JPS5817260B2 - Etching agent waste treatment method - Google Patents

Etching agent waste treatment method

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Publication number
JPS5817260B2
JPS5817260B2 JP1444978A JP1444978A JPS5817260B2 JP S5817260 B2 JPS5817260 B2 JP S5817260B2 JP 1444978 A JP1444978 A JP 1444978A JP 1444978 A JP1444978 A JP 1444978A JP S5817260 B2 JPS5817260 B2 JP S5817260B2
Authority
JP
Japan
Prior art keywords
acid
etching agent
copper
ammonia
ammonium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1444978A
Other languages
Japanese (ja)
Other versions
JPS54107441A (en
Inventor
荒木建
川崎元雄
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Individual
Original Assignee
Individual
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Publication date
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Priority to JP1444978A priority Critical patent/JPS5817260B2/en
Publication of JPS54107441A publication Critical patent/JPS54107441A/en
Publication of JPS5817260B2 publication Critical patent/JPS5817260B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 この発明は、例えばプリント配線基板の製造に際して絶
縁基板上に導体パターンを完成させる最終工程として行
う銅エツチング工程、その他種々の銅エツチング工程に
8いて使用するアンモニアアルカリ性銅エツチング剤の
廃液を処理する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an ammonia-alkaline copper etching process that is used in a copper etching process that is carried out as a final step to complete a conductor pattern on an insulating substrate in the manufacture of printed wiring boards, for example, and in various other copper etching processes. The present invention relates to a method for treating waste liquid of a chemical agent.

周知のように、プリント配線基板の製造プロセスに3い
て、絶縁基板上に導体パターンを完成させるためにその
最終工程で配線の不要銅被膜部分を溶解除去する必要が
あり、この不要部分の溶解除去に従来より塩化第二鉄系
、過酸化水素系、過硫酸アンモニウム系、塩化第二銅系
等、種々の銅エツチング済11が使用されているが、こ
れらエツチング剤は、いずれもその廃液中に多量の銅を
含み、この廃液の処理が問題になっている。
As is well known, in the manufacturing process of printed wiring boards, in order to complete the conductor pattern on the insulating substrate, it is necessary to dissolve and remove unnecessary copper coating parts of the wiring in the final process. Various copper-etched etching agents have been used in the past, such as ferric chloride-based, hydrogen peroxide-based, ammonium persulfate-based, and cupric chloride-based etching agents. The treatment of this waste liquid has become a problem.

また、特に最近に?いては、エツチング特性が良好であ
ること並びに銅以外に他の重金属が含まれず、従って廃
液処理上有利であること等の点から、アンモニアアルカ
リ性銅エツチング剤が注目され、広く採用されるに至っ
ている。
Also, especially recently? Among these, ammonia-alkaline copper etching agents have attracted attention and have been widely adopted because they have good etching properties and do not contain heavy metals other than copper, and are therefore advantageous in waste liquid treatment. .

しかし、このアンモニアアルカリ性銅エツチング剤にし
ても、その使用後の廃液には多量の銅を含み(0,1〜
0.6トン/m、3)、従ってこれを処理することが要
求されるが、従来実際に行われている対策は中和凝集沈
殿法の域を脱せず、廃液中に?ける多量のアンモニウム
イオンの存在、水酸化銅の溶解度の関係から中和処理時
に8けるpH調整に厳格性を要求されること、そしてま
た水酸化銅の沈殿はかさが高く、p別が困難なこと等の
点から廃液処理水中の残留銅イオン濃度を十分低下させ
ることができない場合があり、また銅は水酸化銅として
海洋投棄などで処分されて再利用されて8らす、処理水
の殆んども放流されて再利用されていない現状にある。
However, even with this ammonia alkaline copper etching agent, the waste liquid after its use contains a large amount of copper (0.1~
0.6 ton/m, 3) Therefore, it is required to treat this, but the measures actually taken so far have been limited to neutralization coagulation sedimentation methods, and the waste liquid has not been disposed of. Due to the presence of a large amount of ammonium ions in the copper hydroxide, the solubility of copper hydroxide requires strict pH adjustment during neutralization, and the precipitate of copper hydroxide is bulky and difficult to distinguish. For these reasons, it may not be possible to sufficiently reduce the residual copper ion concentration in treated wastewater, and copper is disposed of as copper hydroxide through ocean dumping and reused. The current situation is that the water is being released into the water and not being reused.

