に直流8Vを印加し、被研摩物に対して0.2 kg
/c4の押付力で工具を押付けながら工具を40 Or
pmで回転させる。
Figures 3 and 4 illustrate the cross-sectional shape of the tool used in the experiment, and both have a diameter of 150 m1 on the electrode of the tool.
φ (tool area: 177 cd), cross-shaped electrode exposed surface area: 40 crA, abrasive material is a non-woven abrasive material with a thickness of 8 to 10 mm impregnated with #600 to 800 abrasive grains, electrolyte is by weight ratio Using 20% sodium nitrate (NaN03) aqueous solution, 3 l/mvtQ was pumped to the tool, 8 V DC was applied to the electrode and the object to be polished, and 0.2 kg was applied to the object to be polished.
40 Or while pressing the tool with a pressing force of /c4
Rotate at pm.

そして、被研摩物はステンレス鋼(SUS304L)で
、半径Rは1800mmにロール成形され、ペーパーで
4〜6μ77ZRmaxに下地仕上げされた円筒内面を
電解研摩する。
Then, the object to be polished is stainless steel (SUS304L), which is roll-formed to a radius R of 1800 mm, and the inner surface of the cylinder, which has been ground-finished to 4 to 6 μ77 ZRmax with paper, is electrolytically polished.

この場合、工具の下面すなわち電極面が被研摩物の曲面
に合致するよう被研摩物内面半径と同じか若干小さい半
径を有する電極を用いる。
In this case, an electrode having a radius equal to or slightly smaller than the inner radius of the object to be polished is used so that the lower surface of the tool, that is, the electrode surface, matches the curved surface of the object to be polished.

そして、第3図は電極3′に剛体の金属を用いた場合を
示し、第4図は電極3にこの発明の導電性のゴム弾性体
を用いた場合を示し、図中tは弾性体電極の厚みを示し
、そのほかの諸元は第3図および第4図とも同じものを
用いる。
FIG. 3 shows a case where a rigid metal is used for the electrode 3', and FIG. 4 shows a case where a conductive rubber elastic body of the present invention is used for the electrode 3. In the figure, t is an elastic body electrode. The other specifications are the same as in FIGS. 3 and 4.

第5図は実験結果を図示したものであり、縦軸は、4〜
6μRmaxの下地仕上げされた被研摩面を0.2〜0
.4μmRmaxの鏡面に一様に研摩できる単位時間当
りの研摩面積を研摩速度として表わしたものである。
Figure 5 shows the experimental results, and the vertical axis is 4~
6μRmax base-finished surface to be polished 0.2 to 0
.. The polished area per unit time that can be uniformly polished to a mirror surface of 4 μmRmax is expressed as the polishing speed.

横軸は、弾性体電極の厚みを表わし、厚みOは第3図に
示すように電極が剛体で構成されていることを示す。
The horizontal axis represents the thickness of the elastic electrode, and the thickness O indicates that the electrode is made of a rigid body as shown in FIG.

そしてパラメータにν弾性体電極の体積固有抵抗値をと
り、それぞれ10−1Ω−篩、10−2Ω−ぼ、10−
3Ω−儒のものを選んで実験した。
Then, the volume resistivity value of the ν elastic body electrode is taken as a parameter, and 10-1Ω-sieve, 10-2Ω-sieve, and 10-
I selected a 3Ω-Fu and experimented with it.

ところでロール加工された大形製缶物の内面は、ロール
成形時に生ずる曲げ誤差や、製缶時の溶接;歪により、
半径1800mmといっても局部的には大きなうねりや
曲げむらがあり、これと同じ曲率をもった電極で研摩す
る場合には、実際の接触面が不均等になり、しかも押付
圧が不均一に加わる。
By the way, the inner surface of a large roll-processed can is subject to bending errors that occur during roll forming, welding during can manufacturing, and distortion.
Even though the radius is 1800 mm, there are large undulations and uneven bends locally, and when polishing with an electrode with the same curvature, the actual contact surface will be uneven and the pressing pressure will be uneven. join.

このため研摩面によるむらが生じ、速やかに鏡面;に仕
上げられる個所と、いつまでも下地面が残り、研摩仕上
げが行なわれない個所ができる。
This causes unevenness due to the polished surface, resulting in areas that are quickly finished to a mirror finish and areas where the underlying surface remains forever and is not polished.