従って、このような中和凝集沈殿法では現在強く要望さ
れている省資源化、リサイクリング化が達成されない等
、その処丹力法にはまだ種種の問題がある。
Therefore, there are still various problems with the processing method, such as the fact that resource saving and recycling, which are currently strongly desired, cannot be achieved with such a neutralization coagulation sedimentation method.

また、アンモニアアルカリ性銅エツチング剤廃液の処理
法として、中和凝集沈殿性以外に金属置換法、電解法等
も知られてはいるが、これら処理法は実際上殆んど採用
されて2らず、またいずれにしても従来のこの種のアン
モニアアルカリ性銅エツチング剤の廃液のリサイクリン
グ処理法は提案されていない。
Furthermore, in addition to the neutralization coagulation-sedimentation method, metal replacement methods and electrolytic methods are also known as treatment methods for ammonia-alkaline copper etching agent waste liquid, but these treatment methods are rarely adopted in practice. In any case, no conventional recycling treatment method for the waste liquid of this type of ammonia-alkaline copper etching agent has been proposed.

本発明は上記事情を改善するためなされたもので、酸の
アンモニウム塩及びアンモニア水を特徴とする特殊な銅
エツチング剤を使用し、このアンモニアアルカリ性銅エ
ツチング剤廃液を簡単かつ確実に処理して、処理水の無
害化も確実に達成し、有害物質による自然環境破壊の防
止を計ると共に、廃液中のアンモニアをほぼ100%回
収シてこれをエツチング剤用原料として有効に再利用し
、廃液の更生を容易に行い、しかも有価物質としての銅
もその殆んどを回収し、従ってリサイクリング化が達成
されて省資源対策として有効なアンモニアアルカリ性銅
エツチング剤廃液の処理力法を損供することを目的とす
る。
The present invention was made to improve the above-mentioned situation, and uses a special copper etching agent characterized by an ammonium salt of an acid and aqueous ammonia to easily and reliably treat this ammonia-alkaline copper etching agent waste liquid. In addition to ensuring the detoxification of treated water and preventing the destruction of the natural environment due to harmful substances, we are also renovating the waste liquid by recovering almost 100% of the ammonia in the waste liquid and effectively reusing it as a raw material for etching agents. The purpose of the present invention is to provide a method for processing ammonia-alkaline copper etching agent waste liquid that can be easily carried out, and also recover most of the copper as a valuable substance, thereby achieving recycling and being effective as a resource saving measure. shall be.

即ち、本発明は、上記目的を達成するため、酸のアンモ
ニウム塩とアンモニア水とを主成分とする銅エツチング
剤の廃液に水酸化アルカリ及び/又は炭酸アルカリを加
えてアンモニアガスと酸化銅とを生成させ、このアンモ
ニアガスを酸及ヒ水と反応させてこの酸のアンモニウム
塩とアンモニア水とをそれぞれ生成させると共に、この
酸のアンモニウム塩及びアンモニア水を前記銅エツチン
グ剤用原料として再使用し、かつ前記酸化銅を回収する
ことを特徴とするアンモニアアルカリ性銅エツチング剤
廃液の処理力法を提供するものである。
That is, in order to achieve the above object, the present invention adds alkali hydroxide and/or alkali carbonate to the waste liquid of a copper etching agent whose main components are an ammonium salt of an acid and aqueous ammonia to form ammonia gas and copper oxide. and reacting this ammonia gas with an acid and aqueous arsenic to generate an ammonium salt of this acid and aqueous ammonia, respectively, and reusing the ammonium salt of this acid and aqueous ammonia as raw materials for the copper etching agent, The present invention also provides a method for treating ammonia-alkaline copper etching agent waste liquid, which is characterized in that the copper oxide is recovered.

以下、本発明の詳細につき図面を参照して説明する。Hereinafter, details of the present invention will be explained with reference to the drawings.

本発明に8いて用いられるアンモニアアルカリ性銅エツ
チング剤は、酸のアンモニウム塩とアンモニア水とを主
成分とするもので、銅以外の重金属類は含まれない。
The ammonia-alkaline copper etching agent used in the present invention contains an acid ammonium salt and aqueous ammonia as main components, and does not contain any heavy metals other than copper.

また、前記酸のアンモニウム塩としては、塩化アンモニ
ウム、硫酸アンモニアガスどの無機酸のアンモニウム塩
や酢酸アンモニウム等が単独で、又は2種以上が併用さ
れて用いられる。
Further, as the ammonium salt of the acid, ammonium salts of inorganic acids such as ammonium chloride and ammonium sulfate gas, ammonium acetate, and the like can be used alone or in combination of two or more kinds.

な旧、このエツチング剤はプリント配線基板の製作、そ
の他に使用される。
In the past, this etching agent was used for manufacturing printed wiring boards and other purposes.

そして、前記エツチング剤の廃液中には、エツチング処
理時に?いて前記酸のアンモニウム塩及びアンモニア水
が銅と反応して、銅が銅アルミン錯体の形で多量に含ま
れる。
And, during the etching process, what is contained in the waste liquid of the etching agent? Then, the ammonium salt of the acid and ammonia water react with copper, and a large amount of copper is contained in the form of a copper-aluminium complex.

本発明は、この銅アンミン錯体を多量に含むエツチング
剤廃液を処理するもので、まずエツチング工程より排出
され、エツチング廃液貯槽1に貯えられたエツチング剤
廃液Aを反応槽2に入れ、これに水酸化ナトリウム、水
酸化カリウム等の水酸化アルカリ(必要により炭酸ナト
リウム、炭酸カリウム等の炭酸アルカリを水酸化アルカ
リに代えて、又は水酸化アルカリと併用して使用するこ
ともできる。
In the present invention, the etching agent waste liquid containing a large amount of copper ammine complexes is treated. First, the etching agent waste liquid A discharged from the etching process and stored in the etching waste liquid storage tank 1 is put into the reaction tank 2, and then water is added to the reaction tank 2. Alkali hydroxides such as sodium oxide and potassium hydroxide (if necessary, alkali carbonates such as sodium carbonate and potassium carbonate may be used in place of the alkali hydroxide or in combination with the alkali hydroxide).

)Bを加える。これにより、下記(1)〜(3)もしく
は(1′)〜(3′)の反応式に示すように、廃液A中
の銅アンミン錯体は分解し、この銅アンミン錯体中のア
ンモニア、並びに廃液A中に残存するアンモニウム塩、
水酸化アンモニウムはアンモニアガスCとなって前記反
応槽2より排出されると共に、銅はその全てが黒色で不
溶性の酸化鋼(CuO)Dとなって沈殿する。
) Add B. As a result, as shown in reaction formulas (1) to (3) or (1') to (3') below, the copper ammine complex in waste liquid A is decomposed, and ammonia in this copper ammine complex and waste liquid ammonium salt remaining in A,
Ammonium hydroxide becomes ammonia gas C and is discharged from the reaction tank 2, and all of the copper becomes black and insoluble oxidized steel (CuO) D and precipitates.

なお、炭酸アルカリをガロえた場合、発生する炭酸ガス
はアンモニアガスCと共に排出される。
Incidentally, when alkali carbonate is used, the generated carbon dioxide gas is discharged together with ammonia gas C.

〔水酸化アルカリの場合〕[In the case of alkali hydroxide]

Cu (NH3)7++ 20H−+4NH3+ Cu
O+)I2゜・・・・・・・・・(1) NH4++OH−→NH3+H20・・・・・・・・・
(2)NH40H→NH3+H20・・・・・・・・・
(3)〔炭酸アルカリの場合〕 Cu(NI(3)x+→4NH3+CuO+C02・・
・・・・(1′)2NH,、++ coi −→2NH
3+H20+CO2・・・(2′)NH40H+NH3
+H20・・・・・・(3’、)なおこの場合、廃液A
とアルカIJ Bとの反応は60〜120℃の加熱攪拌
下で行わせることが好ましく、これにより銅アンミン錯
体が確実に分解し、前記反応(1)〜(3)もしくは(
1′)〜(3′)も速やかに進行する。
Cu (NH3)7++ 20H-+4NH3+ Cu
O+)I2゜・・・・・・・・・(1) NH4+++OH−→NH3+H20・・・・・・・・・
(2) NH40H→NH3+H20・・・・・・・・・
(3) [In the case of alkali carbonate] Cu(NI(3)x+→4NH3+CuO+C02...
...(1')2NH,,++ coi -→2NH
3+H20+CO2...(2')NH40H+NH3
+H20...(3',) In this case, waste liquid A
The reaction between IJB and Alka IJB is preferably carried out under heating and stirring at 60 to 120°C, whereby the copper ammine complex is reliably decomposed and the reactions (1) to (3) or (
1') to (3') also proceed rapidly.