特に剛体の電極を用いる場合はその傾向が強く、研摩速
度が小さい。
This tendency is particularly strong when using a rigid electrode, and the polishing speed is low.

これに対し、弾性体の電極を用いると、電極面が被研摩
物表面によく合致する。
On the other hand, when an elastic electrode is used, the electrode surface closely matches the surface of the object to be polished.

すな・わち、電極面と被研摩物表面が常に平行状態にな
り、かつ押付力が均一に加わるため、被研摩物表面にう
ねりや大きな凹凸があっても、それに応じて電極形状が
変形して適応するため、研摩速度を高めることができる
In other words, the electrode surface and the surface of the object to be polished are always in a parallel state and the pressing force is applied uniformly, so even if the surface of the object to be polished has undulations or large irregularities, the electrode shape will deform accordingly. The polishing speed can be increased to accommodate the

; そして第5図から明らかなように、体積固有抵抗値
が10−2Ω−温以下の弾性体の電極の場合、厚みが5
〜10mmの時に研摩速度は10〜50%向上する。
; As is clear from Fig. 5, in the case of an elastic electrode with a volume resistivity of 10-2 Ω or less, the thickness is 5.
-10 mm, the polishing speed increases by 10-50%.

しかし10−1Ω−温の場合は、厚みの増大とともに電
気抵抗が非常に増大するため、電解電流が流れなくなり
、研摩速度は低下するので、弾性体の電極を用いても効
果は現われない。
However, in the case of a temperature of 10<-1 >ohm, the electric resistance greatly increases as the thickness increases, so that no electrolytic current flows and the polishing speed decreases, so that even if an elastic electrode is used, no effect will be seen.

以上のように、この発明の電解パフ研摩加工装置による
と、10−2Ω−温以下の通電性を有し、かつゴム弾性
体からなる電極を使用することによ□す、曲面を有する
被研摩体に対する追従性を向上させることができ、効率
のよい電解パフ研摩加工ができる。
As described above, according to the electrolytic puff polishing apparatus of the present invention, a polished object having a curved surface can be polished by using an electrode made of a rubber elastic body and having an electrical conductivity of 10-2Ω-temperature or less. The ability to follow the body can be improved, and efficient electrolytic puff polishing can be performed.

また、被研摩物表面と電極との間に衝撃的な力が作用し
ないので、研摩材が長持ちするなどの効果を有する。
Furthermore, since no impact force acts between the surface of the object to be polished and the electrode, the abrasive material lasts a long time.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の電解パフ研摩加工装置に使用される
工具電極の下面図、第2図は第1図の工具のs−s’線
断面図、第3図および第4図は実験時の工具の断面図を
示し、第3図は電極に剛体を使用したもの、第4図は電
極にこの発明の弾性体を使用したもの、第5図は電極の
厚みと研摩速度の関係を示す。 1・・・・・・工具、2・・・・・・電極支持板、3・
・・・・・電極、4・・・・・・流出口、5・・・・・
・電解液、6・・・・・・露出面、7・・・・・・研摩
材。
Fig. 1 is a bottom view of the tool electrode used in the electrolytic puff polishing device of the present invention, Fig. 2 is a sectional view taken along line ss' of the tool in Fig. 1, and Figs. 3 and 4 are during the experiment. Fig. 3 shows a tool using a rigid body for the electrode, Fig. 4 shows a tool using the elastic body of the present invention for the electrode, and Fig. 5 shows the relationship between the thickness of the electrode and the polishing speed. . 1... Tool, 2... Electrode support plate, 3.
... Electrode, 4 ... Outlet, 5 ...
・Electrolyte, 6...exposed surface, 7...abrasive material.