また、100℃以上の加熱により水蒸気も発生し、廃液
Aの濃縮が行われる。
In addition, water vapor is also generated by heating to 100° C. or higher, and the waste liquid A is concentrated.

この水蒸気は前記アンモニアガスCと共に反応槽2より
排出される。
This water vapor is discharged from the reaction tank 2 together with the ammonia gas C.

な旧また、前記アルカリは、前記反応(1) 、 (2
)で費消される量にガロえて、更に5〜30係程度余分
に添加することが好ましい。
In addition, the alkali is used for the reactions (1) and (2).
) It is preferable to add about 5 to 30 parts more than the amount consumed.

前記反応塔2より排出されたアンモニアガスCは、必要
により水蒸気を凝縮させた後、第1アンモニア吸収槽4
内に導く。
The ammonia gas C discharged from the reaction tower 2 is sent to the first ammonia absorption tank 4 after condensing water vapor if necessary.
Lead inward.

この吸収槽4内には、塩酸、硫酸、酢酸或いはこれらの
混合物等の酸Eが収容されて2す、アンモニアガスCは
酸Eと反応してこの酸Eのアンモニウム塩Fが生成する
This absorption tank 4 contains an acid E such as hydrochloric acid, sulfuric acid, acetic acid, or a mixture thereof, and ammonia gas C reacts with the acid E to generate an ammonium salt F of the acid E.

(酸Eを水で希釈して使用する場合、アンモニアガスが
この水に吸収されて更に水酸化アンモニウムも生成する
(When acid E is used diluted with water, ammonia gas is absorbed by this water and ammonium hydroxide is also produced.

(この場合、酸Eとしては、前記エツチング剤を構成す
る酸のアンモニウム塩の酸イオン(アニオン)に相応す
る酸を用いることが好ましく(例えば、エツチング剤中
の酸のアンモニウム塩が塩化アンモニウムであれば、前
記酸Eとして塩酸を用いることが好ましい。
(In this case, as acid E, it is preferable to use an acid corresponding to the acid ion (anion) of the ammonium salt of the acid constituting the etching agent (for example, if the ammonium salt of the acid in the etching agent is ammonium chloride) For example, it is preferable to use hydrochloric acid as the acid E.

)、また酸Eの濃度は適宜である。), and the concentration of acid E is appropriate.

更に、アンモニアガスはその当量数に対応する酸と反応
させるようにすることが好ましく、特に生成する酸のア
ンモニウム塩Eと未反応のアンモニアガスが水(前記酸
Eの希釈水及び後述する第2アンモニア吸収槽5内に存
する水)に吸収されることにより生成する水酸化アンモ
ニウム(アンモニア水)との当量比が、前」己エツチン
グ剤中の酸のアンモニウム塩と水酸化ンモニウムとの当
量比に相応するように酸Eと反応させることが好ましい
Further, it is preferable that the ammonia gas is reacted with an acid corresponding to its equivalent number, and in particular, the generated acid ammonium salt E and unreacted ammonia gas are reacted with water (the dilution water of the acid E and the second The equivalence ratio of ammonium hydroxide (ammonium water) produced by absorption into water present in the ammonia absorption tank 5 is equal to the equivalence ratio of ammonium salt of acid in the self-etching agent to ammonium hydroxide. Preference is given to reacting with acid E accordingly.

前記第1吸収槽4内の未反応のアンモニアガスC′は、
次いで水が収容された第2アンモニア吸収槽5内に導き
、ここで未反応アンモニアガスの殆んどを水に吸収させ
て水酸化アンモニウム(アンモニア水)Gを生成させる
The unreacted ammonia gas C' in the first absorption tank 4 is
Next, it is guided into the second ammonia absorption tank 5 containing water, where most of the unreacted ammonia gas is absorbed into water to generate ammonium hydroxide (ammonium water) G.

なお、前記エツチング廃液Aの分解時に2いて炭酸アル
カリを加えた場合に発生する炭酸ガスは反応塔より排出
後これをアルカリ等で吸収させて除去しなければアンモ
ニアの炭酸塩となる。
Incidentally, the carbon dioxide gas generated when alkali carbonate is added during the decomposition of the etching waste liquid A becomes ammonia carbonate unless it is removed by absorption with an alkali or the like after being discharged from the reaction tower.

この吸収槽5よす漏しでた若干のアンモニアガスC“は
脱臭塔6に導いて処理する。
Some ammonia gas C" leaking out of the absorption tank 5 is led to a deodorizing tower 6 for treatment.

前記第1及び第2アンモニア吸収槽4,5内の酸アンモ
ニウム塩とアンモニア水とは(アンモニアの炭酸塩が生
成する場合はこの炭酸塩も)、エツチング剤母液貯槽7
に導いて貯えると共に、この貯槽7よりエツチング剤製
造槽8に導き、水、アンモニア、アンモニウム塩がもし
不足していれば不足分をカロえ、銅エツチング剤を製造
する。
The acid ammonium salt and aqueous ammonia in the first and second ammonia absorption tanks 4 and 5 (including this carbonate if ammonia carbonate is generated) are in the etching agent mother liquor storage tank 7.
At the same time, the copper etching agent is introduced from the storage tank 7 to an etching agent production tank 8, and if there is a shortage of water, ammonia, or ammonium salt, the insufficient amount is filled up to produce a copper etching agent.

このエツチング剤は上述した銅エツチング剤と同様にし
て使用し、またその廃液は上記と同様にして処理し、リ
サイクリング化を行う。
This etching agent is used in the same manner as the copper etching agent described above, and its waste liquid is treated and recycled in the same manner as described above.

なお、前記エツチング剤製造槽8より漏れでたアンモニ
アは前記脱臭塔6に導き、処理する。
Note that ammonia leaked from the etching agent production tank 8 is led to the deodorizing tower 6 and treated.

一方、前記反応槽2内の酸化銅りは、この反応槽2より
抜出し、沈降型等の沈殿洗浄槽9に入れ、上澄液を大部
分除去したのち、水洗用水Hを供給して十分に水洗し、
固液分離後、酸化銅りはフィルタープレス等の脱水機1
0で脱水し、酸化銅ケーキびとする。
On the other hand, the copper oxide in the reaction tank 2 is extracted from the reaction tank 2, placed in a sedimentation cleaning tank 9 such as a sedimentation type, and after removing most of the supernatant liquid, washing water H is supplied to sufficiently remove the copper oxide. Wash with water,
After solid-liquid separation, the copper oxide is transferred to a dehydrator 1 such as a filter press.
Dehydrate at 0 to form a copper oxide cake.

この酸化銅ケーキD′は乾燥機11により乾燥し、酸化
銅粉末D“とするなどして回収する。
This copper oxide cake D' is dried in a dryer 11 and recovered as copper oxide powder D''.

なお、この酸化銅は、純度が高く、これ自体試薬あるい
は顔料等にもなり得るが、酸、例えば硫酸や塩酸に溶解
して硫酸銅又は塩化銅の水溶液と成せば、電気分解によ
り、再びプリント配線基板用の銅箔製造に用いることも
できる。
This copper oxide has a high purity and can be used as a reagent or pigment in itself, but if it is dissolved in an acid such as sulfuric acid or hydrochloric acid to form an aqueous solution of copper sulfate or copper chloride, it can be used for printing again by electrolysis. It can also be used to manufacture copper foil for wiring boards.

また、沈殿洗浄槽9内の上澄液(処理水)■は、。In addition, the supernatant liquid (treated water) in the sedimentation cleaning tank 9 is as follows.

精密涙過機12等により浮遊物質(酸化銅)D“′を除
去しくこの酸化銅D“′は前記酸化銅ケーキD′と一緒
にする)、次G)で前記フィルタープレス10より排出
された排水、■と共に排水管理槽13に送り、ここでp
Hを5.8〜8.6に調整して放流する。
The suspended solids (copper oxide) D"' are removed using a precision tear filter 12 or the like, and this copper oxide D"' is combined with the copper oxide cake D'), and then discharged from the filter press 10 in G). The wastewater is sent to the wastewater management tank 13 together with ■, where p
Adjust H to 5.8 to 8.6 and discharge.