Claims (1)

【特許請求の範囲】[Claims] 1 電解により被研摩物の金属の陽極溶出を行なうとと
もに、被研摩物表面に生成された不働態化酸化皮膜を研
摩材により擦過除去し、選択的に電解を促進させること
により、被研摩物表面を鏡面に仕上げる電解パフ研摩加
工装置において、工具の加工面側に円板状の電極支持板
を設け、該支持板に、比抵抗10−2Ω−篩以下のゴム
弾性体からなる電極を設け、前記支持板および電極に複
数個の電解液の流出口を透設し、前記電極面上に電極の
露出面と研摩材とを工具の回転方向に交互に設けたこと
を特徴とする電解パフ研摩加工装置。
1 The metal of the object to be polished is anodic eluted by electrolysis, and the passivated oxide film formed on the surface of the object to be polished is removed by abrasive material, and electrolysis is selectively promoted. In an electrolytic puff polishing device for finishing a material to a mirror surface, a disk-shaped electrode support plate is provided on the processing surface side of the tool, and an electrode made of a rubber elastic body with a specific resistance of 10-2 Ω-sieve or less is provided on the support plate, Electrolytic puff polishing characterized in that a plurality of electrolyte outflow ports are provided through the support plate and the electrode, and an exposed surface of the electrode and an abrasive material are alternately provided on the electrode surface in the rotational direction of the tool. Processing equipment.
JP51117742A 1976-09-29 1976-09-29 Electrolytic buffing processing equipment Expired JPS5819414B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51117742A JPS5819414B2 (en) 1976-09-29 1976-09-29 Electrolytic buffing processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51117742A JPS5819414B2 (en) 1976-09-29 1976-09-29 Electrolytic buffing processing equipment

Publications (2)

Publication Number Publication Date
JPS5343298A JPS5343298A (en) 1978-04-19
JPS5819414B2 true JPS5819414B2 (en) 1983-04-18

Family

ID=14719169

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51117742A Expired JPS5819414B2 (en) 1976-09-29 1976-09-29 Electrolytic buffing processing equipment

Country Status (1)

Country Link
JP (1) JPS5819414B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03218004A (en) * 1990-01-23 1991-09-25 Murata Mfg Co Ltd Feed-through capacitor

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103317424B (en) * 2013-07-10 2016-04-13 厦门大学 A kind of flexible polishing head
CN106862685B (en) * 2017-02-24 2019-05-17 哈尔滨工业大学深圳研究生院 A kind of electrolysis electric discharge machining method using plane foil electrode

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4878598A (en) * 1972-01-24 1973-10-22

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4878598A (en) * 1972-01-24 1973-10-22

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03218004A (en) * 1990-01-23 1991-09-25 Murata Mfg Co Ltd Feed-through capacitor

Also Published As

Publication number Publication date
JPS5343298A (en) 1978-04-19

Similar Documents

Publication Publication Date Title
TWI335250B (en) Pad assembly for electrochemical mechanical processing
JP2893012B2 (en) Method and apparatus for planarizing a workpiece
JP2001203179A (en) Advanced electrolytic polishing(aep) using metal wafer planarization method and apparatus
KR20070104870A (en) Conductive polishing article for electrochemical mechanical polishing
TW200401351A (en) Method and apparatus for substrate polishing
TW201321129A (en) Electric field-assisted chemical mechanical polishing system and method thereof
JPS5819414B2 (en) Electrolytic buffing processing equipment
TW200403121A (en) Polishing apparatus and polishing method
JP4878159B2 (en) Rotational surface reduction head, electrolytic surface reduction device, and electrolytic surface reduction method
JPS60204899A (en) Surface treatment
JPS5819413B2 (en) Electrolytic buffing processing equipment
JPH04157197A (en) Electrolytic treatment of surface of metallic material and electrode used the same
KR20070104686A (en) Conductive polishing article for electrochemical mechanical polishing
JP2990676B2 (en) Cathode surface treatment for electroforming metal foil or strip
JPS606360A (en) Carbon fiber buff and electrolytic-polishing therewith
TWI519387B (en) Composite electroplating and electrolytic in-process sharpening grinding method
JPS5819412B2 (en) Electrolytic buffing processing equipment
JPS5835823B2 (en) Electrolytic buffing processing equipment
JP2004230505A (en) Control method of electrolytic polishing pad
JP3169631B2 (en) Method and apparatus for electrolytic dressing with semiconductor contact electrode
JPH0133287B2 (en)
TWI659467B (en) Electrolytic abrasive polishing device
JP3186734B2 (en) Method to improve uniformity of chemical mechanical polishing using electrolytic conductor layer
JPS5819411B2 (en) Electrolytic buffing method
JPH03281799A (en) Method for polishing surface of metallic material