而して、上述した本発明に係る処理法によれば、酸のア
ンモニウム塩とアンモニア水とを主成分とするアンモニ
アアルカリ性銅エツチング剤の廃液に水酸化アルカリ及
び/又は炭酸アルカリをカロえてアンモニアガスを発生
させ、このアンモニアガスを酸及び水と反応させるので
、エツチング剤廃液中のアンモニア分が銅エツチング剤
の有価原料である前記酸のアンモニウム塩及び水酸化ア
ンモニウム(アンモニア水)として確実に固定され、廃
液中のアンモニア分がほぼ1. o o %回収される
According to the treatment method according to the present invention described above, ammonia gas is produced by adding alkali hydroxide and/or alkali carbonate to the waste liquid of an ammonia-alkaline copper etching agent whose main components are an ammonium salt of an acid and aqueous ammonia. Since this ammonia gas is reacted with acid and water, the ammonia content in the etching agent waste liquid is reliably fixed as the ammonium salt of the acid and ammonium hydroxide (ammonia water), which are valuable raw materials for the copper etching agent. , the ammonia content in the waste liquid is approximately 1. o o% recovered.

また、廃液中のアンモニア分を酸のアンモニウム塩及び
アンモニア水としてエツチング剤用原料に有効に再使用
することができ、廃液の更生が無駄なく、効率的に行わ
れる。
Further, the ammonia content in the waste liquid can be effectively reused as a raw material for an etching agent as an acid ammonium salt and aqueous ammonia, and the waste liquid can be regenerated efficiently without waste.

しかも、この廃液の処理、更生時にエツチング剤に悪影
響を及ぼす不純物か混入する?それは全くなく、更生エ
ツチング剤は良好に使用され、エツチング剤成分の循環
再使用が効果的に行われる。
Moreover, during the treatment and rehabilitation of this waste liquid, are there any impurities mixed in that have a negative effect on the etching agent? This is not the case at all, and the refurbished etching agent is used successfully, and the etching agent components are effectively recycled.

更に、廃液中の銅分の全てを有効に回収できると共に、
銅分は溶解度が低く、また、かさが低く、クーのし易い
酸化銅(Cub)として回収できるので、上澄液(処理
水)中番)銅の漏れが殆んどなく、処理水はpH調整だ
けで放流することができる。
Furthermore, all of the copper content in the waste liquid can be effectively recovered, and
Copper has low solubility and can be recovered as copper oxide (Cub), which has low bulk and is easily cooled, so there is almost no leakage of copper in the supernatant liquid (processed water), and the treated water has a low pH. It can be released by simply making adjustments.

このように、本発明によれば、特殊なアンモニアアルカ
リ性エツチング剤の使用により、その廃液を有効に処理
して有価成分の回収、リサイクリング化が達成され、省
資源対策として優れ、かつ公1の発生を確実に防止する
ことができる。
As described above, according to the present invention, by using a special ammonia-alkaline etching agent, the waste liquid can be effectively treated, valuable components can be recovered, and recycling can be achieved. This can be reliably prevented from occurring.

また1、本発明法は操作も簡単であり、エツチング剤廃
液を容易に、しかも確実に処理できると共に、上述した
ように有価成分の再利用、リサイクリング化も達成され
て、経済的に処理できる等、種々の利点を有する。
In addition, 1. The method of the present invention is easy to operate, and the etching agent waste liquid can be treated easily and reliably, and as mentioned above, valuable components can be reused and recycled, making it possible to treat it economically. It has various advantages such as

以下実施例を示し、本発明を更に具体的に説明するが、
本発明はこの実施例に限定されるものではない。
The present invention will be explained in more detail with reference to Examples below.
The invention is not limited to this example.

実施例 下記組成物 水 61,7重量% 塩化アンモニウム 22.5 tt ’(4,2モ
ル)水酸化アンモニウム 15.8 tt (4,
5モル)の銅エツチング剤を使用した後の廃液を図面に
示す通りの工程で処理した。
ExamplesThe following compositionWater 61.7% by weightAmmonium chloride 22.5 tt' (4.2 mol)Ammonium hydroxide 15.8 tt (4,
The waste liquid after using 5 mol of copper etching agent was treated according to the steps shown in the drawing.

即ち、・一回の処理量5m3中に 塩化銅アンモニウム 1013Kp塩化アンモニ
ウム 10.7 tt水酸化アンモニウム
175〃 を含有する銅エツチング剤廃液を115℃に加熱し、水
酸化ナトリウム900に9をカロえ、1時間攪拌処理す
ることにより、この反応で アンモニアガス 740に9水蒸気
1.25 ma 酸化銅 795像 塩化ナトリウム 1170 tt水酸化ナト
リウム 100〃 を得た。
That is, - A copper etching agent waste solution containing 1013 Kp of cupric ammonium chloride, 10.7 tt of ammonium hydroxide, and 175 tt of ammonium hydroxide in a single treatment amount of 5 m3 was heated to 115°C, and 90% of sodium hydroxide was added to the solution, By stirring for 1 hour, this reaction produces 740% ammonia gas and 9% water vapor.
1.25 ma Copper oxide 795 images Sodium chloride 1170 tt Sodium hydroxide 100〃 were obtained.

前記アンモニアガスと水蒸気とは濃塩酸1.75m3及
び水と反応させ、約4.5 mBの生成物(塩化アンモ
ニウム1124kg(4°66モル)、水酸化アンモニ
ウム788kg(5,0モル)を含有)を得た。
The ammonia gas and water vapor were reacted with 1.75 m3 of concentrated hydrochloric acid and water to produce a product of approximately 4.5 mB (containing 1124 kg (4°66 mol) of ammonium chloride and 788 kg (5.0 mol) of ammonium hydroxide). I got it.

この生成物は塩化アンモニウムと水酸化アンモニウムと
のモル比が前記銅エツチング剤と同じであり、そのまま
前記釦1エツチング剤川原石として使用し、水に希釈す
るだけでエツチング剤を得た。
This product had the same molar ratio of ammonium chloride and ammonium hydroxide as the copper etching agent, and was used as it was as the river stone for the button 1 etching agent, and the etching agent was obtained by simply diluting it with water.

一力、前記酸化銅795に7、塩化すl−+7ウム11
70に9、水酸化ナトリウム100kgを含む濃厚スラ
IJ−3,75m3はいったん沈降させ、上澄液を除去
し、水洗水4.4m3でよく水洗し、次いで再び沈降し
た酸化銅を抜き出し、フィルタープレスで脱水し、乾燥
して、酸化銅粉末795ゆを得た。
One power, 7 to the copper oxide 795, 11 um of chloride l-+7
70 to 9, 75 m3 of concentrated slug IJ-3 containing 100 kg of sodium hydroxide was once sedimented, the supernatant liquid was removed, and thoroughly washed with 4.4 m3 of washing water, and then the precipitated copper oxide was extracted again and filter press The powder was dehydrated and dried to obtain 795 g of copper oxide powder.

また、酸化銅1を沈降させた上澄液及びフィルタープレ
スからの排水は、塩酸を刃口えてpH7、0に調整した
後、放流した。
Further, the supernatant liquid in which the copper oxide 1 was precipitated and the waste water from the filter press were adjusted to pH 7.0 by adding hydrochloric acid, and then discharged.

な8、前記アンモニアガスと塩酸、水との反応により得
られた塩化アンモニウム及びアンモニア水を用いて得た
エツチング剤は良好に使用することができた。
8. The etching agent obtained using ammonium chloride and ammonia water obtained by the reaction of ammonia gas with hydrochloric acid and water could be used satisfactorily.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本発明の一実施例を示すフローシートである。 1・・・・・・エツチング廃液貯槽、2・・・・・・反
応槽、4・・・・・・第1アンモニア吸収槽、5・・・
・・・第2アンモニア吸収槽、7・・・・・・エツチン
グ剤母液貯槽、8・・・・・・エツチング剤製造槽、9
・・・・・・沈殿洗浄槽、10・・・・・・脱水機、1
3・・・・・・排水管理槽、A・・・・・・エツチング
剤廃液、B・・・・・・水酸化アルカリ、C、C’・・
・・・・アンモニアガス、D 、 I)’ 、 D /
/ 、 D///・・・・・・酸化銅、E・・・・・・
無機酸、F・・・・・・無機酸のアンモニウム塩、G・
・・・・・水酸化アンモニウム。
The drawing is a flow sheet showing one embodiment of the present invention. 1...Etching waste liquid storage tank, 2...Reaction tank, 4...First ammonia absorption tank, 5...
... Second ammonia absorption tank, 7 ... Etching agent mother liquor storage tank, 8 ... Etching agent production tank, 9
... Sedimentation cleaning tank, 10 ... Dehydrator, 1
3...Drainage management tank, A...Etching agent waste, B...Alkali hydroxide, C, C'...
...Ammonia gas, D, I)', D/
/ , D///・・・・・・Copper oxide, E・・・・・・
Inorganic acid, F... Ammonium salt of inorganic acid, G.
...Ammonium hydroxide.

Claims (1)

【特許請求の範囲】 1 酸のアンモニウム塩とアンモニア水とを主成分とす
る銅エツチング剤の廃液に水酸化アルカリ及び/又は炭
酸アルカリを加えてアンモニアガスと酸化銅とを生成さ
せ、このアンモニアガスヲ酸及び水と反応させてこの酸
のアンモニウム塩とアンモニア水とをそれぞれ生成させ
ると共に、生成したこの酸のアンモニウム塩及びアンモ
ニア水を前記銅エツチング剤用原料として再使用し、か
つ前記酸化銅を回収することを特徴とするエツチング剤
廃液の処理方法。 2 銅エツチング剤を構成する酸のアンモニウム塩が塩
化アンモニウム、硫:酸アンモニウム、及び酢酸アンモ
ニア水からなる群より選ばれる一種以上であり、かつア
ンモニアガスと反応させる酸が塩酸、硫酸、及び酢酸か
らなる群より選ばれる一種以上である特許請求の範囲第
1項記載のエツチング剤廃液の処理方法。
[Claims] 1. Ammonia gas and copper oxide are produced by adding alkali hydroxide and/or alkali carbonate to the waste liquid of a copper etching agent whose main components are an ammonium salt of an acid and aqueous ammonia. The ammonium salt of this acid and the aqueous ammonia are respectively produced by reacting with the acid and water, and the produced ammonium salt of the acid and the aqueous ammonia are reused as raw materials for the copper etching agent, and the copper oxide is A method for treating etching agent waste, the method comprising recovering the etching agent waste. 2. The ammonium salt of the acid constituting the copper etching agent is one or more selected from the group consisting of ammonium chloride, ammonium sulfuric acid, and aqueous ammonium acetate, and the acid to be reacted with ammonia gas is selected from hydrochloric acid, sulfuric acid, and acetic acid. The method for treating etching agent waste according to claim 1, wherein the etching agent is one or more selected from the group consisting of:
JP1444978A 1978-02-10 1978-02-10 Etching agent waste treatment method Expired JPS5817260B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1444978A JPS5817260B2 (en) 1978-02-10 1978-02-10 Etching agent waste treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1444978A JPS5817260B2 (en) 1978-02-10 1978-02-10 Etching agent waste treatment method

Publications (2)

Publication Number Publication Date
JPS54107441A JPS54107441A (en) 1979-08-23
JPS5817260B2 true JPS5817260B2 (en) 1983-04-06

Family

ID=11861334

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1444978A Expired JPS5817260B2 (en) 1978-02-10 1978-02-10 Etching agent waste treatment method

Country Status (1)

Country Link
JP (1) JPS5817260B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103602988A (en) * 2013-10-30 2014-02-26 中国科学院过程工程研究所 Resourceful treatment and cyclic utilization method of PCB circuit board waste etching liquid

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6264674B1 (en) 1998-11-09 2001-07-24 Robert L. Washington Process for hot stretching braided ligatures
KR100964543B1 (en) * 2008-10-31 2010-06-21 주식회사 하이소닉 Cover for compact image photographing device and making methode of the same and compact image photographing device with the same
JP5866823B2 (en) * 2011-06-29 2016-02-24 三菱レイヨン株式会社 Waste water treatment method and treatment apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103602988A (en) * 2013-10-30 2014-02-26 中国科学院过程工程研究所 Resourceful treatment and cyclic utilization method of PCB circuit board waste etching liquid

Also Published As

Publication number Publication date
JPS54107441A (en) 1979-08-23

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